ES2142106T3 - Dispositivo para producir plasma mediante microondas. - Google Patents

Dispositivo para producir plasma mediante microondas.

Info

Publication number
ES2142106T3
ES2142106T3 ES96944062T ES96944062T ES2142106T3 ES 2142106 T3 ES2142106 T3 ES 2142106T3 ES 96944062 T ES96944062 T ES 96944062T ES 96944062 T ES96944062 T ES 96944062T ES 2142106 T3 ES2142106 T3 ES 2142106T3
Authority
ES
Spain
Prior art keywords
resonator
chamber
microwaves
microwave
common wall
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES96944062T
Other languages
English (en)
Inventor
Benedikt Aschermann
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Application granted granted Critical
Publication of ES2142106T3 publication Critical patent/ES2142106T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32211—Means for coupling power to the plasma
    • H01J37/32229—Waveguides
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32211—Means for coupling power to the plasma
    • H01J37/32247—Resonators
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)
  • Drying Of Semiconductors (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Manufacture And Refinement Of Metals (AREA)

Abstract

LA INVENCION SE REFIERE A UN DISPOSITIVO PARA GENERAR PLASMAS DE MICROONDAS CON UN GENERADOR DE MICROONDAS (1) Y SU ACOPLAMIENTO A UN RESONADOR DE GUIA DE ONDAS (5), QUE COMPRENDE UNA CAMARA DE PLASMA (7). EL LADO CORTO DE LA SECCION DEL RESONADOR (5) SE SITUA PARALELO AL EJE Z EN LA PARED COMUN CON LA CAMARA (7) Y LA POTENCIA DE LAS MICROONDAS DEL RESONADOR (5) SE MODULA MEDIANTE PUNTOS DE ACOPLAMIENTO (6) EN ESTE LADO CORTO DE LA SECCION EN LA CAMARA (7). LOS PUNTOS DE ACOPLAMIENTO SE EJECUTAN CON PREFERENCIA COMO ACOPLADORES DE VENTANA AZIMUTAL EN LA PARED COMUN DE 5 Y 7.
ES96944062T 1996-01-05 1996-12-23 Dispositivo para producir plasma mediante microondas. Expired - Lifetime ES2142106T3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19600223A DE19600223A1 (de) 1996-01-05 1996-01-05 Vorrichtung zur Erzeugung von Plasmen mittels Mikrowellen

Publications (1)

Publication Number Publication Date
ES2142106T3 true ES2142106T3 (es) 2000-04-01

Family

ID=7782185

Family Applications (1)

Application Number Title Priority Date Filing Date
ES96944062T Expired - Lifetime ES2142106T3 (es) 1996-01-05 1996-12-23 Dispositivo para producir plasma mediante microondas.

Country Status (10)

Country Link
US (1) US6198224B1 (es)
EP (1) EP0872164B1 (es)
JP (1) JP3571054B2 (es)
KR (1) KR100358902B1 (es)
AT (1) ATE187033T1 (es)
AU (1) AU713071B2 (es)
CA (1) CA2241886C (es)
DE (2) DE19600223A1 (es)
ES (1) ES2142106T3 (es)
WO (1) WO1997025837A1 (es)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU747272B2 (en) * 1997-09-30 2002-05-09 Tetra Laval Holdings & Finance Sa Method and apparatus for treating the inside surface of plastic bottles in a plasma enhanced process
DE19802971C2 (de) * 1998-01-27 1999-12-02 Fraunhofer Ges Forschung Plasmareaktor
FR2797372B1 (fr) * 1999-08-04 2002-10-25 Metal Process Procede de production de plasmas elementaires en vue de creer un plasma uniforme pour une surface d'utilisation et dispositif de production d'un tel plasma
DE10138696A1 (de) * 2001-08-07 2003-03-06 Schott Glas Verfahren und Vorrichtung zum gleichzeitigen Beschichten und Formen eines dreidimensionalen Körpers
AU2002354375A1 (en) * 2001-12-04 2003-06-17 Draka Fibre Technology B.V. Device for applying an electromagnetic microwave to a plasma container
KR100500360B1 (ko) * 2002-01-26 2005-07-12 고등기술연구원연구조합 고효율 상압 마이크로웨이브 플라즈마시스템
US20050212626A1 (en) * 2002-05-07 2005-09-29 Toshiyuki Takamatsu High frequency reaction processing system
KR20050053595A (ko) 2002-07-23 2005-06-08 이프라스 게엠베하 기체 반응을 실시하기 위한 플라즈마 반응기, 및 가스의플라즈마 조장된 반응을 위한 방법
RU2222878C1 (ru) * 2002-07-25 2004-01-27 Федеральное государственное унитарное предприятие "Научно-производственное предприятие "Исток" СВЧ устройство для генерации плазмоидов типа шаровых молний (варианты)
NL1025155C2 (nl) * 2003-12-30 2005-07-04 Draka Fibre Technology Bv Inrichting voor het uitvoeren van PCVD, alsmede werkwijze voor het vervaardigen van een voorvorm.
KR101096950B1 (ko) * 2004-03-19 2011-12-20 샤프 가부시키가이샤 플라즈마 처리장치 및 플라즈마 처리방법
US7557364B2 (en) * 2004-05-25 2009-07-07 Panasonic Corporation Charge neutralizing device
US20070194155A1 (en) * 2005-07-18 2007-08-23 Kendall Jeffrey D Broadcast spreader with rate control system
DE102007028293B4 (de) * 2007-06-20 2009-09-03 Universität Augsburg Plasmareaktor, dessen Verwendung und Verfahren zur Herstellung einkristalliner Diamantschichten
EP2086285A1 (en) * 2008-02-01 2009-08-05 Anton Paar GmbH Applicator and Apparatus for heating samples by microwave radiation
EP2418150B1 (de) 2010-08-13 2013-03-06 MULTIVAC Sepp Haggenmüller GmbH & Co KG Verfahren zum Verpacken, Tiefziehverpackungsmaschine und Verpackung
US9237639B2 (en) * 2011-06-24 2016-01-12 Recarbon, Inc. Microwave resonant cavity
DE102011111884B3 (de) * 2011-08-31 2012-08-30 Martin Weisgerber Verfahren und Vorrichtung zur Erzeugung von thermodynamisch kaltem Mikrowellenplasma
NL2007809C2 (en) 2011-11-17 2013-05-21 Draka Comteq Bv An apparatus for performing a plasma chemical vapour deposition process.
DE102013215252A1 (de) * 2013-08-02 2015-02-05 Eeplasma Gmbh Vorrichtung und Verfahren zur Behandlung von Prozessgasen in einem Plasma angeregt durch elektromagnetische Wellen hoher Frequenz
FR3019708B1 (fr) * 2014-04-04 2016-05-06 Hydromecanique & Frottement Procede et dispositif pour generer un plasma excite par une energie micro-onde dans le domaine de la resonnance cyclonique electronique (rce), pour realiser un traitement de surface ou revetement autour d'un element filiforme.
DE102014016380A1 (de) 2014-11-06 2016-05-12 Brückner Maschinenbau GmbH & Co. KG Plasma Abgasreinigung
KR20170075394A (ko) * 2015-12-23 2017-07-03 한국기초과학지원연구원 고밀도 마이크로파 플라즈마 장치
NL2017575B1 (en) 2016-10-04 2018-04-13 Draka Comteq Bv A method and an apparatus for performing a plasma chemical vapour deposition process and a method
DE102017215471A1 (de) 2017-09-04 2019-03-07 Audi Ag Verwendung eines Plasmas als Ionenleiter einer Brennstoffzelle
DE102018000401A1 (de) 2018-01-19 2019-07-25 Ralf Spitzl Mikrowellenplasmavorrichtung
EP4539245A4 (en) 2022-06-08 2026-08-19 National Inst Of Advanced Industrial Science And Technology Microwave Plasma CVD Device
CN118270975A (zh) * 2024-03-22 2024-07-02 锐光信通科技有限公司 一种用于气相沉积的微波等离子体谐振腔

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3476968A (en) * 1966-12-19 1969-11-04 Hitachi Ltd Microwave ion source
US3577207A (en) * 1969-05-07 1971-05-04 Vladimir Pavlovich Kirjushin Microwave plasmatron
FR2147497A5 (es) * 1971-07-29 1973-03-09 Commissariat Energie Atomique
FR2668676B2 (fr) * 1986-06-06 1993-06-11 Univ Bordeaux 1 Dispositif perfectionne pour l'application de micro-ondes.
US4883570A (en) * 1987-06-08 1989-11-28 Research-Cottrell, Inc. Apparatus and method for enhanced chemical processing in high pressure and atmospheric plasmas produced by high frequency electromagnetic waves
FR2631199B1 (fr) * 1988-05-09 1991-03-15 Centre Nat Rech Scient Reacteur a plasma
DE3923390A1 (de) * 1988-07-14 1990-01-25 Canon Kk Vorrichtung zur bildung eines grossflaechigen aufgedampften films unter verwendung von wenigstens zwei getrennt gebildeten aktivierten gasen
FR2647293B1 (fr) * 1989-05-18 1996-06-28 Defitech Sa Reacteur a plasma perfectionne muni de moyens de couplage d'ondes electromagnetiques
DE4111314C2 (de) * 1991-04-08 1995-04-20 Allied Colloids Gmbh Verfahren zur biologischen Trocknung von Klärschlamm
FR2689717B1 (fr) * 1992-04-03 1994-05-13 Commissariat A Energie Atomique Dispositif d'application de micro-ondes et reacteur a plasma utilisant ce dispositif.
DE4235914A1 (de) * 1992-10-23 1994-04-28 Juergen Prof Dr Engemann Vorrichtung zur Erzeugung von Mikrowellenplasmen
FR2702328B1 (fr) * 1993-03-05 1995-05-12 Univ Lille Sciences Tech Dispositif de production d'un plasma.
DE9405808U1 (de) * 1994-04-11 1994-06-09 Süßmuth, Norbert, Dipl.-Ing., 38106 Braunschweig Plasma-Bearbeitungsgerät

Also Published As

Publication number Publication date
EP0872164A1 (de) 1998-10-21
AU1378597A (en) 1997-08-01
US6198224B1 (en) 2001-03-06
CA2241886A1 (en) 1997-07-17
JP2000515296A (ja) 2000-11-14
KR100358902B1 (ko) 2003-01-14
DE59603738D1 (de) 1999-12-30
KR19990077065A (ko) 1999-10-25
ATE187033T1 (de) 1999-12-15
WO1997025837A1 (de) 1997-07-17
DE19600223A1 (de) 1997-07-17
EP0872164B1 (de) 1999-11-24
AU713071B2 (en) 1999-11-25
CA2241886C (en) 2004-03-23
JP3571054B2 (ja) 2004-09-29

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