JP2000515296A - マイクロ波を利用したプラズマ発生装置 - Google Patents
マイクロ波を利用したプラズマ発生装置Info
- Publication number
- JP2000515296A JP2000515296A JP09524812A JP52481297A JP2000515296A JP 2000515296 A JP2000515296 A JP 2000515296A JP 09524812 A JP09524812 A JP 09524812A JP 52481297 A JP52481297 A JP 52481297A JP 2000515296 A JP2000515296 A JP 2000515296A
- Authority
- JP
- Japan
- Prior art keywords
- resonator
- chamber
- microwave
- plasma
- connection point
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32192—Microwave generated discharge
- H01J37/32211—Means for coupling power to the plasma
- H01J37/32229—Waveguides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32192—Microwave generated discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32192—Microwave generated discharge
- H01J37/32211—Means for coupling power to the plasma
- H01J37/32247—Resonators
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electromagnetism (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Plasma Technology (AREA)
- Drying Of Semiconductors (AREA)
- Chemical Vapour Deposition (AREA)
- Electron Sources, Ion Sources (AREA)
- Manufacture And Refinement Of Metals (AREA)
Abstract
Description
Claims (1)
- 【特許請求の範囲】 1.プラズマチェンバ及び共振器を備えたマイクロ波プラズマ発生装置であり、 共振器5の断面短辺が共振器5とプラズマチェンバ7間の壁にある共通軸zに面 しており、マイクロ波パワーが共振器5から、共振器5の断面短辺にある連結点 6を介してチェンバ7に連結されていることを特徴とするマイクロ波発生装置。 2.連結点6が、共振器5,チェンバ7の共通壁の配向スロットカプラーとして 形成されていることを特徴とする請求項1に記載の装置。 3.連結点6が、共振器5,チェンバ7の共通壁にアンテナまたはループとして 形成されていることを特徴とする請求項1に記載の装置。 4.プラズマチェンバ7が立方形、直平行六面形(cuboid)、方形または矩形柱、 円筒等の形態のマイクロ波共振器として設計されていることを特徴とする請求項 1から3のいずれかに記載の装置。 5.電気コイル8又は永久磁石を付加することによって磁界がチェンバ7内に生 じることを特徴とする請求項1から4のいずれかに記載の装置。 6.共振器5がチェンバ7を囲むことを特徴とする請求項1から3のいずれかに 記載のデバイス。
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19600223.0 | 1996-01-05 | ||
| DE19600223A DE19600223A1 (de) | 1996-01-05 | 1996-01-05 | Vorrichtung zur Erzeugung von Plasmen mittels Mikrowellen |
| PCT/EP1996/005821 WO1997025837A1 (de) | 1996-01-05 | 1996-12-23 | Vorrichtung zur erzeugung von plasmen mittels mikrowellen |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2000515296A true JP2000515296A (ja) | 2000-11-14 |
| JP3571054B2 JP3571054B2 (ja) | 2004-09-29 |
Family
ID=7782185
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP52481297A Expired - Fee Related JP3571054B2 (ja) | 1996-01-05 | 1996-12-23 | マイクロ波を利用したプラズマ発生装置 |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US6198224B1 (ja) |
| EP (1) | EP0872164B1 (ja) |
| JP (1) | JP3571054B2 (ja) |
| KR (1) | KR100358902B1 (ja) |
| AT (1) | ATE187033T1 (ja) |
| AU (1) | AU713071B2 (ja) |
| CA (1) | CA2241886C (ja) |
| DE (2) | DE19600223A1 (ja) |
| ES (1) | ES2142106T3 (ja) |
| WO (1) | WO1997025837A1 (ja) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4782984B2 (ja) * | 2001-12-04 | 2011-09-28 | ドゥラカ ファイバー テクノロジー ベー ヴェー | プラズマキャビティ内に電磁マイクロ波放射を適用する装置を用いたプラズマ処理装置及び方法 |
| JP2014524106A (ja) * | 2011-06-24 | 2014-09-18 | リカーボン,インコーポレイテッド | マイクロ波共鳴空洞 |
| JP2017517638A (ja) * | 2014-04-04 | 2017-06-29 | アッシュ・ウー・エフ | 糸状コンポーネントの表面処理または被覆を実行するための電子サイクロトロン共鳴(ecr)の場におけるマイクロ波エネルギーによってエネルギーを付与されたプラズマを発生するためのプロセス及びデバイス |
| WO2023238826A1 (ja) | 2022-06-08 | 2023-12-14 | 国立研究開発法人産業技術総合研究所 | マイクロ波プラズマcvd装置 |
Families Citing this family (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW449623B (en) * | 1997-09-30 | 2001-08-11 | Tetra Laval Holdings & Amp Fin | Method and apparatus for treating the inside surface of plastic bottles in a plasma enhanced process |
| DE19802971C2 (de) * | 1998-01-27 | 1999-12-02 | Fraunhofer Ges Forschung | Plasmareaktor |
| FR2797372B1 (fr) * | 1999-08-04 | 2002-10-25 | Metal Process | Procede de production de plasmas elementaires en vue de creer un plasma uniforme pour une surface d'utilisation et dispositif de production d'un tel plasma |
| DE10138696A1 (de) * | 2001-08-07 | 2003-03-06 | Schott Glas | Verfahren und Vorrichtung zum gleichzeitigen Beschichten und Formen eines dreidimensionalen Körpers |
| KR100500360B1 (ko) * | 2002-01-26 | 2005-07-12 | 고등기술연구원연구조합 | 고효율 상압 마이크로웨이브 플라즈마시스템 |
| US20050212626A1 (en) * | 2002-05-07 | 2005-09-29 | Toshiyuki Takamatsu | High frequency reaction processing system |
| AU2003251444A1 (en) | 2002-07-23 | 2004-02-09 | Iplas Gmbh | Plasma reactor for carrying out gas reactions and method for the plasma-supported reaction of gases |
| RU2222878C1 (ru) * | 2002-07-25 | 2004-01-27 | Федеральное государственное унитарное предприятие "Научно-производственное предприятие "Исток" | СВЧ устройство для генерации плазмоидов типа шаровых молний (варианты) |
| NL1025155C2 (nl) * | 2003-12-30 | 2005-07-04 | Draka Fibre Technology Bv | Inrichting voor het uitvoeren van PCVD, alsmede werkwijze voor het vervaardigen van een voorvorm. |
| TW200532060A (en) * | 2004-03-19 | 2005-10-01 | Adv Lcd Tech Dev Ct Co Ltd | Plasma treatment apparatus and plasma treatment |
| EP1753009A4 (en) * | 2004-05-25 | 2011-07-06 | Panasonic Corp | CHARGE NEUTRALIZATION DEVICE |
| US20070194155A1 (en) * | 2005-07-18 | 2007-08-23 | Kendall Jeffrey D | Broadcast spreader with rate control system |
| DE102007028293B4 (de) * | 2007-06-20 | 2009-09-03 | Universität Augsburg | Plasmareaktor, dessen Verwendung und Verfahren zur Herstellung einkristalliner Diamantschichten |
| EP2086285A1 (en) * | 2008-02-01 | 2009-08-05 | Anton Paar GmbH | Applicator and Apparatus for heating samples by microwave radiation |
| EP2418150B1 (de) | 2010-08-13 | 2013-03-06 | MULTIVAC Sepp Haggenmüller GmbH & Co KG | Verfahren zum Verpacken, Tiefziehverpackungsmaschine und Verpackung |
| DE102011111884B3 (de) * | 2011-08-31 | 2012-08-30 | Martin Weisgerber | Verfahren und Vorrichtung zur Erzeugung von thermodynamisch kaltem Mikrowellenplasma |
| NL2007809C2 (en) * | 2011-11-17 | 2013-05-21 | Draka Comteq Bv | An apparatus for performing a plasma chemical vapour deposition process. |
| DE102013215252A1 (de) * | 2013-08-02 | 2015-02-05 | Eeplasma Gmbh | Vorrichtung und Verfahren zur Behandlung von Prozessgasen in einem Plasma angeregt durch elektromagnetische Wellen hoher Frequenz |
| DE102014016380A1 (de) | 2014-11-06 | 2016-05-12 | Brückner Maschinenbau GmbH & Co. KG | Plasma Abgasreinigung |
| KR20170075394A (ko) * | 2015-12-23 | 2017-07-03 | 한국기초과학지원연구원 | 고밀도 마이크로파 플라즈마 장치 |
| NL2017575B1 (en) | 2016-10-04 | 2018-04-13 | Draka Comteq Bv | A method and an apparatus for performing a plasma chemical vapour deposition process and a method |
| DE102017215471A1 (de) | 2017-09-04 | 2019-03-07 | Audi Ag | Verwendung eines Plasmas als Ionenleiter einer Brennstoffzelle |
| DE102018000401A1 (de) | 2018-01-19 | 2019-07-25 | Ralf Spitzl | Mikrowellenplasmavorrichtung |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3476968A (en) * | 1966-12-19 | 1969-11-04 | Hitachi Ltd | Microwave ion source |
| US3577207A (en) * | 1969-05-07 | 1971-05-04 | Vladimir Pavlovich Kirjushin | Microwave plasmatron |
| FR2147497A5 (ja) * | 1971-07-29 | 1973-03-09 | Commissariat Energie Atomique | |
| FR2668676B2 (fr) * | 1986-06-06 | 1993-06-11 | Univ Bordeaux 1 | Dispositif perfectionne pour l'application de micro-ondes. |
| US4883570A (en) * | 1987-06-08 | 1989-11-28 | Research-Cottrell, Inc. | Apparatus and method for enhanced chemical processing in high pressure and atmospheric plasmas produced by high frequency electromagnetic waves |
| FR2631199B1 (fr) * | 1988-05-09 | 1991-03-15 | Centre Nat Rech Scient | Reacteur a plasma |
| DE3923390A1 (de) * | 1988-07-14 | 1990-01-25 | Canon Kk | Vorrichtung zur bildung eines grossflaechigen aufgedampften films unter verwendung von wenigstens zwei getrennt gebildeten aktivierten gasen |
| FR2647293B1 (fr) * | 1989-05-18 | 1996-06-28 | Defitech Sa | Reacteur a plasma perfectionne muni de moyens de couplage d'ondes electromagnetiques |
| DE4111314C2 (de) * | 1991-04-08 | 1995-04-20 | Allied Colloids Gmbh | Verfahren zur biologischen Trocknung von Klärschlamm |
| FR2689717B1 (fr) * | 1992-04-03 | 1994-05-13 | Commissariat A Energie Atomique | Dispositif d'application de micro-ondes et reacteur a plasma utilisant ce dispositif. |
| DE4235914A1 (de) * | 1992-10-23 | 1994-04-28 | Juergen Prof Dr Engemann | Vorrichtung zur Erzeugung von Mikrowellenplasmen |
| FR2702328B1 (fr) * | 1993-03-05 | 1995-05-12 | Univ Lille Sciences Tech | Dispositif de production d'un plasma. |
| DE9405808U1 (de) * | 1994-04-11 | 1994-06-09 | Süßmuth, Norbert, Dipl.-Ing., 38106 Braunschweig | Plasma-Bearbeitungsgerät |
-
1996
- 1996-01-05 DE DE19600223A patent/DE19600223A1/de not_active Withdrawn
- 1996-12-23 EP EP96944062A patent/EP0872164B1/de not_active Expired - Lifetime
- 1996-12-23 AT AT96944062T patent/ATE187033T1/de not_active IP Right Cessation
- 1996-12-23 DE DE59603738T patent/DE59603738D1/de not_active Expired - Lifetime
- 1996-12-23 WO PCT/EP1996/005821 patent/WO1997025837A1/de not_active Ceased
- 1996-12-23 AU AU13785/97A patent/AU713071B2/en not_active Ceased
- 1996-12-23 KR KR10-1998-0705198A patent/KR100358902B1/ko not_active Expired - Fee Related
- 1996-12-23 ES ES96944062T patent/ES2142106T3/es not_active Expired - Lifetime
- 1996-12-23 CA CA002241886A patent/CA2241886C/en not_active Expired - Fee Related
- 1996-12-23 US US09/101,314 patent/US6198224B1/en not_active Expired - Lifetime
- 1996-12-23 JP JP52481297A patent/JP3571054B2/ja not_active Expired - Fee Related
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4782984B2 (ja) * | 2001-12-04 | 2011-09-28 | ドゥラカ ファイバー テクノロジー ベー ヴェー | プラズマキャビティ内に電磁マイクロ波放射を適用する装置を用いたプラズマ処理装置及び方法 |
| JP2014524106A (ja) * | 2011-06-24 | 2014-09-18 | リカーボン,インコーポレイテッド | マイクロ波共鳴空洞 |
| JP2017517638A (ja) * | 2014-04-04 | 2017-06-29 | アッシュ・ウー・エフ | 糸状コンポーネントの表面処理または被覆を実行するための電子サイクロトロン共鳴(ecr)の場におけるマイクロ波エネルギーによってエネルギーを付与されたプラズマを発生するためのプロセス及びデバイス |
| WO2023238826A1 (ja) | 2022-06-08 | 2023-12-14 | 国立研究開発法人産業技術総合研究所 | マイクロ波プラズマcvd装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3571054B2 (ja) | 2004-09-29 |
| KR100358902B1 (ko) | 2003-01-14 |
| WO1997025837A1 (de) | 1997-07-17 |
| CA2241886C (en) | 2004-03-23 |
| EP0872164A1 (de) | 1998-10-21 |
| AU713071B2 (en) | 1999-11-25 |
| EP0872164B1 (de) | 1999-11-24 |
| AU1378597A (en) | 1997-08-01 |
| US6198224B1 (en) | 2001-03-06 |
| DE59603738D1 (de) | 1999-12-30 |
| CA2241886A1 (en) | 1997-07-17 |
| ATE187033T1 (de) | 1999-12-15 |
| ES2142106T3 (es) | 2000-04-01 |
| DE19600223A1 (de) | 1997-07-17 |
| KR19990077065A (ko) | 1999-10-25 |
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