ES2156842T1 - Procedimiento para producir una distribucion de intensidad en un rayo laser de trabajo y dispositivo para la realizacion del procedimiento. - Google Patents
Procedimiento para producir una distribucion de intensidad en un rayo laser de trabajo y dispositivo para la realizacion del procedimiento.Info
- Publication number
- ES2156842T1 ES2156842T1 ES00810552T ES00810552T ES2156842T1 ES 2156842 T1 ES2156842 T1 ES 2156842T1 ES 00810552 T ES00810552 T ES 00810552T ES 00810552 T ES00810552 T ES 00810552T ES 2156842 T1 ES2156842 T1 ES 2156842T1
- Authority
- ES
- Spain
- Prior art keywords
- procedure
- distribution
- intensity
- work
- partial
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title abstract 4
- 230000000694 effects Effects 0.000 abstract 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/073—Shaping the laser spot
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Laser Beam Processing (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
- Lasers (AREA)
- Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
- Dot-Matrix Printers And Others (AREA)
- Laser Beam Printer (AREA)
Abstract
Procedimiento para producir una previamente determinada distribución de intensidad de un rayo láser de trabajo (17) sobre la superficie (19) de un objeto o bien dentro de este objeto; procedimiento éste que está caracterizado porque a partir de un rayo de fuente (23) son formados por lo menos un primer rayo parcial y un segundo rayo parcial (3a, 3a", 3b, 3b'', 3b"), cada uno con una respectiva primera y segunda distribución de intensidad previamente determinada (35, 37), y la potencia de cada rayo parcial (3a, 3a", 3b, 3b'', 3b") es variada -de una manera controlada- por unos tiempos de conexión tan reducidos como son los sub-microsegundos, mientras que los rayos parciales (3a", 3b") -con la interferencia de una tercera distribución de intensidad (39)- son dirigidos, como el rayo de trabajo (17), sobre la superficie (19) del objeto o al interior del objeto con el fin de conseguir un diferenciado efecto a causa de una variada tercera distribución de intensidad (39) del rayo de trabajo (17).
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP99810623A EP1072350A1 (de) | 1999-07-12 | 1999-07-12 | Verfahren zur Erzeugung einer Intensitätsverteilung über einen Arbeitslaserstrahl sowie Vorrichtung hierzu |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ES2156842T1 true ES2156842T1 (es) | 2001-08-01 |
Family
ID=8242919
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| ES00810552T Pending ES2156842T1 (es) | 1999-07-12 | 2000-06-23 | Procedimiento para producir una distribucion de intensidad en un rayo laser de trabajo y dispositivo para la realizacion del procedimiento. |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US6462307B1 (es) |
| EP (1) | EP1072350A1 (es) |
| JP (1) | JP2001105166A (es) |
| DE (1) | DE50014719D1 (es) |
| ES (1) | ES2156842T1 (es) |
Families Citing this family (27)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8217304B2 (en) | 2001-03-29 | 2012-07-10 | Gsi Group Corporation | Methods and systems for thermal-based laser processing a multi-material device |
| DE50110828D1 (de) * | 2000-11-15 | 2006-10-05 | Mdc Max Daetwyler Ag | Verfahren zur herstellung von rasternäpfchen in einer tiefdruckform und in dem verfahren verwendbarer grundkörper |
| KR100990300B1 (ko) * | 2001-06-13 | 2010-10-26 | 오르보테크 엘티디. | 에너지 전달 시스템 |
| TW200304175A (en) * | 2001-11-12 | 2003-09-16 | Sony Corp | Laser annealing device and thin-film transistor manufacturing method |
| US6951995B2 (en) | 2002-03-27 | 2005-10-04 | Gsi Lumonics Corp. | Method and system for high-speed, precise micromachining an array of devices |
| EP1369230A1 (en) * | 2002-06-05 | 2003-12-10 | Kba-Giori S.A. | Method of manufacturing an engraved plate |
| JP2004066327A (ja) | 2002-08-09 | 2004-03-04 | Tdk Corp | レーザ加工装置、加工方法、および当該加工方法を用いた回路基板の製造方法 |
| DE112004001527T5 (de) * | 2003-08-19 | 2006-07-06 | Electro Scientific Industries, Inc., Portland | Verfahren und Lasersysteme zur Verbindungsbearbeitung unter Verwendung von Laserimpulsen mit speziell zugeschnittenen Leistungsprofilen |
| US7486705B2 (en) | 2004-03-31 | 2009-02-03 | Imra America, Inc. | Femtosecond laser processing system with process parameters, controls and feedback |
| US7491909B2 (en) * | 2004-03-31 | 2009-02-17 | Imra America, Inc. | Pulsed laser processing with controlled thermal and physical alterations |
| US7885311B2 (en) * | 2007-03-27 | 2011-02-08 | Imra America, Inc. | Beam stabilized fiber laser |
| US7820937B2 (en) * | 2004-10-27 | 2010-10-26 | Boston Scientific Scimed, Inc. | Method of applying one or more electromagnetic beams to form a fusion bond on a workpiece such as a medical device |
| ES2313806B1 (es) * | 2004-12-30 | 2009-12-17 | Universidad De Granada | Procedimiento de calibrado de laser considerando el solapamiento de los pulsos. |
| EP1719633B2 (de) | 2005-05-03 | 2014-03-12 | Merck Patent GmbH | Verwendung von lasergravierten Druckformen |
| WO2007088795A1 (en) | 2006-02-03 | 2007-08-09 | Semiconductor Energy Laboratory Co., Ltd. | Manufacturing method of memory element, laser irradiation apparatus, and laser irradiation method |
| US8580700B2 (en) | 2006-02-17 | 2013-11-12 | Semiconductor Energy Laboratory Co., Ltd. | Method for manufacturing semiconductor device |
| US7532378B2 (en) | 2006-02-21 | 2009-05-12 | Semiconductor Energy Laboratory Co., Ltd. | Laser irradiation apparatus, method of laser irradiation, and method for manufacturing semiconductor device |
| US7522642B2 (en) * | 2006-03-29 | 2009-04-21 | Amo Development Llc | Method and system for laser amplification using a dual crystal Pockels cell |
| SE531975C2 (sv) | 2007-04-23 | 2009-09-22 | Anders Bjurstedt | Anordning för tryckning i djuptryck |
| GB0804955D0 (en) * | 2008-03-18 | 2008-04-16 | Rumsby Philip T | Method and apparatus for laser processing the surface of a drum |
| JP4523978B2 (ja) * | 2008-03-28 | 2010-08-11 | 株式会社日立製作所 | エンジンシステム |
| US8309885B2 (en) * | 2009-01-15 | 2012-11-13 | Electro Scientific Industries, Inc. | Pulse temporal programmable ultrafast burst mode laser for micromachining |
| US10307862B2 (en) | 2009-03-27 | 2019-06-04 | Electro Scientific Industries, Inc | Laser micromachining with tailored bursts of short laser pulses |
| US20110210105A1 (en) * | 2009-12-30 | 2011-09-01 | Gsi Group Corporation | Link processing with high speed beam deflection |
| TW201204497A (en) * | 2010-07-30 | 2012-02-01 | Hon Hai Prec Ind Co Ltd | Laser processing device and method for manufacturing light guide plate |
| CN102343480A (zh) * | 2010-08-04 | 2012-02-08 | 鸿富锦精密工业(深圳)有限公司 | 激光加工装置及导光板制造方法 |
| US9715950B2 (en) * | 2015-04-14 | 2017-07-25 | Honeywell International Inc. | Single cell apparatus and method for single ion addressing |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4958900A (en) * | 1989-03-27 | 1990-09-25 | General Electric Company | Multi-fiber holder for output coupler and methods using same |
| DE4212390A1 (de) * | 1992-04-13 | 1993-10-14 | Baasel Carl Lasertech | Strahlführungssystem für mehrere Laserstrahlen |
| US5279775A (en) * | 1992-06-10 | 1994-01-18 | Iomega Corporation | Acousto-optical intensity control of laser beam during etching of optical servo information of magnetic media |
| US5386221A (en) * | 1992-11-02 | 1995-01-31 | Etec Systems, Inc. | Laser pattern generation apparatus |
| CH689917A5 (de) * | 1995-05-03 | 2000-01-31 | Daetwyler Ag | Verfahren und Vorrichtung zur Herstellung von Rasternäpfchen in der Oberfläche eines Tiefdruckzylinders. |
| US5834094A (en) * | 1996-09-30 | 1998-11-10 | Surface Technologies Ltd. | Bearing having micropores and design method thereof |
-
1999
- 1999-07-12 EP EP99810623A patent/EP1072350A1/de not_active Withdrawn
-
2000
- 2000-06-23 ES ES00810552T patent/ES2156842T1/es active Pending
- 2000-06-23 DE DE50014719T patent/DE50014719D1/de not_active Expired - Lifetime
- 2000-06-30 JP JP2000236248A patent/JP2001105166A/ja active Pending
- 2000-07-11 US US09/613,828 patent/US6462307B1/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| US6462307B1 (en) | 2002-10-08 |
| DE50014719D1 (de) | 2007-11-29 |
| EP1072350A1 (de) | 2001-01-31 |
| JP2001105166A (ja) | 2001-04-17 |
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