ES2159065T3 - Instalacion de tratamiento en vacio para aplicar capas sobre substratos. - Google Patents

Instalacion de tratamiento en vacio para aplicar capas sobre substratos.

Info

Publication number
ES2159065T3
ES2159065T3 ES97104908T ES97104908T ES2159065T3 ES 2159065 T3 ES2159065 T3 ES 2159065T3 ES 97104908 T ES97104908 T ES 97104908T ES 97104908 T ES97104908 T ES 97104908T ES 2159065 T3 ES2159065 T3 ES 2159065T3
Authority
ES
Spain
Prior art keywords
substrates
chamber
substrate
wall
vacuum chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES97104908T
Other languages
English (en)
Inventor
Hermann Dr Kloberdanz
Josef Hoffmann
Jurgen Henrich
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oerlikon Deutschland Holding GmbH
Original Assignee
Unaxis Deutschland Holding GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Unaxis Deutschland Holding GmbH filed Critical Unaxis Deutschland Holding GmbH
Application granted granted Critical
Publication of ES2159065T3 publication Critical patent/ES2159065T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • C23C14/566—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases using a load-lock chamber

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

EN UNA INSTALACION DE TRATAMIENTO AL VACIO PARA APLICAR CAPAS FINAS SOBRE SUSTRATOS (2,2 ,...), POR EJEMPLO EN REFLECTORES DE FAROS, QUE COMPRENDE VARIAS ESTACIONES DE TRATAMIENTO (8,9,10) Y/O DE ESCLUSADO DE ENTRADA/SALIDA (20) UNIDAS A UNA PARED FIJA (16,16 ,...) DE LA CAMARA DE VACIO, ASI COMO UN CILINDRO INTERIOR (14) QUE SOPORTA LAS CAMARAS DE SUSTRATO (3-6) DE FORMA GIRATORIA Y RODEADO POR LA PARED DE LA CAMARA DE VACIO, SE HAN DISPUESTO EN LA PARED FIJA (16,16 ,...) DE LA CAMARA DE VACIO UNOS ORIFICIOS (24-27) QUE PUEDEN HACERSE COINCIDIR CON LAS CAMARAS DE SUSTRATO (3-6) Y A TRAVES DE LOS CUALES SE PUEDEN APLICAR LAS SUSTANCIAS DE TRATAMIENTO DE LOS SUSTRATOS (2,2 ,...), ASI COMO ABRIRSE Y CERRARSE. UNA DE LAS CAMARAS DE SUSTRATO, AL MENOS LA CAMARA DE ESCLUSA (20), PRESENTA UNA TAPA O COMPUERTA (33) QUE PERMITE EL ACCESO DIRECTO A LA CORRESPONDIENTE CAMARA DE SUSTRATO, PUDIENDOSE DESPLAZAR (A,B) LA CAMARA (20) HACIA EL CILINDRO INTERIOR (14) Y PRESIONARSE CONTRA LA PARED EXTERIOR DEL CILINDRO (14) O LA SUPERFICIE FRONTAL EN FORMA DE MARCO DE LA CAMARA DE SUSTRATO (3).
ES97104908T 1996-07-04 1997-03-22 Instalacion de tratamiento en vacio para aplicar capas sobre substratos. Expired - Lifetime ES2159065T3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19626861A DE19626861B4 (de) 1996-07-04 1996-07-04 Vakuumbehandlungsanlage zum Aufbringen dünner Schichten auf Substrate, beispielsweise auf Scheinwerferreflektoren

Publications (1)

Publication Number Publication Date
ES2159065T3 true ES2159065T3 (es) 2001-09-16

Family

ID=7798850

Family Applications (1)

Application Number Title Priority Date Filing Date
ES97104908T Expired - Lifetime ES2159065T3 (es) 1996-07-04 1997-03-22 Instalacion de tratamiento en vacio para aplicar capas sobre substratos.

Country Status (6)

Country Link
US (1) US5849087A (es)
EP (1) EP0816529B1 (es)
JP (1) JP4119499B2 (es)
KR (1) KR100260605B1 (es)
DE (2) DE19626861B4 (es)
ES (1) ES2159065T3 (es)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1998028460A1 (de) * 1996-12-23 1998-07-02 Balzers Aktiengesellschaft Vakuumbehandlungsanlage
DE19704947A1 (de) * 1997-02-10 1998-08-13 Leybold Systems Gmbh Verfahren und Vorrichtung zur Schutzbeschichtung von Verspiegelungsschichten
DE19807031A1 (de) * 1998-02-19 1999-08-26 Leybold Systems Gmbh Schleuseneinrichtung zum Ein- und/oder Ausbringen von Substraten in und/oder aus einer Behandlungskammer
EP0943699B1 (de) 1998-02-19 2003-12-17 Applied Films GmbH & Co. KG Schleuseneinrichtung zum Ein- und/oder Ausbringen von Substraten in und/oder aus einer Behandlungskammer
DE19819726A1 (de) * 1998-05-02 1999-11-04 Leybold Systems Gmbh Vakuumbehandlungsanlage zum Aufbringen dünner, harter Schichten
US6264804B1 (en) 2000-04-12 2001-07-24 Ske Technology Corp. System and method for handling and masking a substrate in a sputter deposition system
US6355723B1 (en) 2000-06-22 2002-03-12 General Electric Co. Dark colored thermoplastic compositions, articles molded therefrom, and article preparation methods
US20030185973A1 (en) * 2002-03-30 2003-10-02 Crawley Richard L. Water vapor plasma method of increasing the surface energy of a surface
US7329462B2 (en) * 2002-08-23 2008-02-12 General Electric Company Reflective article and method for the preparation thereof
US7300742B2 (en) * 2002-08-23 2007-11-27 General Electric Company Data storage medium and method for the preparation thereof
US7132149B2 (en) 2002-08-23 2006-11-07 General Electric Company Data storage medium and method for the preparation thereof
US7128959B2 (en) * 2002-08-23 2006-10-31 General Electric Company Reflective article and method for the preparation thereof
DE102004055388A1 (de) * 2004-11-17 2006-05-18 Jrw Technology + Engineering Gmbh Vorrichtung zur Bearbeitung von Werkstücken im Vakuum
DE102005056323A1 (de) * 2005-11-25 2007-05-31 Aixtron Ag Prozesskammermodul zum gleichzeitigen Abscheiden von Schichten auf mehreren Substraten
DE102006024638A1 (de) * 2006-05-19 2007-11-22 Ptm Packaging Tools Machinery Pte.Ltd. Verfahren und Vorrichtung zur Behandlung von Objekten
DE102008011774B4 (de) * 2008-02-28 2021-12-09 Krones Aktiengesellschaft Schleusenvorrichtung zum Ein- und Ausbringen von Behältern in und aus einer Vakuumbehandlungskammer
CN103943533B (zh) * 2013-01-23 2017-12-29 上海微电子装备（集团）股份有限公司 密封对接装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3856654A (en) * 1971-08-26 1974-12-24 Western Electric Co Apparatus for feeding and coating masses of workpieces in a controlled atmosphere
CH573985A5 (es) * 1973-11-22 1976-03-31 Balzers Patent Beteilig Ag
DE2848480C2 (de) * 1978-11-08 1984-11-08 Siemens AG, 1000 Berlin und 8000 München Vorrichtung zum Aufbringen von Schichten auf Träger unter Vakuum
EP0555764B1 (de) * 1992-02-12 1997-06-11 Balzers Aktiengesellschaft Vakuumbearbeitungsanlage

Also Published As

Publication number Publication date
DE59703760D1 (de) 2001-07-19
JPH1060644A (ja) 1998-03-03
US5849087A (en) 1998-12-15
EP0816529B1 (de) 2001-06-13
KR980009506A (ko) 1998-04-30
DE19626861B4 (de) 2009-04-16
JP4119499B2 (ja) 2008-07-16
DE19626861A1 (de) 1998-01-08
EP0816529A1 (de) 1998-01-07
KR100260605B1 (ko) 2000-07-01

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