ES2177311T3 - Procedimiento para el deposito bajo vacio de un sustrato curvo. - Google Patents

Procedimiento para el deposito bajo vacio de un sustrato curvo.

Info

Publication number
ES2177311T3
ES2177311T3 ES99940277T ES99940277T ES2177311T3 ES 2177311 T3 ES2177311 T3 ES 2177311T3 ES 99940277 T ES99940277 T ES 99940277T ES 99940277 T ES99940277 T ES 99940277T ES 2177311 T3 ES2177311 T3 ES 2177311T3
Authority
ES
Spain
Prior art keywords
curved substrate
procedure
deposit under
under empty
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES99940277T
Other languages
English (en)
Inventor
Pascal Comble
Gerhard Keller
Frederic Mouhot
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EssilorLuxottica SA
Original Assignee
Essilor International Compagnie Generale dOptique SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Essilor International Compagnie Generale dOptique SA filed Critical Essilor International Compagnie Generale dOptique SA
Application granted granted Critical
Publication of ES2177311T3 publication Critical patent/ES2177311T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C23C14/044—Coating on selected surface areas, e.g. using masks using masks using masks to redistribute rather than totally prevent coating, e.g. producing thickness gradient

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Laminated Bodies (AREA)

Abstract

Procedimiento para el tratamiento bajo vacío de cualquier sustrato curvo, del tipo según el cual se provoca la pulverización catódica de un material procedente de una fuente de material dada, sobre este sustrato curvo (10), para formar un depósito, sobre dicho sustrato curvo de una capa de dicho material, caracterizado porque se interpone, entre el sustrato curvo (10) y la fuente de material (13), a distancia del sustrato curvo (10), un protector (19) fijo con relación al sustrato curvo (10), y cuya proyección sobre un plano según una dirección perpendicular a este plano tiene una superficie inferior al 10 % de la superficie de la proyección del sustrato curvo (10) sobre este mismo plano.
ES99940277T 1998-09-04 1999-09-02 Procedimiento para el deposito bajo vacio de un sustrato curvo. Expired - Lifetime ES2177311T3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR9811100A FR2783001B1 (fr) 1998-09-04 1998-09-04 Procede pour le traitement sous vide d'un quelconque substrat courbe, notamment un verre de lunettes, et cache propre a la mise en oeuvre d'un tel procede

Publications (1)

Publication Number Publication Date
ES2177311T3 true ES2177311T3 (es) 2002-12-01

Family

ID=9530149

Family Applications (1)

Application Number Title Priority Date Filing Date
ES99940277T Expired - Lifetime ES2177311T3 (es) 1998-09-04 1999-09-02 Procedimiento para el deposito bajo vacio de un sustrato curvo.

Country Status (10)

Country Link
US (1) US7122223B1 (es)
EP (1) EP1114200B1 (es)
JP (1) JP4574011B2 (es)
AT (1) ATE217362T1 (es)
AU (1) AU761513B2 (es)
CA (1) CA2341608C (es)
DE (1) DE69901455T2 (es)
ES (1) ES2177311T3 (es)
FR (1) FR2783001B1 (es)
WO (1) WO2000014294A1 (es)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7014317B2 (en) 2001-11-02 2006-03-21 Essilor International (Compagnie Generale D'optique) Method for manufacturing multifocal lenses
DE10234855A1 (de) * 2002-07-31 2004-02-12 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Einrichtung zur Einstellung einer vorgegebenen Schichtdickenverteilung bei Vakuumbeschichtungsprozessen auf bewegten Substraten
US8347814B2 (en) * 2008-01-22 2013-01-08 Raytheon Canada Limited Method and apparatus for coating a curved surface
US8293017B2 (en) * 2008-04-10 2012-10-23 Raytheon Canada Limited Method and apparatus for coating surfaces
US20090258151A1 (en) * 2008-04-10 2009-10-15 Raytheon Company Method and Apparatus for Coating Curved Surfaces
US8398776B2 (en) * 2008-05-12 2013-03-19 Raytheon Canada Limited Method and apparatus for supporting workpieces in a coating apparatus
US8246748B2 (en) * 2008-07-09 2012-08-21 Raytheon Canada Limited Method and apparatus for coating surfaces
US20100047594A1 (en) * 2008-08-20 2010-02-25 Aharon Inspektor Equipment and method for physical vapor deposition
US20110020623A1 (en) * 2009-07-22 2011-01-27 Raytheon Company Method and Apparatus for Repairing an Optical Component Substrate Through Coating
CN104988464B (zh) * 2015-06-30 2017-10-27 中国工程物理研究院材料研究所 一种轴对称曲面件内表面均匀磁控溅射沉积方法及其装置

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1380432A (fr) * 1961-12-14 1964-12-04 Siemens Ag Procédé pour déposer au moyen d'une vapeur une couche sur un support, en particulier un corps semi-conducteur en forme de disque
US3627569A (en) * 1968-12-27 1971-12-14 Bell Telephone Labor Inc Deposition of thin films with controlled thickness and planar area profile
FR2406217A1 (fr) * 1977-10-14 1979-05-11 Essilor Int Procede pour le marquage d'une lentille ophtalmique en matiere organique, et une telle lentille ainsi marquee
US4222345A (en) * 1978-11-30 1980-09-16 Optical Coating Laboratory, Inc. Vacuum coating apparatus with rotary motion assembly
JPH0239588B2 (ja) * 1984-04-16 1990-09-06 Ulvac Corp Puranetariishikiseimakusochiniokerumakuatsushuseisochi
JPS62239103A (ja) * 1986-04-11 1987-10-20 Alps Electric Co Ltd プラスチツクレンズ
US5225057A (en) 1988-02-08 1993-07-06 Optical Coating Laboratory, Inc. Process for depositing optical films on both planar and non-planar substrates
DE3816578C1 (en) * 1988-05-14 1989-03-16 Agfa-Gevaert Ag, 5090 Leverkusen, De Process and device for the vapour deposition of graded-light filter layers on transparent plates
JPH0331473A (ja) * 1989-06-27 1991-02-12 Mitsubishi Electric Corp プラネタリー式成膜装置
US5389397A (en) 1989-08-29 1995-02-14 North American Philips Corporation Method for controlling the thickness distribution of a deposited layer
JP2825918B2 (ja) * 1990-03-13 1998-11-18 キヤノン株式会社 真空蒸着装置
US5254236A (en) * 1991-01-25 1993-10-19 Shibaura Engineering Works Co., Ltd. Sputtering apparatus
JPH04371578A (ja) * 1991-06-19 1992-12-24 Sony Corp マグネトロンスパッタリング装置
JPH0643304A (ja) * 1992-07-24 1994-02-18 Nikon Corp 反射防止膜及び反射防止膜付き光学部品
JP3412849B2 (ja) * 1992-12-25 2003-06-03 キヤノン株式会社 薄膜蒸着装置
US5724189A (en) * 1995-12-15 1998-03-03 Mcdonnell Douglas Corporation Methods and apparatus for creating an aspheric optical element and the aspheric optical elements formed thereby
JPH10176267A (ja) * 1996-12-13 1998-06-30 Applied Materials Inc スパッタ装置
GB9701114D0 (en) * 1997-01-20 1997-03-12 Coherent Optics Europ Ltd Three-dimensional masking method for control of optical coating thickness

Also Published As

Publication number Publication date
EP1114200B1 (fr) 2002-05-08
FR2783001B1 (fr) 2000-11-24
AU761513B2 (en) 2003-06-05
WO2000014294A1 (fr) 2000-03-16
DE69901455T2 (de) 2002-12-12
FR2783001A1 (fr) 2000-03-10
EP1114200A1 (fr) 2001-07-11
JP4574011B2 (ja) 2010-11-04
DE69901455D1 (de) 2002-06-13
JP2002524659A (ja) 2002-08-06
CA2341608C (fr) 2005-07-12
US7122223B1 (en) 2006-10-17
AU5428099A (en) 2000-03-27
CA2341608A1 (fr) 2000-03-16
ATE217362T1 (de) 2002-05-15

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