ES2178788T3 - Revestimiento de baja friccion. - Google Patents
Revestimiento de baja friccion.Info
- Publication number
- ES2178788T3 ES2178788T3 ES97949023T ES97949023T ES2178788T3 ES 2178788 T3 ES2178788 T3 ES 2178788T3 ES 97949023 T ES97949023 T ES 97949023T ES 97949023 T ES97949023 T ES 97949023T ES 2178788 T3 ES2178788 T3 ES 2178788T3
- Authority
- ES
- Spain
- Prior art keywords
- low friction
- friction coating
- low
- mxsivryszfw
- hydrophilia
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 229910052720 vanadium Inorganic materials 0.000 abstract 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 abstract 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 abstract 1
- 239000005864 Sulphur Substances 0.000 abstract 1
- 229910052782 aluminium Inorganic materials 0.000 abstract 1
- 229910052796 boron Inorganic materials 0.000 abstract 1
- 229910052804 chromium Inorganic materials 0.000 abstract 1
- 239000008199 coating composition Substances 0.000 abstract 1
- 229910052802 copper Inorganic materials 0.000 abstract 1
- 229910052731 fluorine Inorganic materials 0.000 abstract 1
- 239000011737 fluorine Substances 0.000 abstract 1
- 229910052737 gold Inorganic materials 0.000 abstract 1
- 229910052735 hafnium Inorganic materials 0.000 abstract 1
- 229910052739 hydrogen Inorganic materials 0.000 abstract 1
- 229910052742 iron Inorganic materials 0.000 abstract 1
- 229910052745 lead Inorganic materials 0.000 abstract 1
- 229910052751 metal Inorganic materials 0.000 abstract 1
- 239000002184 metal Substances 0.000 abstract 1
- 229910052976 metal sulfide Inorganic materials 0.000 abstract 1
- 150000002739 metals Chemical class 0.000 abstract 1
- 239000000203 mixture Substances 0.000 abstract 1
- 229910052750 molybdenum Inorganic materials 0.000 abstract 1
- 229910052758 niobium Inorganic materials 0.000 abstract 1
- 229910052757 nitrogen Inorganic materials 0.000 abstract 1
- 229910052760 oxygen Inorganic materials 0.000 abstract 1
- 229910052710 silicon Inorganic materials 0.000 abstract 1
- 239000010703 silicon Substances 0.000 abstract 1
- 229910052715 tantalum Inorganic materials 0.000 abstract 1
- 229910052718 tin Inorganic materials 0.000 abstract 1
- 229910052719 titanium Inorganic materials 0.000 abstract 1
- 229910052721 tungsten Inorganic materials 0.000 abstract 1
- 229910052725 zinc Inorganic materials 0.000 abstract 1
- 229910052726 zirconium Inorganic materials 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0623—Sulfides, selenides or tellurides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31678—Of metal
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Transition And Organic Metals Composition Catalysts For Addition Polymerization (AREA)
- Chemical Vapour Deposition (AREA)
- Lubricants (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Surface Treatment Of Glass Fibres Or Filaments (AREA)
- Silicates, Zeolites, And Molecular Sieves (AREA)
- Catalysts (AREA)
Abstract
LA INVENCION SE REFIERE A UNA COMPOSICION DE REVESTIMIENTO DE SULFURO METALICO DE FORMULA M X SI V R Y S SUB,Z F W , DONDE: M ES UNO O MAS METALES SELECCIONADOS A PAR TIR DE: MO, TI, W, NB, TA, ZR Y NF; SI ES SILICIO; R ES UNO O MAS ELEMENTOS SELECCIONADOS A PARTIR DE: C, B, AL, V, CR, FE, CO, NI, SM, AU, CU, ZN, SN, PB, N, H Y O; S ES AZUFRE; F ES FLUOR; X ES DE 0,2 A 1,5; V ES DE 0,02 A 3; Y ES DE 0 A 4; Z ES DE 0,2 A 6; Y W ES DE 0,01 A 6; Y DONDE X, Y, Z, V Y W SE DAN EN CANTIDADES POR RELACION ATOMICA. DICHAS COMPOSICIONES MUESTRAN BUENAS PROPIEDADES ANTIADHERENTES, BAJA HIDROFILIA Y ELEVADA ESTABILIDAD.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GBGB9625916.3A GB9625916D0 (en) | 1996-12-13 | 1996-12-13 | Low friction coating |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ES2178788T3 true ES2178788T3 (es) | 2003-01-01 |
Family
ID=10804394
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| ES97949023T Expired - Lifetime ES2178788T3 (es) | 1996-12-13 | 1997-12-10 | Revestimiento de baja friccion. |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US6551718B2 (es) |
| EP (1) | EP0948661B1 (es) |
| JP (1) | JP2001505956A (es) |
| CN (1) | CN1226445C (es) |
| AT (1) | ATE219162T1 (es) |
| DE (1) | DE69713389T2 (es) |
| ES (1) | ES2178788T3 (es) |
| GB (1) | GB9625916D0 (es) |
| PT (1) | PT948661E (es) |
| WO (1) | WO1998026106A1 (es) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003113445A (ja) * | 2001-07-31 | 2003-04-18 | Nippon Piston Ring Co Ltd | カム部材およびカムシャフト |
| DE10320183B4 (de) * | 2003-05-02 | 2011-06-22 | Köthener Spezialdichtungen GmbH, 06369 | Herstellung verschleiß- und bruchfester Gleitringe für mechanische Dichtungen |
| TW200522790A (en) * | 2003-10-07 | 2005-07-01 | Ifire Technology Corp | Polysulfide thermal vapour source for thin sulfide film deposition |
| US20070099027A1 (en) * | 2005-10-28 | 2007-05-03 | Anand Krishnamurthy | Wear resistant coatings |
| JP2007239003A (ja) * | 2006-03-07 | 2007-09-20 | Univ Nagoya | Ａｕメッキ方法及びＡｕメッキによるＡｕ回路の製造方法 |
| TWI532892B (zh) * | 2015-02-16 | 2016-05-11 | 炬力奈米科技有限公司 | 二維層狀硫族化合物的合成方法及製程設備 |
| JP6452006B2 (ja) * | 2016-02-29 | 2019-01-16 | 三菱マテリアル株式会社 | 表面被覆切削工具 |
| CN107119257B (zh) * | 2017-07-10 | 2018-12-18 | 宁波盾戈涂层技术有限公司 | 一种纳米复合锆铝铬氮化物刀具涂层及其制备方法 |
| JP7175201B2 (ja) * | 2019-01-10 | 2022-11-18 | 東京エレクトロン株式会社 | 処理装置 |
| KR102792557B1 (ko) * | 2020-07-15 | 2025-04-08 | 삼성전자주식회사 | 발광 소자, 발광 소자의 제조 방법, 및 발광 소자를 포함하는 디스플레이 장치 |
| CN114686812A (zh) * | 2022-03-31 | 2022-07-01 | 中原内配集团股份有限公司 | 一种刀具涂层、复合刀具及其制备方法 |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| SU601306A1 (ru) * | 1976-02-16 | 1978-04-05 | Всесоюзный Научно-Исследовательский Конструкторско-Технологический Институт Подшипниковой Промышленности | Смазочное покрытие |
| US4343881A (en) * | 1981-07-06 | 1982-08-10 | Savin Corporation | Multilayer photoconductive assembly with intermediate heterojunction |
| DE3516933A1 (de) * | 1985-05-10 | 1986-11-13 | Deutsche Forschungs- und Versuchsanstalt für Luft- und Raumfahrt e.V., 5300 Bonn | Verfahren zum aufbringen einer mos(pfeil abwaerts)2(pfeil abwaerts)-beschichtung auf ein substrat |
| JP2770508B2 (ja) * | 1989-12-11 | 1998-07-02 | 住友電気工業株式会社 | 耐摩摺動部材 |
| DE69230448T2 (de) * | 1991-08-23 | 2000-05-04 | Fuji Photo Film Co., Ltd. | Verfahren zur Herstellung eines magnetischen Aufzeichnungsmediums |
| CA2083976A1 (en) * | 1991-12-04 | 1993-06-05 | Shinichi Kinoshita | Optical tape |
| JP2884900B2 (ja) * | 1992-04-08 | 1999-04-19 | 日本電気株式会社 | 磁気記憶体 |
| US5370778A (en) * | 1992-11-19 | 1994-12-06 | Iowa State University Research Foundation, Inc. | Method for preparing basal oriented molybdenum disulfide (MoS2) thin films |
| JPH09259413A (ja) * | 1996-03-21 | 1997-10-03 | Fuji Photo Film Co Ltd | 磁気記録装置用クリーニング媒体 |
| US6015597A (en) * | 1997-11-26 | 2000-01-18 | 3M Innovative Properties Company | Method for coating diamond-like networks onto particles |
-
1996
- 1996-12-13 GB GBGB9625916.3A patent/GB9625916D0/en active Pending
-
1997
- 1997-12-10 US US09/319,826 patent/US6551718B2/en not_active Expired - Fee Related
- 1997-12-10 JP JP52637098A patent/JP2001505956A/ja not_active Ceased
- 1997-12-10 WO PCT/GB1997/003406 patent/WO1998026106A1/en not_active Ceased
- 1997-12-10 CN CNB971805881A patent/CN1226445C/zh not_active Expired - Fee Related
- 1997-12-10 DE DE69713389T patent/DE69713389T2/de not_active Expired - Fee Related
- 1997-12-10 PT PT97949023T patent/PT948661E/pt unknown
- 1997-12-10 AT AT97949023T patent/ATE219162T1/de not_active IP Right Cessation
- 1997-12-10 ES ES97949023T patent/ES2178788T3/es not_active Expired - Lifetime
- 1997-12-10 EP EP97949023A patent/EP0948661B1/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JP2001505956A (ja) | 2001-05-08 |
| WO1998026106A1 (en) | 1998-06-18 |
| PT948661E (pt) | 2002-11-29 |
| DE69713389T2 (de) | 2003-02-13 |
| CN1240486A (zh) | 2000-01-05 |
| DE69713389D1 (de) | 2002-07-18 |
| US20020182447A1 (en) | 2002-12-05 |
| EP0948661A1 (en) | 1999-10-13 |
| US6551718B2 (en) | 2003-04-22 |
| ATE219162T1 (de) | 2002-06-15 |
| EP0948661B1 (en) | 2002-06-12 |
| CN1226445C (zh) | 2005-11-09 |
| GB9625916D0 (en) | 1997-01-29 |
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