ES2183798T3 - Procedimiento para la produccion de revestimientos delgados y dificilmente solubles. - Google Patents

Procedimiento para la produccion de revestimientos delgados y dificilmente solubles.

Info

Publication number
ES2183798T3
ES2183798T3 ES00934914T ES00934914T ES2183798T3 ES 2183798 T3 ES2183798 T3 ES 2183798T3 ES 00934914 T ES00934914 T ES 00934914T ES 00934914 T ES00934914 T ES 00934914T ES 2183798 T3 ES2183798 T3 ES 2183798T3
Authority
ES
Spain
Prior art keywords
layer
production
procedure
starting
complex
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES00934914T
Other languages
English (en)
Inventor
Christian-Herbert Fischer
Hans-Jurgen Muffler
Martha Christina Lux-Steiner
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hahn Meitner Institut Berlin GmbH
Original Assignee
Hahn Meitner Institut Berlin GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hahn Meitner Institut Berlin GmbH filed Critical Hahn Meitner Institut Berlin GmbH
Application granted granted Critical
Publication of ES2183798T3 publication Critical patent/ES2183798T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
    • C23C8/08—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases only one element being applied
    • C23C8/10—Oxidising
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
    • C23C8/08—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases only one element being applied
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C26/00—Coating not provided for in groups C23C2/00 - C23C24/00
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/02—Pretreatment of the material to be coated
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/80—After-treatment
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S501/00—Compositions: ceramic
    • Y10S501/90—Optical glass, e.g. silent on refractive index and/or ABBE number
    • Y10S501/906—Thorium oxide containing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemically Coating (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Photovoltaic Devices (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Pyridine Compounds (AREA)
  • Polysaccharides And Polysaccharide Derivatives (AREA)
  • Chemical Vapour Deposition (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Compositions Of Oxide Ceramics (AREA)
  • Medicinal Preparation (AREA)

Abstract

Procedimiento para la producción de revestimientos delgados y difícilmente solubles sobre substratos (S) con una morfología arbitraria, con las siguientes etapas de procedimiento que se han de realizar de un modo cíclico en dependencia del deseado espesor de capa, para la producción de capas cerámicas u oxídicas (CL/OL): I. aplicación de por lo menos una sustancia de partida (P) apropiada para la constitución de capas sobre la superficie del substrato (S), II. desecación de la capa (PL) de sustancias de partida que se ha formado, en una corriente gaseosa (GS) inerte, o por evaporación, III. gaseo de la capa secada (PLD) de sustancias de partida con un gas reaccionante (RG) húmedo para la transformación en una correspondiente capa (HL) de hidróxido o de complejo, IV. tratamiento térmico de la capa (HL) de hidróxido o complejo que se ha formado, con el fin de formar la capa final (CL/OL) respectiva, y a continuación, dependiendo de la aparición de componentes de partida que no hayan reaccionado o de productos secundarios indeseados: V. enjuagado para la eliminación y subsiguiente desecación de éstos.
ES00934914T 1999-04-06 2000-04-06 Procedimiento para la produccion de revestimientos delgados y dificilmente solubles. Expired - Lifetime ES2183798T3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19916403A DE19916403C1 (de) 1999-04-06 1999-04-06 Verfahren zur Herstellung dünner, schwer löslicher Beschichtungen

Publications (1)

Publication Number Publication Date
ES2183798T3 true ES2183798T3 (es) 2003-04-01

Family

ID=7904248

Family Applications (1)

Application Number Title Priority Date Filing Date
ES00934914T Expired - Lifetime ES2183798T3 (es) 1999-04-06 2000-04-06 Procedimiento para la produccion de revestimientos delgados y dificilmente solubles.

Country Status (16)

Country Link
US (1) US8158204B1 (es)
EP (1) EP1169492B1 (es)
JP (2) JP4275319B2 (es)
KR (1) KR20010113877A (es)
CN (1) CN1268786C (es)
AT (1) ATE224965T1 (es)
AU (1) AU757674B2 (es)
CA (1) CA2367342A1 (es)
DE (2) DE19916403C1 (es)
DK (1) DK1169492T3 (es)
ES (1) ES2183798T3 (es)
HU (1) HU222653B1 (es)
PL (1) PL193049B1 (es)
PT (1) PT1169492E (es)
RU (1) RU2250932C2 (es)
WO (1) WO2000060135A2 (es)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10142913B4 (de) 2001-08-27 2004-03-18 Hahn-Meitner-Institut Berlin Gmbh Vertikale Transistoranordnung mit einem flexiblen, aus Kunststofffolien bestehenden Substrat und Verfahren zu deren Herstellung
DE10160504C2 (de) * 2001-11-30 2003-11-13 Hahn Meitner Inst Berlin Gmbh Verfahren zur Herstellung dünner, schwer löslicher Beschichtungen
DE10258727A1 (de) * 2002-12-05 2004-06-24 Schott Glas Ofen
DE10339824B4 (de) * 2003-08-24 2005-07-07 Hahn-Meitner-Institut Berlin Gmbh Beschichtungsverfahren zur Deposition und Fixierung von Partikeln auf einer Substratoberfläche und Solarzellen mit funkionellem Schichtenaufbau
KR100863932B1 (ko) * 2007-07-10 2008-11-18 주식회사 코미코 세라믹 용사 코팅층의 수화 처리 방법과, 이를 이용한정전척 제조 방법 그리고 상기 수화 처리 방법에 형성된세라믹 용사 코팅층을 갖는 기판 구조물 및 정전척
DE102008017077B4 (de) 2008-04-01 2011-08-11 Helmholtz-Zentrum Berlin für Materialien und Energie GmbH, 14109 Verfahren zur Herstellung einer n-halbleitenden Indiumsulfid-Dünnschicht
DE102009037371B3 (de) * 2009-08-13 2011-03-17 Helmholtz-Zentrum Berlin Für Materialien Und Energie Gmbh Beschichtungsvorrichtung mit Ultraschallzerstäuber
CN103489962B (zh) * 2013-10-07 2017-01-04 复旦大学 大面积制备半导体量子点的方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4242374A (en) * 1979-04-19 1980-12-30 Exxon Research & Engineering Co. Process for thin film deposition of metal and mixed metal chalcogenides displaying semi-conductor properties
US4435839A (en) * 1982-09-21 1984-03-06 The Garrett Corporation Foil bearing rubbing surface coating application methods
JPS63103886A (ja) * 1986-10-21 1988-05-09 日本碍子株式会社 メタライズペ−ストならびにそれを使用してなるセラミツクスのメタライズ法
US5106828A (en) * 1987-07-20 1992-04-21 North American Philips Corporation Method for fabricating superconductors by sol-gel process
SU1717672A1 (ru) * 1989-06-05 1992-03-07 Научно-Производственное Объединение "Всесоюзный Научно-Исследовательский Проектно-Конструкторский И Технологический Институт Кабельной Промышленности" Способ получени керамических покрытий из соединений типа купратов
ES2135427T3 (es) 1992-07-08 1999-11-01 Yeda Res & Dev Peliculas finas y orientadas policristalinas de calgogenuros de un metal de transicion.
JP2535790B2 (ja) * 1994-09-08 1996-09-18 工業技術院長 タングステンブロンズおよびその被覆複合体の製造方法
US5686368A (en) * 1995-12-13 1997-11-11 Quantum Group, Inc. Fibrous metal oxide textiles for spectral emitters
JPH10128115A (ja) * 1996-11-01 1998-05-19 Cosmo Sogo Kenkyusho:Kk 担持貴金属触媒およびその製造方法
DE19831214C2 (de) * 1998-03-19 2003-07-03 Hahn Meitner Inst Berlin Gmbh Verfahren und Anordnung zur Herstellung dünner Metallchalkogenid-Schichten
DE59914444D1 (de) * 1998-03-19 2007-09-20 Hahn Meitner Inst Berlin Gmbh Verfahren und anordnung zur herstellung dünner metallchalkogenid-schichten

Also Published As

Publication number Publication date
CN1346412A (zh) 2002-04-24
DK1169492T3 (da) 2003-02-03
JP4275319B2 (ja) 2009-06-10
DE50000568D1 (de) 2002-10-31
EP1169492A2 (de) 2002-01-09
PT1169492E (pt) 2003-02-28
HU222653B1 (hu) 2003-09-29
JP2009084153A (ja) 2009-04-23
HUP0200790A2 (en) 2002-07-29
EP1169492B1 (de) 2002-09-25
PL350799A1 (en) 2003-02-10
DE19916403C1 (de) 2000-10-12
JP2003530284A (ja) 2003-10-14
AU757674B2 (en) 2003-02-27
KR20010113877A (ko) 2001-12-28
CA2367342A1 (en) 2000-10-12
US8158204B1 (en) 2012-04-17
WO2000060135A3 (de) 2001-04-19
CN1268786C (zh) 2006-08-09
ATE224965T1 (de) 2002-10-15
PL193049B1 (pl) 2007-01-31
RU2250932C2 (ru) 2005-04-27
AU5060000A (en) 2000-10-23
WO2000060135A2 (de) 2000-10-12

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