ES2189177T3 - Procedimiento de fabricacion de oxidos metalicos sencillos o mixtos, o de oxido de silicio. - Google Patents

Procedimiento de fabricacion de oxidos metalicos sencillos o mixtos, o de oxido de silicio.

Info

Publication number
ES2189177T3
ES2189177T3 ES98925712T ES98925712T ES2189177T3 ES 2189177 T3 ES2189177 T3 ES 2189177T3 ES 98925712 T ES98925712 T ES 98925712T ES 98925712 T ES98925712 T ES 98925712T ES 2189177 T3 ES2189177 T3 ES 2189177T3
Authority
ES
Spain
Prior art keywords
silicon oxide
mixed metal
supercritical
metal oxides
manufacturing procedure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES98925712T
Other languages
English (en)
Inventor
Stephane Sarrade
Luc Schrive
Christian Guizard
Anne Julbe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Commissariat à l'Énergie Atomique et Aux Énergies Alternatives
Original Assignee
Commissariat a lEnergie Atomique CEA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Commissariat a lEnergie Atomique CEA filed Critical Commissariat a lEnergie Atomique CEA
Application granted granted Critical
Publication of ES2189177T3 publication Critical patent/ES2189177T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J3/00—Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
    • B01J3/008—Processes carried out under supercritical conditions
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B13/00—Oxygen; Ozone; Oxides or hydroxides in general
    • C01B13/14—Methods for preparing oxides or hydroxides in general
    • C01B13/32—Methods for preparing oxides or hydroxides in general by oxidation or hydrolysis of elements or compounds in the liquid or solid state or in non-aqueous solution, e.g. sol-gel process
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B13/00—Oxygen; Ozone; Oxides or hydroxides in general
    • C01B13/14—Methods for preparing oxides or hydroxides in general
    • C01B13/36—Methods for preparing oxides or hydroxides in general by precipitation reactions in aqueous solutions
    • C01B13/366—Methods for preparing oxides or hydroxides in general by precipitation reactions in aqueous solutions by hydrothermal processing
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
    • C01B33/157—After-treatment of gels
    • C01B33/158—Purification; Drying; Dehydrating
    • C01B33/1585—Dehydration into aerogels
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G1/00—Methods of preparing compounds of metals not covered by subclasses C01B, C01C, C01D, or C01F, in general
    • C01G1/02—Oxides
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G23/00—Compounds of titanium
    • C01G23/04—Oxides; Hydroxides
    • C01G23/047—Titanium dioxide
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G23/00—Compounds of titanium
    • C01G23/04—Oxides; Hydroxides
    • C01G23/047—Titanium dioxide
    • C01G23/053—Producing by wet processes, e.g. hydrolysing titanium salts
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00—Crystal-structural characteristics
    • C01P2002/02—Amorphous compounds
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/10—Particle morphology extending in one dimension, e.g. needle-like
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/30—Particle morphology extending in three dimensions
    • C01P2004/32—Spheres
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/61—Micrometer sized, i.e. from 1-100 micrometer
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/62—Submicrometer sized, i.e. from 0.1-1 micrometer
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/10—Solid density
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/12—Surface area
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/14—Pore volume
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/16—Pore diameter
    • C01P2006/17—Pore diameter distribution
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P20/00—Technologies relating to chemical industry
    • Y02P20/50—Improvements relating to the production of bulk chemicals
    • Y02P20/54—Improvements relating to the production of bulk chemicals using solvents, e.g. supercritical solvents or ionic liquids

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Dispersion Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Geology (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Silicon Compounds (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Oxygen, Ozone, And Oxides In General (AREA)
  • Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)

Abstract

La invención se refiere a un procedimiento para fabricar un óxido metálico simple o mezclado o un producto basado en óxido de silicio a partir de un relleno precursor que contiene uno o más precursores orgánicos. Los óxidos pueden ser, por ejemplo, óxidos de Ti, Al, Mg, Th, Si, Ba, Bc, Zr y similares. El procedimiento consiste en la puesta en contacto del relleno precursor metalo-orgánico con un medio reacción que comprende CO{sub,2} supercrítico a una temperatura de entre 31 y 100º C y a una presión supercrítica de entre 3 x 10{sup,7} y 5 x 10{sup,7} Pa para formar, a partir del precursor, un óxido metálico simple o mezclado o un producto basado en óxido de silicio; el procedimiento finaliza con la separación del óxido metálico simple o mezclado o del producto basado en óxido de silicio de la mezcla de reacción expandiendo el CO{sub,2} supercrítico hasta una presión inferior a la presión supercrítica.
ES98925712T 1997-05-15 1998-05-14 Procedimiento de fabricacion de oxidos metalicos sencillos o mixtos, o de oxido de silicio. Expired - Lifetime ES2189177T3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR9705994A FR2763258B1 (fr) 1997-05-15 1997-05-15 Procede de fabrication d'oxydes metalliques, simples ou mixtes, ou d'oxyde de silicium

Publications (1)

Publication Number Publication Date
ES2189177T3 true ES2189177T3 (es) 2003-07-01

Family

ID=9506938

Family Applications (1)

Application Number Title Priority Date Filing Date
ES98925712T Expired - Lifetime ES2189177T3 (es) 1997-05-15 1998-05-14 Procedimiento de fabricacion de oxidos metalicos sencillos o mixtos, o de oxido de silicio.

Country Status (8)

Country Link
US (1) US6387341B1 (es)
EP (1) EP0981496B1 (es)
JP (1) JP4372846B2 (es)
DE (1) DE69810289T2 (es)
DK (1) DK0981496T3 (es)
ES (1) ES2189177T3 (es)
FR (1) FR2763258B1 (es)
WO (1) WO1998051613A1 (es)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6290735B1 (en) 1997-10-31 2001-09-18 Nanogram Corporation Abrasive particles for surface polishing
US6726990B1 (en) * 1998-05-27 2004-04-27 Nanogram Corporation Silicon oxide particles
EP1199280A1 (de) * 2000-10-19 2002-04-24 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zur Herstellung von Metallchalkogeniden mit Hilfe überkritischer Fluide
DE10106428A1 (de) * 2000-10-19 2002-05-02 Fraunhofer Ges Forschung Verfahren zur Herstellung von Metallchalkogeniden mit Hilfe überkritischer Fluide
GB0208263D0 (en) * 2002-04-10 2002-05-22 Dow Corning Protective coating composition
WO2004001278A2 (en) * 2002-06-25 2003-12-31 Aalborg Universitet Method for production of a product having sub-micron primary particle size, product produced by the method and apparatus for use of the method
FR2843955B1 (fr) * 2002-08-30 2005-05-20 Centre Nat Rech Scient Procede de preparation de poudres d'oxydes inorganiques, de composes cristallins et utilisation de ces composes
CN100417597C (zh) * 2003-06-25 2008-09-10 中国科学院山西煤炭化学研究所 超临界CO2流体干燥制备纳米ZrO2的方法
US20050136292A1 (en) * 2003-08-14 2005-06-23 Mariani Robert D. Thin film dielectrics with perovskite structure and preparation thereof
US20050107252A1 (en) * 2003-11-17 2005-05-19 Gaffney Anne M. Process for preparing mixed metal oxide catalyst
US7452843B2 (en) * 2003-12-29 2008-11-18 Umicore Ag & Co. Kg Exhaust treatment devices, catalyst, and methods of making and using the same
JP4593124B2 (ja) * 2004-02-13 2010-12-08 住友大阪セメント株式会社 ペロブスカイト型ナノ粒子の製造方法
GB0524541D0 (en) * 2005-12-01 2006-01-11 Univ Cardiff Mixed-metal oxides
FR2900845B1 (fr) * 2006-05-15 2009-03-06 Commissariat Energie Atomique Procede et dispositif de synthese de particules organiques ou inorganiques enrobees
FR2915405B1 (fr) * 2007-04-30 2011-09-09 Areva Np Preparation de particules minerales en milieu co2 supercritique
US20110057156A1 (en) * 2007-10-11 2011-03-10 Det Selvejende Institut Cismi (Fond) Method for delaminating/exfoliating layered materials
JP5120060B2 (ja) * 2008-05-14 2013-01-16 大日本印刷株式会社 金属アルコキシドの加水分解物製造装置および金属アルコキシドの加水分解物の製造方法
KR101100297B1 (ko) * 2009-01-09 2011-12-28 한국과학기술연구원 금속 화합물 미세 분말의 제조방법
WO2013061343A1 (en) * 2011-10-27 2013-05-02 Tct Srl Plant and method for nanoparticle generation
JP2014034476A (ja) * 2012-08-07 2014-02-24 Taiyo Nippon Sanso Corp 複合セラミックス材料粒子及びその製造方法
CN103818918A (zh) * 2014-02-25 2014-05-28 大连理工大学 液态、超临界及近临界co2中无机酸诱导的高分散纳米复合材料制备方法
CN107308686A (zh) * 2016-04-27 2017-11-03 北京化工大学常州先进材料研究院 一种超临界二氧化碳连续制备纳米二氧化钛材料的方法
FR3053263B1 (fr) 2016-07-04 2018-08-31 Keey Aerogrl Procede continu de fabrication d'un aerogel
RU2659437C1 (ru) * 2017-03-21 2018-07-02 Общество с ограниченной ответственностью "КерамОптика" (ООО "КерамОптика") Способ получения порошков алюмомагниевой шпинели

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4582731A (en) * 1983-09-01 1986-04-15 Battelle Memorial Institute Supercritical fluid molecular spray film deposition and powder formation
US4619908A (en) * 1984-12-24 1986-10-28 Stauffer Chemical Company Non-aged inorganic oxide-containing aerogels and their preparation
IL80398A0 (en) * 1985-12-06 1987-01-30 Stauffer Chemical Co Preparation of mono-disperse metal oxides
JPH021122A (ja) * 1988-06-09 1990-01-05 Matsushita Electric Ind Co Ltd 薄膜形成方法および薄膜形成装置
IT1240673B (it) * 1990-04-24 1993-12-17 Tenav Microsfere di aerogels di ossidi inorganici a stretta distribuzione dei diametri dei pori e metodo per la loro preparazione
US5409683A (en) * 1990-08-23 1995-04-25 Regents Of The University Of California Method for producing metal oxide aerogels
WO1994001361A1 (en) * 1992-07-10 1994-01-20 Battelle Memorial Institute Method and apparatus for making nanometer sized particles
DK0716641T3 (da) * 1993-08-31 1998-02-09 Basf Ag Hydrofobe kiselsyreaerogeler

Also Published As

Publication number Publication date
FR2763258B1 (fr) 1999-06-25
WO1998051613A1 (fr) 1998-11-19
EP0981496A1 (fr) 2000-03-01
JP2001524922A (ja) 2001-12-04
JP4372846B2 (ja) 2009-11-25
DE69810289D1 (de) 2003-01-30
DK0981496T3 (da) 2003-04-07
DE69810289T2 (de) 2003-09-11
FR2763258A1 (fr) 1998-11-20
US6387341B1 (en) 2002-05-14
EP0981496B1 (fr) 2002-12-18

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