ES2237003T3 - Procedimiento para la deposicion galvanica de precipitados de cinc y/o de precipitados de aleaciones de cinc. - Google Patents

Procedimiento para la deposicion galvanica de precipitados de cinc y/o de precipitados de aleaciones de cinc.

Info

Publication number
ES2237003T3
ES2237003T3 ES99117272T ES99117272T ES2237003T3 ES 2237003 T3 ES2237003 T3 ES 2237003T3 ES 99117272 T ES99117272 T ES 99117272T ES 99117272 T ES99117272 T ES 99117272T ES 2237003 T3 ES2237003 T3 ES 2237003T3
Authority
ES
Spain
Prior art keywords
electrolyte
added
zinc
precipitates
alkoxylate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES99117272T
Other languages
English (en)
Spanish (es)
Inventor
Thomas Helden
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
LPW Chemie GmbH
Original Assignee
LPW Chemie GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by LPW Chemie GmbH filed Critical LPW Chemie GmbH
Application granted granted Critical
Publication of ES2237003T3 publication Critical patent/ES2237003T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/56Electroplating: Baths therefor from solutions of alloys
    • C25D3/565Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of zinc
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/22Electroplating: Baths therefor from solutions of zinc

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
ES99117272T 1998-09-15 1999-09-02 Procedimiento para la deposicion galvanica de precipitados de cinc y/o de precipitados de aleaciones de cinc. Expired - Lifetime ES2237003T3 (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19842098 1998-09-15
DE19842098 1998-09-15

Publications (1)

Publication Number Publication Date
ES2237003T3 true ES2237003T3 (es) 2005-07-16

Family

ID=7880955

Family Applications (1)

Application Number Title Priority Date Filing Date
ES99117272T Expired - Lifetime ES2237003T3 (es) 1998-09-15 1999-09-02 Procedimiento para la deposicion galvanica de precipitados de cinc y/o de precipitados de aleaciones de cinc.

Country Status (4)

Country Link
EP (1) EP0987349B1 (de)
AT (1) ATE286547T1 (de)
DE (2) DE19941765A1 (de)
ES (1) ES2237003T3 (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10146559A1 (de) * 2001-09-21 2003-04-10 Enthone Omi Deutschland Gmbh Verfahren zur Abscheidung einer Zink-Nickel-Legierung aus einem Elektrolyten
US9325037B2 (en) 2013-03-13 2016-04-26 Fluidic, Inc. Hetero-ionic aromatic additives for electrochemical cells comprising a metal fuel
US9269998B2 (en) 2013-03-13 2016-02-23 Fluidic, Inc. Concave gas vent for electrochemical cell
US11228066B2 (en) 2016-07-22 2022-01-18 Form Energy, Inc. Mist elimination system for electrochemical cells
JP2019521497A (ja) 2016-07-22 2019-07-25 ナントエナジー,インク. 電気化学セル内の水分及び二酸化炭素管理システム
CN112805868A (zh) 2018-06-29 2021-05-14 福恩能源公司 金属空气电化学电池构架
CN119481486A (zh) 2018-06-29 2025-02-18 福恩能源公司 滚动膜片密封件
CN114207915A (zh) 2019-06-28 2022-03-18 福恩能源公司 金属-空气电池组的设备架构
WO2021226399A1 (en) 2020-05-06 2021-11-11 Form Energy, Inc. Decoupled electrode electrochemical energy storage system

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3822194A (en) * 1971-06-28 1974-07-02 Du Pont Acid zinc electroplating
US3823076A (en) * 1972-05-23 1974-07-09 Du Pont Zinc electroplating additive
US3769184A (en) * 1972-05-23 1973-10-30 Du Pont Acid zinc electroplating
CA1134317A (en) * 1978-01-16 1982-10-26 Sylvia Martin Zinc electroplating bath
EP0037634A1 (de) * 1980-02-28 1981-10-14 Albright & Wilson Limited Zinkbäder und Zusätze hierfür
US5417840A (en) * 1993-10-21 1995-05-23 Mcgean-Rohco, Inc. Alkaline zinc-nickel alloy plating baths

Also Published As

Publication number Publication date
EP0987349A1 (de) 2000-03-22
ATE286547T1 (de) 2005-01-15
DE19941765A1 (de) 2000-03-16
EP0987349B1 (de) 2005-01-05
DE59911392D1 (de) 2005-02-10

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