ES2349453T3 - Método y aparato para fabricar un dispositivo semiconductor. - Google Patents

Método y aparato para fabricar un dispositivo semiconductor. Download PDF

Info

Publication number: ES2349453T3
Authority: ES; Spain
Prior art keywords: substrate; film; section; air; washing
Prior art date: 1999-05-20
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Lifetime

Application number

ES00105316T

Other languages

English (en)

Spanish (es)

Inventor

Eiji Kuribe

Masataka Kondo

Katsuhiko Hayashi

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Kaneka Corp

Original Assignee

Kaneka Corp

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1999-05-20

Filing date

2000-03-16

Publication date

2011-01-03

2000-03-16 Application filed by Kaneka Corp filed Critical Kaneka Corp

2011-01-03 Application granted granted Critical

2011-01-03 Publication of ES2349453T3 publication Critical patent/ES2349453T3/es

2020-03-16 Anticipated expiration legal-status Critical

Status Expired - Lifetime legal-status Critical Current

Links

239000004065 semiconductor Substances 0.000 title claims abstract description 20
238000004519 manufacturing process Methods 0.000 title claims abstract description 12
238000000034 method Methods 0.000 title claims description 19
239000000758 substrate Substances 0.000 claims abstract description 225
238000005406 washing Methods 0.000 claims abstract description 80
239000007788 liquid Substances 0.000 claims abstract description 78
239000010408 film Substances 0.000 claims abstract description 57
238000000605 extraction Methods 0.000 claims abstract description 30
239000010409 thin film Substances 0.000 claims abstract description 23
238000007664 blowing Methods 0.000 claims abstract description 9
230000015572 biosynthetic process Effects 0.000 claims description 8
239000011261 inert gas Substances 0.000 claims description 8
238000010438 heat treatment Methods 0.000 claims description 3
239000000463 material Substances 0.000 claims 1
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 28
230000007246 mechanism Effects 0.000 description 26
239000002245 particle Substances 0.000 description 22
238000004140 cleaning Methods 0.000 description 13
238000001035 drying Methods 0.000 description 11
230000000903 blocking effect Effects 0.000 description 9
230000007547 defect Effects 0.000 description 7
238000006243 chemical reaction Methods 0.000 description 5
238000011109 contamination Methods 0.000 description 4
239000007789 gas Substances 0.000 description 4
230000002093 peripheral effect Effects 0.000 description 4
230000032258 transport Effects 0.000 description 4
OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
238000007796 conventional method Methods 0.000 description 3
239000000243 solution Substances 0.000 description 3
239000000126 substance Substances 0.000 description 3
238000011144 upstream manufacturing Methods 0.000 description 3
235000012431 wafers Nutrition 0.000 description 3
CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
239000003599 detergent Substances 0.000 description 2
238000005530 etching Methods 0.000 description 2
239000011521 glass Substances 0.000 description 2
239000002184 metal Substances 0.000 description 2
241000894006 Bacteria Species 0.000 description 1
239000004677 Nylon Substances 0.000 description 1
XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical group ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 description 1
230000003213 activating effect Effects 0.000 description 1
230000002411 adverse Effects 0.000 description 1
230000002950 deficient Effects 0.000 description 1
230000000593 degrading effect Effects 0.000 description 1
239000006185 dispersion Substances 0.000 description 1
230000000694 effects Effects 0.000 description 1
230000005611 electricity Effects 0.000 description 1
238000002474 experimental method Methods 0.000 description 1
239000010419 fine particle Substances 0.000 description 1
238000002347 injection Methods 0.000 description 1
239000007924 injection Substances 0.000 description 1
239000004973 liquid crystal related substance Substances 0.000 description 1
229920001778 nylon Polymers 0.000 description 1
239000011368 organic material Substances 0.000 description 1
239000003960 organic solvent Substances 0.000 description 1
239000002244 precipitate Substances 0.000 description 1
239000000047 product Substances 0.000 description 1
238000010926 purge Methods 0.000 description 1
230000002441 reversible effect Effects 0.000 description 1
239000007787 solid Substances 0.000 description 1
238000001228 spectrum Methods 0.000 description 1
239000007921 spray Substances 0.000 description 1
238000005507 spraying Methods 0.000 description 1
230000003068 static effect Effects 0.000 description 1
238000004381 surface treatment Methods 0.000 description 1
230000001360 synchronised effect Effects 0.000 description 1
239000008399 tap water Substances 0.000 description 1
235000020679 tap water Nutrition 0.000 description 1
239000002699 waste material Substances 0.000 description 1
238000003809 water extraction Methods 0.000 description 1

Classifications

- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

Landscapes

Cleaning In General (AREA)
Cleaning By Liquid Or Steam (AREA)
Cleaning Or Drying Semiconductors (AREA)

ES00105316T 1999-05-20 2000-03-16 Método y aparato para fabricar un dispositivo semiconductor. Expired - Lifetime ES2349453T3 (es)

Applications Claiming Priority (4)

Application Number	Priority Date	Filing Date	Title
JP11139820A JP2000331981A (ja)	1999-05-20	1999-05-20	半導体装置の製造方法及び製造装置
JP11-139820		1999-05-20
JP11-228521		1999-08-12
JP11-280266		1999-09-30

Publications (1)

Publication Number	Publication Date
ES2349453T3 true ES2349453T3 (es)	2011-01-03

Family

ID=15254237

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
ES00105316T Expired - Lifetime ES2349453T3 (es)	1999-05-20	2000-03-16	Método y aparato para fabricar un dispositivo semiconductor.

Country Status (2)

Country	Link
JP (1)	JP2000331981A (ja)
ES (1)	ES2349453T3 (ja)

1999
- 1999-05-20 JP JP11139820A patent/JP2000331981A/ja active Pending
2000
- 2000-03-16 ES ES00105316T patent/ES2349453T3/es not_active Expired - Lifetime

Also Published As

Publication number	Publication date
JP2000331981A (ja)	2000-11-30

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