ES2399593R1 - Sistema dinámico para calentamiento o enfriamiento variable de sustratos transportados linealmente - Google Patents
Sistema dinámico para calentamiento o enfriamiento variable de sustratos transportados linealmente Download PDFInfo
- Publication number
- ES2399593R1 ES2399593R1 ES201230441A ES201230441A ES2399593R1 ES 2399593 R1 ES2399593 R1 ES 2399593R1 ES 201230441 A ES201230441 A ES 201230441A ES 201230441 A ES201230441 A ES 201230441A ES 2399593 R1 ES2399593 R1 ES 2399593R1
- Authority
- ES
- Spain
- Prior art keywords
- substrates
- cooling
- heating
- transport direction
- temperature control
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 title abstract 8
- 238000001816 cooling Methods 0.000 title abstract 4
- 238000010438 heat treatment Methods 0.000 title abstract 4
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0623—Sulfides, selenides or tellurides
- C23C14/0629—Sulfides, selenides or tellurides of zinc, cadmium or mercury
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
- F27B9/30—Details, accessories or equipment specially adapted for furnaces of these types
- F27B9/3077—Arrangements for treating electronic components, e.g. semiconductors
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
- F27B9/30—Details, accessories or equipment specially adapted for furnaces of these types
- F27B9/40—Arrangements of controlling or monitoring devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F71/00—Manufacture or treatment of devices covered by this subclass
- H10F71/125—The active layers comprising only Group II-VI materials, e.g. CdS, ZnS or CdTe
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F71/00—Manufacture or treatment of devices covered by this subclass
- H10F71/137—Batch treatment of the devices
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/543—Solar cells from Group II-VI materials
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Engineering & Computer Science (AREA)
- Physical Vapour Deposition (AREA)
- Tunnel Furnaces (AREA)
Abstract
Sistema dinámico para calentamiento o enfriamiento variables de sustratos transportados linealmente.#Se proporciona un sistema (100) para el calentamiento o el enfriamiento de sustratos (108) discretos, transportados linealmente, con un hueco (114) entre un borde posterior (112) de un primer sustrato y un borde anterior (110) de un sustrato subsiguiente en una dirección de transporte. El sistema incluye una cámara (102) y un transportador (132) configurados de forma funcional dentro de la cámara para mover los sustratos a través de ella a una velocidad de transporte. Una pluralidad de unidades de control de temperatura (116) controladas individualmente, por ejemplo, unidades calefactoras o refrigerantes, se disponen linealmente dentro de la cámara a lo largo de la dirección de transporte. Un controlador (118) está en comunicación con cada una de las unidades de control de temperatura (116) para hacer circular secuencialmente la salida de las unidades desde una salida de temperatura en estado estacionario a lo largo de la dirección de transporte como una función de la posición de los bordes anteriores y posteriores de los sustratos dentro de dicha cámara con relación a dichas unidades de control de temperatura con el fin de reducir las variaciones de temperatura inducidas por los bordes en los sustratos.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US13/070661 | 2011-03-24 | ||
| US13/070,661 US20120060758A1 (en) | 2011-03-24 | 2011-03-24 | Dynamic system for variable heating or cooling of linearly conveyed substrates |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| ES2399593A2 ES2399593A2 (es) | 2013-04-02 |
| ES2399593R1 true ES2399593R1 (es) | 2014-11-06 |
| ES2399593B1 ES2399593B1 (es) | 2015-08-11 |
Family
ID=45805407
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| ES201230441A Withdrawn - After Issue ES2399593B1 (es) | 2011-03-24 | 2012-03-23 | Sistema dinámico para calentamiento o enfriamiento variable de sustratos transportados linealmente |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US20120060758A1 (es) |
| CN (1) | CN102691049B (es) |
| ES (1) | ES2399593B1 (es) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1958730B1 (en) * | 2005-12-06 | 2011-06-29 | Musashi Engineering, Inc. | Machining apparatus and machining method |
| DE102011080202A1 (de) * | 2011-08-01 | 2013-02-07 | Gebr. Schmid Gmbh | Vorrichtung und Verfahren zur Herstellung von dünnen Schichten |
| DE102012103254A1 (de) * | 2012-04-16 | 2013-10-17 | Von Ardenne Anlagentechnik Gmbh | Verfahren zum Einschleusen von Substraten in eine Vakuumbehandlungsanlage |
| DE102013100767B4 (de) * | 2013-01-25 | 2021-10-21 | VON ARDENNE Asset GmbH & Co. KG | Übergabebereich einer Vakuumbehandlungsanlage |
| KR101807381B1 (ko) * | 2013-06-26 | 2018-01-10 | 우니페르시테트 콘스탄츠 | 안정화된 효율을 가지는 광기전력 소자를 생산하기 위한 방법 및 디바이스 |
| JP2016024511A (ja) * | 2014-07-16 | 2016-02-08 | セイコーエプソン株式会社 | 電子部品搬送装置および電子部品検査装置 |
| CN104561932B (zh) * | 2015-01-28 | 2019-08-27 | 京东方科技集团股份有限公司 | 气相沉积系统及气相沉积方法 |
| US11538956B2 (en) | 2018-04-27 | 2022-12-27 | Illinois Tool Works Inc. | Methods and apparatus to control zone temperatures of a solar cell production system |
| CN110825130A (zh) * | 2019-10-31 | 2020-02-21 | 中冶陕压重工设备有限公司 | 酸洗线工艺段酸液温度控制方法 |
| CN116871713A (zh) * | 2023-07-17 | 2023-10-13 | 深圳市柠檬光子科技有限公司 | 加热装置及其加热箱 |
| CN117125886A (zh) * | 2023-08-21 | 2023-11-28 | 广东顺德添百利科技股份有限公司 | 玻璃加热温度检测方法及系统 |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3652246A (en) * | 1969-10-27 | 1972-03-28 | Ppg Industries Inc | Apparatus for coating hot glass |
| US4338078A (en) * | 1980-11-24 | 1982-07-06 | Photon Power, Inc. | Heated conveyor system |
| JP2002129311A (ja) * | 2000-10-20 | 2002-05-09 | Ulvac Japan Ltd | プラズマディスプレイ保護膜形成装置および保護膜形成方法 |
| JP2002129325A (ja) * | 2000-10-25 | 2002-05-09 | Matsushita Electric Ind Co Ltd | 薄膜形成装置および薄膜形成方法 |
| US20090188603A1 (en) * | 2008-01-25 | 2009-07-30 | Applied Materials, Inc. | Method and apparatus for controlling laminator temperature on a solar cell |
| US20100189904A1 (en) * | 2008-09-30 | 2010-07-29 | Canon Anelva Corporation | Film forming apparatus and film forming method using the same |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3870460A (en) * | 1974-04-03 | 1975-03-11 | Gca Corp | Single or multi-track fluid bearing heating apparatus and method |
| US4154998A (en) * | 1977-07-12 | 1979-05-15 | Trw Inc. | Solar array fabrication method and apparatus utilizing induction heating |
| US4820365A (en) * | 1987-09-30 | 1989-04-11 | Dimension Industries, Inc. | Glass edge sealant curing system |
| JP2924361B2 (ja) * | 1991-10-08 | 1999-07-26 | 松下電器産業株式会社 | 基板焼成方法 |
| US5390477A (en) * | 1991-11-19 | 1995-02-21 | Mcneilab, Inc. | System for applying a heat shrinkable sleeve to a container |
| US5758817A (en) * | 1996-03-19 | 1998-06-02 | Resource Concepts, Inc. | Apparatus and process for removing surface mounted components from printed wiring assemblies |
| US6203639B1 (en) * | 1998-02-17 | 2001-03-20 | Donnelly Corporation | Vehicle assembly line-side heat activation of a “ready-to-install” window fixing adhesive for attachment of a vehicle window to a vehicle |
| US6054001A (en) * | 1998-02-17 | 2000-04-25 | Donnelly Corporation | Vehicle assembly line-side heat activation of a "ready-to-install" window fixing adhesive for attachment of a vehicle window to a vehicle |
| DE69937042T2 (de) * | 1998-09-11 | 2008-05-29 | Japan Science And Technology Agency, Kawaguchi | Kombinatorische vorrichtung für epitaktische molekularschicht |
| JP2000306978A (ja) * | 1999-02-15 | 2000-11-02 | Kokusai Electric Co Ltd | 基板処理装置、基板搬送装置、および基板処理方法 |
| US6849831B2 (en) * | 2002-03-29 | 2005-02-01 | Mattson Technology, Inc. | Pulsed processing semiconductor heating methods using combinations of heating sources |
| US7703197B2 (en) * | 2005-07-01 | 2010-04-27 | Moltion James R | Process for depopulating a circuit board |
| US7677198B2 (en) * | 2005-11-28 | 2010-03-16 | Industrial Technology Research Institute | Method and apparatus for growing a composite metal sulphide photocatalyst thin film |
| WO2007112454A2 (en) * | 2006-03-28 | 2007-10-04 | Stratusys Inc. | Apparatus and method for processing substrates using one or more vacuum transfer chamber units |
| US8571396B2 (en) * | 2006-06-26 | 2013-10-29 | Tp Solar, Inc. | Rapid thermal firing IR conveyor furnace having high intensity heating section |
| DE102007034135A1 (de) * | 2007-05-30 | 2009-01-29 | Robert Bürkle GmbH | Verfahren und Vorrichtung zum Laminieren von im Wesentlichen plattenförmigen Werkstücken unter Druck- und Wärmeeinwirkung |
| US8575521B2 (en) * | 2008-04-01 | 2013-11-05 | Mattson Technology, Inc. | Monitoring witness structures for temperature control in RTP systems |
| US20090308860A1 (en) * | 2008-06-11 | 2009-12-17 | Applied Materials, Inc. | Short thermal profile oven useful for screen printing |
| JP2010168649A (ja) * | 2008-12-26 | 2010-08-05 | Canon Anelva Corp | 基板処理装置、成膜方法、電子デバイスの生産方法 |
-
2011
- 2011-03-24 US US13/070,661 patent/US20120060758A1/en not_active Abandoned
-
2012
- 2012-03-23 ES ES201230441A patent/ES2399593B1/es not_active Withdrawn - After Issue
- 2012-03-23 CN CN201210154370.1A patent/CN102691049B/zh not_active Expired - Fee Related
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3652246A (en) * | 1969-10-27 | 1972-03-28 | Ppg Industries Inc | Apparatus for coating hot glass |
| US4338078A (en) * | 1980-11-24 | 1982-07-06 | Photon Power, Inc. | Heated conveyor system |
| JP2002129311A (ja) * | 2000-10-20 | 2002-05-09 | Ulvac Japan Ltd | プラズマディスプレイ保護膜形成装置および保護膜形成方法 |
| JP2002129325A (ja) * | 2000-10-25 | 2002-05-09 | Matsushita Electric Ind Co Ltd | 薄膜形成装置および薄膜形成方法 |
| US20090188603A1 (en) * | 2008-01-25 | 2009-07-30 | Applied Materials, Inc. | Method and apparatus for controlling laminator temperature on a solar cell |
| US20100189904A1 (en) * | 2008-09-30 | 2010-07-29 | Canon Anelva Corporation | Film forming apparatus and film forming method using the same |
Also Published As
| Publication number | Publication date |
|---|---|
| ES2399593A2 (es) | 2013-04-02 |
| CN102691049B (zh) | 2016-03-30 |
| US20120060758A1 (en) | 2012-03-15 |
| ES2399593B1 (es) | 2015-08-11 |
| CN102691049A (zh) | 2012-09-26 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| FG2A | Definitive protection |
Ref document number: 2399593 Country of ref document: ES Kind code of ref document: B1 Effective date: 20150811 |
|
| FA2A | Application withdrawn |
Effective date: 20160114 |