ES2522281T3 - Microdispositivo electromecánico mejorado de condensador variable y método para hacer el mismo - Google Patents

Microdispositivo electromecánico mejorado de condensador variable y método para hacer el mismo Download PDF

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Publication number
ES2522281T3
ES2522281T3 ES06717294.0T ES06717294T ES2522281T3 ES 2522281 T3 ES2522281 T3 ES 2522281T3 ES 06717294 T ES06717294 T ES 06717294T ES 2522281 T3 ES2522281 T3 ES 2522281T3
Authority
ES
Spain
Prior art keywords
substrate
contact
microdevice
same
variable capacitor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES06717294.0T
Other languages
English (en)
Inventor
Robert C. Allison
Ron K Nakahira
Joon Park
Brian H. Tran
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Raytheon Co
Original Assignee
Raytheon Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Raytheon Co filed Critical Raytheon Co
Application granted granted Critical
Publication of ES2522281T3 publication Critical patent/ES2522281T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G5/00—Capacitors in which the capacitance is varied by mechanical means, e.g. by turning a shaft; Processes of their manufacture
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G2/00—Details of capacitors not covered by a single one of groups H01G4/00-H01G11/00
    • H01G2/14—Protection against electric or thermal overload
    • H01G2/18—Protection against electric or thermal overload with breakable contacts
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G5/00—Capacitors in which the capacitance is varied by mechanical means, e.g. by turning a shaft; Processes of their manufacture
    • H01G5/16—Capacitors in which the capacitance is varied by mechanical means, e.g. by turning a shaft; Processes of their manufacture using variation of distance between electrodes
    • H01G5/18—Capacitors in which the capacitance is varied by mechanical means, e.g. by turning a shaft; Processes of their manufacture using variation of distance between electrodes due to change in inclination, e.g. by flexing, by spiral wrapping
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01P—WAVEGUIDES; RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE
    • H01P1/00—Auxiliary devices
    • H01P1/10—Auxiliary devices for switching or interrupting
    • H01P1/12—Auxiliary devices for switching or interrupting by mechanical chopper
    • H01P1/127—Strip line switches
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01P—WAVEGUIDES; RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE
    • H01P11/00—Apparatus or processes specially adapted for manufacturing waveguides or resonators, lines, or other devices of the waveguide type
    • H01P11/001—Manufacturing waveguides or transmission lines of the waveguide type
    • H01P11/003—Manufacturing lines with conductors on a substrate, e.g. strip lines, slot lines

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Micromachines (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Fixed Capacitors And Capacitor Manufacturing Machines (AREA)

Abstract

Un microcondensador electromecánico variable que comprende: un primer sustrato (24); un primer contacto (34) dispuesto en una primera superficie de dicho sustrato (24); un activador piezoeléctrico (16) dispuesto sobre dicha primera superficie de dicho sustrato (24); un segundo contacto (18) acoplado a dicho activador (16) y dispuesto próximo a dicho primer contacto (34); una parada (37, 39) de control de holgura dispuesta entre dicho sustrato (24) y dicho activador (16) para limitar el movimiento de dicho primer contacto (34) con respecto a dicho segundo contacto (18); varias conexiones (25) entre dicho activador (16) y dicho primer sustrato (24); y un segundo sustrato (14) dispuesto sobre dicho activador piezoeléctrico (16), caracterizado porque dicho segundo sustrato (14) tiene unos pozos (15, 17) sobre dichas conexiones (25) para facilitar la aplicación de una herramienta de conexión (19) a dichas conexiones (25).

Description

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Claims (1)

  1. imagen1
ES06717294.0T 2005-01-10 2006-01-03 Microdispositivo electromecánico mejorado de condensador variable y método para hacer el mismo Expired - Lifetime ES2522281T3 (es)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US31950 2005-01-10
US11/031,950 US7098576B2 (en) 2005-01-10 2005-01-10 Micro-electrical-mechanical device and method of making same
PCT/US2006/000069 WO2006076182A1 (en) 2005-01-10 2006-01-03 Improved micro-electrical-mechanical variable capacitor device and method of making same

Publications (1)

Publication Number Publication Date
ES2522281T3 true ES2522281T3 (es) 2014-11-14

Family

ID=36282628

Family Applications (1)

Application Number Title Priority Date Filing Date
ES06717294.0T Expired - Lifetime ES2522281T3 (es) 2005-01-10 2006-01-03 Microdispositivo electromecánico mejorado de condensador variable y método para hacer el mismo

Country Status (10)

Country Link
US (1) US7098576B2 (es)
EP (1) EP1836712B1 (es)
JP (1) JP4927758B2 (es)
KR (1) KR100896612B1 (es)
AU (1) AU2006205200B2 (es)
CA (1) CA2579572C (es)
DK (1) DK1836712T3 (es)
ES (1) ES2522281T3 (es)
NO (1) NO338423B1 (es)
WO (1) WO2006076182A1 (es)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006093463A (ja) * 2004-09-24 2006-04-06 Toshiba Corp 圧電mems素子及びチューナブルフィルタ
US7417511B2 (en) * 2004-12-13 2008-08-26 Lexmark International, Inc. Modulation circuit with integrated microelectro-mechanical system (MEMS) components
US8424176B2 (en) * 2008-11-25 2013-04-23 Kovio, Inc. Methods of forming tunable capacitors
TWI471955B (zh) * 2011-12-13 2015-02-01 精材科技股份有限公司 半導體封裝件及其製法
EP2898519A4 (en) 2012-09-20 2016-06-01 Wispry Inc VARIABLE CONDENSATE DEVICES WITH A MICROELECTROMECHANICAL SYSTEM (MEMS) AND CORRESPONDING METHOD
US9136165B2 (en) * 2013-06-04 2015-09-15 Invensense, Inc. Methods for stiction reduction in MEMS sensors
EP3501104B1 (en) * 2016-08-18 2021-06-02 King Abdullah University Of Science And Technology Tunable narrow bandpass mems technology filter using an arch beam microresonator
US10332687B2 (en) 2017-10-23 2019-06-25 Blackberry Limited Tunable coplanar capacitor with vertical tuning and lateral RF path and methods for manufacturing thereof
US10497774B2 (en) 2017-10-23 2019-12-03 Blackberry Limited Small-gap coplanar tunable capacitors and methods for manufacturing thereof

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06232202A (ja) * 1993-02-01 1994-08-19 Oki Electric Ind Co Ltd フリップチップicの実装構造
US6404063B2 (en) * 1995-12-22 2002-06-11 Micron Technology, Inc. Die-to-insert permanent connection and method of forming
US6212056B1 (en) * 1999-03-26 2001-04-03 Lucent Technologies Inc. Micromachined variable capacitor
JP2001196414A (ja) * 2000-01-12 2001-07-19 Seiko Epson Corp 半導体装置、その製造方法および回路基板並びに電子機器
ATE263118T1 (de) * 2000-08-09 2004-04-15 Fraunhofer Ges Forschung Anordnung mit variabler kapazität
JP2002076055A (ja) * 2000-08-22 2002-03-15 Hitachi Ltd 半導体装置の実装方法および実装構造
JP2003264123A (ja) * 2002-03-11 2003-09-19 Murata Mfg Co Ltd 可変容量素子
US6784766B2 (en) * 2002-08-21 2004-08-31 Raytheon Company MEMS tunable filters
US7132723B2 (en) * 2002-11-14 2006-11-07 Raytheon Company Micro electro-mechanical system device with piezoelectric thin film actuator
JP2004221128A (ja) 2003-01-09 2004-08-05 Murata Mfg Co Ltd 可変容量素子
US7372346B2 (en) * 2003-12-24 2008-05-13 Interuniversitair Microelektronica Centrum (Imec) Acoustic resonator
US7323805B2 (en) * 2004-01-28 2008-01-29 Kabushiki Kaisha Toshiba Piezoelectric thin film device and method for manufacturing the same

Also Published As

Publication number Publication date
NO338423B1 (no) 2016-08-15
NO20074080L (no) 2007-10-03
WO2006076182A1 (en) 2006-07-20
AU2006205200B2 (en) 2009-10-22
AU2006205200A1 (en) 2006-07-20
CA2579572A1 (en) 2006-07-20
JP2008527715A (ja) 2008-07-24
KR20070087018A (ko) 2007-08-27
JP4927758B2 (ja) 2012-05-09
DK1836712T3 (da) 2014-10-27
US7098576B2 (en) 2006-08-29
CA2579572C (en) 2013-10-08
US20060152111A1 (en) 2006-07-13
EP1836712B1 (en) 2014-10-01
EP1836712A1 (en) 2007-09-26
KR100896612B1 (ko) 2009-05-08

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