ES2745071T3 - Generación electrolítica de iones manganeso (III) en ácido sulfúrico fuerte - Google Patents

Generación electrolítica de iones manganeso (III) en ácido sulfúrico fuerte Download PDF

Info

Publication number: ES2745071T3
Authority: ES; Spain
Prior art keywords: manganese; ions; solution; iii; acid
Prior art date: 2013-03-12
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Active

Application number

ES14779082T

Other languages

English (en)

Spanish (es)

Inventor

Trevor Pearson

Terence Clarke

Roshan Chapaneri

Craig Robinson

Alison Hyslop

Amrik Singh

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

MacDermid Acumen Inc

Original Assignee

MacDermid Acumen Inc

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2013-03-12

Filing date

2014-03-07

Publication date

2020-02-27

2013-03-12 Priority claimed from US13/795,382 external-priority patent/US9534306B2/en

2014-03-07 Application filed by MacDermid Acumen Inc filed Critical MacDermid Acumen Inc

2020-02-27 Application granted granted Critical

2020-02-27 Publication of ES2745071T3 publication Critical patent/ES2745071T3/es

Status Active legal-status Critical Current

2034-03-07 Anticipated expiration legal-status Critical

Links

QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 title claims abstract description 122
-1 manganese (III) ions Chemical class 0.000 title claims abstract description 69
239000000243 solution Substances 0.000 claims abstract description 106
AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 claims abstract description 34
239000002253 acid Substances 0.000 claims abstract description 26
229940098779 methanesulfonic acid Drugs 0.000 claims abstract description 17
239000008151 electrolyte solution Substances 0.000 claims abstract description 12
OPUAWDUYWRUIIL-UHFFFAOYSA-N methanedisulfonic acid Chemical compound OS(=O)(=O)CS(O)(=O)=O OPUAWDUYWRUIIL-UHFFFAOYSA-N 0.000 claims abstract description 12
239000000126 substance Substances 0.000 claims description 66
229920003023 plastic Polymers 0.000 claims description 53
239000004033 plastic Substances 0.000 claims description 53
NUJOXMJBOLGQSY-UHFFFAOYSA-N manganese dioxide Chemical compound O=[Mn]=O NUJOXMJBOLGQSY-UHFFFAOYSA-N 0.000 claims description 36
238000000034 method Methods 0.000 claims description 35
229910001437 manganese ion Inorganic materials 0.000 claims description 34
239000003792 electrolyte Substances 0.000 claims description 25
239000011572 manganese Substances 0.000 claims description 24
BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 23
MMIPFLVOWGHZQD-UHFFFAOYSA-N manganese(3+) Chemical compound [Mn+3] MMIPFLVOWGHZQD-UHFFFAOYSA-N 0.000 claims description 19
PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 claims description 16
SQQMAOCOWKFBNP-UHFFFAOYSA-L manganese(II) sulfate Chemical compound [Mn+2].[O-]S([O-])(=O)=O SQQMAOCOWKFBNP-UHFFFAOYSA-L 0.000 claims description 15
238000007747 plating Methods 0.000 claims description 15
UUWCBFKLGFQDME-UHFFFAOYSA-N platinum titanium Chemical compound [Ti].[Pt] UUWCBFKLGFQDME-UHFFFAOYSA-N 0.000 claims description 15
238000005868 electrolysis reaction Methods 0.000 claims description 14
239000000463 material Substances 0.000 claims description 13
239000000203 mixture Substances 0.000 claims description 13
OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 12
229920000049 Carbon (fiber) Polymers 0.000 claims description 12
238000009825 accumulation Methods 0.000 claims description 12
239000004917 carbon fiber Substances 0.000 claims description 12
239000004417 polycarbonate Substances 0.000 claims description 12
229920000122 acrylonitrile butadiene styrene Polymers 0.000 claims description 10
JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 claims description 10
229940099596 manganese sulfate Drugs 0.000 claims description 10
239000011702 manganese sulphate Substances 0.000 claims description 10
235000007079 manganese sulphate Nutrition 0.000 claims description 10
RUOJZAUFBMNUDX-UHFFFAOYSA-N propylene carbonate Chemical compound CC1COC(=O)O1 RUOJZAUFBMNUDX-UHFFFAOYSA-N 0.000 claims description 10
229910052697 platinum Inorganic materials 0.000 claims description 9
229910000978 Pb alloy Inorganic materials 0.000 claims description 8
229910021397 glassy carbon Inorganic materials 0.000 claims description 8
238000012544 monitoring process Methods 0.000 claims description 8
229910000457 iridium oxide Inorganic materials 0.000 claims description 7
YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 claims description 6
AEMRFAOFKBGASW-UHFFFAOYSA-N Glycolic acid Chemical compound OCC(O)=O AEMRFAOFKBGASW-UHFFFAOYSA-N 0.000 claims description 6
150000001261 hydroxy acids Chemical class 0.000 claims description 6
239000002904 solvent Substances 0.000 claims description 6
229910001936 tantalum oxide Inorganic materials 0.000 claims description 6
238000006056 electrooxidation reaction Methods 0.000 claims description 5
239000004310 lactic acid Substances 0.000 claims description 5
235000014655 lactic acid Nutrition 0.000 claims description 5
229910052758 niobium Inorganic materials 0.000 claims description 5
239000010955 niobium Substances 0.000 claims description 5
GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 5
BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 claims description 5
RGHNJXZEOKUKBD-SQOUGZDYSA-N D-gluconic acid Chemical compound OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C(O)=O RGHNJXZEOKUKBD-SQOUGZDYSA-N 0.000 claims description 4
GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 claims description 4
229920000515 polycarbonate Polymers 0.000 claims description 3
ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 2
RGHNJXZEOKUKBD-UHFFFAOYSA-N D-gluconic acid Natural products OCC(O)C(O)C(O)C(O)C(O)=O RGHNJXZEOKUKBD-UHFFFAOYSA-N 0.000 claims description 2
229910052796 boron Inorganic materials 0.000 claims description 2
229910003460 diamond Inorganic materials 0.000 claims description 2
239000010432 diamond Substances 0.000 claims description 2
239000000174 gluconic acid Substances 0.000 claims description 2
235000012208 gluconic acid Nutrition 0.000 claims description 2
239000011656 manganese carbonate Substances 0.000 claims description 2
235000006748 manganese carbonate Nutrition 0.000 claims description 2
229940093474 manganese carbonate Drugs 0.000 claims description 2
IPJKJLXEVHOKSE-UHFFFAOYSA-L manganese dihydroxide Chemical compound [OH-].[OH-].[Mn+2] IPJKJLXEVHOKSE-UHFFFAOYSA-L 0.000 claims description 2
229910000016 manganese(II) carbonate Inorganic materials 0.000 claims description 2
XMWCXZJXESXBBY-UHFFFAOYSA-L manganese(ii) carbonate Chemical compound [Mn+2].[O-]C([O-])=O XMWCXZJXESXBBY-UHFFFAOYSA-L 0.000 claims description 2
229910003446 platinum oxide Inorganic materials 0.000 claims description 2
XECAHXYUAAWDEL-UHFFFAOYSA-N acrylonitrile butadiene styrene Chemical compound C=CC=C.C=CC#N.C=CC1=CC=CC=C1 XECAHXYUAAWDEL-UHFFFAOYSA-N 0.000 claims 2
239000004676 acrylonitrile butadiene styrene Substances 0.000 claims 2
150000001875 compounds Chemical class 0.000 claims 1
150000002500 ions Chemical class 0.000 description 23
230000008569 process Effects 0.000 description 18
239000000758 substrate Substances 0.000 description 18
KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 16
230000003647 oxidation Effects 0.000 description 15
238000007254 oxidation reaction Methods 0.000 description 15
238000006243 chemical reaction Methods 0.000 description 14
AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 14
239000003795 chemical substances by application Substances 0.000 description 13
229910052748 manganese Inorganic materials 0.000 description 12
238000012360 testing method Methods 0.000 description 12
238000002474 experimental method Methods 0.000 description 9
PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 8
NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 8
RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 8
230000000052 comparative effect Effects 0.000 description 8
229910052751 metal Inorganic materials 0.000 description 8
239000002184 metal Substances 0.000 description 8
VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 8
239000010936 titanium Substances 0.000 description 8
229910052719 titanium Inorganic materials 0.000 description 8
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
WAEMQWOKJMHJLA-UHFFFAOYSA-N Manganese(2+) Chemical compound [Mn+2] WAEMQWOKJMHJLA-UHFFFAOYSA-N 0.000 description 6
KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 6
238000000576 coating method Methods 0.000 description 6
238000004070 electrodeposition Methods 0.000 description 6
238000004519 manufacturing process Methods 0.000 description 6
RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 5
238000013019 agitation Methods 0.000 description 5
230000015572 biosynthetic process Effects 0.000 description 5
229910052802 copper Inorganic materials 0.000 description 5
239000010949 copper Substances 0.000 description 5
239000001257 hydrogen Substances 0.000 description 5
229910052739 hydrogen Inorganic materials 0.000 description 5
VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 4
BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 4
ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 4
230000002378 acidificating effect Effects 0.000 description 4
229910000147 aluminium phosphate Inorganic materials 0.000 description 4
QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
229910052804 chromium Inorganic materials 0.000 description 4
239000011651 chromium Substances 0.000 description 4
239000011248 coating agent Substances 0.000 description 4
230000007797 corrosion Effects 0.000 description 4
238000005260 corrosion Methods 0.000 description 4
239000000835 fiber Substances 0.000 description 4
229910002804 graphite Inorganic materials 0.000 description 4
239000010439 graphite Substances 0.000 description 4
238000007654 immersion Methods 0.000 description 4
229910052759 nickel Inorganic materials 0.000 description 4
239000001301 oxygen Substances 0.000 description 4
229910052760 oxygen Inorganic materials 0.000 description 4
238000005406 washing Methods 0.000 description 4
239000004593 Epoxy Substances 0.000 description 3
UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 3
239000005062 Polybutadiene Substances 0.000 description 3
HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 3
150000007513 acids Chemical class 0.000 description 3
239000002537 cosmetic Substances 0.000 description 3
HTXDPTMKBJXEOW-UHFFFAOYSA-N dioxoiridium Chemical compound O=[Ir]=O HTXDPTMKBJXEOW-UHFFFAOYSA-N 0.000 description 3
239000007772 electrode material Substances 0.000 description 3
230000001590 oxidative effect Effects 0.000 description 3
229910052763 palladium Inorganic materials 0.000 description 3
229920002857 polybutadiene Polymers 0.000 description 3
229920000642 polymer Polymers 0.000 description 3
230000009467 reduction Effects 0.000 description 3
230000008929 regeneration Effects 0.000 description 3
238000011069 regeneration method Methods 0.000 description 3
239000010802 sludge Substances 0.000 description 3
NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 2
241000167854 Bourreria succulenta Species 0.000 description 2
KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
239000002033 PVDF binder Substances 0.000 description 2
229910021607 Silver chloride Inorganic materials 0.000 description 2
QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 2
230000004913 activation Effects 0.000 description 2
229910052783 alkali metal Inorganic materials 0.000 description 2
150000001340 alkali metals Chemical class 0.000 description 2
239000010405 anode material Substances 0.000 description 2
229910052787 antimony Inorganic materials 0.000 description 2
WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 2
125000004432 carbon atom Chemical group C* 0.000 description 2
235000019693 cherries Nutrition 0.000 description 2
JAWGVVJVYSANRY-UHFFFAOYSA-N cobalt(3+) Chemical compound [Co+3] JAWGVVJVYSANRY-UHFFFAOYSA-N 0.000 description 2
238000000354 decomposition reaction Methods 0.000 description 2
238000007865 diluting Methods 0.000 description 2
YADSGOSSYOOKMP-UHFFFAOYSA-N dioxolead Chemical compound O=[Pb]=O YADSGOSSYOOKMP-UHFFFAOYSA-N 0.000 description 2
DMBHHRLKUKUOEG-UHFFFAOYSA-N diphenylamine Chemical compound C=1C=CC=CC=1NC1=CC=CC=C1 DMBHHRLKUKUOEG-UHFFFAOYSA-N 0.000 description 2
238000007323 disproportionation reaction Methods 0.000 description 2
239000003822 epoxy resin Substances 0.000 description 2
230000036541 health Effects 0.000 description 2
229910000357 manganese(II) sulfate Inorganic materials 0.000 description 2
238000000465 moulding Methods 0.000 description 2
238000010137 moulding (plastic) Methods 0.000 description 2
150000007524 organic acids Chemical class 0.000 description 2
KHIWWQKSHDUIBK-UHFFFAOYSA-N periodic acid Chemical compound OI(=O)(=O)=O KHIWWQKSHDUIBK-UHFFFAOYSA-N 0.000 description 2
229920002239 polyacrylonitrile Polymers 0.000 description 2
229920000647 polyepoxide Polymers 0.000 description 2
229920002981 polyvinylidene fluoride Polymers 0.000 description 2
229920005989 resin Polymers 0.000 description 2
239000011347 resin Substances 0.000 description 2
229910052709 silver Inorganic materials 0.000 description 2
239000004332 silver Substances 0.000 description 2
HKZLPVFGJNLROG-UHFFFAOYSA-M silver monochloride Chemical compound [Cl-].[Ag+] HKZLPVFGJNLROG-UHFFFAOYSA-M 0.000 description 2
238000004513 sizing Methods 0.000 description 2
MCSXGCZMEPXKIW-UHFFFAOYSA-N 3-hydroxy-4-[(4-methyl-2-nitrophenyl)diazenyl]-N-(3-nitrophenyl)naphthalene-2-carboxamide Chemical compound Cc1ccc(N=Nc2c(O)c(cc3ccccc23)C(=O)Nc2cccc(c2)[N+]([O-])=O)c(c1)[N+]([O-])=O MCSXGCZMEPXKIW-UHFFFAOYSA-N 0.000 description 1
RZVAJINKPMORJF-UHFFFAOYSA-N Acetaminophen Chemical compound CC(=O)NC1=CC=C(O)C=C1 RZVAJINKPMORJF-UHFFFAOYSA-N 0.000 description 1
OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
206010067125 Liver injury Diseases 0.000 description 1
UEZVMMHDMIWARA-UHFFFAOYSA-N Metaphosphoric acid Chemical compound OP(=O)=O UEZVMMHDMIWARA-UHFFFAOYSA-N 0.000 description 1
GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
FOIXSVOLVBLSDH-UHFFFAOYSA-N Silver ion Chemical compound [Ag+] FOIXSVOLVBLSDH-UHFFFAOYSA-N 0.000 description 1
239000005708 Sodium hypochlorite Substances 0.000 description 1
JOJPFQVZNUNZBO-UHFFFAOYSA-N [O-2].[O-2].[O-2].[O-2].[O-2].[O-2].[O-2].[Mn+2].[Mn+2].[Mn+2].[Mn+2].[Mn+2].[Mn+2].[Mn+2] Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[O-2].[O-2].[Mn+2].[Mn+2].[Mn+2].[Mn+2].[Mn+2].[Mn+2].[Mn+2] JOJPFQVZNUNZBO-UHFFFAOYSA-N 0.000 description 1
238000000862 absorption spectrum Methods 0.000 description 1
239000003929 acidic solution Substances 0.000 description 1
239000012190 activator Substances 0.000 description 1
229910052784 alkaline earth metal Inorganic materials 0.000 description 1
239000012670 alkaline solution Substances 0.000 description 1
229910045601 alloy Inorganic materials 0.000 description 1
239000000956 alloy Substances 0.000 description 1
229940010514 ammonium ferrous sulfate Drugs 0.000 description 1
239000012298 atmosphere Substances 0.000 description 1
230000000740 bleeding effect Effects 0.000 description 1
229910052791 calcium Inorganic materials 0.000 description 1
239000011575 calcium Substances 0.000 description 1
230000000711 cancerogenic effect Effects 0.000 description 1
229910052799 carbon Inorganic materials 0.000 description 1
238000003763 carbonization Methods 0.000 description 1
231100000357 carcinogen Toxicity 0.000 description 1
239000003183 carcinogenic agent Substances 0.000 description 1
230000015556 catabolic process Effects 0.000 description 1
239000003054 catalyst Substances 0.000 description 1
239000000460 chlorine Substances 0.000 description 1
229910052801 chlorine Inorganic materials 0.000 description 1
150000001845 chromium compounds Chemical class 0.000 description 1
JOPOVCBBYLSVDA-UHFFFAOYSA-N chromium(6+) Chemical compound [Cr+6] JOPOVCBBYLSVDA-UHFFFAOYSA-N 0.000 description 1
238000005253 cladding Methods 0.000 description 1
229910017052 cobalt Inorganic materials 0.000 description 1
239000010941 cobalt Substances 0.000 description 1
GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
XLJKHNWPARRRJB-UHFFFAOYSA-N cobalt(2+) Chemical compound [Co+2] XLJKHNWPARRRJB-UHFFFAOYSA-N 0.000 description 1
239000004020 conductor Substances 0.000 description 1
239000000599 controlled substance Substances 0.000 description 1
229920001577 copolymer Polymers 0.000 description 1
125000004122 cyclic group Chemical group 0.000 description 1
238000002484 cyclic voltammetry Methods 0.000 description 1
238000005034 decoration Methods 0.000 description 1
238000006731 degradation reaction Methods 0.000 description 1
238000000151 deposition Methods 0.000 description 1
230000008021 deposition Effects 0.000 description 1
238000013461 design Methods 0.000 description 1
238000009792 diffusion process Methods 0.000 description 1
238000002845 discoloration Methods 0.000 description 1
238000004090 dissolution Methods 0.000 description 1
230000000694 effects Effects 0.000 description 1
230000007613 environmental effect Effects 0.000 description 1
239000002360 explosive Substances 0.000 description 1
IMBKASBLAKCLEM-UHFFFAOYSA-L ferrous ammonium sulfate (anhydrous) Chemical compound [NH4+].[NH4+].[Fe+2].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O IMBKASBLAKCLEM-UHFFFAOYSA-L 0.000 description 1
238000001914 filtration Methods 0.000 description 1
238000009472 formulation Methods 0.000 description 1
LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
238000010438 heat treatment Methods 0.000 description 1
XLYOFNOQVPJJNP-ZSJDYOACSA-N heavy water Substances [2H]O[2H] XLYOFNOQVPJJNP-ZSJDYOACSA-N 0.000 description 1
231100000234 hepatic damage Toxicity 0.000 description 1
238000007373 indentation Methods 0.000 description 1
239000004922 lacquer Substances 0.000 description 1
PIJPYDMVFNTHIP-UHFFFAOYSA-L lead sulfate Chemical compound [PbH4+2].[O-]S([O-])(=O)=O PIJPYDMVFNTHIP-UHFFFAOYSA-L 0.000 description 1
230000008818 liver damage Effects 0.000 description 1
231100000053 low toxicity Toxicity 0.000 description 1
229910000471 manganese heptoxide Inorganic materials 0.000 description 1
WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
BECVLEVEVXAFSH-UHFFFAOYSA-K manganese(3+);phosphate Chemical compound [Mn+3].[O-]P([O-])([O-])=O BECVLEVEVXAFSH-UHFFFAOYSA-K 0.000 description 1
238000005259 measurement Methods 0.000 description 1
230000007246 mechanism Effects 0.000 description 1
238000001465 metallisation Methods 0.000 description 1
150000002739 metals Chemical class 0.000 description 1
150000007522 mineralic acids Chemical class 0.000 description 1
229910017604 nitric acid Inorganic materials 0.000 description 1
235000005985 organic acids Nutrition 0.000 description 1
239000007800 oxidant agent Substances 0.000 description 1
239000003973 paint Substances 0.000 description 1
VLTRZXGMWDSKGL-UHFFFAOYSA-M perchlorate Inorganic materials [O-]Cl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-M 0.000 description 1
VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical compound OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 description 1
ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
229920001568 phenolic resin Polymers 0.000 description 1
239000005011 phenolic resin Substances 0.000 description 1
239000012286 potassium permanganate Substances 0.000 description 1
239000002244 precipitate Substances 0.000 description 1
238000002360 preparation method Methods 0.000 description 1
230000002035 prolonged effect Effects 0.000 description 1
230000001105 regulatory effect Effects 0.000 description 1
231100001260 reprotoxic Toxicity 0.000 description 1
210000002345 respiratory system Anatomy 0.000 description 1
230000002441 reversible effect Effects 0.000 description 1
238000005096 rolling process Methods 0.000 description 1
150000003839 salts Chemical class 0.000 description 1
SUKJFIGYRHOWBL-UHFFFAOYSA-N sodium hypochlorite Chemical compound [Na+].Cl[O-] SUKJFIGYRHOWBL-UHFFFAOYSA-N 0.000 description 1
238000001179 sorption measurement Methods 0.000 description 1
238000004611 spectroscopical analysis Methods 0.000 description 1
150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
238000009864 tensile test Methods 0.000 description 1
238000004448 titration Methods 0.000 description 1
231100000331 toxic Toxicity 0.000 description 1
230000002588 toxic effect Effects 0.000 description 1
239000002341 toxic gas Substances 0.000 description 1
231100000419 toxicity Toxicity 0.000 description 1
230000001988 toxicity Effects 0.000 description 1
SWGJCIMEBVHMTA-UHFFFAOYSA-K trisodium;6-oxido-4-sulfo-5-[(4-sulfonatonaphthalen-1-yl)diazenyl]naphthalene-2-sulfonate Chemical compound [Na+].[Na+].[Na+].C1=CC=C2C(N=NC3=C4C(=CC(=CC4=CC=C3O)S([O-])(=O)=O)S([O-])(=O)=O)=CC=C(S([O-])(=O)=O)C2=C1 SWGJCIMEBVHMTA-UHFFFAOYSA-K 0.000 description 1
238000009941 weaving Methods 0.000 description 1
239000000080 wetting agent Substances 0.000 description 1

Classifications

- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B1/00—Electrolytic production of inorganic compounds or non-metals
- C25B1/01—Products
- C25B1/21—Manganese oxides
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/2006—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30
- C23C18/2046—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30 by chemical pretreatment
- C23C18/2073—Multistep pretreatment
- C23C18/2086—Multistep pretreatment with use of organic or inorganic compounds other than metals, first
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/22—Roughening, e.g. by etching
- C23C18/24—Roughening, e.g. by etching using acid aqueous solutions
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/042—Electrodes formed of a single material
- C25B11/043—Carbon, e.g. diamond or graphene
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
- C25B11/075—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of a single catalytic element or catalytic compound
- C25B11/081—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of a single catalytic element or catalytic compound the element being a noble metal
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B15/00—Operating or servicing cells
- C25B15/02—Process control or regulation
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/54—Electroplating of non-metallic surfaces
- C25D5/56—Electroplating of non-metallic surfaces of plastics

Landscapes

Chemical & Material Sciences (AREA)
Engineering & Computer Science (AREA)
Metallurgy (AREA)
Chemical Kinetics & Catalysis (AREA)
Materials Engineering (AREA)
Organic Chemistry (AREA)
Electrochemistry (AREA)
Inorganic Chemistry (AREA)
General Chemical & Material Sciences (AREA)
Mechanical Engineering (AREA)
Automation & Control Theory (AREA)
Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
Chemically Coating (AREA)
Chemical Or Physical Treatment Of Fibers (AREA)

ES14779082T 2013-03-12 2014-03-07 Generación electrolítica de iones manganeso (III) en ácido sulfúrico fuerte Active ES2745071T3 (es)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
US13/795,382 US9534306B2 (en)	2012-01-23	2013-03-12	Electrolytic generation of manganese (III) ions in strong sulfuric acid
PCT/US2014/021618 WO2014164272A1 (en)	2013-03-12	2014-03-07	Electrolytic generation of manganese (iii) ions in strong sulfuric acid

Publications (1)

Publication Number	Publication Date
ES2745071T3 true ES2745071T3 (es)	2020-02-27

Family

ID=51658840

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
ES14779082T Active ES2745071T3 (es)	2013-03-12	2014-03-07	Generación electrolítica de iones manganeso (III) en ácido sulfúrico fuerte

Country Status (18)

Country	Link
EP (1)	EP2971260B1 (pl)
JP (1)	JP6167222B2 (pl)
KR (1)	KR101749947B1 (pl)
CN (1)	CN105209667B (pl)
AU (1)	AU2014249521B2 (pl)
BR (1)	BR112015021067B1 (pl)
CA (2)	CA2955467C (pl)
DK (1)	DK2971260T3 (pl)
ES (1)	ES2745071T3 (pl)
HR (1)	HRP20191626T1 (pl)
HU (1)	HUE045344T2 (pl)
LT (1)	LT2971260T (pl)
MX (1)	MX379432B (pl)
PL (1)	PL2971260T3 (pl)
PT (1)	PT2971260T (pl)
SI (1)	SI2971260T1 (pl)
TW (1)	TWI489007B (pl)
WO (1)	WO2014164272A1 (pl)

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BR112015016031A2 (pt) *	2013-10-22	2017-07-11	Okuno Chem Ind Co	composição para tratamento de decapagem de material de resina
CN105483715B (zh) *	2015-12-09	2018-01-30	哈尔滨工业大学	镁金属表面微‑纳米复合多级孔材料的模板‑3d刻蚀制备方法
CN106830204B (zh) *	2017-03-13	2020-04-28	重庆大学	一种电化学阴极激发高锰酸盐降解水中污染物的方法及装置
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JP7336126B2 (ja) *	2019-03-11	2023-08-31	国立研究開発法人産業技術総合研究所	高価数マンガンの製造方法、及び製造装置
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US11842958B2 (en) *	2022-03-18	2023-12-12	Chun-Ming Lin	Conductive structure including copper-phosphorous alloy and a method of manufacturing conductive structure

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CN104838044B (zh) *	2012-11-15	2017-12-05	麦克德米德尖端有限公司	在强硫酸中电解产生锰(iii)离子

2014
- 2014-03-07 HU HUE14779082A patent/HUE045344T2/hu unknown
- 2014-03-07 DK DK14779082.8T patent/DK2971260T3/da active
- 2014-03-07 MX MX2015012584A patent/MX379432B/es unknown
- 2014-03-07 CN CN201480014056.0A patent/CN105209667B/zh active Active
- 2014-03-07 SI SI201431343T patent/SI2971260T1/sl unknown
- 2014-03-07 CA CA2955467A patent/CA2955467C/en active Active
- 2014-03-07 ES ES14779082T patent/ES2745071T3/es active Active
- 2014-03-07 CA CA2901589A patent/CA2901589C/en active Active
- 2014-03-07 AU AU2014249521A patent/AU2014249521B2/en active Active
- 2014-03-07 LT LTEP14779082.8T patent/LT2971260T/lt unknown
- 2014-03-07 BR BR112015021067-8A patent/BR112015021067B1/pt active IP Right Grant
- 2014-03-07 PT PT14779082T patent/PT2971260T/pt unknown
- 2014-03-07 HR HRP20191626 patent/HRP20191626T1/hr unknown
- 2014-03-07 PL PL14779082T patent/PL2971260T3/pl unknown
- 2014-03-07 JP JP2016500796A patent/JP6167222B2/ja active Active
- 2014-03-07 EP EP14779082.8A patent/EP2971260B1/en active Active
- 2014-03-07 WO PCT/US2014/021618 patent/WO2014164272A1/en not_active Ceased
- 2014-03-07 KR KR1020157028235A patent/KR101749947B1/ko active Active
- 2014-03-11 TW TW103108294A patent/TWI489007B/zh active

Also Published As

Publication number	Publication date
TW201500593A (zh)	2015-01-01
EP2971260A1 (en)	2016-01-20
SI2971260T1 (sl)	2019-12-31
CA2955467A1 (en)	2014-10-09
AU2014249521B2 (en)	2018-03-01
CA2901589A1 (en)	2014-10-09
MX2015012584A (es)	2016-01-14
TWI489007B (zh)	2015-06-21
HRP20191626T1 (hr)	2019-12-13
PT2971260T (pt)	2019-09-27
MX379432B (es)	2025-03-10
KR101749947B1 (ko)	2017-06-22
BR112015021067A2 (pt)	2017-07-18
DK2971260T3 (da)	2019-09-23
BR112015021067B1 (pt)	2021-06-08
PL2971260T3 (pl)	2020-03-31
EP2971260A4 (en)	2017-04-19
JP2016512574A (ja)	2016-04-28
AU2014249521A1 (en)	2015-08-27
LT2971260T (lt)	2019-09-25
CN105209667A (zh)	2015-12-30
WO2014164272A1 (en)	2014-10-09
CA2955467C (en)	2021-03-16
EP2971260B1 (en)	2019-06-19
JP6167222B2 (ja)	2017-07-19
CA2901589C (en)	2019-01-22
CN105209667B (zh)	2017-12-05
KR20150126935A (ko)	2015-11-13
HUE045344T2 (hu)	2019-12-30

Publication	Publication Date	Title
ES2745071T3 (es)	2020-02-27	Generación electrolítica de iones manganeso (III) en ácido sulfúrico fuerte
US10895016B2 (en)	2021-01-19	Electrolytic generation of manganese (III) ions in strong sulfuric acid
ES2688549T3 (es)	2018-11-05	Grabado al aguafuerte de plástico utilizando soluciones ácidas que contienen manganeso trivalente
ES2704672T3 (es)	2019-03-19	Generación electrolítica de iones de manganeso (III) en ácido sulfúrico fuerte
US10246788B2 (en)	2019-04-02	Electrolytic generation of manganese (III) ions in strong sulfuric acid using an improved anode