ES2969188T3 - Procedimiento para la deposición galvánica de revestimientos de aleaciones de cinc-níquel a partir de un baño de aleación de cinc-níquel alcalino con degradación reducida de aditivos - Google Patents

Procedimiento para la deposición galvánica de revestimientos de aleaciones de cinc-níquel a partir de un baño de aleación de cinc-níquel alcalino con degradación reducida de aditivos Download PDF

Info

Publication number: ES2969188T3
Authority: ES; Spain
Prior art keywords: zinc; bath; nickel; nickel alloy; chloride
Prior art date: 2017-06-14
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Active

Application number

ES17175993T

Other languages

English (en)

Spanish (es)

Inventor

Michael Zöllinger

Oliver Daub

Ralph Krauss

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Dr Ing Max Schloetter GmbH and Co KG

Original Assignee

Dr Ing Max Schloetter GmbH and Co KG

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2017-06-14

Filing date

2017-06-14

Publication date

2024-05-16

2017-06-14 Application filed by Dr Ing Max Schloetter GmbH and Co KG filed Critical Dr Ing Max Schloetter GmbH and Co KG

2024-05-16 Application granted granted Critical

2024-05-16 Publication of ES2969188T3 publication Critical patent/ES2969188T3/es

Status Active legal-status Critical Current

2037-06-14 Anticipated expiration legal-status Critical

Links

QELJHCBNGDEXLD-UHFFFAOYSA-N nickel zinc Chemical group [Ni].[Zn] QELJHCBNGDEXLD-UHFFFAOYSA-N 0.000 title claims abstract description 125
229910000990 Ni alloy Inorganic materials 0.000 title claims abstract description 113
230000008021 deposition Effects 0.000 title claims abstract description 45
238000000034 method Methods 0.000 title claims abstract description 44
239000000654 additive Substances 0.000 title claims abstract description 40
238000000576 coating method Methods 0.000 title claims abstract description 36
230000015556 catabolic process Effects 0.000 title abstract description 8
238000006731 degradation reaction Methods 0.000 title abstract description 8
230000000996 additive effect Effects 0.000 title description 8
PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims abstract description 109
HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims abstract description 74
VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 claims abstract description 57
KWYUFKZDYYNOTN-UHFFFAOYSA-M potassium hydroxide Substances [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 claims abstract description 57
229910052759 nickel Inorganic materials 0.000 claims abstract description 46
239000011701 zinc Substances 0.000 claims abstract description 43
HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims abstract description 42
239000003792 electrolyte Substances 0.000 claims abstract description 41
229910052725 zinc Inorganic materials 0.000 claims abstract description 40
CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 claims abstract description 26
229910045601 alloy Inorganic materials 0.000 claims abstract description 13
239000000956 alloy Substances 0.000 claims abstract description 13
229910000831 Steel Inorganic materials 0.000 claims description 19
239000010959 steel Substances 0.000 claims description 19
239000000463 material Substances 0.000 claims description 12
229910001220 stainless steel Inorganic materials 0.000 claims description 8
239000010935 stainless steel Substances 0.000 claims description 8
VEQPNABPJHWNSG-UHFFFAOYSA-N Nickel(2+) Chemical compound [Ni+2] VEQPNABPJHWNSG-UHFFFAOYSA-N 0.000 claims description 6
229910001453 nickel ion Inorganic materials 0.000 claims description 6
230000015572 biosynthetic process Effects 0.000 abstract description 28
150000001412 amines Chemical class 0.000 abstract description 20
150000002825 nitriles Chemical class 0.000 abstract description 17
239000007857 degradation product Substances 0.000 abstract description 9
230000008092 positive effect Effects 0.000 abstract description 4
XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical compound N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 description 43
239000000203 mixture Substances 0.000 description 42
238000012360 testing method Methods 0.000 description 33
230000000052 comparative effect Effects 0.000 description 23
RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 description 22
239000011248 coating agent Substances 0.000 description 21
XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 20
239000003795 chemical substances by application Substances 0.000 description 19
229910052751 metal Inorganic materials 0.000 description 16
239000002184 metal Substances 0.000 description 16
239000012528 membrane Substances 0.000 description 14
238000005282 brightening Methods 0.000 description 13
239000010405 anode material Substances 0.000 description 12
FAPWRFPIFSIZLT-UHFFFAOYSA-M sodium chloride Inorganic materials [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 12
DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 11
GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 11
-1 hydroxide ions Chemical class 0.000 description 11
WCUXLLCKKVVCTQ-UHFFFAOYSA-M potassium chloride Inorganic materials [Cl-].[K+] WCUXLLCKKVVCTQ-UHFFFAOYSA-M 0.000 description 11
230000000536 complexating effect Effects 0.000 description 10
239000011787 zinc oxide Substances 0.000 description 10
XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 8
229910021586 Nickel(II) chloride Inorganic materials 0.000 description 8
239000010406 cathode material Substances 0.000 description 8
239000011734 sodium Substances 0.000 description 8
JHJLBTNAGRQEKS-UHFFFAOYSA-M sodium bromide Inorganic materials [Na+].[Br-] JHJLBTNAGRQEKS-UHFFFAOYSA-M 0.000 description 8
PTFCDOFLOPIGGS-UHFFFAOYSA-N Zinc dication Chemical compound [Zn+2] PTFCDOFLOPIGGS-UHFFFAOYSA-N 0.000 description 7
LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 7
229910000363 nickel(II) sulfate Inorganic materials 0.000 description 7
230000003647 oxidation Effects 0.000 description 7
238000007254 oxidation reaction Methods 0.000 description 7
VNDYJBBGRKZCSX-UHFFFAOYSA-L zinc bromide Chemical compound Br[Zn]Br VNDYJBBGRKZCSX-UHFFFAOYSA-L 0.000 description 7
JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 7
REEBJQTUIJTGAL-UHFFFAOYSA-N 3-pyridin-1-ium-1-ylpropane-1-sulfonate Chemical compound [O-]S(=O)(=O)CCC[N+]1=CC=CC=C1 REEBJQTUIJTGAL-UHFFFAOYSA-N 0.000 description 6
PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 6
ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 6
238000006243 chemical reaction Methods 0.000 description 6
238000001914 filtration Methods 0.000 description 6
239000003014 ion exchange membrane Substances 0.000 description 6
QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 6
238000005498 polishing Methods 0.000 description 6
239000011148 porous material Substances 0.000 description 6
239000011591 potassium Substances 0.000 description 6
239000011780 sodium chloride Substances 0.000 description 6
239000007858 starting material Substances 0.000 description 6
239000000758 substrate Substances 0.000 description 6
239000010960 cold rolled steel Substances 0.000 description 5
230000000694 effects Effects 0.000 description 5
238000011068 loading method Methods 0.000 description 5
238000004519 manufacturing process Methods 0.000 description 5
239000001103 potassium chloride Substances 0.000 description 5
235000011164 potassium chloride Nutrition 0.000 description 5
239000000080 wetting agent Substances 0.000 description 5
229910021585 Nickel(II) bromide Inorganic materials 0.000 description 4
238000002479 acid--base titration Methods 0.000 description 4
239000012670 alkaline solution Substances 0.000 description 4
229910052804 chromium Inorganic materials 0.000 description 4
239000011651 chromium Substances 0.000 description 4
150000001875 compounds Chemical class 0.000 description 4
229910052742 iron Inorganic materials 0.000 description 4
235000014666 liquid concentrate Nutrition 0.000 description 4
229910052700 potassium Inorganic materials 0.000 description 4
229910052708 sodium Inorganic materials 0.000 description 4
238000003756 stirring Methods 0.000 description 4
238000005303 weighing Methods 0.000 description 4
229940102001 zinc bromide Drugs 0.000 description 4
239000011592 zinc chloride Substances 0.000 description 4
235000005074 zinc chloride Nutrition 0.000 description 4
DPRMFUAMSRXGDE-UHFFFAOYSA-N ac1o530g Chemical compound NCCN.NCCN DPRMFUAMSRXGDE-UHFFFAOYSA-N 0.000 description 3
238000004458 analytical method Methods 0.000 description 3
238000005260 corrosion Methods 0.000 description 3
230000007797 corrosion Effects 0.000 description 3
238000004090 dissolution Methods 0.000 description 3
238000009826 distribution Methods 0.000 description 3
IOLCXVTUBQKXJR-UHFFFAOYSA-M potassium bromide Inorganic materials [K+].[Br-] IOLCXVTUBQKXJR-UHFFFAOYSA-M 0.000 description 3
150000003839 salts Chemical class 0.000 description 3
238000000926 separation method Methods 0.000 description 3
FAGUFWYHJQFNRV-UHFFFAOYSA-N tetraethylenepentamine Chemical compound NCCNCCNCCNCCN FAGUFWYHJQFNRV-UHFFFAOYSA-N 0.000 description 3
JJKVMNNUINFIRK-UHFFFAOYSA-N 4-amino-n-(4-methoxyphenyl)benzamide Chemical compound C1=CC(OC)=CC=C1NC(=O)C1=CC=C(N)C=C1 JJKVMNNUINFIRK-UHFFFAOYSA-N 0.000 description 2
241000920033 Eugenes Species 0.000 description 2
229910000760 Hardened steel Inorganic materials 0.000 description 2
MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 2
AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 2
NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
230000002378 acidificating effect Effects 0.000 description 2
229910052782 aluminium Inorganic materials 0.000 description 2
XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
150000001491 aromatic compounds Chemical class 0.000 description 2
QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
GENLSXMKBFUFBU-UHFFFAOYSA-N benzyl pyridin-1-ium-1-carboxylate Chemical compound C=1C=CC=C[N+]=1C(=O)OCC1=CC=CC=C1 GENLSXMKBFUFBU-UHFFFAOYSA-N 0.000 description 2
238000005266 casting Methods 0.000 description 2
229910017052 cobalt Inorganic materials 0.000 description 2
239000010941 cobalt Substances 0.000 description 2
GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 2
238000004512 die casting Methods 0.000 description 2
150000002390 heteroarenes Chemical class 0.000 description 2
238000010348 incorporation Methods 0.000 description 2
239000011777 magnesium Substances 0.000 description 2
229910052749 magnesium Inorganic materials 0.000 description 2
CXIHYTLHIDQMGN-UHFFFAOYSA-L methanesulfonate;nickel(2+) Chemical compound [Ni+2].CS([O-])(=O)=O.CS([O-])(=O)=O CXIHYTLHIDQMGN-UHFFFAOYSA-L 0.000 description 2
IPLJNQFXJUCRNH-UHFFFAOYSA-L nickel(2+);dibromide Chemical compound [Ni+2].[Br-].[Br-] IPLJNQFXJUCRNH-UHFFFAOYSA-L 0.000 description 2
UQPSGBZICXWIAG-UHFFFAOYSA-L nickel(2+);dibromide;trihydrate Chemical compound O.O.O.Br[Ni]Br UQPSGBZICXWIAG-UHFFFAOYSA-L 0.000 description 2
KERTUBUCQCSNJU-UHFFFAOYSA-L nickel(2+);disulfamate Chemical compound [Ni+2].NS([O-])(=O)=O.NS([O-])(=O)=O KERTUBUCQCSNJU-UHFFFAOYSA-L 0.000 description 2
229910052760 oxygen Inorganic materials 0.000 description 2
239000001301 oxygen Substances 0.000 description 2
238000007747 plating Methods 0.000 description 2
CHQMHPLRPQMAMX-UHFFFAOYSA-L sodium persulfate Chemical compound [Na+].[Na+].[O-]S(=O)(=O)OOS([O-])(=O)=O CHQMHPLRPQMAMX-UHFFFAOYSA-L 0.000 description 2
239000000243 solution Substances 0.000 description 2
230000009469 supplementation Effects 0.000 description 2
239000010936 titanium Substances 0.000 description 2
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
229960001939 zinc chloride Drugs 0.000 description 2
NWONKYPBYAMBJT-UHFFFAOYSA-L zinc sulfate Chemical compound [Zn+2].[O-]S([O-])(=O)=O NWONKYPBYAMBJT-UHFFFAOYSA-L 0.000 description 2
229910000368 zinc sulfate Inorganic materials 0.000 description 2
229960001763 zinc sulfate Drugs 0.000 description 2
MKRZFOIRSLOYCE-UHFFFAOYSA-L zinc;methanesulfonate Chemical compound [Zn+2].CS([O-])(=O)=O.CS([O-])(=O)=O MKRZFOIRSLOYCE-UHFFFAOYSA-L 0.000 description 2
VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
229910000861 Mg alloy Inorganic materials 0.000 description 1
229910019142 PO4 Inorganic materials 0.000 description 1
ABLZXFCXXLZCGV-UHFFFAOYSA-N Phosphorous acid Chemical compound OP(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 description 1
239000004698 Polyethylene Substances 0.000 description 1
239000004743 Polypropylene Substances 0.000 description 1
239000005708 Sodium hypochlorite Substances 0.000 description 1
229910001297 Zn alloy Inorganic materials 0.000 description 1
230000004913 activation Effects 0.000 description 1
229910000147 aluminium phosphate Inorganic materials 0.000 description 1
150000001450 anions Chemical class 0.000 description 1
238000013459 approach Methods 0.000 description 1
150000001649 bromium compounds Chemical class 0.000 description 1
239000006227 byproduct Substances 0.000 description 1
150000001768 cations Chemical class 0.000 description 1
239000008139 complexing agent Substances 0.000 description 1
238000001816 cooling Methods 0.000 description 1
238000000354 decomposition reaction Methods 0.000 description 1
238000011161 development Methods 0.000 description 1
238000010586 diagram Methods 0.000 description 1
JZBWUTVDIDNCMW-UHFFFAOYSA-L dipotassium;oxido sulfate Chemical compound [K+].[K+].[O-]OS([O-])(=O)=O JZBWUTVDIDNCMW-UHFFFAOYSA-L 0.000 description 1
238000009713 electroplating Methods 0.000 description 1
238000005265 energy consumption Methods 0.000 description 1
238000005242 forging Methods 0.000 description 1
150000004820 halides Chemical class 0.000 description 1
238000010438 heat treatment Methods 0.000 description 1
150000002391 heterocyclic compounds Chemical class 0.000 description 1
238000009434 installation Methods 0.000 description 1
230000007774 longterm Effects 0.000 description 1
238000012423 maintenance Methods 0.000 description 1
229910021645 metal ion Inorganic materials 0.000 description 1
150000002739 metals Chemical class 0.000 description 1
229940098779 methanesulfonic acid Drugs 0.000 description 1
BYMZQQLCZDLNKW-UHFFFAOYSA-N nickel(2+);tetracyanide Chemical compound [Ni+2].N#[C-].N#[C-].N#[C-].N#[C-] BYMZQQLCZDLNKW-UHFFFAOYSA-N 0.000 description 1
BFDHFSHZJLFAMC-UHFFFAOYSA-L nickel(ii) hydroxide Chemical compound [OH-].[OH-].[Ni+2] BFDHFSHZJLFAMC-UHFFFAOYSA-L 0.000 description 1
230000003287 optical effect Effects 0.000 description 1
239000006259 organic additive Substances 0.000 description 1
239000007800 oxidant agent Substances 0.000 description 1
230000001590 oxidative effect Effects 0.000 description 1
239000012476 oxidizable substance Substances 0.000 description 1
NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
239000010452 phosphate Substances 0.000 description 1
UUWCBFKLGFQDME-UHFFFAOYSA-N platinum titanium Chemical compound [Ti].[Pt] UUWCBFKLGFQDME-UHFFFAOYSA-N 0.000 description 1
229920000573 polyethylene Polymers 0.000 description 1
229920000642 polymer Polymers 0.000 description 1
229920000098 polyolefin Polymers 0.000 description 1
229920001155 polypropylene Polymers 0.000 description 1
229920001343 polytetrafluoroethylene Polymers 0.000 description 1
239000004810 polytetrafluoroethylene Substances 0.000 description 1
239000011253 protective coating Substances 0.000 description 1
SUKJFIGYRHOWBL-UHFFFAOYSA-N sodium hypochlorite Chemical compound [Na+].Cl[O-] SUKJFIGYRHOWBL-UHFFFAOYSA-N 0.000 description 1
IIACRCGMVDHOTQ-UHFFFAOYSA-N sulfamic acid Chemical compound NS(O)(=O)=O IIACRCGMVDHOTQ-UHFFFAOYSA-N 0.000 description 1
238000004381 surface treatment Methods 0.000 description 1
238000010518 undesired secondary reaction Methods 0.000 description 1
239000002351 wastewater Substances 0.000 description 1

Classifications

- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/565—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of zinc
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/562—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of iron or nickel or cobalt

Landscapes

Chemical & Material Sciences (AREA)
Engineering & Computer Science (AREA)
Chemical Kinetics & Catalysis (AREA)
Electrochemistry (AREA)
Materials Engineering (AREA)
Metallurgy (AREA)
Organic Chemistry (AREA)
Electroplating And Plating Baths Therefor (AREA)

ES17175993T 2017-06-14 2017-06-14 Procedimiento para la deposición galvánica de revestimientos de aleaciones de cinc-níquel a partir de un baño de aleación de cinc-níquel alcalino con degradación reducida de aditivos Active ES2969188T3 (es)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
EP17175993.9A EP3415665B1 (de)	2017-06-14	2017-06-14	Verfahren zur galvanischen abscheidung von zink-nickel-legierungsüberzügen aus einem alkalischen zink-nickel-legierungsbad mit reduziertem abbau von additiven

Publications (1)

Publication Number	Publication Date
ES2969188T3 true ES2969188T3 (es)	2024-05-16

Family

ID=59061906

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
ES17175993T Active ES2969188T3 (es)	2017-06-14	2017-06-14	Procedimiento para la deposición galvánica de revestimientos de aleaciones de cinc-níquel a partir de un baño de aleación de cinc-níquel alcalino con degradación reducida de aditivos

Country Status (8)

Country	Link
EP (1)	EP3415665B1 (pl)
DK (1)	DK3415665T3 (pl)
ES (1)	ES2969188T3 (pl)
FI (1)	FI3415665T3 (pl)
HU (1)	HUE065554T2 (pl)
PL (1)	PL3415665T3 (pl)
PT (1)	PT3415665T (pl)
SI (1)	SI3415665T1 (pl)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
WO2023241905A1 (en) *	2022-06-13	2023-12-21	Basf Se	Stable alkaline electroplating bath with a diacid
WO2024208786A1 (en) *	2023-04-03	2024-10-10	Basf Se	Electroplating with a diacid prepared by hydrolysis of diester

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US3681211A (en) *	1970-11-23	1972-08-01	Enequist Chem Co Inc The	Electroplating a black nickel-zinc alloy deposit
JP3230626B2 (ja) *	1993-07-29	2001-11-19	三菱アルミニウム株式会社	表面処理Ａｌ材
US5417840A (en) *	1993-10-21	1995-05-23	Mcgean-Rohco, Inc.	Alkaline zinc-nickel alloy plating baths
DE19834353C2 (de)	1998-07-30	2000-08-17	Hillebrand Walter Gmbh & Co Kg	Alkalisches Zink-Nickelbad
ES2250166T5 (es)	2000-06-15	2016-05-20	Coventya Inc	Electrochapado de zinc-níquel
FR2864553B1 (fr)	2003-12-31	2006-09-01	Coventya	Installation de depot de zinc ou d'alliages de zinc
CN1281787C (zh) *	2004-05-20	2006-10-25	上海交通大学	镁及镁合金高耐蚀性复合镀层及其制备工艺
ATE429528T1 (de)	2005-04-26	2009-05-15	Atotech Deutschland Gmbh	Alkalisches galvanikbad mit einer filtrationsmembran
EP1870495A1 (de) *	2006-06-21	2007-12-26	Atotech Deutschland Gmbh	Wässriges alkalisches cyanidfreies Bad zur galvanischen Abscheidung von Zink- und Zinklegierungsüberzügen

2017
- 2017-06-14 ES ES17175993T patent/ES2969188T3/es active Active
- 2017-06-14 HU HUE17175993A patent/HUE065554T2/hu unknown
- 2017-06-14 EP EP17175993.9A patent/EP3415665B1/de active Active
- 2017-06-14 FI FIEP17175993.9T patent/FI3415665T3/fi active
- 2017-06-14 PT PT171759939T patent/PT3415665T/pt unknown
- 2017-06-14 DK DK17175993.9T patent/DK3415665T3/da active
- 2017-06-14 PL PL17175993.9T patent/PL3415665T3/pl unknown
- 2017-06-14 SI SI201731476T patent/SI3415665T1/sl unknown

Also Published As

Publication number	Publication date
EP3415665A1 (de)	2018-12-19
PT3415665T (pt)	2024-01-23
HUE065554T2 (hu)	2024-06-28
DK3415665T3 (da)	2024-02-12
SI3415665T1 (sl)	2024-06-28
EP3415665B1 (de)	2023-12-27
FI3415665T3 (fi)	2024-02-06
PL3415665T3 (pl)	2024-03-25

Publication	Publication Date	Title
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