PL3415665T3 - Sposób osadzania galwanicznego powłok ze stopu cynku i niklu z alkalicznej kąpieli stopu cynku i niklu z ograniczoną degradacją dodatków - Google Patents

Sposób osadzania galwanicznego powłok ze stopu cynku i niklu z alkalicznej kąpieli stopu cynku i niklu z ograniczoną degradacją dodatków

Info

Publication number
PL3415665T3
PL3415665T3 PL17175993.9T PL17175993T PL3415665T3 PL 3415665 T3 PL3415665 T3 PL 3415665T3 PL 17175993 T PL17175993 T PL 17175993T PL 3415665 T3 PL3415665 T3 PL 3415665T3
Authority
PL
Poland
Prior art keywords
nickel alloy
zinc
additives
galvanic deposition
reduced degradation
Prior art date
Application number
PL17175993.9T
Other languages
English (en)
Inventor
Michael Zöllinger
Oliver Daub
Ralph Krauß
Original Assignee
Dr.Ing. Max Schlötter Gmbh & Co. Kg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dr.Ing. Max Schlötter Gmbh & Co. Kg filed Critical Dr.Ing. Max Schlötter Gmbh & Co. Kg
Publication of PL3415665T3 publication Critical patent/PL3415665T3/pl

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys
    • C25D3/565—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of zinc
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys
    • C25D3/562—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of iron or nickel or cobalt

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
PL17175993.9T 2017-06-14 2017-06-14 Sposób osadzania galwanicznego powłok ze stopu cynku i niklu z alkalicznej kąpieli stopu cynku i niklu z ograniczoną degradacją dodatków PL3415665T3 (pl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP17175993.9A EP3415665B1 (de) 2017-06-14 2017-06-14 Verfahren zur galvanischen abscheidung von zink-nickel-legierungsüberzügen aus einem alkalischen zink-nickel-legierungsbad mit reduziertem abbau von additiven

Publications (1)

Publication Number Publication Date
PL3415665T3 true PL3415665T3 (pl) 2024-03-25

Family

ID=59061906

Family Applications (1)

Application Number Title Priority Date Filing Date
PL17175993.9T PL3415665T3 (pl) 2017-06-14 2017-06-14 Sposób osadzania galwanicznego powłok ze stopu cynku i niklu z alkalicznej kąpieli stopu cynku i niklu z ograniczoną degradacją dodatków

Country Status (8)

Country Link
EP (1) EP3415665B1 (pl)
DK (1) DK3415665T3 (pl)
ES (1) ES2969188T3 (pl)
FI (1) FI3415665T3 (pl)
HU (1) HUE065554T2 (pl)
PL (1) PL3415665T3 (pl)
PT (1) PT3415665T (pl)
SI (1) SI3415665T1 (pl)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2023241905A1 (en) * 2022-06-13 2023-12-21 Basf Se Stable alkaline electroplating bath with a diacid
WO2024208786A1 (en) * 2023-04-03 2024-10-10 Basf Se Electroplating with a diacid prepared by hydrolysis of diester

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3681211A (en) * 1970-11-23 1972-08-01 Enequist Chem Co Inc The Electroplating a black nickel-zinc alloy deposit
JP3230626B2 (ja) * 1993-07-29 2001-11-19 三菱アルミニウム株式会社 表面処理Ａｌ材
US5417840A (en) * 1993-10-21 1995-05-23 Mcgean-Rohco, Inc. Alkaline zinc-nickel alloy plating baths
DE19834353C2 (de) 1998-07-30 2000-08-17 Hillebrand Walter Gmbh & Co Kg Alkalisches Zink-Nickelbad
ATE306572T1 (de) 2000-06-15 2005-10-15 Taskem Inc Zink-nickel-elektroplattierung
FR2864553B1 (fr) 2003-12-31 2006-09-01 Coventya Installation de depot de zinc ou d'alliages de zinc
CN1281787C (zh) * 2004-05-20 2006-10-25 上海交通大学 镁及镁合金高耐蚀性复合镀层及其制备工艺
DE502005007138D1 (de) 2005-04-26 2009-06-04 Atotech Deutschland Gmbh Alkalisches Galvanikbad mit einer Filtrationsmembran
EP1870495A1 (de) * 2006-06-21 2007-12-26 Atotech Deutschland Gmbh Wässriges alkalisches cyanidfreies Bad zur galvanischen Abscheidung von Zink- und Zinklegierungsüberzügen

Also Published As

Publication number Publication date
FI3415665T3 (fi) 2024-02-06
PT3415665T (pt) 2024-01-23
ES2969188T3 (es) 2024-05-16
HUE065554T2 (hu) 2024-06-28
SI3415665T1 (sl) 2024-06-28
EP3415665A1 (de) 2018-12-19
DK3415665T3 (da) 2024-02-12
EP3415665B1 (de) 2023-12-27

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