ES373504A1 - Un procedimiento para la fabricacion de un material fotosensitivo. - Google Patents

Un procedimiento para la fabricacion de un material fotosensitivo.

Info

Publication number: ES373504A1
Authority: ES; Spain
Prior art keywords: resin; weight; layer; novolac; vinyl compounds
Prior art date: 1968-12-27
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired

Application number

ES373504A

Other languages

English (en)

Spanish (es)

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Kalle G A

Original Assignee

Kalle G A

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1968-12-27

Filing date

1969-11-13

Publication date

1972-02-01

1969-11-13 Application filed by Kalle G A filed Critical Kalle G A

1972-02-01 Publication of ES373504A1 publication Critical patent/ES373504A1/es

Status Expired legal-status Critical Current

Links

239000000463 material Substances 0.000 title abstract 2
238000007645 offset printing Methods 0.000 title abstract 2
239000002184 metal Substances 0.000 title 1
229920003986 novolac Polymers 0.000 abstract 4
229920005989 resin Polymers 0.000 abstract 4
239000011347 resin Substances 0.000 abstract 4
125000003118 aryl group Chemical group 0.000 abstract 3
229920000642 polymer Polymers 0.000 abstract 3
125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 abstract 3
LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 abstract 2
125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 abstract 2
FOCAUTSVDIKZOP-UHFFFAOYSA-N chloroacetic acid Chemical compound OC(=O)CCl FOCAUTSVDIKZOP-UHFFFAOYSA-N 0.000 abstract 2
239000003822 epoxy resin Substances 0.000 abstract 2
229910052739 hydrogen Inorganic materials 0.000 abstract 2
239000001257 hydrogen Substances 0.000 abstract 2
229920000647 polyepoxide Polymers 0.000 abstract 2
VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 abstract 1
RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract 1
229910000881 Cu alloy Inorganic materials 0.000 abstract 1
UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract 1
238000007792 addition Methods 0.000 abstract 1
230000001476 alcoholic effect Effects 0.000 abstract 1
125000003545 alkoxy group Chemical group 0.000 abstract 1
125000002837 carbocyclic group Chemical group 0.000 abstract 1
229910052804 chromium Inorganic materials 0.000 abstract 1
239000011651 chromium Substances 0.000 abstract 1
150000001875 compounds Chemical class 0.000 abstract 1
238000009833 condensation Methods 0.000 abstract 1
230000005494 condensation Effects 0.000 abstract 1
229920001577 copolymer Polymers 0.000 abstract 1
229910052802 copper Inorganic materials 0.000 abstract 1
239000010949 copper Substances 0.000 abstract 1
150000008049 diazo compounds Chemical class 0.000 abstract 1
238000001035 drying Methods 0.000 abstract 1
229910052736 halogen Inorganic materials 0.000 abstract 1
150000002367 halogens Chemical class 0.000 abstract 1
125000000623 heterocyclic group Chemical group 0.000 abstract 1
150000002431 hydrogen Chemical class 0.000 abstract 1
238000004519 manufacturing process Methods 0.000 abstract 1
238000000034 method Methods 0.000 abstract 1
238000006116 polymerization reaction Methods 0.000 abstract 1

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
- G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N1/00—Printing plates or foils; Materials therefor
- B41N1/04—Printing plates or foils; Materials therefor metallic
- B41N1/08—Printing plates or foils; Materials therefor metallic for lithographic printing
- B41N1/10—Printing plates or foils; Materials therefor metallic for lithographic printing multiple
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
- C08G8/04—Condensation polymers of aldehydes or ketones with phenols only of aldehydes
- C08G8/08—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ
- C08G8/20—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ with polyhydric phenols
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
- C08G8/28—Chemically modified polycondensates
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
- C08G8/28—Chemically modified polycondensates
- C08G8/32—Chemically modified polycondensates by organic acids or derivatives thereof, e.g. fatty oils

Landscapes

Chemical & Material Sciences (AREA)
Polymers & Plastics (AREA)
Health & Medical Sciences (AREA)
Chemical Kinetics & Catalysis (AREA)
Medicinal Chemistry (AREA)
Organic Chemistry (AREA)
Physics & Mathematics (AREA)
General Chemical & Material Sciences (AREA)
Spectroscopy & Molecular Physics (AREA)
Oil, Petroleum & Natural Gas (AREA)
General Physics & Mathematics (AREA)
Photosensitive Polymer And Photoresist Processing (AREA)
Printing Plates And Materials Therefor (AREA)

ES373504A 1968-12-27 1969-11-13 Un procedimiento para la fabricacion de un material fotosensitivo. Expired ES373504A1 (es)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
DE1817107A DE1817107C3 (de)	1968-12-27	1968-12-27	Vorsensibilisierte MehrmetaU-Offsetdruckplatte

Publications (1)

Publication Number	Publication Date
ES373504A1 true ES373504A1 (es)	1972-02-01

Family

ID=5717460

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
ES373504A Expired ES373504A1 (es)	1968-12-27	1969-11-13	Un procedimiento para la fabricacion de un material fotosensitivo.

Country Status (14)

Country	Link
AT (1)	AT292034B (cs)
BE (1)	BE741743A (cs)
BR (1)	BR6914931D0 (cs)
CA (1)	CA931806A (cs)
CH (1)	CH530656A (cs)
CS (1)	CS151538B2 (cs)
DE (1)	DE1817107C3 (cs)
DK (1)	DK133207C (cs)
ES (1)	ES373504A1 (cs)
FR (1)	FR2027168A1 (cs)
GB (1)	GB1286879A (cs)
IL (1)	IL33511A (cs)
NL (1)	NL6918151A (cs)
SE (1)	SE355088B (cs)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
GB1375461A (cs) *	1972-05-05	1974-11-27
US4268610A (en)	1979-11-05	1981-05-19	Hercules Incorporated	Photoresist formulations
DE3114163C2 (de) *	1981-04-08	1983-12-29	Renker GmbH & Co KG, 5160 Düren	Negativ arbeitendes photomechanisches Aufzeichnungsmaterial
DE3211547C2 (de) *	1982-03-29	1984-08-09	Renker GmbH & Co KG, 5160 Düren	Verwendung einer mit Photolack beschichteten Kunststoffolie als Beschriftungsschablone
US4539286A (en) *	1983-06-06	1985-09-03	Dynachem Corporation	Flexible, fast processing, photopolymerizable composition
US4610951A (en) *	1983-06-06	1986-09-09	Dynachem Corporation	Process of using a flexible, fast processing photopolymerizable composition
US4684599A (en) *	1986-07-14	1987-08-04	Eastman Kodak Company	Photoresist compositions containing quinone sensitizer

1968
- 1968-12-27 DE DE1817107A patent/DE1817107C3/de not_active Expired
1969
- 1969-11-03 AT AT1031869A patent/AT292034B/de not_active IP Right Cessation
- 1969-11-05 SE SE15181/69A patent/SE355088B/xx unknown
- 1969-11-07 DK DK589769A patent/DK133207C/da active
- 1969-11-13 ES ES373504A patent/ES373504A1/es not_active Expired
- 1969-11-14 BE BE741743D patent/BE741743A/xx unknown
- 1969-11-17 FR FR6939439A patent/FR2027168A1/fr not_active Withdrawn
- 1969-11-19 CH CH1723469A patent/CH530656A/de not_active IP Right Cessation
- 1969-12-03 NL NL6918151A patent/NL6918151A/xx unknown
- 1969-12-08 CA CA069223A patent/CA931806A/en not_active Expired
- 1969-12-09 IL IL33511A patent/IL33511A/en unknown
- 1969-12-10 GB GB60319/69A patent/GB1286879A/en not_active Expired
- 1969-12-10 BR BR214931/69A patent/BR6914931D0/pt unknown
- 1969-12-23 CS CS8493A patent/CS151538B2/cs unknown

Also Published As

Publication number	Publication date
DE1817107C3 (de)	1980-09-11
CH530656A (de)	1972-11-15
DE1817107B2 (de)	1980-01-17
GB1286879A (en)	1972-08-23
IL33511A0 (en)	1970-02-19
DK133207C (da)	1976-08-30
CA931806A (en)	1973-08-14
BE741743A (cs)	1970-05-14
NL6918151A (cs)	1970-06-30
SE355088B (cs)	1973-04-02
SU403207A3 (cs)	1973-10-19
AT292034B (de)	1971-08-10
FR2027168A1 (cs)	1970-09-25
DK133207B (da)	1976-04-05
IL33511A (en)	1973-07-30
BR6914931D0 (pt)	1973-01-25
DE1817107A1 (de)	1970-07-09
CS151538B2 (cs)	1973-10-19

Publication	Publication Date	Title
US3785825A (en)	1974-01-15	Light-sensitive quinone diazide compounds,compositions,and presensitized lithographic plate
GB1316994A (en)	1973-05-16	Photoconductive compositions
JPS6046701B2 (ja)	1985-10-17	光感受性エレメント
GB1017445A (en)	1966-01-19	Material and process for screen process printing
JPS5843951A (ja)	1983-03-14	イミジル化合物
ES373504A1 (es)	1972-02-01	Un procedimiento para la fabricacion de un material fotosensitivo.
US2670287A (en)	1954-02-23	Photosensitization of polymeric cinnamic acid esters
TW558559B (en)	2003-10-21	An oxygen atom-containing heterocyclic dione polymer and photosensitive composition comprising the same
ES381482A1 (es)	1973-04-16	Mejoras introducidas en un procedimiento para la confeccionde una hoja de comprobacion de colores.
GB1333560A (en)	1973-10-10	Increasing the light sensitivity of polymeric compositions comprising azido groups
US3804628A (en)	1974-04-16	Photosensitive compositions comprising a photosensitive polymer and a photochromic compound
US3048487A (en)	1962-08-07	Basic mordants derived from the reaction between maleic anhydride interpolymers and disubstituted diamines
US3770443A (en)	1973-11-06	Photosensitive composition comprising a photosensitive polymer
US1587269A (en)	1926-06-01	Synthetic resins, photographic process, and media
GB1388432A (en)	1975-03-26	Radiation-sensitive materials
US1587270A (en)	1926-06-01	Condensation photographic process, media, and process of preparing same
JPS5579435A (en)	1980-06-14	Photographic material
US3832181A (en)	1974-08-27	Photosensitive silver halide material containing a hydrophilic colloid hardened with a combination of formaldehyde and bis(vinylsulfonyl-methyl)ether
GB651625A (en)	1951-04-04	Diazotype photoprinting material
GB1378861A (en)	1974-12-27	Light-sensitive copying compositions
US3877947A (en)	1975-04-15	Photographic element
US2823999A (en)	1958-02-18	Photomagnetic composition and printing process
US3711285A (en)	1973-01-16	Light-sensitive compounds
JPS56121031A (en)	1981-09-22	Photosensitive composition
US3753718A (en)	1973-08-21	Photosensitive medium comprising a cyclic acetal of furfural, a lower haloalkane, and silica