ES533027A0 - Mejoras en o relativas a composiciones sensibles a la radiacion - Google Patents

Mejoras en o relativas a composiciones sensibles a la radiacion

Info

Publication number
ES533027A0
ES533027A0 ES533027A ES533027A ES533027A0 ES 533027 A0 ES533027 A0 ES 533027A0 ES 533027 A ES533027 A ES 533027A ES 533027 A ES533027 A ES 533027A ES 533027 A0 ES533027 A0 ES 533027A0
Authority
ES
Spain
Prior art keywords
image
radiation sensitive
heating
sensitive compositions
relative
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
ES533027A
Other languages
English (en)
Other versions
ES8603652A1 (es
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Vinters Ltd
Original Assignee
Vickers PLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Vickers PLC filed Critical Vickers PLC
Publication of ES8603652A1 publication Critical patent/ES8603652A1/es
Publication of ES533027A0 publication Critical patent/ES533027A0/es
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Conversion Of X-Rays Into Visible Images (AREA)
  • Indole Compounds (AREA)
  • Paints Or Removers (AREA)
  • Light Receiving Elements (AREA)
  • Heat Sensitive Colour Forming Recording (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Measurement And Recording Of Electrical Phenomena And Electrical Characteristics Of The Living Body (AREA)
  • Silicon Polymers (AREA)
ES533027A 1983-05-31 1984-05-31 Mejoras en o relativas a composiciones sensibles a la radiacion Granted ES533027A0 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB838314918A GB8314918D0 (en) 1983-05-31 1983-05-31 Radiation sensitive compositions

Publications (2)

Publication Number Publication Date
ES8603652A1 ES8603652A1 (es) 1985-12-16
ES533027A0 true ES533027A0 (es) 1985-12-16

Family

ID=10543592

Family Applications (1)

Application Number Title Priority Date Filing Date
ES533027A Granted ES533027A0 (es) 1983-05-31 1984-05-31 Mejoras en o relativas a composiciones sensibles a la radiacion

Country Status (13)

Country Link
US (1) US4687728A (es)
EP (1) EP0127477B1 (es)
AT (1) ATE82643T1 (es)
AU (1) AU576764B2 (es)
CA (1) CA1253728A (es)
DE (1) DE3485985T2 (es)
DK (1) DK269684A (es)
ES (1) ES533027A0 (es)
FI (1) FI78992C (es)
GB (1) GB8314918D0 (es)
NO (1) NO842188L (es)
NZ (1) NZ208325A (es)
ZA (1) ZA844117B (es)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0247153A4 (en) * 1985-11-27 1988-05-19 Macdermid Inc THERMALLY STABILIZED, LIGHT-RESISTANT IMAGES.
JP2721843B2 (ja) * 1989-03-23 1998-03-04 関西ペイント株式会社 プリント配線板の製造方法
GB8921116D0 (en) * 1989-09-18 1989-11-01 Du Pont Improvements in or relating to radiation sensitive compositions
US5264329A (en) * 1989-09-18 1993-11-23 Dupont (U.K.) Limited Radiation sensitive compositions
JP2627571B2 (ja) * 1990-05-31 1997-07-09 富士写真フイルム株式会社 感光性組成物
US5206208A (en) * 1991-11-20 1993-04-27 Polaroid Corporation Stabilization of thermal images
US5268245A (en) * 1992-07-09 1993-12-07 Polaroid Corporation Process for forming a filter on a solid state imager
GB9802973D0 (en) * 1998-02-13 1998-04-08 Du Pont Uk Improvements in the performance of printing plates
US7019129B1 (en) * 2000-05-09 2006-03-28 Biosearch Technologies, Inc. Dark quenchers for donor-acceptor energy transfer
US7063983B2 (en) * 2002-05-31 2006-06-20 Owens Corning Fiberglas Technology, Inc. Method for determining cure in a polycarboxylic acid bindered material
KR20060113953A (ko) * 2003-12-19 2006-11-03 시바 스폐셜티 케미칼스 홀딩 인코포레이티드 캡핑된 디아조화 화합물 및 결합 성분을 사용한 착색 방법
JP2005190616A (ja) * 2003-12-26 2005-07-14 Taiyo Yuden Co Ltd 光情報記録媒体
WO2006010038A2 (en) * 2004-07-08 2006-01-26 Biosearch Technologies, Inc. Inducible fluorescence assay
JP2006134518A (ja) * 2004-11-08 2006-05-25 Taiyo Yuden Co Ltd 光情報記録媒体
FR2886842B1 (fr) * 2005-06-08 2007-09-07 Oreal Composition de teinture de fibres keratiniques comprenant un colorant direct particulier et procedes de coloration la mettant en oeuvre
WO2009124150A2 (en) 2008-04-01 2009-10-08 Biosearch Technologies, Inc. Stabilized nucleic acid dark quencher-fluorophore probes
US9962923B2 (en) 2013-10-15 2018-05-08 Agfa Nv Method for providing lithographic printing plates
JP7572838B2 (ja) * 2020-11-02 2024-10-24 住友化学株式会社 化合物、組成物、膜、積層体および表示装置

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR519448A (fr) * 1914-01-22 1921-06-09 William Grass Perfectionnements aux plaques lithographiques
FR589422A (fr) * 1924-11-19 1925-05-28 Procédé d'insolubilisation de la gélatine, ses applications et produits en résultant
DE732534C (de) * 1940-07-30 1943-03-05 Dr Johannes Albrecht Verfahren zum photomechanischen Herstellen metallischer Hochdruckformen
FR1360815A (fr) * 1963-04-03 1964-05-15 Kodak Pathe Nouveau procédé de teinture pour clichés de photogravure et autres
GB1267812A (en) * 1968-06-21 1972-03-22 Howson Algraphy Ltd Improvements in and relating to the processing of printing plates
US3647448A (en) * 1970-03-02 1972-03-07 Eastman Kodak Co Light-sensitive halocarbon and phenol derivative composition
GB1337228A (en) * 1971-02-26 1973-11-14 Xerox Corp Layered photoconductive imaging member and method
FR2264307B1 (es) * 1974-03-15 1976-12-17 Cellophane Sa
GB1513368A (en) * 1974-07-08 1978-06-07 Vickers Ltd Processing of radiation-sensitive members
DE2807933A1 (de) * 1978-02-24 1979-08-30 Hoechst Ag Photopolymerisierbares gemisch
US4248959A (en) * 1978-12-07 1981-02-03 American Hoechst Corporation Preparation of diazo printing plates using laser exposure
US4259421A (en) * 1979-06-04 1981-03-31 Rca Corporation Improving etch-resistance of casein-based photoresist pattern
US4518669A (en) * 1982-11-06 1985-05-21 Canon Kabushiki Kaisha Electrophotographic photosensitive member
US4599410A (en) * 1985-02-19 1986-07-08 Eastman Kodak Company Oxachalcogenazole dyes and processes for their preparation

Also Published As

Publication number Publication date
DE3485985T2 (de) 1993-04-08
FI78992B (fi) 1989-06-30
FI842176A0 (fi) 1984-05-30
DK269684A (da) 1984-12-01
US4687728A (en) 1987-08-18
DK269684D0 (da) 1984-05-30
FI78992C (fi) 1989-10-10
ZA844117B (en) 1986-10-29
ATE82643T1 (de) 1992-12-15
AU2884984A (en) 1984-12-06
EP0127477A2 (en) 1984-12-05
ES8603652A1 (es) 1985-12-16
NO842188L (no) 1984-12-03
GB8314918D0 (en) 1983-07-06
FI842176L (fi) 1984-12-01
EP0127477B1 (en) 1992-11-19
EP0127477A3 (en) 1986-10-01
CA1253728A (en) 1989-05-09
NZ208325A (en) 1986-04-11
DE3485985D1 (de) 1992-12-24
AU576764B2 (en) 1988-09-08

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