ES8304175A1 - "un procedimiento para la polimerizacion de una composicion por medio de radiacion actinica y-o catalizadores de radical libre". - Google Patents

"un procedimiento para la polimerizacion de una composicion por medio de radiacion actinica y-o catalizadores de radical libre".

Info

Publication number
ES8304175A1
ES8304175A1 ES513247A ES513247A ES8304175A1 ES 8304175 A1 ES8304175 A1 ES 8304175A1 ES 513247 A ES513247 A ES 513247A ES 513247 A ES513247 A ES 513247A ES 8304175 A1 ES8304175 A1 ES 8304175A1
Authority
ES
Spain
Prior art keywords
group
methacryloyloxy
allyl
methallyl
bis
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
ES513247A
Other languages
English (en)
Other versions
ES513247A0 (es
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Novartis AG
Original Assignee
Ciba Geigy AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Geigy AG filed Critical Ciba Geigy AG
Publication of ES513247A0 publication Critical patent/ES513247A0/es
Publication of ES8304175A1 publication Critical patent/ES8304175A1/es
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/0275—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with dithiol or polysulfide compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/56—Polymerisation initiated by wave energy or particle radiation by ultrasonic vibrations
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S525/00—Synthetic resins or natural rubbers -- part of the class 520 series
    • Y10S525/921—Polyester having terminal ethylenic unsaturation other than polyesterurethanes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polymerisation Methods In General (AREA)

Abstract

PROCEDIMIENTO PARA LA POLIMERIZACION DE UNA COMPOSICION POR MEDIO DE RADIACION ACTINICA Y/O CATALIZADORES DE RADICAL LIBRE, QUE TIENE APLICACIONES PARA LA PRODUCCION DE REVESTIMIENTOS SUPERFICIALES Y ENLACES ADHESIVOS EN LA OBTENCION DE PLACAS DE IMPRESION Y CIRCUITOS IMPRESOS. CONSISTE EN POLIMERIZAR, POR EXPOSICION A RADIACION ACTINICA DE LONGITUDES DE ONDA DE 200-600 MM, O CALENTAMIENTO EN PRESENCIA DE UN CATALIZADOR DE RADICALES LIBRES, UNA COMPOSICION QUE CONSTA DE UN COMPUESTO QUE CONTIENE POR LO MENOS UN GRUPO ACRILOILOXILO O METACRILOILOXILO, POR LO MENOS UN GRUPO ALILO, METALILO O L-PROPENILO Y POR LO MENOS UN GRUPO ACIDO CARBOXILICO, Y DE UN COMPUESTO QUE CONTIENE, POR MOLECULA, AL MENOS DOS GRUPOS MERCAPTANO ENLAZADOS DIRECTAMENTE A UN ATOMO O ATOMOS DE CARBONO ALIFATICOS.
ES513247A 1981-06-19 1982-06-18 "un procedimiento para la polimerizacion de una composicion por medio de radiacion actinica y-o catalizadores de radical libre". Expired ES8304175A1 (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB8119036 1981-06-19
GB8208667 1982-03-24

Publications (2)

Publication Number Publication Date
ES513247A0 ES513247A0 (es) 1983-03-01
ES8304175A1 true ES8304175A1 (es) 1983-03-01

Family

ID=26279862

Family Applications (1)

Application Number Title Priority Date Filing Date
ES513247A Expired ES8304175A1 (es) 1981-06-19 1982-06-18 "un procedimiento para la polimerizacion de una composicion por medio de radiacion actinica y-o catalizadores de radical libre".

Country Status (5)

Country Link
US (1) US4435497A (es)
EP (1) EP0069069B1 (es)
CA (1) CA1185982A (es)
DE (1) DE3278177D1 (es)
ES (1) ES8304175A1 (es)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4476215A (en) * 1983-11-25 1984-10-09 Minnesota Mining And Manufacturing Company Negative-acting photoresist composition
JPS62290705A (ja) * 1986-06-10 1987-12-17 Mitsubishi Chem Ind Ltd 光重合性組成物
US4808638A (en) * 1986-10-14 1989-02-28 Loctite Corporation Thiolene compositions on based bicyclic 'ene compounds
DE3837569A1 (de) * 1988-11-04 1990-05-10 Espe Stiftung Mit sichtbarem licht aushaertbare dentalmassen
US6369164B1 (en) 1993-05-26 2002-04-09 Dentsply G.M.B.H. Polymerizable compounds and compositions
US5998499A (en) 1994-03-25 1999-12-07 Dentsply G.M.B.H. Liquid crystalline (meth)acrylate compounds, composition and method
US6353061B1 (en) 1993-05-26 2002-03-05 Dentsply Gmbh α, ω-methacrylate terminated macromonomer compounds
DE4413436A1 (de) * 1994-04-18 1995-10-19 Basf Lacke & Farben Verfahren zur Lackierung von Gegenständen unter Verwendung strahlungshärtbarer Pulverlacke
CA2146816A1 (en) 1994-04-22 1995-10-23 Joachim E. Klee Process and composition for preparing a dental polymer product
US7312266B2 (en) * 2000-12-15 2007-12-25 The College Of William And Mary Organic thiol metal-free stabilizers and plasticizers for halogen-containing polymers
ES2329892T3 (es) * 2002-12-05 2009-12-02 Tokuyama Corporation Composiciones de recubrimiento y articulos opticos.
US8192673B2 (en) * 2003-10-22 2012-06-05 University Of Kansas Resin systems for dental restorative materials
KR20090042341A (ko) 2007-10-26 2009-04-30 주식회사 엘지화학 알칼리 가용성 수지, 및 이를 포함하는 네가티브형 감광성수지 조성물
EP2222740B1 (en) * 2007-12-21 2017-10-11 Rolic AG Functionalized photoreactive compounds
JP5940454B2 (ja) * 2009-11-02 2016-06-29 イノレックス インベストメント コーポレイション Ｕｖ吸収複合ポリエステルポリマー、ｕｖ吸収複合ポリエステルポリマーを含有する組成物、および関連方法
KR101273140B1 (ko) 2010-11-19 2013-06-17 주식회사 엘지화학 아크릴레이트계 화합물 및 이를 포함하는 감광성 조성물
WO2013167576A2 (en) * 2012-05-07 2013-11-14 Mercene Labs Ab Method and formulations for the manufacture of coated articles and composites
CN109160993A (zh) * 2018-08-07 2019-01-08 哈尔滨工业大学无锡新材料研究院 一种四臂星形对称多嵌段亚光涂层用uv树脂及其制备方法

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1567036A (es) 1966-07-26 1969-05-16
GB1251232A (es) 1967-10-12 1971-10-27
CA926183A (en) 1970-02-26 1973-05-15 W.R. Grace And Co. Photocurable photoresist composition and method
GB1390711A (en) 1973-04-19 1975-04-16 Grace W R & Co Image-forming process employing a polyene/polythiol composition
GB1445814A (en) 1974-01-14 1976-08-11 Grace W R & Co Photocurable lacquer composition
GB1464287A (en) 1974-02-22 1977-02-09 Ciba Geigy Ag Polymerisable esters
US4179577A (en) 1974-11-30 1979-12-18 Ciba-Geigy Corporation Polymerisable esters derived from a phenolic unsaturated ketone
US4181807A (en) 1974-11-30 1980-01-01 Ciba-Geigy Corporation Polymerizable esters derived from a glycidyl ether of a phenolic unsaturated ketone
GB1489419A (en) 1974-11-30 1977-10-19 Ciba Geigy Ag Polymerisable esters
GB1474715A (en) 1975-10-31 1977-05-25 Ciba Geigy Ag Polymerisable esters
US4243793A (en) 1975-11-07 1981-01-06 Phillips Petroleum Company Prepolymers for photocurable compositions
GB1560822A (en) 1976-09-17 1980-02-13 Grace W R & Co Ethylenically unsaturated compounds useful as thixotropic agents and their preparation
CH621539A5 (es) 1976-12-14 1981-02-13 Ciba Geigy Ag
US4132812A (en) 1977-09-02 1979-01-02 W. R. Grace & Co. Photocurable imidizable polyene-polythiol compositions
US4120721A (en) 1977-06-02 1978-10-17 W. R. Grace & Co. Radiation curable compositions for coating and imaging processes and method of use
DE2737406A1 (de) * 1977-08-19 1979-02-22 Bayer Ag Strahlenhaertbare bindemittel
JPS5495691A (en) 1978-01-13 1979-07-28 Toyo Ink Mfg Co Ltd Photocurable resin composition
GB2012781B (en) * 1978-01-20 1982-03-17 Ciba Geigy Ag Hydroxyl containing compositions and their polymerisation
DE2901685A1 (de) 1978-01-20 1979-07-26 Ciba Geigy Ag Epoxidhaltige massen und deren polymerisation
DE2901686A1 (de) 1978-01-20 1979-07-26 Ciba Geigy Ag Mischungen auf basis von alkenylsubstituierten phenolen und polymercaptanen
US4216306A (en) 1979-03-22 1980-08-05 Freeman Chemical Corporation Film-forming polymerizable resin of benzophenone dianhydride, epoxy compound and unsaturate carboxylic acid
DE3071155D1 (en) * 1979-12-22 1985-11-07 Ciba Geigy Ag Compositions containing acrylate and their polymerisation
DE3005036A1 (de) * 1980-02-11 1981-08-27 Basf Ag, 6700 Ludwigshafen Strahlungshaertbare waessrige bindemitteldispersionen

Also Published As

Publication number Publication date
ES513247A0 (es) 1983-03-01
US4435497A (en) 1984-03-06
DE3278177D1 (en) 1988-04-07
EP0069069B1 (de) 1988-03-02
EP0069069A3 (en) 1983-02-09
CA1185982A (en) 1985-04-23
EP0069069A2 (de) 1983-01-05

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