ES8308089A1 - Un procedimiento para producir una imagen de fotopolimerizacion y fotorreticulacion transversa. - Google Patents

Un procedimiento para producir una imagen de fotopolimerizacion y fotorreticulacion transversa.

Info

Publication number
ES8308089A1
ES8308089A1 ES511034A ES511034A ES8308089A1 ES 8308089 A1 ES8308089 A1 ES 8308089A1 ES 511034 A ES511034 A ES 511034A ES 511034 A ES511034 A ES 511034A ES 8308089 A1 ES8308089 A1 ES 8308089A1
Authority
ES
Spain
Prior art keywords
exposed
layer
meth
actinic radiation
acryloyl group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
ES511034A
Other languages
English (en)
Other versions
ES511034A0 (es
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Novartis AG
Original Assignee
Ciba Geigy AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Geigy AG filed Critical Ciba Geigy AG
Publication of ES8308089A1 publication Critical patent/ES8308089A1/es
Publication of ES511034A0 publication Critical patent/ES511034A0/es
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

PROCEDIMIENTO PARA PRODUCIR UNA IMAGEN POR FOTOPOLIMERIZACION Y FOTORRETICULACION TRANSVERSA. COMPRENDE LAS SIGUIENTES FASES: PRIMERA, SE EXPONE A RADIACION ACTINICA UNA CAPA FORMADA POR UN SOPORTE Y POR UNA COMPOSICION LIQUIDA QUE CONTIENE UN COMPUESTO DE FORMULA (I) QUE INCLUYE EN SU MOLECULA UN GRUPO DE FORMULA (II) Y UN GRUPO DE FORMULA (III); SEGUNDA, SE EXPONE LA CAPA SOLIDIFICADA A TRAVES DE UNA TRANSPARENCIA PORTADORA DE IMAGEN, QUE ESTA CONSTITUIDA POR PARTES OPACAS Y POR PARTES TRANSPARENTES A LA RADICACION ACTINICA; Y POR ULTIMO, SE REVELA LA IMAGEN FORMADA MEDIANTE LA DISOLUCION EN UN DISOLVENTE DE LAS PARTES DE LA CAPA QUE NO SE HAN FOTORRETICULA
ES511034A 1981-04-02 1982-04-01 Un procedimiento para producir una imagen de fotopolimerizacion y fotorreticulacion transversa. Granted ES511034A0 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB8110403 1981-04-02

Publications (2)

Publication Number Publication Date
ES8308089A1 true ES8308089A1 (es) 1983-09-01
ES511034A0 ES511034A0 (es) 1983-09-01

Family

ID=10520873

Family Applications (1)

Application Number Title Priority Date Filing Date
ES511034A Granted ES511034A0 (es) 1981-04-02 1982-04-01 Un procedimiento para producir una imagen de fotopolimerizacion y fotorreticulacion transversa.

Country Status (6)

Country Link
US (1) US4413052A (es)
EP (1) EP0062611B1 (es)
JP (1) JPS57177139A (es)
CA (1) CA1178478A (es)
DE (1) DE3263229D1 (es)
ES (1) ES511034A0 (es)

Families Citing this family (44)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0092901B1 (en) * 1982-04-23 1987-10-14 Autotype International Limited Photopolymers
US5512329A (en) * 1982-09-29 1996-04-30 Bsi Corporation Substrate surface preparation
DE3371573D1 (en) * 1982-11-25 1987-06-19 Ciba Geigy Ag Light-sensitive and possibly cross-linkable mixture of compounds apt to condensation and addition reactions, reaction products obtained thereby and use thereof
US4572890A (en) * 1983-05-11 1986-02-25 Ciba-Geigy Corporation Process for the production of images
GB8333853D0 (en) * 1983-12-20 1984-02-01 Ciba Geigy Ag Production of images
US5194365A (en) * 1985-06-19 1993-03-16 Ciba-Geigy Corporation Method for forming images
GB8515475D0 (en) * 1985-06-19 1985-07-24 Ciba Geigy Ag Forming images
CH678897A5 (es) * 1986-05-10 1991-11-15 Ciba Geigy Ag
ATE78266T1 (de) * 1987-04-03 1992-08-15 Akzo Nv Lineare additionspolymere mit hyperpolarisierbaren seitenketten.
GB8715435D0 (en) * 1987-07-01 1987-08-05 Ciba Geigy Ag Forming images
US5175217A (en) * 1988-12-12 1992-12-29 Duphar International Research B.V. Method for the photochemical conversion of tachysterol compounds into previtamin D compounds and of trans-vitamin D compounds into cis-vitamin D compounds using a polymeric photoinitiator
US6773864B1 (en) * 1991-11-15 2004-08-10 Shipley Company, L.L.C. Antihalation compositions
US6528235B2 (en) 1991-11-15 2003-03-04 Shipley Company, L.L.C. Antihalation compositions
US6472128B2 (en) 1996-04-30 2002-10-29 Shipley Company, L.L.C. Antihalation compositions
US6165697A (en) 1991-11-15 2000-12-26 Shipley Company, L.L.C. Antihalation compositions
DE4400975C2 (de) 1993-01-14 2001-11-29 Toshiba Kawasaki Kk Verfahren zum Ausbilden von Mustern
US5679719A (en) * 1993-03-24 1997-10-21 Loctite Corporation Method of preparing fiber/resin composites
US5565499A (en) * 1993-03-24 1996-10-15 Loctite Corporation Filament-winding compositions for fiber/resin composites
US5539012A (en) * 1993-08-18 1996-07-23 Loctite Corporation Fiber/resin composites and method of preparation
US5576359A (en) * 1993-07-20 1996-11-19 Wako Pure Chemical Industries, Ltd. Deep ultraviolet absorbent composition
EP0921147B1 (en) * 1997-12-03 2005-01-12 Nissan Chemical Industries, Limited Transparent conducting polymers
KR100465864B1 (ko) * 1999-03-15 2005-01-24 주식회사 하이닉스반도체 유기 난반사방지 중합체 및 그의 제조방법
US6268457B1 (en) 1999-06-10 2001-07-31 Allied Signal, Inc. Spin-on glass anti-reflective coatings for photolithography
US6824879B2 (en) 1999-06-10 2004-11-30 Honeywell International Inc. Spin-on-glass anti-reflective coatings for photolithography
JP2003502449A (ja) * 1999-06-10 2003-01-21 ハネウエル・インターナシヨナル・インコーポレーテツド フォトリソグラフィ用スピンオンガラス反射防止コーティング
KR100574486B1 (ko) * 2000-06-30 2006-04-27 주식회사 하이닉스반도체 유기반사방지막 조성물 및 그의 제조방법
KR100721182B1 (ko) * 2000-06-30 2007-05-23 주식회사 하이닉스반도체 유기반사방지막 조성물 및 그의 제조방법
KR100721181B1 (ko) * 2000-06-30 2007-05-23 주식회사 하이닉스반도체 유기반사방지막 조성물 및 그의 제조방법
KR100687850B1 (ko) * 2000-06-30 2007-02-27 주식회사 하이닉스반도체 유기반사방지막 조성물 및 그의 제조방법
KR100687851B1 (ko) * 2000-06-30 2007-02-27 주식회사 하이닉스반도체 유기반사방지막 조성물 및 그의 제조방법
US6368400B1 (en) * 2000-07-17 2002-04-09 Honeywell International Absorbing compounds for spin-on-glass anti-reflective coatings for photolithography
US6911109B2 (en) * 2000-12-11 2005-06-28 Henkel Corporation Two-part, room temperature curable epoxy resin/ (meth)acrylate compositions and process for using same to bond substrates
WO2003044600A1 (en) 2001-11-15 2003-05-30 Honeywell International Inc. Spin-on anti-reflective coatings for photolithography
US20050013733A1 (en) * 2003-05-22 2005-01-20 Ciphergen Biosystems, Inc. Trace incorporation of fluorescent monomer facilitating quality control of polymerization reactions
TW200523298A (en) 2003-08-04 2005-07-16 Honeywell Int Inc Coating composition optimization for via fill and photolithography applications and methods of preparation thereof
US8053159B2 (en) 2003-11-18 2011-11-08 Honeywell International Inc. Antireflective coatings for via fill and photolithography applications and methods of preparation thereof
US8642246B2 (en) 2007-02-26 2014-02-04 Honeywell International Inc. Compositions, coatings and films for tri-layer patterning applications and methods of preparation thereof
US8187770B2 (en) * 2007-10-19 2012-05-29 The Regents Of The University Of California High performance, crosslinked polymeric material for holographic data storage
JP5243887B2 (ja) * 2008-02-12 2013-07-24 富士フイルム株式会社 ナノインプリント用硬化性組成物およびパターン形成方法
US7955782B2 (en) * 2008-09-22 2011-06-07 Honeywell International Inc. Bottom antireflective coatings exhibiting enhanced wet strip rates, bottom antireflective coating compositions for forming bottom antireflective coatings, and methods for fabricating the same
US8557877B2 (en) 2009-06-10 2013-10-15 Honeywell International Inc. Anti-reflective coatings for optically transparent substrates
US8864898B2 (en) 2011-05-31 2014-10-21 Honeywell International Inc. Coating formulations for optical elements
JP6803842B2 (ja) 2015-04-13 2020-12-23 ハネウェル・インターナショナル・インコーポレーテッドＨｏｎｅｙｗｅｌｌ Ｉｎｔｅｒｎａｔｉｏｎａｌ Ｉｎｃ． オプトエレクトロニクス用途のためのポリシロキサン製剤及びコーティング
TW202337929A (zh) * 2021-11-15 2023-10-01 日商日產化學股份有限公司 多環芳香族烴系光硬化性樹脂組成物

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2980535A (en) * 1954-01-05 1961-04-18 Feldmuhle Papier Und Zellstoff Light sensitive layers of synthetic materials
US2929710A (en) * 1954-10-08 1960-03-22 Du Pont Polyvinyl acetal with terminal vinylidene groups
GB964871A (en) * 1959-02-26 1964-07-22 Gevaert Photo Prod Nv Improvements in or relating to electrophotography
US3131060A (en) * 1959-02-26 1964-04-28 Gevaert Photo Prod Nv Electrophotographic material
BE591347A (es) * 1959-10-31
US3575925A (en) * 1968-06-17 1971-04-20 Nat Starch Chem Corp Photosensitive coating systems
BE780294A (nl) * 1972-03-07 1972-07-03 Agfa Gevaert Nv Fotocycloadditie-polymerisatie van bis-antracenen
US3923762A (en) * 1973-11-19 1975-12-02 Xerox Corp Process for preparation of 2-anthryl and substituted 2-anthryl functional monomers and polymers
US4291118A (en) * 1979-12-26 1981-09-22 W. R. Grace & Co. Relief imaging liquids

Also Published As

Publication number Publication date
EP0062611B1 (de) 1985-04-24
EP0062611A2 (de) 1982-10-13
JPS57177139A (en) 1982-10-30
US4413052A (en) 1983-11-01
CA1178478A (en) 1984-11-27
ES511034A0 (es) 1983-09-01
DE3263229D1 (de) 1985-05-30
EP0062611A3 (en) 1983-02-09

Similar Documents

Publication Publication Date Title
ES8308089A1 (es) Un procedimiento para producir una imagen de fotopolimerizacion y fotorreticulacion transversa.
ES8308090A1 (es) Un procedimiento para la produccion de una imagen por fotopolimerizacion y fotorreticulacion transversa.
JPS5321923A (en) Photopolymerizable composition
JPS5560944A (en) Image forming method
JPS5474728A (en) Photosensitive composition
JPS5365381A (en) Photopolymerizable composition
EP0366977A3 (de) Mit sichtbarem Licht aushärtbare Dentalmassen
JPS5335518A (en) Light sensitive composition
JPS5427424A (en) Corrosion preventing method of hydrophilic colloid of silver halide photographic materials
ES8405165A1 (es) Procedimiento para la produccion de una imagen.
GB867959A (en) Improvements in or relating to photopolymerizable elements
JPS51123140A (en) Photosensitive compositions and processing method thereof
JPS5225651A (en) Process for fabricating an optical curved surface using a photopolymer izable adhesive
JPS5550246A (en) Photosensitive lithographic printing plate material
EP0152114A3 (en) Method for making a dry planographic printing plate
JPS55105581A (en) Protecting agent for surface of form for lithographic printing
JPS51116060A (en) Method of fixing fluorine in borofluoride-containing waste liquid
JPS5762047A (en) Image-forming material
EP0342812A3 (en) Photopolymerisable compositions suitable for recording holographic information
JPS5286329A (en) Photographic lens of gaussian type
JPS5432599A (en) Epoxy resin composition
JPS525520A (en) Ophthalmo funduscopic camera
JPS5267623A (en) Exposure adjusting mechanism for simplified camera
JPS55103554A (en) Photosensitive resin composition for sand blast resist
JPS5230428A (en) Photoresist exposure method