ES8501131A1 - Un procedimiento para la preparacion de una imagen - Google Patents

Un procedimiento para la preparacion de una imagen

Info

Publication number
ES8501131A1
ES8501131A1 ES530647A ES530647A ES8501131A1 ES 8501131 A1 ES8501131 A1 ES 8501131A1 ES 530647 A ES530647 A ES 530647A ES 530647 A ES530647 A ES 530647A ES 8501131 A1 ES8501131 A1 ES 8501131A1
Authority
ES
Spain
Prior art keywords
formula
compound
layer
unsaturated ester
epoxide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
ES530647A
Other languages
English (en)
Other versions
ES530647A0 (es
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Novartis AG
Original Assignee
Ciba Geigy AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Geigy AG filed Critical Ciba Geigy AG
Publication of ES8501131A1 publication Critical patent/ES8501131A1/es
Publication of ES530647A0 publication Critical patent/ES530647A0/es
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Epoxy Resins (AREA)
  • Fax Reproducing Arrangements (AREA)
  • Polymerisation Methods In General (AREA)

Abstract

METODO DE PREPARACION DE IMAGENES.CONSISTE EN EL CALENTAMIENTO DE UNA CAPA SOSTENIDA SOBRE UN SOPORTE, DE UNA COMPOSICION LIQUIDA DE UN AGENTE POLIMERIZANTE LATENTE, TERMOACTIVADO, PARA 1,2-EPOXIDOS Y UN COMPUESTO FOTOSENSNTIVO QUE TENGA, AL MENOS, UN GRUPO 1,2-EPOXIDO Y, AL MENOS UN GRUPO ESTER DE FORMULA CH2FC(R)COOC, EN LA QUE R PUEDE SER MUCHOS RADICALES; EXPOSICION DE LA CAPA A RADIACION ACTINICA; Y ELIMINACION DE LAS PARTES NO POLIMERIZADAS CON UN DISOLVENTE.
ES530647A 1983-03-16 1984-03-15 Un procedimiento para la preparacion de una imagen Granted ES530647A0 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB838307220A GB8307220D0 (en) 1983-03-16 1983-03-16 Production of images

Publications (2)

Publication Number Publication Date
ES8501131A1 true ES8501131A1 (es) 1984-12-01
ES530647A0 ES530647A0 (es) 1984-12-01

Family

ID=10539670

Family Applications (1)

Application Number Title Priority Date Filing Date
ES530647A Granted ES530647A0 (es) 1983-03-16 1984-03-15 Un procedimiento para la preparacion de una imagen

Country Status (7)

Country Link
US (1) US4548895A (es)
EP (1) EP0119959B1 (es)
JP (1) JPS59177538A (es)
CA (1) CA1242919A (es)
DE (1) DE3461868D1 (es)
ES (1) ES530647A0 (es)
GB (1) GB8307220D0 (es)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB8332073D0 (en) * 1983-12-01 1984-01-11 Ciba Geigy Ag Polymerisable compositions
US4610941A (en) * 1985-03-19 1986-09-09 Sullivan Donald F Method for photographically improving the resolution of screen printed photopolymer images
US4786569A (en) * 1985-09-04 1988-11-22 Ciba-Geigy Corporation Adhesively bonded photostructurable polyimide film
US4975300A (en) * 1987-12-31 1990-12-04 Minnesota Mining And Manufacturing Company Method for curing an organic coating using condensation heating and radiation energy
US5070002A (en) * 1988-09-13 1991-12-03 Amp-Akzo Corporation Photoimageable permanent resist
US5178988A (en) * 1988-09-13 1993-01-12 Amp-Akzo Corporation Photoimageable permanent resist
GB8822145D0 (en) * 1988-09-21 1988-10-26 Ciba Geigy Ag Method
US5264325A (en) * 1988-12-30 1993-11-23 International Business Machines Corporation Composition for photo imaging
US5747223A (en) * 1988-12-30 1998-05-05 International Business Machines Corporation Composition for photoimaging
US5439766A (en) * 1988-12-30 1995-08-08 International Business Machines Corporation Composition for photo imaging
US6180317B1 (en) 1988-12-30 2001-01-30 International Business Machines Corporation Composition for photoimaging
US5026624A (en) * 1989-03-03 1991-06-25 International Business Machines Corporation Composition for photo imaging
US5304457A (en) * 1989-03-03 1994-04-19 International Business Machines Corporation Composition for photo imaging
IL94474A (en) * 1989-06-09 1993-07-08 Morton Int Inc Photoimageable compositions
JPH03191352A (ja) * 1989-12-15 1991-08-21 W R Grace & Co 感光性樹脂組成物
US5439779A (en) * 1993-02-22 1995-08-08 International Business Machines Corporation Aqueous soldermask
US5631201A (en) * 1996-07-29 1997-05-20 Osram Sylvania Inc. Translucent polycrystalline alumina and method of making same
JP3969109B2 (ja) * 2002-02-08 2007-09-05 コニカミノルタホールディングス株式会社 感光性平版印刷版及びその記録方法
JP2008088167A (ja) * 2006-09-07 2008-04-17 Mitsui Chemicals Inc （メタ）アクリロイル基およびグリシジル基を含有する化合物、当該化合物を含む重合性組成物、ならびに当該化合物の製造方法に関する。
KR100943421B1 (ko) * 2007-12-24 2010-02-19 연세대학교 산학협력단 에폭시기와 불포화이중결합을 갖는 광중합성 단량체 및이를 함유한 광중합 조성물

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL283978A (es) * 1961-10-05 1900-01-01
US3450613A (en) * 1964-03-09 1969-06-17 Bausch & Lomb Epoxy adhesive containing acrylic acid-epoxy reaction products and photosensitizers
GB1346768A (en) * 1970-08-11 1974-02-13 Ciba Geigy Uk Ltd Curable epoxide resin compositions
US3796578A (en) * 1970-12-26 1974-03-12 Asahi Chemical Ind Photopolymerizable compositions and elements containing addition polymerizable polymeric compounds
JPS51482B1 (es) * 1971-06-16 1976-01-08
DE2406400B2 (de) * 1973-02-14 1977-04-28 Hitachi Chemical Co., Ltd., Tokio Lichtempfindliche harzzusammensetzungen auf der basis von verbindungen mit epoxy- bzw. photopolymerisierbaren acrylgruppen
US4025348A (en) * 1974-05-10 1977-05-24 Hitachi Chemical Company, Ltd. Photosensitive resin compositions
US4054451A (en) * 1974-09-26 1977-10-18 American Can Company Method of polymerizing a copolymer of glycidyl methacrylate and allyl glycidyl ether
GB1512814A (en) * 1975-08-13 1978-06-01 Ciba Geigy Ag Epoxide resins
US4047963A (en) * 1976-06-17 1977-09-13 Hercules Incorporated Photopolymer compositions
US4090936A (en) * 1976-10-28 1978-05-23 Minnesota Mining And Manufacturing Company Photohardenable compositions
US4192924A (en) * 1977-12-16 1980-03-11 General Electric Company Method of foaming curable organic resin compositions
US4171974A (en) * 1978-02-15 1979-10-23 Polychrome Corporation Aqueous alkali developable negative working lithographic printing plates
JPS5828571B2 (ja) * 1978-07-20 1983-06-16 沖電気工業株式会社 微細加工用レジスト形成方法
DE2962710D1 (en) * 1978-09-07 1982-06-24 Akzo Nv Radiation curable liquid coating composition based on an epoxy terminated compound and a process for coating a substrate with such a composition
US4237216A (en) * 1978-12-08 1980-12-02 International Business Machines Corporation Photosensitive patternable coating composition containing novolak type materials
US4291118A (en) * 1979-12-26 1981-09-22 W. R. Grace & Co. Relief imaging liquids
US4317858A (en) * 1980-06-27 1982-03-02 Westinghouse Electric Corp. Ultraviolet curable solvent-free wire enamel blends
US4374751A (en) * 1980-08-08 1983-02-22 General Electric Company Polymerization initiator compositions
US4352723A (en) * 1980-08-13 1982-10-05 W. R. Grace & Co. Method of curing a dual UV/thermally curable acrylate composition
US4288527A (en) * 1980-08-13 1981-09-08 W. R. Grace & Co. Dual UV/thermally curable acrylate compositions with pinacol

Also Published As

Publication number Publication date
CA1242919A (en) 1988-10-11
GB8307220D0 (en) 1983-04-20
DE3461868D1 (en) 1987-02-05
ES530647A0 (es) 1984-12-01
EP0119959A1 (de) 1984-09-26
EP0119959B1 (de) 1986-12-30
US4548895A (en) 1985-10-22
JPS59177538A (ja) 1984-10-08

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