ES8600346A1 - Un metodo de aumentar el contraste de un material protector positivo de polimero - Google Patents
Un metodo de aumentar el contraste de un material protector positivo de polimeroInfo
- Publication number
- ES8600346A1 ES8600346A1 ES532484A ES532484A ES8600346A1 ES 8600346 A1 ES8600346 A1 ES 8600346A1 ES 532484 A ES532484 A ES 532484A ES 532484 A ES532484 A ES 532484A ES 8600346 A1 ES8600346 A1 ES 8600346A1
- Authority
- ES
- Spain
- Prior art keywords
- polymer
- contrast
- increasing
- protective material
- molecular weight
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
PROCEDIMIENTO PARA AUMENTAR LA SENSIBILIDAD DE MATERIALES PROTECTORES POSITIVOS SENSIBLES A RADIACIONES.COMPRENDE: OBTENER UNA FRACCION ESTRECHA DE PESOS MOLECULARES DE UN MATERIAL PROTECTOR POSITIVO DE POLIMERO; RECUBRIR UN SUSTRATO CON DICHO MATERIAL DE FRACCION ESTRECHA DE PESOS MOLECULARES; Y COCER DICHO SUSTRATO RECUBIERTO CON EL MATERIAL PROTECTOR DE FRACCION ESTRECHA A UNA TEMPERATURA SUPERIOR A LA TEMPERATURA DE TRANSICION VITREA.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US42624382A | 1982-09-28 | 1982-09-28 | |
| US52817883A | 1983-08-31 | 1983-08-31 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| ES532484A0 ES532484A0 (es) | 1985-09-16 |
| ES8600346A1 true ES8600346A1 (es) | 1985-09-16 |
Family
ID=27026986
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| ES525880A Expired ES8503703A1 (es) | 1982-09-28 | 1983-09-23 | Un metodo de aumentar la sensibilidad de una capa protectora positiva de polimero |
| ES532484A Expired ES8600346A1 (es) | 1982-09-28 | 1984-05-14 | Un metodo de aumentar el contraste de un material protector positivo de polimero |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| ES525880A Expired ES8503703A1 (es) | 1982-09-28 | 1983-09-23 | Un metodo de aumentar la sensibilidad de una capa protectora positiva de polimero |
Country Status (3)
| Country | Link |
|---|---|
| EP (1) | EP0110515A1 (es) |
| AU (1) | AU1962283A (es) |
| ES (2) | ES8503703A1 (es) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4230297C1 (de) * | 1992-09-10 | 1994-03-17 | Kernforschungsz Karlsruhe | Verwendung eines Gießharzes und Verfahren zu dessen Herstellung |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3535137A (en) * | 1967-01-13 | 1970-10-20 | Ibm | Method of fabricating etch resistant masks |
| US3996393A (en) * | 1974-03-25 | 1976-12-07 | International Business Machines Corporation | Positive polymeric electron beam resists of very great sensitivity |
| FR2394833A1 (fr) * | 1977-06-17 | 1979-01-12 | Thomson Csf | Resine de masquage positive presentant une sensibilite amelioree a l'irradiation electronique, et methode de fabrication d'une telle resine |
-
1983
- 1983-09-23 ES ES525880A patent/ES8503703A1/es not_active Expired
- 1983-09-27 AU AU19622/83A patent/AU1962283A/en not_active Abandoned
- 1983-09-28 EP EP83305800A patent/EP0110515A1/en not_active Withdrawn
-
1984
- 1984-05-14 ES ES532484A patent/ES8600346A1/es not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| ES532484A0 (es) | 1985-09-16 |
| EP0110515A1 (en) | 1984-06-13 |
| ES525880A0 (es) | 1985-03-01 |
| ES8503703A1 (es) | 1985-03-01 |
| AU1962283A (en) | 1984-04-05 |
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