ES8605589A1 - Procedimiento para fabricar material en capas o piezas en capas - Google Patents
Procedimiento para fabricar material en capas o piezas en capasInfo
- Publication number
- ES8605589A1 ES8605589A1 ES540255A ES540255A ES8605589A1 ES 8605589 A1 ES8605589 A1 ES 8605589A1 ES 540255 A ES540255 A ES 540255A ES 540255 A ES540255 A ES 540255A ES 8605589 A1 ES8605589 A1 ES 8605589A1
- Authority
- ES
- Spain
- Prior art keywords
- sputtering
- layers
- layer
- coated
- bond
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000004544 sputter deposition Methods 0.000 title abstract 4
- 239000010410 layer Substances 0.000 abstract 6
- 239000002344 surface layer Substances 0.000 abstract 3
- 238000011109 contamination Methods 0.000 abstract 2
- 238000005530 etching Methods 0.000 abstract 2
- 238000004140 cleaning Methods 0.000 abstract 1
- 238000007788 roughening Methods 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- ing And Chemical Polishing (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19843404880 DE3404880A1 (de) | 1984-02-11 | 1984-02-11 | Verfahren zum herstellen von schichtwerkstoff oder schichtwerkstuecken |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| ES540255A0 ES540255A0 (es) | 1986-03-16 |
| ES8605589A1 true ES8605589A1 (es) | 1986-03-16 |
Family
ID=6227432
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| ES540255A Expired ES8605589A1 (es) | 1984-02-11 | 1985-02-08 | Procedimiento para fabricar material en capas o piezas en capas |
Country Status (9)
| Country | Link |
|---|---|
| JP (1) | JPS60184676A (de) |
| AT (1) | AT383145B (de) |
| BR (1) | BR8500587A (de) |
| CH (1) | CH663220A5 (de) |
| DE (1) | DE3404880A1 (de) |
| ES (1) | ES8605589A1 (de) |
| FR (1) | FR2559507A1 (de) |
| GB (1) | GB2154249B (de) |
| IT (1) | IT1184136B (de) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4661233A (en) * | 1985-07-05 | 1987-04-28 | Westinghouse Electric Corp. | Cathode/ground shield arrangement in a sputter coating apparatus |
| CH671239A5 (de) * | 1986-07-15 | 1989-08-15 | Balzers Hochvakuum | |
| DE3640767A1 (de) * | 1986-10-30 | 1988-05-05 | Kolbenschmidt Ag | Lagerung |
| ATE80671T1 (de) * | 1986-12-23 | 1992-10-15 | Balzers Hochvakuum | Verbundwerkstoff mit einer durch kathodenzerstaeubung aufgebrachten gleitschicht. |
| EP0288677B1 (de) * | 1987-04-30 | 1992-08-19 | Balzers Aktiengesellschaft | Bauteil, insbesondere Maschinenelement |
| RU2180365C2 (ru) * | 1998-09-01 | 2002-03-10 | Сенокосов Евгений Степанович | Способ получения многослойной ленты и устройство для его осуществления |
| JP5550565B2 (ja) * | 2008-12-15 | 2014-07-16 | 株式会社アルバック | スパッタリング装置及びスパッタリング方法 |
| AT519107B1 (de) | 2017-01-23 | 2018-04-15 | Miba Gleitlager Austria Gmbh | Verfahren zur Herstellung eines Mehrschichtgleitlagerelementes |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL6615807A (de) * | 1965-11-12 | 1967-05-16 | ||
| US3723276A (en) * | 1969-06-03 | 1973-03-27 | Warner Lambert Co | Article coating method |
| DE2039416A1 (de) * | 1969-08-11 | 1971-02-25 | Varian Associates | Vakuumgalvanisiervorrichtung |
| GB1391842A (en) * | 1971-08-04 | 1975-04-23 | Elektromat Veb | Apparatus for coating substrates by cathode sputtering and for cleaning by ion bombardment in the same vacuum vessel |
| BE792605A (fr) * | 1972-01-13 | 1973-03-30 | Siempelkamp Gmbh & Co | Procede et installation de fabrication de panneaux plaques |
| US3784458A (en) * | 1973-04-03 | 1974-01-08 | Warner Lambert Co | Method of coating a continuous strip of ribbon razor blade material |
| US3864239A (en) * | 1974-04-22 | 1975-02-04 | Nasa | Multitarget sequential sputtering apparatus |
| US3981791A (en) * | 1975-03-10 | 1976-09-21 | Signetics Corporation | Vacuum sputtering apparatus |
| DE2636293A1 (de) * | 1976-08-12 | 1978-02-16 | Leybold Heraeus Gmbh & Co Kg | Katodenzerstaeubungsvorrichtung |
| GB1570380A (en) * | 1978-05-30 | 1980-07-02 | Standard Telephones Cables Ltd | Electroless plating |
| US4410407A (en) * | 1981-12-22 | 1983-10-18 | Raytheon Company | Sputtering apparatus and methods |
-
1984
- 1984-02-11 DE DE19843404880 patent/DE3404880A1/de not_active Ceased
- 1984-12-11 CH CH5880/84A patent/CH663220A5/de not_active IP Right Cessation
-
1985
- 1985-01-11 AT AT0006285A patent/AT383145B/de not_active IP Right Cessation
- 1985-01-23 IT IT19200/85A patent/IT1184136B/it active
- 1985-02-04 GB GB08502734A patent/GB2154249B/en not_active Expired
- 1985-02-08 JP JP60022116A patent/JPS60184676A/ja active Pending
- 1985-02-08 FR FR8502016A patent/FR2559507A1/fr not_active Withdrawn
- 1985-02-08 BR BR8500587A patent/BR8500587A/pt unknown
- 1985-02-08 ES ES540255A patent/ES8605589A1/es not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| FR2559507A1 (fr) | 1985-08-16 |
| DE3404880A1 (de) | 1985-08-14 |
| ES540255A0 (es) | 1986-03-16 |
| AT383145B (de) | 1987-05-25 |
| IT1184136B (it) | 1987-10-22 |
| CH663220A5 (de) | 1987-11-30 |
| ATA6285A (de) | 1986-10-15 |
| BR8500587A (pt) | 1985-09-24 |
| JPS60184676A (ja) | 1985-09-20 |
| GB2154249A (en) | 1985-09-04 |
| GB8502734D0 (en) | 1985-03-06 |
| IT8519200A0 (it) | 1985-01-23 |
| GB2154249B (en) | 1988-05-05 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP0198459A3 (de) | Verfahren und Vorrichtung zur Zerstäubung einer dünnen Schicht | |
| AU4902897A (en) | Method for improving reliability of thin circuit substrates by increasing the T of the substrate | |
| ATE47431T1 (de) | Verfahren zur oberflaechenbehandlung. | |
| GB1418278A (en) | Integrated circuit devices | |
| ES8601820A1 (es) | Un metodo para recubrir un substrato con una pelicula por pulverizacion electronica catodica | |
| CA1268846C (en) | SEMICONDUCTOR LASER WITH MESA STRUCTURE | |
| DE59004525D1 (de) | Verfahren zur beschichtung elektrisch leitfähiger substrate. | |
| DE3468584D1 (en) | Metal/semiconductor deposition | |
| EP0053711A3 (en) | Method of making layer structures from silicides or silicides-polysilicon by reactive sputter etching | |
| GB1244618A (en) | A method of forming a metal contact on an element and a vacuum deposition system that may be used in performing this method | |
| EP0301604A3 (en) | Apparatus for coating a substrate by plasma-chemical vapour deposition or cathodic sputtering, and process using the apparatus | |
| DE3472974D1 (en) | Method and apparatus for the deposition of a thin layer on a substrate by a reactive plasma | |
| GB2154249A (en) | Cathode sputtering | |
| EP0160202A3 (de) | Abscheidung von Überzügen mittels eines Mikrowellenplasmas und die dadurch hergestellten Überzüge | |
| JPS53141369A (en) | Treatment of article with thermosetting resin | |
| EP0969120A3 (de) | Verfahren und Vorrichtung zur Plasmabeschichtung | |
| AU2002364794A8 (en) | Improved method for coating a support | |
| DE69019869D1 (de) | Verfahren zur Plattierung einer metallischen Schicht zwischen funktionellen Bahnen auf einem Substrat. | |
| JPS5339864A (en) | Production of semiconductor element electrode | |
| JPS6487763A (en) | Superconducting material | |
| EP0824275A3 (de) | Verfahren zur Herstellung einer mehrschichtigen Struktur mit einer supraleitenden Oxyddünnschicht | |
| DE59201775D1 (de) | Vorrichtung zur Beschichtung von Substraten für Kathodenzerstäubungsanlagen. | |
| JPS6467893A (en) | Manufacture of electroluminescence display panel | |
| JPS57188694A (en) | Formation of metallic film on transparent conductive film | |
| Criss et al. | Method for Coating Substrates With a Film by Cathode Sputtering, and Coated Articles |