JPS60184676A - 有被覆基材または有被覆部材の製造法 - Google Patents

有被覆基材または有被覆部材の製造法

Info

Publication number: JPS60184676A
Authority: JP; Japan
Prior art keywords: coated; sputtering; base; base material; free
Prior art date: 1984-02-11
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Pending

Application number

JP60022116A

Other languages

English (en)

Japanese (ja)

Inventor

クラウス・ゲールケ

エーリツヒ・ホーデス

ミヒヤエル・シユテーグ

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

GLYCO METALL WERKE

GURIKO METARU UERUKE DEEREN UNTO RUUSU GmbH

Original Assignee

GLYCO METALL WERKE

GURIKO METARU UERUKE DEEREN UNTO RUUSU GmbH

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1984-02-11

Filing date

1985-02-08

Publication date

1985-09-20

1985-02-08 Application filed by GLYCO METALL WERKE, GURIKO METARU UERUKE DEEREN UNTO RUUSU GmbH filed Critical GLYCO METALL WERKE

1985-09-20 Publication of JPS60184676A publication Critical patent/JPS60184676A/ja

Status Pending legal-status Critical Current

Links

239000000463 material Substances 0.000 title claims description 22
238000004519 manufacturing process Methods 0.000 title claims description 10
238000004544 sputter deposition Methods 0.000 claims description 66
238000005530 etching Methods 0.000 claims description 32
239000000758 substrate Substances 0.000 claims description 29
238000000576 coating method Methods 0.000 claims description 25
239000011248 coating agent Substances 0.000 claims description 19
238000000034 method Methods 0.000 claims description 9
239000000203 mixture Substances 0.000 claims description 7
239000000126 substance Substances 0.000 claims description 7
239000011159 matrix material Substances 0.000 claims description 2
230000015572 biosynthetic process Effects 0.000 claims 1
210000003127 knee Anatomy 0.000 claims 1
239000010410 layer Substances 0.000 description 20
238000004140 cleaning Methods 0.000 description 4
229910000990 Ni alloy Inorganic materials 0.000 description 2
VNNRSPGTAMTISX-UHFFFAOYSA-N chromium nickel Chemical compound [Cr].[Ni] VNNRSPGTAMTISX-UHFFFAOYSA-N 0.000 description 2
238000011109 contamination Methods 0.000 description 2
238000007788 roughening Methods 0.000 description 2
238000003860 storage Methods 0.000 description 2
239000002344 surface layer Substances 0.000 description 2
230000001360 synchronised effect Effects 0.000 description 2
CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical compound [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 description 1
NMFHJNAPXOMSRX-PUPDPRJKSA-N [(1r)-3-(3,4-dimethoxyphenyl)-1-[3-(2-morpholin-4-ylethoxy)phenyl]propyl] (2s)-1-[(2s)-2-(3,4,5-trimethoxyphenyl)butanoyl]piperidine-2-carboxylate Chemical compound C([C@@H](OC(=O)[C@@H]1CCCCN1C(=O)[C@@H](CC)C=1C=C(OC)C(OC)=C(OC)C=1)C=1C=C(OCCN2CCOCC2)C=CC=1)CC1=CC=C(OC)C(OC)=C1 NMFHJNAPXOMSRX-PUPDPRJKSA-N 0.000 description 1
230000000903 blocking effect Effects 0.000 description 1
238000010924 continuous production Methods 0.000 description 1
238000005520 cutting process Methods 0.000 description 1
238000002474 experimental method Methods 0.000 description 1
239000003292 glue Substances 0.000 description 1
238000009499 grossing Methods 0.000 description 1
239000002184 metal Substances 0.000 description 1
229910052751 metal Inorganic materials 0.000 description 1
238000002360 preparation method Methods 0.000 description 1
239000007858 starting material Substances 0.000 description 1
239000013077 target material Substances 0.000 description 1
235000012976 tarts Nutrition 0.000 description 1

Classifications

- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering

Landscapes

Chemical & Material Sciences (AREA)
Chemical Kinetics & Catalysis (AREA)
Engineering & Computer Science (AREA)
Materials Engineering (AREA)
Mechanical Engineering (AREA)
Metallurgy (AREA)
Organic Chemistry (AREA)
Physical Vapour Deposition (AREA)
ing And Chemical Polishing (AREA)

JP60022116A 1984-02-11 1985-02-08 有被覆基材または有被覆部材の製造法 Pending JPS60184676A (ja)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
DE3404880.4		1984-02-11
DE19843404880 DE3404880A1 (de)	1984-02-11	1984-02-11	Verfahren zum herstellen von schichtwerkstoff oder schichtwerkstuecken

Publications (1)

Publication Number	Publication Date
JPS60184676A true JPS60184676A (ja)	1985-09-20

Family

ID=6227432

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP60022116A Pending JPS60184676A (ja)	1984-02-11	1985-02-08	有被覆基材または有被覆部材の製造法

Country Status (9)

Country	Link
JP (1)	JPS60184676A (de)
AT (1)	AT383145B (de)
BR (1)	BR8500587A (de)
CH (1)	CH663220A5 (de)
DE (1)	DE3404880A1 (de)
ES (1)	ES8605589A1 (de)
FR (1)	FR2559507A1 (de)
GB (1)	GB2154249B (de)
IT (1)	IT1184136B (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
WO2010070845A1 (ja) *	2008-12-15	2010-06-24	株式会社アルバック	スパッタリング装置及びスパッタリング方法

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US4661233A (en) *	1985-07-05	1987-04-28	Westinghouse Electric Corp.	Cathode/ground shield arrangement in a sputter coating apparatus
CH671239A5 (de) *	1986-07-15	1989-08-15	Balzers Hochvakuum
DE3640767A1 (de) *	1986-10-30	1988-05-05	Kolbenschmidt Ag	Lagerung
ATE80671T1 (de) *	1986-12-23	1992-10-15	Balzers Hochvakuum	Verbundwerkstoff mit einer durch kathodenzerstaeubung aufgebrachten gleitschicht.
DE3873813D1 (de) *	1987-04-30	1992-09-24	Balzers Hochvakuum	Bauteil, insbesondere maschinenelement.
RU2180365C2 (ru) *	1998-09-01	2002-03-10	Сенокосов Евгений Степанович	Способ получения многослойной ленты и устройство для его осуществления
AT519107B1 (de)	2017-01-23	2018-04-15	Miba Gleitlager Austria Gmbh	Verfahren zur Herstellung eines Mehrschichtgleitlagerelementes

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
NL6615807A (de) *	1965-11-12	1967-05-16
US3723276A (en) *	1969-06-03	1973-03-27	Warner Lambert Co	Article coating method
DE2039416A1 (de) *	1969-08-11	1971-02-25	Varian Associates	Vakuumgalvanisiervorrichtung
GB1391842A (en) *	1971-08-04	1975-04-23	Elektromat Veb	Apparatus for coating substrates by cathode sputtering and for cleaning by ion bombardment in the same vacuum vessel
BE792605A (fr) *	1972-01-13	1973-03-30	Siempelkamp Gmbh & Co	Procede et installation de fabrication de panneaux plaques
US3784458A (en) *	1973-04-03	1974-01-08	Warner Lambert Co	Method of coating a continuous strip of ribbon razor blade material
US3864239A (en) *	1974-04-22	1975-02-04	Nasa	Multitarget sequential sputtering apparatus
US3981791A (en) *	1975-03-10	1976-09-21	Signetics Corporation	Vacuum sputtering apparatus
DE2636293A1 (de) *	1976-08-12	1978-02-16	Leybold Heraeus Gmbh & Co Kg	Katodenzerstaeubungsvorrichtung
GB1570380A (en) *	1978-05-30	1980-07-02	Standard Telephones Cables Ltd	Electroless plating
US4410407A (en) *	1981-12-22	1983-10-18	Raytheon Company	Sputtering apparatus and methods

1984
- 1984-02-11 DE DE19843404880 patent/DE3404880A1/de not_active Ceased
- 1984-12-11 CH CH5880/84A patent/CH663220A5/de not_active IP Right Cessation
1985
- 1985-01-11 AT AT0006285A patent/AT383145B/de not_active IP Right Cessation
- 1985-01-23 IT IT19200/85A patent/IT1184136B/it active
- 1985-02-04 GB GB08502734A patent/GB2154249B/en not_active Expired
- 1985-02-08 BR BR8500587A patent/BR8500587A/pt unknown
- 1985-02-08 FR FR8502016A patent/FR2559507A1/fr not_active Withdrawn
- 1985-02-08 JP JP60022116A patent/JPS60184676A/ja active Pending
- 1985-02-08 ES ES540255A patent/ES8605589A1/es not_active Expired

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
WO2010070845A1 (ja) *	2008-12-15	2010-06-24	株式会社アルバック	スパッタリング装置及びスパッタリング方法
US8834685B2 (en)	2008-12-15	2014-09-16	Ulvac, Inc.	Sputtering apparatus and sputtering method

Also Published As

Publication number	Publication date
ATA6285A (de)	1986-10-15
CH663220A5 (de)	1987-11-30
BR8500587A (pt)	1985-09-24
ES540255A0 (es)	1986-03-16
FR2559507A1 (fr)	1985-08-16
IT1184136B (it)	1987-10-22
GB8502734D0 (en)	1985-03-06
AT383145B (de)	1987-05-25
DE3404880A1 (de)	1985-08-14
GB2154249B (en)	1988-05-05
IT8519200A0 (it)	1985-01-23
ES8605589A1 (es)	1986-03-16
GB2154249A (en)	1985-09-04

Publication	Publication Date	Title
EP0119343A1 (de)	1984-09-26	Turbinenmotordichtung und Verfahren zu deren Reparatur
US3945902A (en)	1976-03-23	Metallized device and method of fabrication
JP3548221B2 (ja)	2004-07-28	金属表面へのシリコン含有組成物の接合方法
US5382471A (en)	1995-01-17	Adherent metal coating for aluminum nitride surfaces
US3012904A (en)	1961-12-12	Oxidizable oxide-free metal coated with metal
GB2154249A (en)	1985-09-04	Cathode sputtering
JPH0892764A (ja)	1996-04-09	スパッタ装置
JP7651517B2 (ja)	2025-03-26	集塵方法
US6599581B2 (en)	2003-07-29	Method of fabricating jig for vacuum apparatus
US5028306A (en)	1991-07-02	Process for forming a ceramic-metal adduct
JP2875892B2 (ja)	1999-03-31	立方晶窒化ほう素膜の形成方法
JPS59208071A (ja)	1984-11-26	成膜方法および装置
JP2694058B2 (ja)	1997-12-24	アーク蒸着装置
JP2965670B2 (ja)	1999-10-18	多層薄膜コンデンサの製造法
JPH09279336A (ja)	1997-10-28	薄膜形成方法
JPS60227856A (ja)	1985-11-13	低圧溶射装置
JPH03215662A (ja)	1991-09-20	スパッタ蒸着装置およびスパッタ蒸着方法
JPH04151220A (ja)	1992-05-25	微細加工を施した射出成形用コアの作成方法
JPH0310706B2 (de)	1991-02-14
JP2738263B2 (ja)	1998-04-08	マグネトロンスパッタリング用Ｔｉターゲット材
JPH02115361A (ja)	1990-04-27	スパッタ成膜方法
JPH097950A (ja)	1997-01-10	半導体装置の製造方法
KR960015791B1 (ko)	1996-11-21	산화막 제거 가능한 메탈증착방법
JPH05148632A (ja)	1993-06-15	薄膜形成装置
SU1763520A1 (ru)	1992-09-23	Способ локального нанесени покрытий в вакууме