FI93822C - Parannetut lasimaiset piidioksidituotteet - Google Patents

Parannetut lasimaiset piidioksidituotteet Download PDF

Info

Publication number: FI93822C
Authority: FI; Finland
Prior art keywords: silica; product; process according; vapor; combustion
Prior art date: 1989-03-15

Application number

FI914317A

Other languages

English (en)

Finnish (fi)

Swedish (sv)

Other versions

FI93822B (fi

FI914317A0 (fi

Inventor

Alan Smithson

Ian George Sayce

Peter John Wells

Original Assignee

Tsl Group Plc

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1989-03-15

Filing date

1991-09-13

Publication date

1995-06-12

Family has litigation

First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=10653383&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=FI93822(C) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.

1991-09-13 Application filed by Tsl Group Plc filed Critical Tsl Group Plc

1991-09-13 Publication of FI914317A0 publication Critical patent/FI914317A0/fi

1995-02-28 Publication of FI93822B publication Critical patent/FI93822B/fi

1995-06-12 Application granted granted Critical

1995-06-12 Publication of FI93822C publication Critical patent/FI93822C/fi

Links

VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 143
239000000377 silicon dioxide Substances 0.000 claims abstract description 62
238000000034 method Methods 0.000 claims abstract description 25
230000003647 oxidation Effects 0.000 claims abstract description 9
238000007254 oxidation reaction Methods 0.000 claims abstract description 9
125000004122 cyclic group Chemical group 0.000 claims abstract description 8
239000002243 precursor Substances 0.000 claims abstract description 8
239000000463 material Substances 0.000 claims abstract description 5
150000003377 silicon compounds Chemical class 0.000 claims abstract 4
238000002485 combustion reaction Methods 0.000 claims description 16
150000001875 compounds Chemical class 0.000 claims description 13
230000015572 biosynthetic process Effects 0.000 claims description 10
XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 9
229910052782 aluminium Inorganic materials 0.000 claims description 9
238000003786 synthesis reaction Methods 0.000 claims description 9
239000000654 additive Substances 0.000 claims description 7
238000000151 deposition Methods 0.000 claims description 7
239000000203 mixture Substances 0.000 claims description 7
RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 6
125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 6
229910052719 titanium Inorganic materials 0.000 claims description 6
239000010936 titanium Substances 0.000 claims description 6
230000000996 additive effect Effects 0.000 claims description 5
125000003118 aryl group Chemical group 0.000 claims description 4
239000013307 optical fiber Substances 0.000 claims description 4
ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 3
125000000217 alkyl group Chemical group 0.000 claims description 3
229910052796 boron Inorganic materials 0.000 claims description 3
229910052710 silicon Inorganic materials 0.000 claims description 3
239000010703 silicon Substances 0.000 claims description 3
239000012808 vapor phase Substances 0.000 claims description 3
PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims description 2
125000003636 chemical group Chemical group 0.000 claims description 2
238000005056 compaction Methods 0.000 claims description 2
229910052731 fluorine Inorganic materials 0.000 claims description 2
239000011737 fluorine Substances 0.000 claims description 2
UQEAIHBTYFGYIE-UHFFFAOYSA-N hexamethyldisiloxane Chemical group C[Si](C)(C)O[Si](C)(C)C UQEAIHBTYFGYIE-UHFFFAOYSA-N 0.000 claims description 2
150000004678 hydrides Chemical group 0.000 claims description 2
230000001590 oxidative effect Effects 0.000 claims description 2
125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 2
125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 2
239000012071 phase Substances 0.000 claims 1
229920000642 polymer Polymers 0.000 claims 1
239000004071 soot Substances 0.000 abstract description 8
238000004519 manufacturing process Methods 0.000 abstract description 5
239000003517 fume Substances 0.000 abstract description 2
239000000843 powder Substances 0.000 abstract description 2
125000001181 organosilyl group Chemical group [SiH3]* 0.000 abstract 1
239000000047 product Substances 0.000 description 32
239000000758 substrate Substances 0.000 description 21
229920001296 polysiloxane Polymers 0.000 description 15
239000002245 particle Substances 0.000 description 11
239000007789 gas Substances 0.000 description 10
OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 8
QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 8
239000001257 hydrogen Substances 0.000 description 8
229910052739 hydrogen Inorganic materials 0.000 description 8
239000001301 oxygen Substances 0.000 description 8
229910052760 oxygen Inorganic materials 0.000 description 8
KPZGRMZPZLOPBS-UHFFFAOYSA-N 1,3-dichloro-2,2-bis(chloromethyl)propane Chemical compound ClCC(CCl)(CCl)CCl KPZGRMZPZLOPBS-UHFFFAOYSA-N 0.000 description 7
ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 7
239000000460 chlorine Substances 0.000 description 7
229910052801 chlorine Inorganic materials 0.000 description 7
UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 6
239000006229 carbon black Substances 0.000 description 6
230000008021 deposition Effects 0.000 description 6
BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 5
IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
229910052799 carbon Inorganic materials 0.000 description 4
238000006243 chemical reaction Methods 0.000 description 4
229910002804 graphite Inorganic materials 0.000 description 4
239000010439 graphite Substances 0.000 description 4
VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 4
238000005245 sintering Methods 0.000 description 4
238000009833 condensation Methods 0.000 description 3
230000005494 condensation Effects 0.000 description 3
239000000835 fiber Substances 0.000 description 3
239000011521 glass Substances 0.000 description 3
238000005816 glass manufacturing process Methods 0.000 description 3
230000007062 hydrolysis Effects 0.000 description 3
238000006460 hydrolysis reaction Methods 0.000 description 3
HMMGMWAXVFQUOA-UHFFFAOYSA-N octamethylcyclotetrasiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1 HMMGMWAXVFQUOA-UHFFFAOYSA-N 0.000 description 3
239000011148 porous material Substances 0.000 description 3
238000002360 preparation method Methods 0.000 description 3
229910000077 silane Inorganic materials 0.000 description 3
SNOJPWLNAMAYSX-UHFFFAOYSA-N 2-methylpropan-1-ol;titanium Chemical compound [Ti].CC(C)CO.CC(C)CO.CC(C)CO.CC(C)CO SNOJPWLNAMAYSX-UHFFFAOYSA-N 0.000 description 2
CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
239000005046 Chlorosilane Substances 0.000 description 2
XMSXQFUHVRWGNA-UHFFFAOYSA-N Decamethylcyclopentasiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1 XMSXQFUHVRWGNA-UHFFFAOYSA-N 0.000 description 2
VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
210000000988 bone and bone Anatomy 0.000 description 2
WTEOIRVLGSZEPR-UHFFFAOYSA-N boron trifluoride Chemical compound FB(F)F WTEOIRVLGSZEPR-UHFFFAOYSA-N 0.000 description 2
-1 chlorosilane compound Chemical class 0.000 description 2
238000001816 cooling Methods 0.000 description 2
150000002431 hydrogen Chemical class 0.000 description 2
IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 2
229910000041 hydrogen chloride Inorganic materials 0.000 description 2
239000012535 impurity Substances 0.000 description 2
229910052757 nitrogen Inorganic materials 0.000 description 2
230000003287 optical effect Effects 0.000 description 2
238000000746 purification Methods 0.000 description 2
235000012239 silicon dioxide Nutrition 0.000 description 2
238000001089 thermophoresis Methods 0.000 description 2
FYSNRJHAOHDILO-UHFFFAOYSA-N thionyl chloride Chemical compound ClS(Cl)=O FYSNRJHAOHDILO-UHFFFAOYSA-N 0.000 description 2
VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 1
229910015900 BF3 Inorganic materials 0.000 description 1
KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
229910003902 SiCl 4 Inorganic materials 0.000 description 1
229910003910 SiCl4 Inorganic materials 0.000 description 1
229910004298 SiO 2 Inorganic materials 0.000 description 1
238000009825 accumulation Methods 0.000 description 1
PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
230000004888 barrier function Effects 0.000 description 1
KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
239000004327 boric acid Substances 0.000 description 1
239000006227 byproduct Substances 0.000 description 1
125000004432 carbon atom Chemical group C* 0.000 description 1
239000001569 carbon dioxide Substances 0.000 description 1
229910002092 carbon dioxide Inorganic materials 0.000 description 1
KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical class Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 1
238000004581 coalescence Methods 0.000 description 1
229910052681 coesite Inorganic materials 0.000 description 1
238000011109 contamination Methods 0.000 description 1
238000005260 corrosion Methods 0.000 description 1
230000007797 corrosion Effects 0.000 description 1
229910052906 cristobalite Inorganic materials 0.000 description 1
238000007872 degassing Methods 0.000 description 1
125000004177 diethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
230000000694 effects Effects 0.000 description 1
210000002257 embryonic structure Anatomy 0.000 description 1
JKGITWJSGDFJKO-UHFFFAOYSA-N ethoxy(trihydroxy)silane Chemical class CCO[Si](O)(O)O JKGITWJSGDFJKO-UHFFFAOYSA-N 0.000 description 1
238000001704 evaporation Methods 0.000 description 1
230000008020 evaporation Effects 0.000 description 1
239000002360 explosive Substances 0.000 description 1
239000012467 final product Substances 0.000 description 1
150000004820 halides Chemical class 0.000 description 1
XLYOFNOQVPJJNP-ZSJDYOACSA-N heavy water Substances [2H]O[2H] XLYOFNOQVPJJNP-ZSJDYOACSA-N 0.000 description 1
239000001307 helium Substances 0.000 description 1
229910052734 helium Inorganic materials 0.000 description 1
SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
230000007246 mechanism Effects 0.000 description 1
VUZPPFZMUPKLLV-UHFFFAOYSA-N methane;hydrate Chemical compound C.O VUZPPFZMUPKLLV-UHFFFAOYSA-N 0.000 description 1
125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
239000011859 microparticle Substances 0.000 description 1
QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
239000007800 oxidant agent Substances 0.000 description 1
HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
229910010271 silicon carbide Inorganic materials 0.000 description 1
229910052814 silicon oxide Inorganic materials 0.000 description 1
FDNAPBUWERUEDA-UHFFFAOYSA-N silicon tetrachloride Chemical compound Cl[Si](Cl)(Cl)Cl FDNAPBUWERUEDA-UHFFFAOYSA-N 0.000 description 1
239000005049 silicon tetrachloride Substances 0.000 description 1
229910052682 stishovite Inorganic materials 0.000 description 1
239000000126 substance Substances 0.000 description 1
125000001424 substituent group Chemical group 0.000 description 1
231100000331 toxic Toxicity 0.000 description 1
230000002588 toxic effect Effects 0.000 description 1
229910052905 tridymite Inorganic materials 0.000 description 1
238000007740 vapor deposition Methods 0.000 description 1
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1

Classifications

- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/01413—Reactant delivery systems
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
- C01B33/181—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process
- C01B33/183—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process by oxidation or hydrolysis in the vapour phase of silicon compounds such as halides, trichlorosilane, monosilane
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1415—Reactant delivery systems
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2002/00—Crystal-structural characteristics
- C01P2002/50—Solid solutions
- C01P2002/52—Solid solutions containing elements as dopants
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2002/00—Crystal-structural characteristics
- C01P2002/50—Solid solutions
- C01P2002/52—Solid solutions containing elements as dopants
- C01P2002/54—Solid solutions containing elements as dopants one element only
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/10—Particle morphology extending in one dimension, e.g. needle-like
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/10—Particle morphology extending in one dimension, e.g. needle-like
- C01P2004/12—Particle morphology extending in one dimension, e.g. needle-like with a cylindrical shape
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/50—Agglomerated particles
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/10—Solid density
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/12—Surface area
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/80—Compositional purity
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/08—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
- C03B2201/28—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with phosphorus
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
- C03B2201/31—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with germanium
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
- C03B2201/32—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with aluminium
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
- C03B2201/40—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
- C03B2201/42—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn doped with titanium
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/30—For glass precursor of non-standard type, e.g. solid SiH3F
- C03B2207/32—Non-halide
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/36—Fuel or oxidant details, e.g. flow rate, flow rate ratio, fuel additives
- C03B2207/38—Fuel combinations or non-standard fuels, e.g. H2+CH4, ethane
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/02—Pure silica glass, e.g. pure fused quartz
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/08—Doped silica-based glasses containing boron or halide
- C03C2201/10—Doped silica-based glasses containing boron or halide containing boron
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/08—Doped silica-based glasses containing boron or halide
- C03C2201/12—Doped silica-based glasses containing boron or halide containing fluorine
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/08—Doped silica-based glasses containing boron or halide
- C03C2201/14—Doped silica-based glasses containing boron or halide containing boron and fluorine
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/30—Doped silica-based glasses containing metals
- C03C2201/32—Doped silica-based glasses containing metals containing aluminium
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/30—Doped silica-based glasses containing metals
- C03C2201/40—Doped silica-based glasses containing metals containing transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
- C03C2201/42—Doped silica-based glasses containing metals containing transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn containing titanium
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2203/00—Production processes
- C03C2203/40—Gas-phase processes

Landscapes

Chemical & Material Sciences (AREA)
Organic Chemistry (AREA)
Engineering & Computer Science (AREA)
Materials Engineering (AREA)
Chemical Kinetics & Catalysis (AREA)
General Chemical & Material Sciences (AREA)
Life Sciences & Earth Sciences (AREA)
Geochemistry & Mineralogy (AREA)
Manufacturing & Machinery (AREA)
Inorganic Chemistry (AREA)
General Life Sciences & Earth Sciences (AREA)
Glass Compositions (AREA)
Silicon Compounds (AREA)
Glass Melting And Manufacturing (AREA)
Silicon Polymers (AREA)
Manufacture, Treatment Of Glass Fibers (AREA)

FI914317A 1989-03-15 1991-09-13 Parannetut lasimaiset piidioksidituotteet FI93822C (fi)

Applications Claiming Priority (4)

Application Number	Priority Date	Filing Date	Title
GB898905966A GB8905966D0 (en)	1989-03-15	1989-03-15	Improved vitreous silica products
GB8905966		1989-03-15
GB9000384		1990-03-14
PCT/GB1990/000384 WO1990010596A1 (en)	1989-03-15	1990-03-14	Improved vitreous silica products

Publications (3)

Publication Number	Publication Date
FI914317A0 FI914317A0 (fi)	1991-09-13
FI93822B FI93822B (fi)	1995-02-28
FI93822C true FI93822C (fi)	1995-06-12

Family

ID=10653383

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
FI914317A FI93822C (fi)	1989-03-15	1991-09-13	Parannetut lasimaiset piidioksidituotteet

Country Status (11)

Country	Link
EP (1)	EP0463045B1 (2)
JP (1)	JP2744695B2 (2)
KR (1)	KR0130007B1 (2)
AT (1)	ATE141901T1 (2)
CA (1)	CA2047187C (2)
DE (1)	DE69028300T2 (2)
DK (1)	DK0463045T3 (2)
ES (1)	ES2092505T3 (2)
FI (1)	FI93822C (2)
GB (2)	GB8905966D0 (2)
WO (1)	WO1990010596A1 (2)

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US6672111B2 (en) *	2001-12-21	2004-01-06	Corning Incorporated	Method and apparatus for adding metals to fused silica
JP5230051B2 (ja) *	2002-09-11	2013-07-10	株式会社トクヤマ	微小溶融シリカ粒子
WO2004048261A2 (en) *	2002-11-26	2004-06-10	Cabot Corporation	Fumed metal oxide particles and process for producing the same
DE10302914B4 (de)	2003-01-24	2005-12-29	Heraeus Quarzglas Gmbh & Co. Kg	Verfahren zur Herstellung von synthetischem Quarzglas
US8414970B2 (en)	2008-02-15	2013-04-09	Guardian Industries Corp.	Organosiloxane inclusive precursors having ring and/or cage-like structures for use in combustion deposition
US8729158B2 (en)	2008-09-05	2014-05-20	Cabot Corporation	Fumed silica of controlled aggregate size and processes for manufacturing the same
US8038971B2 (en)	2008-09-05	2011-10-18	Cabot Corporation	Fumed silica of controlled aggregate size and processes for manufacturing the same
GB2478307A (en)	2010-03-02	2011-09-07	Heraeus Quartz Uk Ltd	Manufacture of silica glass
DE102010052685A1 (de)	2010-11-26	2012-05-31	J-Fiber Gmbh	Verfahren zur Herstellung von strahlungsresistentem Quarzglasmaterial und danach hergestellte Quarzglaskörper
DE102011119374A1 (de)	2011-11-25	2013-05-29	Heraeus Quarzglas Gmbh & Co. Kg	Verfahren zur Herstellung von synthetischem Quarzglas
DE102011119373A1 (de)	2011-11-25	2013-05-29	Heraeus Quarzglas Gmbh & Co. Kg	Verfahren zur Herstellung von synthetischem Quarzglas
DE102011119341A1 (de) *	2011-11-25	2013-05-29	Heraeus Quarzglas Gmbh & Co. Kg	Verfahren zur Herstellung von synthetischem Quarzglas nach der Sootmethode
DE102011119339A1 (de)	2011-11-25	2013-05-29	Heraeus Quarzglas Gmbh & Co. Kg	Zerstäubungsverfahren zur Herstellung von synthetischem Quarzglas
DE102011121153B3 (de) *	2011-12-15	2013-03-21	Heraeus Quarzglas Gmbh & Co. Kg	Verfahren zur Herstellung von synthetischem Quarzglas sowie Quarzglas für den Einsatz als Mantelmaterial einer optischen Faser
DE102011121190A1 (de)	2011-12-16	2013-06-20	Heraeus Quarzglas Gmbh & Co. Kg	OMCTS-Verdampfungsverfahren
JP5906930B2 (ja) *	2012-05-07	2016-04-20	住友電気工業株式会社	ガラス管およびその製造方法
JP5906929B2 (ja) *	2012-05-07	2016-04-20	住友電気工業株式会社	ガラス管およびその製造方法、ガラス管を用いた流体分離材料
EP3059212A1 (de)	2015-02-18	2016-08-24	Heraeus Quarzglas GmbH & Co. KG	Verfahren und vorrichtung zur herstellung von quarzglas aus einer polymerisierbaren polyalkylsiloxanverbindung mit membranfilter als reinigungsvorrichtung
CN108698883A (zh)	2015-12-18	2018-10-23	贺利氏石英玻璃有限两合公司	石英玻璃制备中的二氧化硅的喷雾造粒
EP3390293B1 (de)	2015-12-18	2023-04-19	Heraeus Quarzglas GmbH & Co. KG	Erhöhen des siliziumgehalts bei der herstellung von quarzglas
TWI813534B (zh)	2015-12-18	2023-09-01	德商何瑞斯廓格拉斯公司	利用露點監測在熔融烘箱中製備石英玻璃體
CN108698880B (zh)	2015-12-18	2023-05-02	贺利氏石英玻璃有限两合公司	不透明石英玻璃体的制备
JP6981710B2 (ja)	2015-12-18	2021-12-17	ヘレウスクワルツグラスゲーエムベーハーウントコンパニーカーゲー	二酸化ケイ素造粒体からの石英ガラス体の調製
US10618833B2 (en)	2015-12-18	2020-04-14	Heraeus Quarzglas Gmbh & Co. Kg	Preparation of a synthetic quartz glass grain
JP6940235B2 (ja)	2015-12-18	2021-09-22	ヘレウスクワルツグラスゲーエムベーハーウントコンパニーカーゲー	高融点金属の溶融坩堝内での石英ガラス体の調製
TWI788278B (zh)	2015-12-18	2023-01-01	德商何瑞斯廓格拉斯公司	由均質石英玻璃製得之玻璃纖維及預成型品
TW201731782A (zh)	2015-12-18	2017-09-16	何瑞斯廓格拉斯公司	在多腔式爐中製備石英玻璃體
JP7044454B2 (ja)	2015-12-18	2022-03-30	ヘレウスクワルツグラスゲーエムベーハーウントコンパニーカーゲー	石英ガラス調製時の中間体としての炭素ドープ二酸化ケイ素造粒体の調製
EP3830044B1 (en) *	2018-08-02	2025-09-03	Corning Incorporated	Methods of capturing soot
KR102388688B1 (ko) *	2020-10-23	2022-04-20	비씨엔씨 주식회사	합성 쿼츠 제조 방법
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1989
- 1989-03-15 GB GB898905966A patent/GB8905966D0/en active Pending
1990
- 1990-03-14 ES ES90904872T patent/ES2092505T3/es not_active Expired - Lifetime
- 1990-03-14 CA CA002047187A patent/CA2047187C/en not_active Expired - Lifetime
- 1990-03-14 AT AT90904872T patent/ATE141901T1/de not_active IP Right Cessation
- 1990-03-14 DE DE69028300T patent/DE69028300T2/de not_active Expired - Lifetime
- 1990-03-14 DK DK90904872.0T patent/DK0463045T3/da active
- 1990-03-14 JP JP2504742A patent/JP2744695B2/ja not_active Expired - Lifetime
- 1990-03-14 KR KR1019910701084A patent/KR0130007B1/ko not_active Expired - Lifetime
- 1990-03-14 WO PCT/GB1990/000384 patent/WO1990010596A1/en not_active Ceased
- 1990-03-14 EP EP90904872A patent/EP0463045B1/en not_active Expired - Lifetime
1991
- 1991-08-07 GB GB9117060A patent/GB2245553B/en not_active Expired - Lifetime
- 1991-09-13 FI FI914317A patent/FI93822C/fi active

Also Published As

Publication number	Publication date
FI93822B (fi)	1995-02-28
GB2245553A (en)	1992-01-08
CA2047187A1 (en)	1990-09-16
ES2092505T3 (es)	1996-12-01
KR920701044A (ko)	1992-08-11
ATE141901T1 (de)	1996-09-15
GB2245553B (en)	1992-08-19
FI914317A0 (fi)	1991-09-13
AU638702B2 (en)	1993-07-08
GB9117060D0 (en)	1991-09-18
DE69028300T2 (de)	1997-03-06
DK0463045T3 (2)	1997-02-10
EP0463045A1 (en)	1992-01-02
JPH04505149A (ja)	1992-09-10
KR0130007B1 (ko)	1998-04-06
EP0463045B1 (en)	1996-08-28
JP2744695B2 (ja)	1998-04-28
DE69028300D1 (de)	1996-10-02
GB8905966D0 (en)	1989-04-26
WO1990010596A1 (en)	1990-09-20
CA2047187C (en)	1999-05-25
AU5286490A (en)	1990-10-09

Legal Events

Date	Code	Title	Description
1995-02-01	BB	Publication of examined application

Publication	Publication Date	Title
FI93822B (fi)	1995-02-28	Parannetut lasimaiset piidioksidituotteet
AU647955B2 (en)	1994-03-31	Method of making titania-doped fused silica
AU655832B2 (en)	1995-01-12	Method of making fused silica
CA2037102C (en)	1997-10-21	Method of making fused silica
JP6058693B2 (ja)	2017-01-11	合成石英ガラスを製造する方法及び光ファイバーのクラッド材としての石英ガラス
US5703191A (en)	1997-12-30	Method for purifying polyalkylsiloxanes and the resulting products
KR100473827B1 (ko)	2005-07-18	액체반응물의연소에의해용융실리카를제조하는방법및장치
US5879649A (en)	1999-03-09	Method for purifying polyalkylsiloxanes and the resulting products
CN1211264A (zh)	1999-03-17	制造锗掺杂的二氧化硅用的原料及制造方法
EP0146659A1 (en)	1985-07-03	A method for the preparation of synthetic quartz glass suitable as a material of optical fibers
CA1265711A (en)	1990-02-13	Method for producing glass preform for optical fiber
US4388095A (en)	1983-06-14	Method of producing a glass layer on an interior surface of a hollow body
US5238479A (en)	1993-08-24	Method for producing porous glass preform for optical fiber
EP0135126B1 (en)	1987-11-04	Preparation of glass for optical fibers
AU638702C (en)	1997-11-06	Vitreous silica products
JPS6289B2 (2)	1987-01-06
FI91146C (fi)	1994-05-25	Menetelmä huokoisen lasiesimuodon valmistamiseksi optisia kuituja varten
JPH0459253B2 (2)	1992-09-21
JPH0729806B2 (ja)	1995-04-05	光ファイバー母材の製造方法
JPH0561210B2 (2)	1993-09-03