FR2583780B1 - Procede de revetement de substrats dans une chambre a vide - Google Patents

Procede de revetement de substrats dans une chambre a vide

Info

Publication number
FR2583780B1
FR2583780B1 FR868608855A FR8608855A FR2583780B1 FR 2583780 B1 FR2583780 B1 FR 2583780B1 FR 868608855 A FR868608855 A FR 868608855A FR 8608855 A FR8608855 A FR 8608855A FR 2583780 B1 FR2583780 B1 FR 2583780B1
Authority
FR
France
Prior art keywords
vacuum chamber
coating substrates
substrates
coating
vacuum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
FR868608855A
Other languages
English (en)
Other versions
FR2583780A1 (fr
Inventor
Erich Bergmann
Elmar Hummer
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
OC Oerlikon Balzers AG
Original Assignee
Balzers AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Balzers AG filed Critical Balzers AG
Publication of FR2583780A1 publication Critical patent/FR2583780A1/fr
Application granted granted Critical
Publication of FR2583780B1 publication Critical patent/FR2583780B1/fr
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/503—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using DC or AC discharges

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Vapour Deposition (AREA)
FR868608855A 1985-06-20 1986-06-19 Procede de revetement de substrats dans une chambre a vide Expired - Lifetime FR2583780B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH2610/85A CH664768A5 (de) 1985-06-20 1985-06-20 Verfahren zur beschichtung von substraten in einer vakuumkammer.

Publications (2)

Publication Number Publication Date
FR2583780A1 FR2583780A1 (fr) 1986-12-26
FR2583780B1 true FR2583780B1 (fr) 1991-08-23

Family

ID=4237637

Family Applications (1)

Application Number Title Priority Date Filing Date
FR868608855A Expired - Lifetime FR2583780B1 (fr) 1985-06-20 1986-06-19 Procede de revetement de substrats dans une chambre a vide

Country Status (9)

Country Link
US (1) US4749587A (fr)
JP (1) JPH0791654B2 (fr)
CH (1) CH664768A5 (fr)
DE (1) DE3614384A1 (fr)
ES (1) ES8707311A1 (fr)
FR (1) FR2583780B1 (fr)
GB (1) GB2176808B (fr)
IT (1) IT1189560B (fr)
SE (1) SE463461B (fr)

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GB2162207B (en) * 1984-07-26 1989-05-10 Japan Res Dev Corp Semiconductor crystal growth apparatus
FR2604188B1 (fr) * 1986-09-18 1992-11-27 Framatome Sa Element tubulaire en acier inoxydable presentant une resistance a l'usure amelioree
JPS6395200A (ja) * 1986-10-09 1988-04-26 Sumitomo Electric Ind Ltd 硬質窒化ホウ素膜の製造方法
EP0286306B1 (fr) * 1987-04-03 1993-10-06 Fujitsu Limited Méthode et appareil de déposition en phase gazeuse de diamant
JPH089519B2 (ja) * 1987-05-11 1996-01-31 富士通株式会社 高圧相窒化ホウ素の気相合成法
US4854263B1 (en) * 1987-08-14 1997-06-17 Applied Materials Inc Inlet manifold and methods for increasing gas dissociation and for PECVD of dielectric films
JP2657810B2 (ja) * 1988-01-11 1997-09-30 フラマトメ 改良された耐摩耗性を有するステンレス鋼製管状要素
GB2215739A (en) * 1988-03-26 1989-09-27 Univ Hull Ionisation assisted chemical vapour deposition
JPH0244738A (ja) * 1988-08-05 1990-02-14 Semiconductor Energy Lab Co Ltd 電子装置作製方法
US4992153A (en) * 1989-04-26 1991-02-12 Balzers Aktiengesellschaft Sputter-CVD process for at least partially coating a workpiece
US5061513A (en) * 1990-03-30 1991-10-29 Flynn Paul L Process for depositing hard coating in a nozzle orifice
US5360479A (en) * 1990-07-02 1994-11-01 General Electric Company Isotopically pure single crystal epitaxial diamond films and their preparation
DE4029270C1 (fr) * 1990-09-14 1992-04-09 Balzers Ag, Balzers, Li
DE4029268C2 (de) * 1990-09-14 1995-07-06 Balzers Hochvakuum Verfahren zur gleichspannungs-bogenentladungs-unterstützten, reaktiven Behandlung von Gut und Vakuumbehandlungsanlage zur Durchführung
CA2065581C (fr) 1991-04-22 2002-03-12 Andal Corp. Methode de deposition physique en phase vapeur activee par plasma, et appareil connexe
JPH04326725A (ja) * 1991-04-26 1992-11-16 Tokyo Electron Ltd プラズマ装置
CA2077773A1 (fr) * 1991-10-25 1993-04-26 Thomas R. Anthony Procede de deposition chimique en phase vapeur assistee par chauffage a micro-ondes, hf, ca ou cc
US5175929A (en) * 1992-03-04 1993-01-05 General Electric Company Method for producing articles by chemical vapor deposition
GB2267733A (en) * 1992-05-13 1993-12-15 Gen Electric Abrasion protective and thermal dissipative coating for jet engine component leading edges.
CH687111A5 (de) * 1992-05-26 1996-09-13 Balzers Hochvakuum Verfahren zum Erzeugen einer Niederspannungsentladung, Vakuumbehandlungsanlage hierfuer sowie Anwendung des Verfahrens.
ES2060539B1 (es) * 1993-01-22 1995-06-16 Tekniker Proceso para la obtencion de recubrimientos de carbono y carbono-metal mediante deposicion fisica en fase vapor por arco metalico con catodo de grafito.
DE19526387C2 (de) * 1994-07-19 1998-12-10 Sumitomo Metal Mining Co Doppelt beschichteter Stahlverbundgegenstand und Verfahren zu dessen Herstellung
EP0724026B1 (fr) * 1995-01-25 1999-10-13 Balzers Aktiengesellschaft Procédé de dépÔt réactif
US5753045A (en) * 1995-01-25 1998-05-19 Balzers Aktiengesellschaft Vacuum treatment system for homogeneous workpiece processing
CH690857A5 (de) * 1995-07-04 2001-02-15 Erich Bergmann Anlage zur plasmaunterstützten physikalischen Hochvakuumbedampfung von Werkstücken mit verschleissfesten Schichten und Verfahren zur Durchführung in dieser Anlage
DE19621855C2 (de) * 1996-05-31 2003-03-27 Univ Dresden Tech Verfahren zur Herstellung von Metallisierungen auf Halbleiterkörpern unter Verwendung eines gepulsten Vakuumbogenverdampfers
CH691717A5 (de) * 1997-03-08 2001-09-14 Comet Technik Ag Kondensator mit kaltfliessgepressten Elektroden.
EP0988407B9 (fr) * 1997-06-13 2004-12-15 Unaxis Trading AG Procede de fabrication de pieces enduites d'une couche de qualite pour epitaxie
US6110544A (en) * 1997-06-26 2000-08-29 General Electric Company Protective coating by high rate arc plasma deposition
AU9410498A (en) 1997-11-26 1999-06-17 Vapor Technologies, Inc. Apparatus for sputtering or arc evaporation
US5997705A (en) * 1999-04-14 1999-12-07 Vapor Technologies, Inc. Rectangular filtered arc plasma source
CH694699A5 (de) * 1999-04-29 2005-06-15 Balzers Hochvakuum Verfahren zur Herstellung von Silizium.
JP4806146B2 (ja) * 1999-07-13 2011-11-02 エリコン・トレーディング・アクチェンゲゼルシャフト，トリュープバッハ 真空処理ないしは粉末製造のための装置および方法
DE10018143C5 (de) * 2000-04-12 2012-09-06 Oerlikon Trading Ag, Trübbach DLC-Schichtsystem sowie Verfahren und Vorrichtung zur Herstellung eines derartigen Schichtsystems
US20020160620A1 (en) * 2001-02-26 2002-10-31 Rudolf Wagner Method for producing coated workpieces, uses and installation for the method
US7465210B2 (en) * 2004-02-25 2008-12-16 The Regents Of The University Of California Method of fabricating carbide and nitride nano electron emitters
US7498587B2 (en) * 2006-05-01 2009-03-03 Vapor Technologies, Inc. Bi-directional filtered arc plasma source
BRPI0811241B1 (pt) * 2007-05-25 2019-06-25 Oerlikon Trading Ag, Trübbach Instalação e método de tratamento a vácuo
CN111647879A (zh) * 2020-04-20 2020-09-11 中国科学技术大学 一种化学气相沉积装置与方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US679926A (en) * 1900-07-30 1901-08-06 Theron Clark Crawford Manufacture of filaments for incandescing electric lamps.
US3573098A (en) * 1968-05-09 1971-03-30 Boeing Co Ion beam deposition unit
US3625848A (en) * 1968-12-26 1971-12-07 Alvin A Snaper Arc deposition process and apparatus
CH624817B (de) * 1979-09-04 Balzers Hochvakuum Verfahren zur herstellung goldfarbener ueberzuege.
SU1040631A1 (ru) * 1980-06-25 1983-09-07 Предприятие П/Я В-8851 Вакуумно-дуговое устройство
JPS57188670A (en) * 1981-05-13 1982-11-19 Hitachi Ltd Treatment of electrically conductive member
JPS57201527A (en) * 1981-06-01 1982-12-10 Toshiba Corp Ion implantation method
US4443488A (en) * 1981-10-19 1984-04-17 Spire Corporation Plasma ion deposition process
US4512867A (en) * 1981-11-24 1985-04-23 Andreev Anatoly A Method and apparatus for controlling plasma generation in vapor deposition
IN160089B (fr) * 1982-07-14 1987-06-27 Standard Oil Co Ohio
US4540596A (en) * 1983-05-06 1985-09-10 Smith International, Inc. Method of producing thin, hard coating
US4559121A (en) * 1983-09-12 1985-12-17 Vac-Tec Systems, Inc. Method and apparatus for evaporation arc stabilization for permeable targets
US4622452A (en) * 1983-07-21 1986-11-11 Multi-Arc Vacuum Systems, Inc. Electric arc vapor deposition electrode apparatus

Also Published As

Publication number Publication date
IT8620793A1 (it) 1987-12-16
IT1189560B (it) 1988-02-04
SE8602715D0 (sv) 1986-06-18
ES554902A0 (es) 1987-07-16
GB2176808B (en) 1990-03-21
FR2583780A1 (fr) 1986-12-26
IT8620793A0 (it) 1986-06-16
CH664768A5 (de) 1988-03-31
US4749587A (en) 1988-06-07
SE8602715L (fr) 1986-12-21
SE463461B (sv) 1990-11-26
DE3614384A1 (de) 1987-01-02
GB2176808A (en) 1987-01-07
ES8707311A1 (es) 1987-07-16
GB8615066D0 (en) 1986-07-23
JPH0791654B2 (ja) 1995-10-04
JPS61295377A (ja) 1986-12-26

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