FR2819632B1 - Circuit integre comportant un dispositif analogique de stockage de charges, et procede de fabrication - Google Patents

Circuit integre comportant un dispositif analogique de stockage de charges, et procede de fabrication

Info

Publication number
FR2819632B1
FR2819632B1 FR0100419A FR0100419A FR2819632B1 FR 2819632 B1 FR2819632 B1 FR 2819632B1 FR 0100419 A FR0100419 A FR 0100419A FR 0100419 A FR0100419 A FR 0100419A FR 2819632 B1 FR2819632 B1 FR 2819632B1
Authority
FR
France
Prior art keywords
manufacturing
storage device
integrated circuit
charge storage
analogue charge
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR0100419A
Other languages
English (en)
Other versions
FR2819632A1 (fr
Inventor
Olivier Menut
Yvon Gris
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
STMicroelectronics SA
Original Assignee
STMicroelectronics SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by STMicroelectronics SA filed Critical STMicroelectronics SA
Priority to FR0100419A priority Critical patent/FR2819632B1/fr
Priority to US10/466,145 priority patent/US7115933B2/en
Priority to EP02710090A priority patent/EP1350267A1/fr
Priority to PCT/FR2002/000054 priority patent/WO2002056370A1/fr
Publication of FR2819632A1 publication Critical patent/FR2819632A1/fr
Application granted granted Critical
Publication of FR2819632B1 publication Critical patent/FR2819632B1/fr
Priority to US11/533,939 priority patent/US7470585B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/80—FETs having rectifying junction gate electrodes
    • H10D30/83—FETs having PN junction gate electrodes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10B—ELECTRONIC MEMORY DEVICES
    • H10B12/00—Dynamic random access memory [DRAM] devices
    • H10B12/01—Manufacture or treatment
    • H10B12/02—Manufacture or treatment for one transistor one-capacitor [1T-1C] memory cells
    • H10B12/03—Making the capacitor or connections thereto
    • H10B12/038—Making the capacitor or connections thereto the capacitor being in a trench in the substrate
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10B—ELECTRONIC MEMORY DEVICES
    • H10B12/00—Dynamic random access memory [DRAM] devices
    • H10B12/01—Manufacture or treatment
    • H10B12/02—Manufacture or treatment for one transistor one-capacitor [1T-1C] memory cells
    • H10B12/05—Making the transistor
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10B—ELECTRONIC MEMORY DEVICES
    • H10B12/00—Dynamic random access memory [DRAM] devices
    • H10B12/30—DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells
    • H10B12/37—DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells the capacitor being at least partially in a trench in the substrate
    • H10B12/373—DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells the capacitor being at least partially in a trench in the substrate the capacitor extending under or around the transistor
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/011—Manufacture or treatment of image sensors covered by group H10F39/12

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Semiconductor Memories (AREA)
  • Semiconductor Integrated Circuits (AREA)
FR0100419A 2001-01-12 2001-01-12 Circuit integre comportant un dispositif analogique de stockage de charges, et procede de fabrication Expired - Fee Related FR2819632B1 (fr)

Priority Applications (5)

Application Number Priority Date Filing Date Title
FR0100419A FR2819632B1 (fr) 2001-01-12 2001-01-12 Circuit integre comportant un dispositif analogique de stockage de charges, et procede de fabrication
US10/466,145 US7115933B2 (en) 2001-01-12 2002-01-09 Integrated circuit and fabrication process
EP02710090A EP1350267A1 (fr) 2001-01-12 2002-01-09 Circuit integre et procede de fabrication
PCT/FR2002/000054 WO2002056370A1 (fr) 2001-01-12 2002-01-09 Circuit integre et procede de fabrication
US11/533,939 US7470585B2 (en) 2001-01-12 2006-09-21 Integrated circuit and fabrication process

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR0100419A FR2819632B1 (fr) 2001-01-12 2001-01-12 Circuit integre comportant un dispositif analogique de stockage de charges, et procede de fabrication

Publications (2)

Publication Number Publication Date
FR2819632A1 FR2819632A1 (fr) 2002-07-19
FR2819632B1 true FR2819632B1 (fr) 2003-09-26

Family

ID=8858769

Family Applications (1)

Application Number Title Priority Date Filing Date
FR0100419A Expired - Fee Related FR2819632B1 (fr) 2001-01-12 2001-01-12 Circuit integre comportant un dispositif analogique de stockage de charges, et procede de fabrication

Country Status (4)

Country Link
US (2) US7115933B2 (fr)
EP (1) EP1350267A1 (fr)
FR (1) FR2819632B1 (fr)
WO (1) WO2002056370A1 (fr)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6888214B2 (en) * 2002-11-12 2005-05-03 Micron Technology, Inc. Isolation techniques for reducing dark current in CMOS image sensors
FR2889356A1 (fr) * 2005-07-26 2007-02-02 St Microelectronics Crolles 2 Cellule memoire a un transistor a corps isole a sensibilite de lecture amelioree
US7414460B1 (en) 2006-03-31 2008-08-19 Integrated Device Technology, Inc. System and method for integrated circuit charge recycling
US7729149B2 (en) * 2007-05-01 2010-06-01 Suvolta, Inc. Content addressable memory cell including a junction field effect transistor
US20080273409A1 (en) * 2007-05-01 2008-11-06 Thummalapally Damodar R Junction field effect dynamic random access memory cell and applications therefor
US7633784B2 (en) * 2007-05-17 2009-12-15 Dsm Solutions, Inc. Junction field effect dynamic random access memory cell and content addressable memory cell
US9059030B2 (en) * 2011-10-07 2015-06-16 Micron Technology, Inc. Memory cells having capacitor dielectric directly against a transistor source/drain region
FR3085540B1 (fr) 2018-08-31 2020-09-25 St Microelectronics Rousset Dispositif integre de mesure temporelle a constante de temps ultra longue et procede de fabrication
FR3099964B1 (fr) * 2019-08-14 2024-03-29 St Microelectronics Crolles 2 Sas Procédé de réalisation d’une électrode dans un substrat de base et dispositif électronique

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60152058A (ja) * 1984-01-20 1985-08-10 Toshiba Corp 半導体記憶装置
US4649625A (en) * 1985-10-21 1987-03-17 International Business Machines Corporation Dynamic memory device having a single-crystal transistor on a trench capacitor structure and a fabrication method therefor
US4728623A (en) * 1986-10-03 1988-03-01 International Business Machines Corporation Fabrication method for forming a self-aligned contact window and connection in an epitaxial layer and device structures employing the method
US5307169A (en) * 1991-05-07 1994-04-26 Olympus Optical Co., Ltd. Solid-state imaging device using high relative dielectric constant material as insulating film
US5998821A (en) * 1997-05-21 1999-12-07 Kabushiki Kaisha Toshiba Dynamic ram structure having a trench capacitor
US5843820A (en) * 1997-09-29 1998-12-01 Vanguard International Semiconductor Corporation Method of fabricating a new dynamic random access memory (DRAM) cell having a buried horizontal trench capacitor
US6383864B2 (en) * 1997-09-30 2002-05-07 Siemens Aktiengesellschaft Memory cell for dynamic random access memory (DRAM)
US5981332A (en) * 1997-09-30 1999-11-09 Siemens Aktiengesellschaft Reduced parasitic leakage in semiconductor devices
US6600199B2 (en) * 2000-12-29 2003-07-29 International Business Machines Corporation Deep trench-buried layer array and integrated device structures for noise isolation and latch up immunity
FR2819631B1 (fr) * 2001-01-12 2003-04-04 St Microelectronics Sa Procede de fabrication d'un substrat monocristallin, et circuit integre comportant un tel substrat
FR2819636B1 (fr) * 2001-01-12 2003-09-26 St Microelectronics Sa Circuit integre comportant un point memoire de type dram, et procede de fabrication

Also Published As

Publication number Publication date
US20040113193A1 (en) 2004-06-17
US20070015326A1 (en) 2007-01-18
US7115933B2 (en) 2006-10-03
EP1350267A1 (fr) 2003-10-08
WO2002056370A8 (fr) 2002-08-08
WO2002056370A1 (fr) 2002-07-18
US7470585B2 (en) 2008-12-30
FR2819632A1 (fr) 2002-07-19

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Legal Events

Date Code Title Description
ST Notification of lapse