FR2869324A1 - Procede de depot sous vide - Google Patents
Procede de depot sous videInfo
- Publication number
- FR2869324A1 FR2869324A1 FR0404204A FR0404204A FR2869324A1 FR 2869324 A1 FR2869324 A1 FR 2869324A1 FR 0404204 A FR0404204 A FR 0404204A FR 0404204 A FR0404204 A FR 0404204A FR 2869324 A1 FR2869324 A1 FR 2869324A1
- Authority
- FR
- France
- Prior art keywords
- sprayed
- target
- species
- vacuum deposition
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3618—Coatings of type glass/inorganic compound/other inorganic layers, at least one layer being metallic
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/001—General methods for coating; Devices therefor
- C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3626—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer one layer at least containing a nitride, oxynitride, boronitride or carbonitride
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3644—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the metal being silver
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3652—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the coating stack containing at least one sacrificial layer to protect the metal from oxidation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
- C23C14/0047—Activation or excitation of reactive gases outside the coating chamber
- C23C14/0052—Bombardment of substrates by reactive ion beams
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/46—Sputtering by ion beam produced by an external ion source
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/73—Anti-reflective coatings with specific characteristics
- C03C2217/734—Anti-reflective coatings with specific characteristics comprising an alternation of high and low refractive indexes
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Physical Vapour Deposition (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
Procédé de dépôt sous vide d'au moins une couche mince sur une portion de surface d'un substrat, caractérisé en ce que :- on choisit au moins une espèce de pulvérisation chimiquement inactive ou active à l'égard d'un matériau à pulvériser,- on génère, à l'aide d'au moins une source ionique linéaire positionnée au sein d'une installation ayant une taille industrielle, un faisceau collimaté d'ions comprenant majoritairement ladite espèce de pulvérisation,- on dirige ledit faisceau vers au moins une cible à base du matériau à pulvériser,- on positionne au moins une portion de surface dudit substrat en regard de ladite cible de telle sorte que ledit matériau pulvérisé par le bombardement ionique de la cible ou un matériau résultant de la réaction dudit matériau pulvérisé avec au moins une des espèces de pulvérisation se dépose sur ladite portion de surface.
Priority Applications (9)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR0404204A FR2869324B1 (fr) | 2004-04-21 | 2004-04-21 | Procede de depot sous vide |
| CNA2005800125256A CN1950540A (zh) | 2004-04-21 | 2005-04-15 | 真空沉积方法 |
| US11/578,938 US20090226735A1 (en) | 2004-04-21 | 2005-04-15 | Vacuum deposition method |
| JP2007508949A JP2007533856A (ja) | 2004-04-21 | 2005-04-15 | 真空蒸着方法 |
| PCT/FR2005/050250 WO2005106070A2 (fr) | 2004-04-21 | 2005-04-15 | Procede de depot sous vide |
| RU2006141003/02A RU2006141003A (ru) | 2004-04-21 | 2005-04-15 | Способ вакуумного напыления |
| KR1020067021550A KR20070004042A (ko) | 2004-04-21 | 2005-04-15 | 진공 증착 방법 |
| EP05746900A EP1743048A2 (fr) | 2004-04-21 | 2005-04-15 | Procede de depot sous vide |
| ARP050101584A AR049884A1 (es) | 2004-04-21 | 2005-04-21 | Procedimiento de deposito al vacio y el sustrato obtenido |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR0404204A FR2869324B1 (fr) | 2004-04-21 | 2004-04-21 | Procede de depot sous vide |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR2869324A1 true FR2869324A1 (fr) | 2005-10-28 |
| FR2869324B1 FR2869324B1 (fr) | 2007-08-10 |
Family
ID=34944951
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR0404204A Expired - Fee Related FR2869324B1 (fr) | 2004-04-21 | 2004-04-21 | Procede de depot sous vide |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US20090226735A1 (fr) |
| EP (1) | EP1743048A2 (fr) |
| JP (1) | JP2007533856A (fr) |
| KR (1) | KR20070004042A (fr) |
| CN (1) | CN1950540A (fr) |
| AR (1) | AR049884A1 (fr) |
| FR (1) | FR2869324B1 (fr) |
| RU (1) | RU2006141003A (fr) |
| WO (1) | WO2005106070A2 (fr) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2950878B1 (fr) | 2009-10-01 | 2011-10-21 | Saint Gobain | Procede de depot de couche mince |
| JP2011100111A (ja) * | 2009-10-09 | 2011-05-19 | Seiko Epson Corp | 光学物品、光学物品の製造方法、電子機器 |
| US8758580B2 (en) * | 2010-08-23 | 2014-06-24 | Vaeco Inc. | Deposition system with a rotating drum |
| US9365450B2 (en) * | 2012-12-27 | 2016-06-14 | Intermolecular, Inc. | Base-layer consisting of two materials layer with extreme high/low index in low-e coating to improve the neutral color and transmittance performance |
| US20150364626A1 (en) * | 2014-06-11 | 2015-12-17 | Electronics And Telecommunications Research Institute | Transparent electrode and solar cell including the same |
| CA3086497A1 (fr) | 2017-12-22 | 2019-06-27 | Institute Of Geological And Nuclear Sciences Limited | Procede et appareil de pulverisation par faisceau d'ions |
| US10544499B1 (en) * | 2018-08-13 | 2020-01-28 | Valeo North America, Inc. | Reflector for vehicle lighting |
| CN112745038B (zh) * | 2019-10-30 | 2022-12-06 | 传奇视界有限公司 | 电控变色玻璃制备方法 |
| FR3133057B1 (fr) * | 2022-02-25 | 2024-05-24 | Saint Gobain | Matériau comprenant un revêtement contrôle solaire |
Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4250009A (en) * | 1979-05-18 | 1981-02-10 | International Business Machines Corporation | Energetic particle beam deposition system |
| EP0357824A1 (fr) * | 1988-09-08 | 1990-03-14 | Joshin Uramoto | Méthode de pulvérisation par flux de plasma en ruban et appareil pour la mise en oeuvre de cette méthode |
| US4933065A (en) * | 1988-10-08 | 1990-06-12 | Leybold Aktiengesellschaft | Apparatus for applying dielectric or metallic materials |
| DE3904991A1 (de) * | 1989-02-18 | 1990-08-23 | Leybold Ag | Kathodenzerstaeubungsvorrichtung |
| EP0636587A2 (fr) * | 1993-07-22 | 1995-02-01 | Saint Gobain Vitrage International | Procédé de fabrication d'un vitrage revêtu à couches multiples |
| US5607781A (en) * | 1989-07-27 | 1997-03-04 | Kabushiki Kaisha Toshiba | Oxide film with preferred crystal orientation, method of manufacturing the same, and magneto-optical recording medium |
| US6214183B1 (en) * | 1999-01-30 | 2001-04-10 | Advanced Ion Technology, Inc. | Combined ion-source and target-sputtering magnetron and a method for sputtering conductive and nonconductive materials |
| US6416880B1 (en) * | 1993-12-09 | 2002-07-09 | Seagate Technology, Llc | Amorphous permalloy films and method of preparing the same |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| AU616736B2 (en) * | 1988-03-03 | 1991-11-07 | Asahi Glass Company Limited | Amorphous oxide film and article having such film thereon |
| JPH0626877B2 (ja) * | 1988-06-14 | 1994-04-13 | 旭硝子株式会社 | 熱線遮断ガラス |
| JPH08127869A (ja) * | 1994-10-27 | 1996-05-21 | Japan Aviation Electron Ind Ltd | イオンビームスパッタリング装置 |
| EP1155816B1 (fr) * | 1998-12-28 | 2007-02-14 | Asahi Glass Company Ltd. | Produit en couches |
| JP4370650B2 (ja) * | 1998-12-28 | 2009-11-25 | 旭硝子株式会社 | 積層体およびその製造方法 |
-
2004
- 2004-04-21 FR FR0404204A patent/FR2869324B1/fr not_active Expired - Fee Related
-
2005
- 2005-04-15 JP JP2007508949A patent/JP2007533856A/ja active Pending
- 2005-04-15 US US11/578,938 patent/US20090226735A1/en not_active Abandoned
- 2005-04-15 EP EP05746900A patent/EP1743048A2/fr not_active Withdrawn
- 2005-04-15 RU RU2006141003/02A patent/RU2006141003A/ru not_active Application Discontinuation
- 2005-04-15 CN CNA2005800125256A patent/CN1950540A/zh active Pending
- 2005-04-15 KR KR1020067021550A patent/KR20070004042A/ko not_active Withdrawn
- 2005-04-15 WO PCT/FR2005/050250 patent/WO2005106070A2/fr not_active Ceased
- 2005-04-21 AR ARP050101584A patent/AR049884A1/es unknown
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4250009A (en) * | 1979-05-18 | 1981-02-10 | International Business Machines Corporation | Energetic particle beam deposition system |
| EP0357824A1 (fr) * | 1988-09-08 | 1990-03-14 | Joshin Uramoto | Méthode de pulvérisation par flux de plasma en ruban et appareil pour la mise en oeuvre de cette méthode |
| US4933065A (en) * | 1988-10-08 | 1990-06-12 | Leybold Aktiengesellschaft | Apparatus for applying dielectric or metallic materials |
| DE3904991A1 (de) * | 1989-02-18 | 1990-08-23 | Leybold Ag | Kathodenzerstaeubungsvorrichtung |
| US5607781A (en) * | 1989-07-27 | 1997-03-04 | Kabushiki Kaisha Toshiba | Oxide film with preferred crystal orientation, method of manufacturing the same, and magneto-optical recording medium |
| EP0636587A2 (fr) * | 1993-07-22 | 1995-02-01 | Saint Gobain Vitrage International | Procédé de fabrication d'un vitrage revêtu à couches multiples |
| US6416880B1 (en) * | 1993-12-09 | 2002-07-09 | Seagate Technology, Llc | Amorphous permalloy films and method of preparing the same |
| US6214183B1 (en) * | 1999-01-30 | 2001-04-10 | Advanced Ion Technology, Inc. | Combined ion-source and target-sputtering magnetron and a method for sputtering conductive and nonconductive materials |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2005106070A2 (fr) | 2005-11-10 |
| FR2869324B1 (fr) | 2007-08-10 |
| JP2007533856A (ja) | 2007-11-22 |
| RU2006141003A (ru) | 2008-05-27 |
| AR049884A1 (es) | 2006-09-13 |
| CN1950540A (zh) | 2007-04-18 |
| WO2005106070A3 (fr) | 2005-12-29 |
| KR20070004042A (ko) | 2007-01-05 |
| US20090226735A1 (en) | 2009-09-10 |
| EP1743048A2 (fr) | 2007-01-17 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PLFP | Fee payment |
Year of fee payment: 13 |
|
| ST | Notification of lapse |
Effective date: 20171229 |