FR2909194B1 - Substrat formant reseau pour un dispositif d'affichage a cristaux liquides et son procede de fabrication. - Google Patents
Substrat formant reseau pour un dispositif d'affichage a cristaux liquides et son procede de fabrication.Info
- Publication number
- FR2909194B1 FR2909194B1 FR0704697A FR0704697A FR2909194B1 FR 2909194 B1 FR2909194 B1 FR 2909194B1 FR 0704697 A FR0704697 A FR 0704697A FR 0704697 A FR0704697 A FR 0704697A FR 2909194 B1 FR2909194 B1 FR 2909194B1
- Authority
- FR
- France
- Prior art keywords
- electrode
- gate
- liquid crystal
- display device
- crystal display
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/133345—Insulating layers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
- H10D86/01—Manufacture or treatment
- H10D86/021—Manufacture or treatment of multiple TFTs
- H10D86/0231—Manufacture or treatment of multiple TFTs using masks, e.g. half-tone masks
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1343—Electrodes
- G02F1/134309—Electrodes characterised by their geometrical arrangement
- G02F1/134363—Electrodes characterised by their geometrical arrangement for applying an electric field parallel to the substrate, i.e. in-plane switching [IPS]
-
- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09G—ARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
- G09G3/00—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes
- G09G3/20—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters
- G09G3/34—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters by control of light from an independent source
- G09G3/36—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters by control of light from an independent source using liquid crystals
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
- H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
- H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
- H10D86/60—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs wherein the TFTs are in active matrices
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136231—Active matrix addressed cells for reducing the number of lithographic steps
Landscapes
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Mathematical Physics (AREA)
- Optics & Photonics (AREA)
- Geometry (AREA)
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Theoretical Computer Science (AREA)
- Liquid Crystal (AREA)
- Thin Film Transistor (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR20060118593 | 2006-11-28 | ||
| KR1020070039312A KR100920482B1 (ko) | 2006-11-28 | 2007-04-23 | 액정표시장치용 어레이 기판과 그 제조방법 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR2909194A1 FR2909194A1 (fr) | 2008-05-30 |
| FR2909194B1 true FR2909194B1 (fr) | 2013-12-27 |
Family
ID=38352878
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR0704697A Expired - Fee Related FR2909194B1 (fr) | 2006-11-28 | 2007-06-29 | Substrat formant reseau pour un dispositif d'affichage a cristaux liquides et son procede de fabrication. |
Country Status (4)
| Country | Link |
|---|---|
| US (2) | US8031312B2 (fr) |
| JP (1) | JP4885805B2 (fr) |
| FR (1) | FR2909194B1 (fr) |
| GB (2) | GB2444347A (fr) |
Families Citing this family (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW413844B (en) * | 1998-11-26 | 2000-12-01 | Samsung Electronics Co Ltd | Manufacturing methods of thin film transistor array panels for liquid crystal displays and photolithography method of thin films |
| KR100978266B1 (ko) * | 2006-12-29 | 2010-08-26 | 엘지디스플레이 주식회사 | 액정표시장치 및 그 제조방법 |
| US7988871B2 (en) * | 2007-07-20 | 2011-08-02 | Lg Display Co., Ltd. | Method of lifting off and fabricating array substrate for liquid crystal display device using the same |
| KR20090027920A (ko) * | 2007-09-13 | 2009-03-18 | 삼성전자주식회사 | 표시 기판 및 이를 구비한 표시 패널 |
| CN101630640B (zh) * | 2008-07-18 | 2012-09-26 | 北京京东方光电科技有限公司 | 光刻胶毛刺边缘形成方法和tft-lcd阵列基板制造方法 |
| TWI373680B (en) * | 2008-10-06 | 2012-10-01 | Au Optronics Corp | Fabricating method of pixel structure |
| JP5615018B2 (ja) * | 2009-04-10 | 2014-10-29 | 株式会社半導体エネルギー研究所 | 半導体装置および半導体装置の作製方法 |
| US8405810B2 (en) * | 2009-07-23 | 2013-03-26 | Lg Display Co., Ltd. | Liquid crystal display and fabricating method thereof |
| KR20110062170A (ko) * | 2009-12-02 | 2011-06-10 | 엘지디스플레이 주식회사 | 액정표시장치 |
| KR102598388B1 (ko) | 2010-02-26 | 2023-11-03 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 액정 표시 장치 |
| JP2012226160A (ja) * | 2011-04-20 | 2012-11-15 | Japan Display West Co Ltd | 表示パネルおよび表示装置 |
| JP2012242678A (ja) * | 2011-05-20 | 2012-12-10 | Japan Display West Co Ltd | 液晶装置および電子機器 |
| CN104335113A (zh) * | 2012-05-26 | 2015-02-04 | 希百特股份有限公司 | 用于mofet的掩膜层级减少 |
| KR101493128B1 (ko) * | 2012-09-27 | 2015-02-23 | 엘지디스플레이 주식회사 | 액정표시패널 및 그 제조방법 |
| CN102929060B (zh) * | 2012-11-16 | 2015-06-17 | 京东方科技集团股份有限公司 | 阵列基板及其制作方法、显示装置 |
| CN104485334B (zh) * | 2014-12-16 | 2018-02-13 | 京东方科技集团股份有限公司 | 阵列基板及其制作方法、显示装置 |
| KR102460937B1 (ko) * | 2015-12-31 | 2022-10-31 | 엘지디스플레이 주식회사 | 액티브층, 이를 포함하는 박막트랜지스터 어레이 기판 및 표시장치 |
| JP2019101382A (ja) * | 2017-12-08 | 2019-06-24 | シャープ株式会社 | 液晶表示装置 |
| JP6934435B2 (ja) * | 2018-02-26 | 2021-09-15 | 株式会社Screenホールディングス | センタリング装置、センタリング方法、基板処理装置、および基板処理方法 |
| US20200166791A1 (en) * | 2018-11-23 | 2020-05-28 | Innolux Corporation | Panel and method for manufacturing the same |
| CN111524903B (zh) * | 2020-04-23 | 2023-03-28 | 深圳市华星光电半导体显示技术有限公司 | Goa阵列基板及制备方法 |
Family Cites Families (34)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH08248427A (ja) * | 1995-03-13 | 1996-09-27 | Semiconductor Energy Lab Co Ltd | 液晶表示装置 |
| JP3632934B2 (ja) * | 1995-10-04 | 2005-03-30 | 株式会社 日立ディスプレイズ | アクティブマトリクス型液晶表示装置 |
| JPH1073823A (ja) | 1996-09-02 | 1998-03-17 | Hitachi Ltd | アクティブマトリクス型液晶表示装置 |
| KR100471393B1 (ko) | 1997-12-22 | 2005-07-11 | 비오이 하이디스 테크놀로지 주식회사 | 액정표시장치의제조방법 |
| KR100299381B1 (ko) | 1998-08-24 | 2002-06-20 | 박종섭 | 고개구율 및 고투과율을 갖는 액정표시장치 및 그 제조방법 |
| US6287899B1 (en) * | 1998-12-31 | 2001-09-11 | Samsung Electronics Co., Ltd. | Thin film transistor array panels for a liquid crystal display and a method for manufacturing the same |
| JP2001339072A (ja) * | 2000-03-15 | 2001-12-07 | Advanced Display Inc | 液晶表示装置 |
| JP4683688B2 (ja) | 2000-03-16 | 2011-05-18 | 株式会社半導体エネルギー研究所 | 液晶表示装置の作製方法 |
| US6636289B2 (en) * | 2000-04-19 | 2003-10-21 | Lg.Philips Lcd Co., Ltd. | In-plane switching LCD panel with multiple domains and rubbing directions symetric about a line |
| KR100372577B1 (ko) * | 2000-08-07 | 2003-02-17 | 엘지.필립스 엘시디 주식회사 | 광시야각 액정 표시 장치 |
| JP2002107762A (ja) * | 2000-10-02 | 2002-04-10 | Sharp Corp | 液晶用マトリクス基板の製造方法 |
| US7095460B2 (en) * | 2001-02-26 | 2006-08-22 | Samsung Electronics Co., Ltd. | Thin film transistor array substrate using low dielectric insulating layer and method of fabricating the same |
| JP4086581B2 (ja) | 2002-07-31 | 2008-05-14 | Nec液晶テクノロジー株式会社 | 液晶表示装置 |
| KR100866976B1 (ko) | 2002-09-03 | 2008-11-05 | 엘지디스플레이 주식회사 | 액정표시장치용 어레이기판과 제조방법 |
| KR100971955B1 (ko) * | 2002-11-11 | 2010-07-23 | 엘지디스플레이 주식회사 | 액정표시장치용 어레이기판 제조방법 |
| KR20040108276A (ko) | 2003-06-17 | 2004-12-23 | 엘지.필립스 엘시디 주식회사 | 박막 트랜지스터의 구조 및 그 제조방법 |
| KR100731045B1 (ko) * | 2003-06-17 | 2007-06-22 | 엘지.필립스 엘시디 주식회사 | 횡전계 방식의 액정표시장치 및 그 제조방법 |
| KR101054819B1 (ko) * | 2003-06-24 | 2011-08-05 | 엘지디스플레이 주식회사 | 횡전계 방식 액정표시장치용 어레이기판과 그 제조방법 |
| JP3595327B2 (ja) | 2003-07-23 | 2004-12-02 | 株式会社 日立ディスプレイズ | 液晶表示装置 |
| KR100975734B1 (ko) | 2003-09-08 | 2010-08-12 | 엘지디스플레이 주식회사 | 횡전계방식 액정 표시 장치용 어레이 기판 및 그 제조 방법 |
| US7279370B2 (en) * | 2003-10-11 | 2007-10-09 | Lg.Philips Lcd Co., Ltd. | Thin film transistor array substrate and method of fabricating the same |
| CN100371813C (zh) * | 2003-10-14 | 2008-02-27 | Lg.菲利浦Lcd株式会社 | 面内切换型液晶显示装置中的液晶显示板及其制造方法 |
| US7202928B2 (en) * | 2003-10-16 | 2007-04-10 | Lg. Philips Lcd Co., Ltd | Array substrate for in-plane switching mode liquid crystal display device and method of fabricating the same |
| KR100560402B1 (ko) | 2003-11-04 | 2006-03-14 | 엘지.필립스 엘시디 주식회사 | 수평 전계 인가형 박막 트랜지스터 기판 및 그 제조 방법 |
| KR101019045B1 (ko) * | 2003-11-25 | 2011-03-04 | 엘지디스플레이 주식회사 | 액정표시장치용 어레이기판과 그 제조방법 |
| KR101071711B1 (ko) * | 2003-12-29 | 2011-10-12 | 엘지디스플레이 주식회사 | 횡전계형 액정표시장치 |
| KR101050300B1 (ko) * | 2004-07-30 | 2011-07-19 | 엘지디스플레이 주식회사 | 액정 표시 장치용 어레이 기판 및 그 제조 방법 |
| KR101127822B1 (ko) * | 2004-12-24 | 2012-03-26 | 엘지디스플레이 주식회사 | 수평 전계 박막 트랜지스터 기판 및 그 제조 방법 |
| KR101107245B1 (ko) * | 2004-12-24 | 2012-01-25 | 엘지디스플레이 주식회사 | 수평 전계 박막 트랜지스터 기판 및 그 제조 방법 |
| KR101125252B1 (ko) * | 2004-12-31 | 2012-03-21 | 엘지디스플레이 주식회사 | 폴리 액정 표시 패널 및 그 제조 방법 |
| KR101180718B1 (ko) * | 2005-12-29 | 2012-09-07 | 엘지디스플레이 주식회사 | 횡전계형 액정표시장치용 어레이 기판 및 그 제조 방법 |
| TWI329773B (en) * | 2006-03-20 | 2010-09-01 | Au Optronics Corp | Pixel structure and liquid crystal display panel |
| KR101182322B1 (ko) * | 2006-06-30 | 2012-09-20 | 엘지디스플레이 주식회사 | 수평 전계 인가형 박막 트랜지스터 기판 및 그 제조 방법 |
| KR100920482B1 (ko) | 2006-11-28 | 2009-10-08 | 엘지디스플레이 주식회사 | 액정표시장치용 어레이 기판과 그 제조방법 |
-
2007
- 2007-05-30 US US11/806,214 patent/US8031312B2/en active Active
- 2007-06-25 GB GB0712299A patent/GB2444347A/en not_active Withdrawn
- 2007-06-29 FR FR0704697A patent/FR2909194B1/fr not_active Expired - Fee Related
- 2007-06-29 JP JP2007173016A patent/JP4885805B2/ja not_active Expired - Fee Related
- 2007-11-23 GB GB0723021A patent/GB2444379B/en not_active Expired - Fee Related
-
2011
- 2011-07-28 US US13/193,384 patent/US8456601B2/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| GB2444379A (en) | 2008-06-04 |
| US8456601B2 (en) | 2013-06-04 |
| US20080122767A1 (en) | 2008-05-29 |
| GB0723021D0 (en) | 2008-01-02 |
| JP2008134593A (ja) | 2008-06-12 |
| GB2444347A (en) | 2008-06-04 |
| GB0712299D0 (en) | 2007-08-01 |
| GB2444379B (en) | 2008-12-17 |
| JP4885805B2 (ja) | 2012-02-29 |
| FR2909194A1 (fr) | 2008-05-30 |
| US20110281386A1 (en) | 2011-11-17 |
| US8031312B2 (en) | 2011-10-04 |
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