FR3145852B1 - Structure integree comprenant une couche ferroelectrique a polarisation selective reportee sur un substrat et procede de fabrication - Google Patents

Structure integree comprenant une couche ferroelectrique a polarisation selective reportee sur un substrat et procede de fabrication Download PDF

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Publication number
FR3145852B1
FR3145852B1 FR2301220A FR2301220A FR3145852B1 FR 3145852 B1 FR3145852 B1 FR 3145852B1 FR 2301220 A FR2301220 A FR 2301220A FR 2301220 A FR2301220 A FR 2301220A FR 3145852 B1 FR3145852 B1 FR 3145852B1
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FR
France
Prior art keywords
ferroelectric layer
substrate
manufacturing
polarization
integrated structure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
FR2301220A
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English (en)
Other versions
FR3145852A1 (fr
Inventor
Alexis Drouin
Sébastien Ledrappier
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Soitec SA
Original Assignee
Soitec SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to FR2301220A priority Critical patent/FR3145852B1/fr
Application filed by Soitec SA filed Critical Soitec SA
Priority to JP2025546365A priority patent/JP2026505437A/ja
Priority to CN202480010737.3A priority patent/CN120731688A/zh
Priority to PCT/EP2024/052092 priority patent/WO2024165363A1/fr
Priority to KR1020257026765A priority patent/KR20250149978A/ko
Priority to EP24701979.7A priority patent/EP4662989A1/fr
Priority to TW113104923A priority patent/TW202448307A/zh
Publication of FR3145852A1 publication Critical patent/FR3145852A1/fr
Application granted granted Critical
Publication of FR3145852B1 publication Critical patent/FR3145852B1/fr
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/02—Details
    • H03H9/02535—Details of surface acoustic wave devices
    • H03H9/02543—Characteristics of substrate, e.g. cutting angles
    • H03H9/02559—Characteristics of substrate, e.g. cutting angles of lithium niobate or lithium-tantalate substrates
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
    • H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
    • H03H3/08—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of resonators or networks using surface acoustic waves
    • H03H3/10—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of resonators or networks using surface acoustic waves for obtaining desired frequency or temperature coefficient
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/02—Details
    • H03H9/02535—Details of surface acoustic wave devices
    • H03H9/02543—Characteristics of substrate, e.g. cutting angles
    • H03H9/02574—Characteristics of substrate, e.g. cutting angles of combined substrates, multilayered substrates, piezoelectrical layers on not-piezoelectrical substrate
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00—Piezoelectric or electrostrictive devices
    • H10N30/01—Manufacture or treatment
    • H10N30/04—Treatments to modify a piezoelectric or electrostrictive property, e.g. polarisation characteristics, vibration characteristics or mode tuning
    • H10N30/045—Treatments to modify a piezoelectric or electrostrictive property, e.g. polarisation characteristics, vibration characteristics or mode tuning by polarising
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00—Piezoelectric or electrostrictive devices
    • H10N30/01—Manufacture or treatment
    • H10N30/07—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base
    • H10N30/072—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base by laminating or bonding of piezoelectric or electrostrictive bodies
    • H10N30/073—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base by laminating or bonding of piezoelectric or electrostrictive bodies by fusion of metals or by adhesives

Landscapes

  • Physics & Mathematics (AREA)
  • Acoustics & Sound (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Laminated Bodies (AREA)
  • Polarising Elements (AREA)

Abstract

Structure (Struct) comprenant une couche ferroélectrique (Ferrolay) présentant une première polarisation (P1) dans une première zone et une deuxième polarisation (P2), opposée à la première polarisation, dans une deuxième zone distincte de la première zone, la première polarisation et la deuxième polarisation étant orientées perpendiculairement ou obliquement par rapport à la couche ferroélectrique, la structure comprenant en outre un support (Sprt) et une couche diélectrique (Diel) interposée entre ce support et la couche ferroélectrique. Figure à publier avec l’abrégé : Fig. 7
FR2301220A 2023-02-09 2023-02-09 Structure integree comprenant une couche ferroelectrique a polarisation selective reportee sur un substrat et procede de fabrication Active FR3145852B1 (fr)

Priority Applications (7)

Application Number Priority Date Filing Date Title
FR2301220A FR3145852B1 (fr) 2023-02-09 2023-02-09 Structure integree comprenant une couche ferroelectrique a polarisation selective reportee sur un substrat et procede de fabrication
CN202480010737.3A CN120731688A (zh) 2023-02-09 2024-01-29 包括具有选择性极化的铁电层的基板安装集成结构及其制造方法
PCT/EP2024/052092 WO2024165363A1 (fr) 2023-02-09 2024-01-29 Structure integree comprenant une couche ferroelectrique a polarisation selective reportee sur un substrat et procede de fabrication
KR1020257026765A KR20250149978A (ko) 2023-02-09 2024-01-29 기판에 부착된 선택적 분극을 갖는 강유전체 층을 포함하는 집적 구조체, 및 이의 제조 방법
JP2025546365A JP2026505437A (ja) 2023-02-09 2024-01-29 基板に付着された選択的分極を有する強誘電体層を含む集積構造、および製造方法
EP24701979.7A EP4662989A1 (fr) 2023-02-09 2024-01-29 Structure integree comprenant une couche ferroelectrique a polarisation selective reportee sur un substrat et procede de fabrication
TW113104923A TW202448307A (zh) 2023-02-09 2024-02-07 包含附接至基板之具選擇性極化之鐵電層的整合結構及製造方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR2301220 2023-02-09
FR2301220A FR3145852B1 (fr) 2023-02-09 2023-02-09 Structure integree comprenant une couche ferroelectrique a polarisation selective reportee sur un substrat et procede de fabrication

Publications (2)

Publication Number Publication Date
FR3145852A1 FR3145852A1 (fr) 2024-08-16
FR3145852B1 true FR3145852B1 (fr) 2025-05-30

Family

ID=86942639

Family Applications (1)

Application Number Title Priority Date Filing Date
FR2301220A Active FR3145852B1 (fr) 2023-02-09 2023-02-09 Structure integree comprenant une couche ferroelectrique a polarisation selective reportee sur un substrat et procede de fabrication

Country Status (7)

Country Link
EP (1) EP4662989A1 (fr)
JP (1) JP2026505437A (fr)
KR (1) KR20250149978A (fr)
CN (1) CN120731688A (fr)
FR (1) FR3145852B1 (fr)
TW (1) TW202448307A (fr)
WO (1) WO2024165363A1 (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN119853635B (zh) * 2024-12-24 2025-12-05 南京大学 基于倾斜畴结构的铌酸锂声学超晶格体声波谐振器件及其设计方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69322585T2 (de) 1992-10-07 1999-06-17 Matsushita Electric Industrial Co., Ltd., Kadoma, Osaka Optische Wellenlängenkonversionseinrichtung
EP1687672B1 (fr) 2003-11-24 2013-01-02 University Of Southampton Fabrication de guides d'ondes optiques en niobate de lithium a polarisation periodique
JP5569537B2 (ja) * 2009-11-26 2014-08-13 株式会社村田製作所 圧電デバイスの製造方法
FR2981203B1 (fr) * 2011-10-05 2013-12-20 Centre Nat Rech Scient Transducteur electroacoustique a polarisation ferroelectrique periodique realise sur une structure verticale micro usinee.
JP6489234B2 (ja) * 2015-12-02 2019-03-27 株式会社村田製作所 圧電素子、圧電マイクロフォン、圧電共振子及び圧電素子の製造方法
FR3094573B1 (fr) 2019-03-29 2021-08-13 Soitec Silicon On Insulator Procede de preparation d’une couche mince de materiau ferroelectrique
CN110670134B (zh) * 2019-09-20 2021-04-23 南开大学 一种p型和n型导电铌酸锂纳米线的制备方法
CN110828653B (zh) * 2019-10-24 2023-11-24 济南晶正电子科技有限公司 压电复合薄膜及其制备方法
JP7560010B2 (ja) * 2020-12-22 2024-10-02 富士通セミコンダクターメモリソリューション株式会社 半導体装置及び半導体装置の製造方法

Also Published As

Publication number Publication date
WO2024165363A1 (fr) 2024-08-15
FR3145852A1 (fr) 2024-08-16
JP2026505437A (ja) 2026-02-13
EP4662989A1 (fr) 2025-12-17
KR20250149978A (ko) 2025-10-17
CN120731688A (zh) 2025-09-30
TW202448307A (zh) 2024-12-01

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