HK25596A - Light-sensitive positive mixture containing a dye, and light-sensitive positive registration material prepared therefrom - Google Patents

Light-sensitive positive mixture containing a dye, and light-sensitive positive registration material prepared therefrom

Info

Publication number
HK25596A
HK25596A HK25596A HK25596A HK25596A HK 25596 A HK25596 A HK 25596A HK 25596 A HK25596 A HK 25596A HK 25596 A HK25596 A HK 25596A HK 25596 A HK25596 A HK 25596A
Authority
HK
Hong Kong
Prior art keywords
photosensitive
light
compound
dye
photosensitive composition
Prior art date
Application number
HK25596A
Other languages
German (de)
English (en)
Inventor
Hans-Joachim Dr Merrem
Original Assignee
Hoechst Aktiengesellschaft
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Aktiengesellschaft filed Critical Hoechst Aktiengesellschaft
Publication of HK25596A publication Critical patent/HK25596A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Materials For Photolithography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

Claims (8)

  1. Composition photosensible travaillant en positif, qui contient un composé photosensible, un liant insoluble dans l'eau mais soluble ou gonflable dans une solution alcaline aqueuse, ainsi qu'un colorant, caractérisée en ce que le colorant est un composé non décolorable, absorbant à 365±15 nm, de formule générale I, dans laquelle    R₁ à R₄ sont identiques ou différents et représentent l'atome d'hydrogène ou un groupe alkyle, hydroxyalkyle ou alcoxyalkyle, et    R₅ et R₆ sont identiques ou différents et représentent un atome d'hydrogéne ou d'halogène ou un groupe alkyle, hydroxyalkyle, alcoxyalkyle ou amino.
  2. Composition photosensible selon la revendication 1, caractérisée en ce qu'elle contient, comme composé photosensible, un o-quinonediazide.
  3. Composition photosensible selon la revendication 1, caractérisée en ce qu'elle contient, comme composé photosensible, un donneur photolytique d'acide en combinaison avec un composé clivable par un acide contenant un enchaînement C-O-C.
  4. Composition photosensible selon la revendication 3, caractérisée en ce qu'elle contient, comme donneur photolytique d'acide, un composé halogéné organique.
  5. Composition photosensible selon une ou plusieurs des revendications 1 à 4, caractérisée en ce qu'elle contient, comme liant, une résine de condensation novolaque.
  6. Composition photosensible selon la revendication 5, caractérisée en ce que la résine de condensation novolaque soluble dans une base alcaline est mélangée à d'autres résines, à raison de jusqu'à 20 % en poids.
  7. Matériau d'enregistrement photosensible travaillant en positif, essentiellement constitué d'un substrat courant dans la technique des photorésists et d'une couche photosensible, caractérisé en ce que ledit matériau comprend, comme couche photosensible, une composition correspondant aux revendications 1 à 6.
  8. Procédé de fabrication d'un modèle de photorésist, caractérisé en ce qu'un matériau d'enregistrement travaillant en positif de la revendication 7 est exposé à travers un original masque, à une longueur d'onde de 365 nm, puis est soit développé avec un développateur alcalin aqueux, soit chauffé à 120°C puis exposé sur toute sa surface, à une longueur d'onde comprise entre 365 et 436 nm, et développé ensuite avec un développateur alcalin aqueux.
HK25596A 1987-10-30 1996-02-08 Light-sensitive positive mixture containing a dye, and light-sensitive positive registration material prepared therefrom HK25596A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19873736758 DE3736758A1 (de) 1987-10-30 1987-10-30 Positiv arbeitendes lichtempfindliches gemisch, enthaltend einen farbstoff, und daraus hergestelltes positiv arbeitendes lichtempfindliches aufzeichnungsmaterial

Publications (1)

Publication Number Publication Date
HK25596A true HK25596A (en) 1996-02-16

Family

ID=6339393

Family Applications (1)

Application Number Title Priority Date Filing Date
HK25596A HK25596A (en) 1987-10-30 1996-02-08 Light-sensitive positive mixture containing a dye, and light-sensitive positive registration material prepared therefrom

Country Status (5)

Country Link
EP (1) EP0314037B1 (fr)
JP (1) JP2608940B2 (fr)
KR (1) KR960015638B1 (fr)
DE (2) DE3736758A1 (fr)
HK (1) HK25596A (fr)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2711590B2 (ja) * 1990-09-13 1998-02-10 富士写真フイルム株式会社 ポジ型フオトレジスト組成物
JP2579387B2 (ja) * 1990-12-12 1997-02-05 三菱化学株式会社 フォトレジスト組成物
JP2838335B2 (ja) * 1992-02-03 1998-12-16 富士写真フイルム株式会社 感光性組成物
US5275909A (en) * 1992-06-01 1994-01-04 Ocg Microelectronic Materials, Inc. Positive-working radiation sensitive mixtures and articles containing alkali-soluble binder, o-quinonediazide photoactive compound and BLANKOPHOR FBW acting dye
US5290418A (en) * 1992-09-24 1994-03-01 Applied Biosystems, Inc. Viscous electrophoresis polymer medium and method
JPH08146599A (ja) * 1994-11-24 1996-06-07 Nec Corp 感光性組成物とこれを用いた微細パターン形成方法
JP3436843B2 (ja) * 1996-04-25 2003-08-18 東京応化工業株式会社 リソグラフィー用下地材及びそれを用いたリソグラフィー用レジスト材料
JP4333095B2 (ja) * 1998-10-30 2009-09-16 日立化成デュポンマイクロシステムズ株式会社 感光性重合体組成物、レリーフパターンの製造法及び電子部品

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3307943A (en) * 1963-05-14 1967-03-07 Du Pont Image reproduction elements and processes
JPS6088941A (ja) * 1983-10-21 1985-05-18 Nagase Kasei Kogyo Kk フオトレジスト組成物
JPS61231541A (ja) * 1985-04-06 1986-10-15 Nippon Seihaku Kk 感光性平版印刷版材
JPS61241759A (ja) * 1985-04-18 1986-10-28 Toray Ind Inc 水なし平版印刷版

Also Published As

Publication number Publication date
KR890007120A (ko) 1989-06-19
EP0314037A3 (en) 1990-10-31
KR960015638B1 (ko) 1996-11-18
JPH01154049A (ja) 1989-06-16
JP2608940B2 (ja) 1997-05-14
DE3887955D1 (de) 1994-03-31
EP0314037A2 (fr) 1989-05-03
EP0314037B1 (fr) 1994-02-23
DE3736758A1 (de) 1989-05-11

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)