IL139782A - Absorption-based gas storage and supply system for very pure gas distribution - Google Patents

Absorption-based gas storage and supply system for very pure gas distribution

Info

Publication number: IL139782A
Authority: IL; Israel
Prior art keywords: storage; gas; dispensing; fluid; sorbent
Prior art date: 1998-05-21

Application number

IL13978299A

Other languages

English (en)

Hebrew (he)

Other versions

IL139782A0 (en

Original Assignee

Advanced Tech Materials

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1998-05-21

Filing date

1999-05-21

Publication date

2004-03-28

1999-05-21 Application filed by Advanced Tech Materials filed Critical Advanced Tech Materials

2002-02-10 Publication of IL139782A0 publication Critical patent/IL139782A0/xx

2004-03-28 Publication of IL139782A publication Critical patent/IL139782A/en

Links

238000003860 storage Methods 0.000 title claims abstract description 158
239000002594 sorbent Substances 0.000 title claims abstract description 123
238000000034 method Methods 0.000 claims abstract description 106
230000008569 process Effects 0.000 claims abstract description 89
239000012535 impurity Substances 0.000 claims abstract description 49
239000003153 chemical reaction reagent Substances 0.000 claims abstract description 42
239000012071 phase Substances 0.000 claims abstract description 16
239000007790 solid phase Substances 0.000 claims abstract description 16
238000007599 discharging Methods 0.000 claims abstract description 6
239000012530 fluid Substances 0.000 claims description 115
239000000463 material Substances 0.000 claims description 83
238000004519 manufacturing process Methods 0.000 claims description 73
239000004065 semiconductor Substances 0.000 claims description 55
229940075554 sorbate Drugs 0.000 claims description 48
WSWCOQWTEOXDQX-MQQKCMAXSA-M (E,E)-sorbate Chemical compound C\C=C\C=C\C([O-])=O WSWCOQWTEOXDQX-MQQKCMAXSA-M 0.000 claims description 47
239000000758 substrate Substances 0.000 claims description 41
150000001875 compounds Chemical class 0.000 claims description 27
238000005229 chemical vapour deposition Methods 0.000 claims description 26
239000002775 capsule Substances 0.000 claims description 25
RBFQJDQYXXHULB-UHFFFAOYSA-N arsane Chemical compound [AsH3] RBFQJDQYXXHULB-UHFFFAOYSA-N 0.000 claims description 24
VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 23
150000002500 ions Chemical class 0.000 claims description 19
238000005468 ion implantation Methods 0.000 claims description 18
229910052751 metal Inorganic materials 0.000 claims description 18
239000002184 metal Substances 0.000 claims description 18
239000012528 membrane Substances 0.000 claims description 17
239000003990 capacitor Substances 0.000 claims description 16
238000004140 cleaning Methods 0.000 claims description 16
-1 polypropylene Polymers 0.000 claims description 16
239000000203 mixture Substances 0.000 claims description 15
239000002243 precursor Substances 0.000 claims description 15
238000004891 communication Methods 0.000 claims description 14
239000000470 constituent Substances 0.000 claims description 13
OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 12
XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 claims description 12
238000006243 chemical reaction Methods 0.000 claims description 12
239000000356 contaminant Substances 0.000 claims description 12
BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 12
230000000694 effects Effects 0.000 claims description 11
QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims description 10
229910052788 barium Inorganic materials 0.000 claims description 10
238000000151 deposition Methods 0.000 claims description 10
230000008021 deposition Effects 0.000 claims description 10
229910021420 polycrystalline silicon Inorganic materials 0.000 claims description 10
229920005591 polysilicon Polymers 0.000 claims description 10
DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 claims description 9
OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 claims description 8
150000001450 anions Chemical class 0.000 claims description 8
229910052791 calcium Inorganic materials 0.000 claims description 8
239000011575 calcium Substances 0.000 claims description 8
238000001465 metallisation Methods 0.000 claims description 8
238000000206 photolithography Methods 0.000 claims description 8
229910052712 strontium Inorganic materials 0.000 claims description 8
CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 claims description 8
229910000073 phosphorus hydride Inorganic materials 0.000 claims description 7
239000000377 silicon dioxide Substances 0.000 claims description 7
PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 6
KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 6
229910000323 aluminium silicate Inorganic materials 0.000 claims description 6
229910052799 carbon Inorganic materials 0.000 claims description 6
150000002739 metals Chemical class 0.000 claims description 6
238000001020 plasma etching Methods 0.000 claims description 6
229910052697 platinum Inorganic materials 0.000 claims description 6
239000010936 titanium Substances 0.000 claims description 6
FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims description 5
PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 5
229910021529 ammonia Inorganic materials 0.000 claims description 5
230000004888 barrier function Effects 0.000 claims description 5
WTEOIRVLGSZEPR-UHFFFAOYSA-N boron trifluoride Chemical compound FB(F)F WTEOIRVLGSZEPR-UHFFFAOYSA-N 0.000 claims description 5
229910052749 magnesium Inorganic materials 0.000 claims description 5
239000011777 magnesium Substances 0.000 claims description 5
RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 4
DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 claims description 4
ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 claims description 4
BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 claims description 4
229910045601 alloy Inorganic materials 0.000 claims description 4
239000000956 alloy Substances 0.000 claims description 4
229910052782 aluminium Inorganic materials 0.000 claims description 4
XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 4
238000000429 assembly Methods 0.000 claims description 4
230000000712 assembly Effects 0.000 claims description 4
UORVGPXVDQYIDP-UHFFFAOYSA-N borane Chemical compound B UORVGPXVDQYIDP-UHFFFAOYSA-N 0.000 claims description 4
229910052792 caesium Inorganic materials 0.000 claims description 4
TVFDJXOCXUVLDH-UHFFFAOYSA-N caesium atom Chemical compound [Cs] TVFDJXOCXUVLDH-UHFFFAOYSA-N 0.000 claims description 4
238000010276 construction Methods 0.000 claims description 4
229910052802 copper Inorganic materials 0.000 claims description 4
239000010949 copper Substances 0.000 claims description 4
KWLSQQRRSAWBOQ-UHFFFAOYSA-N dipotassioarsanylpotassium Chemical compound [K][As]([K])[K] KWLSQQRRSAWBOQ-UHFFFAOYSA-N 0.000 claims description 4
239000011159 matrix material Substances 0.000 claims description 4
239000011591 potassium Substances 0.000 claims description 4
229910052700 potassium Inorganic materials 0.000 claims description 4
238000000197 pyrolysis Methods 0.000 claims description 4
229910052701 rubidium Inorganic materials 0.000 claims description 4
IGLNJRXAVVLDKE-UHFFFAOYSA-N rubidium atom Chemical compound [Rb] IGLNJRXAVVLDKE-UHFFFAOYSA-N 0.000 claims description 4
230000002000 scavenging effect Effects 0.000 claims description 4
239000011734 sodium Substances 0.000 claims description 4
229910052708 sodium Inorganic materials 0.000 claims description 4
229910015900 BF3 Inorganic materials 0.000 claims description 3
VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 3
ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 3
RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 3
229910052804 chromium Inorganic materials 0.000 claims description 3
239000011651 chromium Substances 0.000 claims description 3
239000003989 dielectric material Substances 0.000 claims description 3
PZPGRFITIJYNEJ-UHFFFAOYSA-N disilane Chemical compound [SiH3][SiH3] PZPGRFITIJYNEJ-UHFFFAOYSA-N 0.000 claims description 3
239000004744 fabric Substances 0.000 claims description 3
239000011521 glass Substances 0.000 claims description 3
PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 3
229910052737 gold Inorganic materials 0.000 claims description 3
239000010931 gold Substances 0.000 claims description 3
229910052741 iridium Inorganic materials 0.000 claims description 3
GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 claims description 3
229910052750 molybdenum Inorganic materials 0.000 claims description 3
239000011733 molybdenum Substances 0.000 claims description 3
229910052759 nickel Inorganic materials 0.000 claims description 3
229910052758 niobium Inorganic materials 0.000 claims description 3
239000010955 niobium Substances 0.000 claims description 3
GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 3
229910052763 palladium Inorganic materials 0.000 claims description 3
238000002161 passivation Methods 0.000 claims description 3
FAIAAWCVCHQXDN-UHFFFAOYSA-N phosphorus trichloride Chemical compound ClP(Cl)Cl FAIAAWCVCHQXDN-UHFFFAOYSA-N 0.000 claims description 3
238000005240 physical vapour deposition Methods 0.000 claims description 3
229920000642 polymer Polymers 0.000 claims description 3
229910052703 rhodium Inorganic materials 0.000 claims description 3
239000010948 rhodium Substances 0.000 claims description 3
MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 claims description 3
229910052715 tantalum Inorganic materials 0.000 claims description 3
GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 3
229910052719 titanium Inorganic materials 0.000 claims description 3
FAQYAMRNWDIXMY-UHFFFAOYSA-N trichloroborane Chemical compound ClB(Cl)Cl FAQYAMRNWDIXMY-UHFFFAOYSA-N 0.000 claims description 3
AJSTXXYNEIHPMD-UHFFFAOYSA-N triethyl borate Chemical compound CCOB(OCC)OCC AJSTXXYNEIHPMD-UHFFFAOYSA-N 0.000 claims description 3
DQWPFSLDHJDLRL-UHFFFAOYSA-N triethyl phosphate Chemical compound CCOP(=O)(OCC)OCC DQWPFSLDHJDLRL-UHFFFAOYSA-N 0.000 claims description 3
WRECIMRULFAWHA-UHFFFAOYSA-N trimethyl borate Chemical compound COB(OC)OC WRECIMRULFAWHA-UHFFFAOYSA-N 0.000 claims description 3
CYTQBVOFDCPGCX-UHFFFAOYSA-N trimethyl phosphite Chemical compound COP(OC)OC CYTQBVOFDCPGCX-UHFFFAOYSA-N 0.000 claims description 3
WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 3
229910052721 tungsten Inorganic materials 0.000 claims description 3
239000010937 tungsten Substances 0.000 claims description 3
NXHILIPIEUBEPD-UHFFFAOYSA-H tungsten hexafluoride Chemical compound F[W](F)(F)(F)(F)F NXHILIPIEUBEPD-UHFFFAOYSA-H 0.000 claims description 3
229910052720 vanadium Inorganic materials 0.000 claims description 3
GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 claims description 3
239000005046 Chlorosilane Substances 0.000 claims description 2
239000002033 PVDF binder Substances 0.000 claims description 2
239000004721 Polyphenylene oxide Substances 0.000 claims description 2
239000004743 Polypropylene Substances 0.000 claims description 2
BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims description 2
229910000085 borane Inorganic materials 0.000 claims description 2
239000003575 carbonaceous material Substances 0.000 claims description 2
KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical class Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 claims description 2
229920006380 polyphenylene oxide Polymers 0.000 claims description 2
229920001155 polypropylene Polymers 0.000 claims description 2
229920001296 polysiloxane Polymers 0.000 claims description 2
229920001343 polytetrafluoroethylene Polymers 0.000 claims description 2
239000004810 polytetrafluoroethylene Substances 0.000 claims description 2
229920002981 polyvinylidene fluoride Polymers 0.000 claims description 2
229910000077 silane Inorganic materials 0.000 claims description 2
BDZBKCUKTQZUTL-UHFFFAOYSA-N triethyl phosphite Chemical compound CCOP(OCC)OCC BDZBKCUKTQZUTL-UHFFFAOYSA-N 0.000 claims description 2
WVLBCYQITXONBZ-UHFFFAOYSA-N trimethyl phosphate Chemical compound COP(=O)(OC)OC WVLBCYQITXONBZ-UHFFFAOYSA-N 0.000 claims description 2
YONPGGFAJWQGJC-UHFFFAOYSA-K titanium(iii) chloride Chemical compound Cl[Ti](Cl)Cl YONPGGFAJWQGJC-UHFFFAOYSA-K 0.000 claims 1
239000007789 gas Substances 0.000 description 165
239000010410 layer Substances 0.000 description 53
235000012431 wafers Nutrition 0.000 description 17
238000003795 desorption Methods 0.000 description 16
239000000047 product Substances 0.000 description 16
238000010438 heat treatment Methods 0.000 description 15
HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 13
238000000354 decomposition reaction Methods 0.000 description 12
239000010457 zeolite Substances 0.000 description 12
UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 11
239000001257 hydrogen Substances 0.000 description 11
229910052739 hydrogen Inorganic materials 0.000 description 11
239000007788 liquid Substances 0.000 description 11
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239000010408 film Substances 0.000 description 9
IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 8
XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 8
239000003463 adsorbent Substances 0.000 description 8
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239000010703 silicon Substances 0.000 description 8
239000002019 doping agent Substances 0.000 description 7
FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 7
239000007943 implant Substances 0.000 description 7
KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 6
150000004678 hydrides Chemical class 0.000 description 6
238000011065 in-situ storage Methods 0.000 description 6
239000002808 molecular sieve Substances 0.000 description 6
229920002120 photoresistant polymer Polymers 0.000 description 6
URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 description 6
238000001179 sorption measurement Methods 0.000 description 6
231100001261 hazardous Toxicity 0.000 description 5
238000010884 ion-beam technique Methods 0.000 description 5
238000002955 isolation Methods 0.000 description 5
239000011148 porous material Substances 0.000 description 5
239000002516 radical scavenger Substances 0.000 description 5
230000000717 retained effect Effects 0.000 description 5
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
229910001868 water Inorganic materials 0.000 description 5
230000015572 biosynthetic process Effects 0.000 description 4
IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 description 4
230000001404 mediated effect Effects 0.000 description 4
229910052757 nitrogen Inorganic materials 0.000 description 4
125000002524 organometallic group Chemical group 0.000 description 4
238000012545 processing Methods 0.000 description 4
239000007787 solid Substances 0.000 description 4
229910052723 transition metal Inorganic materials 0.000 description 4
150000003624 transition metals Chemical class 0.000 description 4
238000005406 washing Methods 0.000 description 4
LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
230000002411 adverse Effects 0.000 description 3
229910052784 alkaline earth metal Inorganic materials 0.000 description 3
229910052785 arsenic Inorganic materials 0.000 description 3
RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 3
QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
239000011324 bead Substances 0.000 description 3
230000008878 coupling Effects 0.000 description 3
238000010168 coupling process Methods 0.000 description 3
238000005859 coupling reaction Methods 0.000 description 3
230000007547 defect Effects 0.000 description 3
150000004820 halides Chemical class 0.000 description 3
BHEPBYXIRTUNPN-UHFFFAOYSA-N hydridophosphorus(.) (triplet) Chemical compound [PH] BHEPBYXIRTUNPN-UHFFFAOYSA-N 0.000 description 3
150000002431 hydrogen Chemical class 0.000 description 3
229910052760 oxygen Inorganic materials 0.000 description 3
239000001301 oxygen Substances 0.000 description 3
239000000843 powder Substances 0.000 description 3
230000002829 reductive effect Effects 0.000 description 3
238000002336 sorption--desorption measurement Methods 0.000 description 3
239000010409 thin film Substances 0.000 description 3
XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
229910015148 B2H6 Inorganic materials 0.000 description 2
ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 2
ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
CPELXLSAUQHCOX-UHFFFAOYSA-N Hydrogen bromide Chemical compound Br CPELXLSAUQHCOX-UHFFFAOYSA-N 0.000 description 2
OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
229910052787 antimony Inorganic materials 0.000 description 2
WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 2
239000012298 atmosphere Substances 0.000 description 2
229910052454 barium strontium titanate Inorganic materials 0.000 description 2
230000008901 benefit Effects 0.000 description 2
229910052796 boron Inorganic materials 0.000 description 2
239000012159 carrier gas Substances 0.000 description 2
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238000012423 maintenance Methods 0.000 description 2
238000004377 microelectronic Methods 0.000 description 2
238000012544 monitoring process Methods 0.000 description 2
GVGCUCJTUSOZKP-UHFFFAOYSA-N nitrogen trifluoride Chemical compound FN(F)F GVGCUCJTUSOZKP-UHFFFAOYSA-N 0.000 description 2
238000010943 off-gassing Methods 0.000 description 2
239000002245 particle Substances 0.000 description 2
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239000000376 reactant Substances 0.000 description 2
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FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 description 2
230000003068 static effect Effects 0.000 description 2
239000000126 substance Substances 0.000 description 2
239000002341 toxic gas Substances 0.000 description 2
231100000419 toxicity Toxicity 0.000 description 2
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238000010977 unit operation Methods 0.000 description 2
UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 1
JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 1
WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical compound S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
229910001218 Gallium arsenide Inorganic materials 0.000 description 1
229910017843 NF3 Inorganic materials 0.000 description 1
239000004727 Noryl Substances 0.000 description 1
229920001207 Noryl Polymers 0.000 description 1
CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 1
230000001133 acceleration Effects 0.000 description 1
239000002253 acid Substances 0.000 description 1
150000007513 acids Chemical class 0.000 description 1
230000001154 acute effect Effects 0.000 description 1
239000003570 air Substances 0.000 description 1
229910000074 antimony hydride Inorganic materials 0.000 description 1
229910052786 argon Inorganic materials 0.000 description 1
229910000070 arsenic hydride Inorganic materials 0.000 description 1
125000003118 aryl group Chemical group 0.000 description 1
230000003190 augmentative effect Effects 0.000 description 1
239000011230 binding agent Substances 0.000 description 1
GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
229910052794 bromium Inorganic materials 0.000 description 1
230000015556 catabolic process Effects 0.000 description 1
239000000919 ceramic Substances 0.000 description 1
238000003486 chemical etching Methods 0.000 description 1
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230000003749 cleanliness Effects 0.000 description 1
230000002860 competitive effect Effects 0.000 description 1
239000002131 composite material Substances 0.000 description 1
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230000036541 health Effects 0.000 description 1
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238000002513 implantation Methods 0.000 description 1
238000009434 installation Methods 0.000 description 1
239000011810 insulating material Substances 0.000 description 1
238000009413 insulation Methods 0.000 description 1
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PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 1
239000007769 metal material Substances 0.000 description 1
238000001451 molecular beam epitaxy Methods 0.000 description 1
150000002823 nitrates Chemical class 0.000 description 1
QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
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SPVXKVOXSXTJOY-UHFFFAOYSA-N selane Chemical compound [SeH2] SPVXKVOXSXTJOY-UHFFFAOYSA-N 0.000 description 1
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238000005389 semiconductor device fabrication Methods 0.000 description 1
150000004756 silanes Chemical class 0.000 description 1
239000012686 silicon precursor Substances 0.000 description 1
239000002356 single layer Substances 0.000 description 1
235000002639 sodium chloride Nutrition 0.000 description 1
239000002904 solvent Substances 0.000 description 1
125000006850 spacer group Chemical group 0.000 description 1
239000012798 spherical particle Substances 0.000 description 1
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OUULRIDHGPHMNQ-UHFFFAOYSA-N stibane Chemical compound [SbH3] OUULRIDHGPHMNQ-UHFFFAOYSA-N 0.000 description 1
LSNNMFCWUKXFEE-UHFFFAOYSA-L sulfite Chemical class [O-]S([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-L 0.000 description 1
230000000153 supplemental effect Effects 0.000 description 1
229920003002 synthetic resin Polymers 0.000 description 1
VTLHPSMQDDEFRU-UHFFFAOYSA-N tellane Chemical compound [TeH2] VTLHPSMQDDEFRU-UHFFFAOYSA-N 0.000 description 1
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XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 1
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Classifications

- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/02—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography
- B01D53/04—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography with stationary adsorbents
- B01D53/0407—Constructional details of adsorbing systems
- B01D53/0446—Means for feeding or distributing gases
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/02—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography
- B01D53/04—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography with stationary adsorbents
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/22—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by diffusion
- B01D53/229—Integrated processes (Diffusion and at least one other process, e.g. adsorption, absorption)
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
- F17C11/00—Use of gas-solvents or gas-sorbents in vessels
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2253/00—Adsorbents used in seperation treatment of gases and vapours
- B01D2253/10—Inorganic adsorbents
- B01D2253/102—Carbon
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2253/00—Adsorbents used in seperation treatment of gases and vapours
- B01D2253/10—Inorganic adsorbents
- B01D2253/104—Alumina
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2253/00—Adsorbents used in seperation treatment of gases and vapours
- B01D2253/10—Inorganic adsorbents
- B01D2253/106—Silica or silicates
- B01D2253/108—Zeolites
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2253/00—Adsorbents used in seperation treatment of gases and vapours
- B01D2253/20—Organic adsorbents
- B01D2253/202—Polymeric adsorbents
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2256/00—Main component in the product gas stream after treatment
- B01D2256/26—Halogens or halogen compounds
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2258/00—Sources of waste gases
- B01D2258/02—Other waste gases
- B01D2258/0216—Other waste gases from CVD treatment or semi-conductor manufacturing
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2259/00—Type of treatment
- B01D2259/45—Gas separation or purification devices adapted for specific applications
- B01D2259/4525—Gas separation or purification devices adapted for specific applications for storage and dispensing systems
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
- F17C2223/00—Handled fluid before transfer, i.e. state of fluid when stored in the vessel or before transfer from the vessel
- F17C2223/01—Handled fluid before transfer, i.e. state of fluid when stored in the vessel or before transfer from the vessel characterised by the phase
- F17C2223/0107—Single phase
- F17C2223/0123—Single phase gaseous, e.g. CNG, GNC
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
- F17C2270/00—Applications
- F17C2270/05—Applications for industrial use
- F17C2270/0518—Semiconductors
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/006—Details of gas supplies, e.g. in an ion source, to a beam line, to a specimen or to a workpiece
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/317—Processing objects on a microscale
- H01J2237/31701—Ion implantation
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S95/00—Gas separation: processes
- Y10S95/90—Solid sorbent
- Y10S95/901—Activated carbon
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S95/00—Gas separation: processes
- Y10S95/90—Solid sorbent
- Y10S95/902—Molecular sieve

Landscapes

Chemical & Material Sciences (AREA)
Engineering & Computer Science (AREA)
Analytical Chemistry (AREA)
General Chemical & Material Sciences (AREA)
Oil, Petroleum & Natural Gas (AREA)
Chemical Kinetics & Catalysis (AREA)
Health & Medical Sciences (AREA)
Biomedical Technology (AREA)
Environmental & Geological Engineering (AREA)
Mechanical Engineering (AREA)
General Engineering & Computer Science (AREA)
Filling Or Discharging Of Gas Storage Vessels (AREA)
Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
Solid-Sorbent Or Filter-Aiding Compositions (AREA)

IL13978299A 1998-05-21 1999-05-21 Absorption-based gas storage and supply system for very pure gas distribution IL139782A (en)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
US09/082,596 US6132492A (en)	1994-10-13	1998-05-21	Sorbent-based gas storage and delivery system for dispensing of high-purity gas, and apparatus and process for manufacturing semiconductor devices, products and precursor structures utilizing same
PCT/US1999/011420 WO1999059701A1 (fr)	1998-05-21	1999-05-21	Dispositif de production et de stockage d'un gaz au moyen d'un absorbant pour la distribution d'un gaz de haute purete

Publications (2)

Publication Number	Publication Date
IL139782A0 IL139782A0 (en)	2002-02-10
IL139782A true IL139782A (en)	2004-03-28

Family

ID=22172165

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
IL13978299A IL139782A (en)	1998-05-21	1999-05-21	Absorption-based gas storage and supply system for very pure gas distribution

Country Status (9)

Country	Link
US (1)	US6132492A (fr)
EP (1)	EP1093395B1 (fr)
JP (1)	JP4705240B2 (fr)
KR (1)	KR100641087B1 (fr)
AU (1)	AU4199699A (fr)
IL (1)	IL139782A (fr)
MY (1)	MY117506A (fr)
TW (1)	TWI228260B (fr)
WO (1)	WO1999059701A1 (fr)

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1999
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- 1999-05-21 KR KR1020007013096A patent/KR100641087B1/ko not_active Expired - Lifetime

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Publication number	Publication date
IL139782A0 (en)	2002-02-10
TWI228260B (en)	2005-02-21
WO1999059701A1 (fr)	1999-11-25
US6132492A (en)	2000-10-17
MY117506A (en)	2004-07-31
EP1093395A1 (fr)	2001-04-25
JP2002515570A (ja)	2002-05-28
JP4705240B2 (ja)	2011-06-22
AU4199699A (en)	1999-12-06
EP1093395B1 (fr)	2014-06-11
KR20010043742A (ko)	2001-05-25
EP1093395A4 (fr)	2006-11-15
KR100641087B1 (ko)	2006-10-31

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Date	Code	Title
2004-09-27	KB	Patent renewed
2009-11-18	KB	Patent renewed
2013-05-30	KB	Patent renewed
2017-05-29	KB	Patent renewed
2019-12-31	EXP	Patent expired

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