IL35376A0 - Method for the production of semiconductor devices - Google Patents

Method for the production of semiconductor devices

Info

Publication number
IL35376A0
IL35376A0 IL35376A IL3537670A IL35376A0 IL 35376 A0 IL35376 A0 IL 35376A0 IL 35376 A IL35376 A IL 35376A IL 3537670 A IL3537670 A IL 3537670A IL 35376 A0 IL35376 A0 IL 35376A0
Authority
IL
Israel
Prior art keywords
production
semiconductor devices
semiconductor
devices
Prior art date
Application number
IL35376A
Other languages
English (en)
Original Assignee
Semiconduttori Spa Sgs Soc Gen
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Semiconduttori Spa Sgs Soc Gen filed Critical Semiconduttori Spa Sgs Soc Gen
Publication of IL35376A0 publication Critical patent/IL35376A0/xx

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00—Interconnections in chips, wafers or substrates
    • H10W20/40—Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P50/00—Etching of wafers, substrates or parts of devices
    • H10P50/20—Dry etching; Plasma etching; Reactive-ion etching
    • H10P50/28—Dry etching; Plasma etching; Reactive-ion etching of insulating materials
    • H10P50/282—Dry etching; Plasma etching; Reactive-ion etching of insulating materials of inorganic materials
    • H10P50/283—Dry etching; Plasma etching; Reactive-ion etching of insulating materials of inorganic materials by chemical means
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W74/00—Encapsulations, e.g. protective coatings
    • H10W74/40—Encapsulations, e.g. protective coatings characterised by their materials
IL35376A 1969-10-04 1970-09-30 Method for the production of semiconductor devices IL35376A0 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IT5358869 1969-10-04

Publications (1)

Publication Number Publication Date
IL35376A0 true IL35376A0 (en) 1970-11-30

Family

ID=11283893

Family Applications (1)

Application Number Title Priority Date Filing Date
IL35376A IL35376A0 (en) 1969-10-04 1970-09-30 Method for the production of semiconductor devices

Country Status (5)

Country Link
BE (1) BE756729A (fr)
DE (1) DE2046872A1 (fr)
FR (1) FR2064138A1 (fr)
IL (1) IL35376A0 (fr)
NL (1) NL7014087A (fr)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3940288A (en) 1973-05-16 1976-02-24 Fujitsu Limited Method of making a semiconductor device
DE2824026A1 (de) * 1978-06-01 1979-12-20 Licentia Gmbh Verfahren zum herstellen eines sperrschicht-feldeffekttransistors
US4544443A (en) * 1983-05-13 1985-10-01 Shap Kabushiki Kaisha Method for manufacturing an optical memory element

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1614829C3 (de) * 1967-06-22 1974-04-04 Telefunken Patentverwertungs Gmbh, 7900 Ulm Verfahren zum Herstellen eines Halbleiterbauelementes

Also Published As

Publication number Publication date
NL7014087A (fr) 1971-04-06
BE756729A (fr) 1971-03-01
DE2046872A1 (de) 1971-05-19
FR2064138B1 (fr) 1974-06-21
FR2064138A1 (en) 1971-07-16

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