IL88718A0 - Manufacture of electronic device with deposition of material particularly cadmium mercury telluride - Google Patents

Manufacture of electronic device with deposition of material particularly cadmium mercury telluride

Info

Publication number
IL88718A0
IL88718A0 IL88718A IL8871888A IL88718A0 IL 88718 A0 IL88718 A0 IL 88718A0 IL 88718 A IL88718 A IL 88718A IL 8871888 A IL8871888 A IL 8871888A IL 88718 A0 IL88718 A0 IL 88718A0
Authority
IL
Israel
Prior art keywords
deposition
manufacture
electronic device
material particularly
cadmium mercury
Prior art date
Application number
IL88718A
Other languages
English (en)
Original Assignee
Philips Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Nv filed Critical Philips Nv
Publication of IL88718A0 publication Critical patent/IL88718A0/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45561—Gas plumbing upstream of the reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02—Epitaxial-layer growth
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02—Epitaxial-layer growth
    • C30B25/14—Feed and outlet means for the gases; Modifying the flow of the reactive gases
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10—Inorganic compounds or compositions
    • C30B29/46—Sulfur-, selenium- or tellurium-containing compounds
    • C30B29/48—AIIBVI compounds wherein A is Zn, Cd or Hg, and B is S, Se or Te
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
    • H10P14/24—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials using chemical vapour deposition [CVD]
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
    • H10P14/34—Deposited materials, e.g. layers
    • H10P14/3402—Deposited materials, e.g. layers characterised by the chemical composition
    • H10P14/3424—Deposited materials, e.g. layers characterised by the chemical composition being Group IIB-VIA materials
    • H10P14/3432—Tellurides
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
    • H10P14/34—Deposited materials, e.g. layers
    • H10P14/3438—Doping during depositing
    • H10P14/3441—Conductivity type

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Vapour Deposition (AREA)
IL88718A 1987-12-22 1988-12-19 Manufacture of electronic device with deposition of material particularly cadmium mercury telluride IL88718A0 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB8729875A GB2213837B (en) 1987-12-22 1987-12-22 Electronic device manufacture with deposition of material

Publications (1)

Publication Number Publication Date
IL88718A0 true IL88718A0 (en) 1989-07-31

Family

ID=10628873

Family Applications (1)

Application Number Title Priority Date Filing Date
IL88718A IL88718A0 (en) 1987-12-22 1988-12-19 Manufacture of electronic device with deposition of material particularly cadmium mercury telluride

Country Status (5)

Country Link
US (2) US4992303A (ja)
EP (1) EP0322050A3 (ja)
JP (1) JPH01202829A (ja)
GB (1) GB2213837B (ja)
IL (1) IL88718A0 (ja)

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69027496T2 (de) * 1989-09-26 1996-10-31 Canon Kk Gasversorgungsvorrichtung und ihre Verwendung für eine Filmabscheidungsanlage
JP2722833B2 (ja) * 1991-03-18 1998-03-09 富士通株式会社 気相エピタキシャル成長装置および気相エピタキシャル成長方法
JP3131005B2 (ja) * 1992-03-06 2001-01-31 パイオニア株式会社 化合物半導体気相成長装置
JP2870719B2 (ja) * 1993-01-29 1999-03-17 東京エレクトロン株式会社 処理装置
US6500734B2 (en) 1993-07-30 2002-12-31 Applied Materials, Inc. Gas inlets for wafer processing chamber
US5916369A (en) * 1995-06-07 1999-06-29 Applied Materials, Inc. Gas inlets for wafer processing chamber
JP3137164B2 (ja) * 1994-06-02 2001-02-19 信越半導体株式会社 熱処理炉
US5496409A (en) * 1994-07-18 1996-03-05 United Microelectronics Corporation Particle contamination apparatus for semiconductor wafer processing
US6093252A (en) 1995-08-03 2000-07-25 Asm America, Inc. Process chamber with inner support
US5814561A (en) * 1997-02-14 1998-09-29 Jackson; Paul D. Substrate carrier having a streamlined shape and method for thin film formation
JP3406488B2 (ja) * 1997-09-05 2003-05-12 東京エレクトロン株式会社 真空処理装置
TW432578B (en) 1997-09-18 2001-05-01 Tokyo Electron Ltd A vacuum processing apparatus
US6703283B1 (en) * 1999-02-04 2004-03-09 International Business Machines Corporation Discontinuous dielectric interface for bipolar transistors
US6383330B1 (en) 1999-09-10 2002-05-07 Asm America, Inc. Quartz wafer processing chamber
US6716302B2 (en) 2000-11-01 2004-04-06 Applied Materials Inc. Dielectric etch chamber with expanded process window
US20030111013A1 (en) * 2001-12-19 2003-06-19 Oosterlaken Theodorus Gerardus Maria Method for the deposition of silicon germanium layers
US20080264443A1 (en) * 2002-02-05 2008-10-30 Novellus Systems, Inc. Apparatus and methods for increasing the rate of solute concentration evolution in a supercritical process chamber
JP3973605B2 (ja) * 2002-07-10 2007-09-12 東京エレクトロン株式会社 成膜装置及びこれに使用する原料供給装置、成膜方法
US6829056B1 (en) 2003-08-21 2004-12-07 Michael Barnes Monitoring dimensions of features at different locations in the processing of substrates
DE102004009130A1 (de) * 2004-02-25 2005-09-15 Aixtron Ag Einlasssystem für einen MOCVD-Reaktor
JP2007211326A (ja) * 2006-02-13 2007-08-23 Nec Electronics Corp 成膜装置および成膜方法
US20080131979A1 (en) * 2006-12-04 2008-06-05 Sumitomo Electric Industries, Ltd. Vapor-Phase Growth System and Vapor-Phase Growth Method
US7879401B2 (en) * 2006-12-22 2011-02-01 The Regents Of The University Of Michigan Organic vapor jet deposition using an exhaust
CA2649322C (en) * 2008-09-30 2011-02-01 5N Plus Inc. Cadmium telluride production process
US9589793B2 (en) 2008-11-06 2017-03-07 Arizona Board of Regents, a body corporate acting for and on behalf of Arizona State University Laterally varying II-VI alloys and uses thereof
US8720072B2 (en) 2010-08-11 2014-05-13 Thomas J. Bucco Razor with three-axis multi-position capability
CN108909156A (zh) * 2018-09-13 2018-11-30 宛兴友 一种可自动调节印花位置的纺织布料印花装置
US11578405B2 (en) * 2019-04-23 2023-02-14 King Fahd University Of Petroleum And Minerals Apparatus for monitoring carbon nanotube growth
CN113178401A (zh) 2020-01-24 2021-07-27 Asm Ip 控股有限公司 具有侧支撑的处理室

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3338209A (en) * 1965-10-23 1967-08-29 Sperry Rand Corp Epitaxial deposition apparatus
FR2116194B1 (ja) * 1970-02-27 1974-09-06 Labo Electronique Physique
FR2320774A1 (fr) * 1974-01-10 1977-03-11 Radiotechnique Compelec Procede et dispositif de depot de materiau dope
FR2419585A1 (fr) * 1978-03-07 1979-10-05 Thomson Csf Procede d'obtention en phase gazeuse d'une couche epitaxiale de phosphure d'indium, et appareil d'application de ce procede
JPS56138917A (en) * 1980-03-31 1981-10-29 Fujitsu Ltd Vapor phase epitaxial growth
JPS582294A (ja) * 1981-06-29 1983-01-07 Fujitsu Ltd 気相成長方法
JPH0669027B2 (ja) * 1983-02-21 1994-08-31 株式会社日立製作所 半導体ウエハの薄膜形成方法
GB2156857B (en) * 1983-11-30 1987-01-14 Philips Electronic Associated Method of manufacturing a semiconductor device
JPS61114521A (ja) * 1984-11-09 1986-06-02 Nec Corp 半導体結晶成長方法
JPS61143579A (ja) * 1984-12-14 1986-07-01 Nachi Fujikoshi Corp プラズマイオン供給方法
JPS61284931A (ja) * 1985-06-11 1986-12-15 Fujitsu Ltd 気相成長装置
JPS6242517A (ja) * 1985-08-20 1987-02-24 Fujitsu Ltd 半導体気相処理方法
JPS6266621A (ja) * 1985-09-19 1987-03-26 Matsushita Electric Ind Co Ltd 気相成長装置
JPH01143579A (ja) * 1987-11-30 1989-06-06 Matsushita Electric Ind Co Ltd 文字放送受信装置

Also Published As

Publication number Publication date
US4992303A (en) 1991-02-12
GB8729875D0 (en) 1988-02-03
GB2213837A (en) 1989-08-23
JPH01202829A (ja) 1989-08-15
GB2213837B (en) 1992-03-11
EP0322050A2 (en) 1989-06-28
EP0322050A3 (en) 1990-05-16
US5070814A (en) 1991-12-10

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