IN2013CH00566A - - Google Patents

Info

Publication number
IN2013CH00566A
IN2013CH00566A IN566CH2013A IN2013CH00566A IN 2013CH00566 A IN2013CH00566 A IN 2013CH00566A IN 566CH2013 A IN566CH2013 A IN 566CH2013A IN 2013CH00566 A IN2013CH00566 A IN 2013CH00566A
Authority
IN
India
Prior art keywords
robot
robot control
control device
substrate positioning
positioning device
Prior art date
Application number
Other languages
English (en)
Inventor
Minami Takashi
Katsuda Shinichi
Original Assignee
Yaskawa Denki Seisakusho Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Yaskawa Denki Seisakusho Kk filed Critical Yaskawa Denki Seisakusho Kk
Publication of IN2013CH00566A publication Critical patent/IN2013CH00566A/en

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B25HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
    • B25JMANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
    • B25J9/00Program-controlled manipulators
    • B25J9/16Program controls
    • B25J9/1679Program controls characterised by the tasks executed
    • B25J9/1682Dual arm manipulator; Coordination of several manipulators
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/30Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations
    • H10P72/33Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations into and out of processing chamber
    • H10P72/3302Mechanical parts of transfer devices
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B25HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
    • B25JMANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
    • B25J9/00Program-controlled manipulators
    • B25J9/0084Program-controlled manipulators comprising a plurality of manipulators
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B25HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
    • B25JMANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
    • B25J9/00Program-controlled manipulators
    • B25J9/02Program-controlled manipulators characterised by movement of the arms, e.g. cartesian coordinate type
    • B25J9/04Program-controlled manipulators characterised by movement of the arms, e.g. cartesian coordinate type by rotating at least one arm, excluding the head movement itself, e.g. cylindrical coordinate type or polar coordinate type
    • B25J9/041Cylindrical coordinate type
    • B25J9/042Cylindrical coordinate type comprising an articulated arm
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B25HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
    • B25JMANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
    • B25J9/00Program-controlled manipulators
    • B25J9/16Program controls
    • B25J9/1628Program controls characterised by the control loop
    • B25J9/1633Program controls characterised by the control loop compliant, force, torque control, e.g. combined with position control
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B25HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
    • B25JMANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
    • B25J9/00Program-controlled manipulators
    • B25J9/16Program controls
    • B25J9/1656Program controls characterised by programming, planning systems for manipulators
    • B25J9/1664Program controls characterised by programming, planning systems for manipulators characterised by motion, path, trajectory planning
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/06Apparatus for monitoring, sorting, marking, testing or measuring
    • H10P72/0606Position monitoring, e.g. misposition detection or presence detection
    • H10P72/0608Position monitoring, e.g. misposition detection or presence detection of substrates stored in a container, a magazine, a carrier, a boat or the like
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/30Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations
    • H10P72/34Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H10P72/3402Mechanical parts of transfer devices
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/50Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for positioning, orientation or alignment
    • H10P72/53Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for positioning, orientation or alignment using optical controlling means
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/76Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches
    • H10P72/7602Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches the wafers being placed on a robot blade or gripped by a gripper for conveyance
    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05BCONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00Program-control systems
    • G05B2219/30Nc systems
    • G05B2219/45Nc applications
    • G05B2219/45031Manufacturing semiconductor wafers
    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05BCONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00Program-control systems
    • G05B2219/30Nc systems
    • G05B2219/50Machine tool, machine tool null till machine tool work handling
    • G05B2219/50036Find center of circular mark, groove
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00Material or article handling
    • Y10S414/135Associated with semiconductor wafer handling
    • Y10S414/137Associated with semiconductor wafer handling including means for charging or discharging wafer cassette

Landscapes

  • Engineering & Computer Science (AREA)
  • Robotics (AREA)
  • Mechanical Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Manipulator (AREA)
IN566CH2013 2012-02-16 2013-02-11 IN2013CH00566A (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012031982A JP5573861B2 (ja) 2012-02-16 2012-02-16 搬送システム

Publications (1)

Publication Number Publication Date
IN2013CH00566A true IN2013CH00566A (de) 2015-04-24

Family

ID=48957803

Family Applications (1)

Application Number Title Priority Date Filing Date
IN566CH2013 IN2013CH00566A (de) 2012-02-16 2013-02-11

Country Status (6)

Country Link
US (1) US8989901B2 (de)
JP (1) JP5573861B2 (de)
KR (1) KR101446413B1 (de)
CN (1) CN103253512A (de)
IN (1) IN2013CH00566A (de)
TW (1) TW201347937A (de)

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JP6199199B2 (ja) * 2014-02-20 2017-09-20 東京エレクトロン株式会社 基板処理装置、位置ずれ補正方法及び記憶媒体
JP6384195B2 (ja) * 2014-08-20 2018-09-05 株式会社安川電機 ロボットシステムおよびロボット教示方法
US9824908B2 (en) * 2015-05-05 2017-11-21 Kawasaki Jukogyo Kabushiki Kaisha Conveying system, conveying robot and teaching method of the same
JP6587423B2 (ja) * 2015-05-28 2019-10-09 キヤノン株式会社 搬送システム及び露光システム
WO2017104039A1 (ja) * 2015-12-17 2017-06-22 株式会社安川電機 教示システム、教示方法およびロボット
US10099377B2 (en) * 2016-06-29 2018-10-16 Applied Materials, Inc. Methods and systems providing misalignment correction in robots
JP6741538B2 (ja) * 2016-09-28 2020-08-19 川崎重工業株式会社 ロボット、ロボットの制御装置、及び、ロボットの位置教示方法
JP7199073B2 (ja) * 2017-10-20 2023-01-05 株式会社キーレックス 垂直多関節ロボットの教示データ作成システム
US12191168B2 (en) * 2018-04-09 2025-01-07 Tokyo Electron Limited Laser processing device, laser processing system and laser processing method
US11059178B2 (en) * 2018-12-27 2021-07-13 Kawasaki Jukogyo Kabushiki Kaisha Method of correcting position of robot and robot
US10974388B2 (en) * 2018-12-27 2021-04-13 Kawasaki Jukogyo Kabushiki Kaisha Method of correcting position of robot and robot
US12394653B2 (en) * 2020-02-19 2025-08-19 Mao-Yen Sung Wafer carrier disc installation/uninstallation device and installation/uninstallation method thereof
CN113276104B (zh) * 2020-02-19 2024-08-27 总督科技股份有限公司 晶圆转载机构的机械臂校准方法
JP7515323B2 (ja) * 2020-07-09 2024-07-12 東京エレクトロン株式会社 検査装置及び基板搬送方法
JP7712078B2 (ja) * 2020-12-25 2025-07-23 川崎重工業株式会社 基板搬送ロボットの制御装置及び関節モータの制御方法
TW202306022A (zh) * 2021-06-18 2023-02-01 荷蘭商Asm Ip私人控股有限公司 氣相沉積總成、基座處理設備以及清潔基材之方法
CN114536339B (zh) * 2022-03-03 2024-05-31 深圳市大族机器人有限公司 协作机器人的控制方法、装置、协作机器人和存储介质
WO2025002723A1 (en) 2023-06-29 2025-01-02 Asml Netherlands B.V. System and method for robot calibration

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JPH10173022A (ja) * 1996-12-10 1998-06-26 Mecs:Kk ウェハ搬送装置
US6405101B1 (en) * 1998-11-17 2002-06-11 Novellus Systems, Inc. Wafer centering system and method
JP2003142417A (ja) 2001-11-05 2003-05-16 Anelva Corp 成膜処理装置に装備されたロボットの制御装置
JP3760212B2 (ja) * 2001-11-30 2006-03-29 川崎重工業株式会社 アライメント処理方法およびアライメント処理装置
JP4071057B2 (ja) * 2002-07-10 2008-04-02 東京エレクトロン株式会社 基板位置決め装置及び基板処理装置
US6748293B1 (en) * 2003-03-24 2004-06-08 Varian Semiconductor Equipment Associates, Inc. Methods and apparatus for high speed object handling
KR100583727B1 (ko) * 2004-01-07 2006-05-25 삼성전자주식회사 기판 제조 장치 및 이에 사용되는 기판 이송 모듈
CN1876529B (zh) 2006-07-11 2010-12-01 友达光电股份有限公司 玻璃基板移送装置
JP2008173744A (ja) * 2007-01-22 2008-07-31 Tokyo Electron Ltd 搬送システムの搬送位置合わせ方法
KR100855877B1 (ko) 2007-02-23 2008-09-03 세메스 주식회사 기판 처리 장치 및 그 장치에서의 기판 정렬 방법
US8060252B2 (en) * 2007-11-30 2011-11-15 Novellus Systems, Inc. High throughput method of in transit wafer position correction in system using multiple robots
KR20110059724A (ko) * 2008-08-26 2011-06-03 어플라이드 머티어리얼스, 인코포레이티드 레이저 재료 제거 방법 및 장치
JP2011108958A (ja) * 2009-11-20 2011-06-02 Hitachi High-Tech Control Systems Corp 半導体ウェーハ搬送装置及びこれを用いた搬送方法
JP5755844B2 (ja) * 2010-05-31 2015-07-29 株式会社ダイヘン ワーク搬送システム
JP5627518B2 (ja) * 2011-03-16 2014-11-19 大日本スクリーン製造株式会社 基板処理装置および電源管理方法

Also Published As

Publication number Publication date
JP5573861B2 (ja) 2014-08-20
KR20130094754A (ko) 2013-08-26
JP2013168579A (ja) 2013-08-29
US20130218337A1 (en) 2013-08-22
US8989901B2 (en) 2015-03-24
KR101446413B1 (ko) 2014-10-02
CN103253512A (zh) 2013-08-21
TW201347937A (zh) 2013-12-01

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