IT1095410B - Metodo di fabbricazione di una mascherina resistente all'attacco ghimico con un rivestimento di caseina sensibilizzata con bicromato - Google Patents
Metodo di fabbricazione di una mascherina resistente all'attacco ghimico con un rivestimento di caseina sensibilizzata con bicromatoInfo
- Publication number
- IT1095410B IT1095410B IT20243/78A IT2024378A IT1095410B IT 1095410 B IT1095410 B IT 1095410B IT 20243/78 A IT20243/78 A IT 20243/78A IT 2024378 A IT2024378 A IT 2024378A IT 1095410 B IT1095410 B IT 1095410B
- Authority
- IT
- Italy
- Prior art keywords
- bicromate
- manufacture
- chemical attack
- casein coating
- mask resistant
- Prior art date
Links
- 239000005018 casein Substances 0.000 title 1
- BECPQYXYKAMYBN-UHFFFAOYSA-N casein, tech. Chemical compound NCCCCC(C(O)=O)N=C(O)C(CC(O)=O)N=C(O)C(CCC(O)=N)N=C(O)C(CC(C)C)N=C(O)C(CCC(O)=O)N=C(O)C(CC(O)=O)N=C(O)C(CCC(O)=O)N=C(O)C(C(C)O)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=O)N=C(O)C(CCC(O)=O)N=C(O)C(COP(O)(O)=O)N=C(O)C(CCC(O)=N)N=C(O)C(N)CC1=CC=CC=C1 BECPQYXYKAMYBN-UHFFFAOYSA-N 0.000 title 1
- 235000021240 caseins Nutrition 0.000 title 1
- 239000011248 coating agent Substances 0.000 title 1
- 238000000576 coating method Methods 0.000 title 1
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
- 239000000126 substance Substances 0.000 title 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/04—Chromates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/02—Local etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/02—Manufacture of electrodes or electrode systems
- H01J9/14—Manufacture of electrodes or electrode systems of non-emitting electrodes
- H01J9/142—Manufacture of electrodes or electrode systems of non-emitting electrodes of shadow-masks for colour television tubes
- H01J9/144—Mask treatment related to the process of dot deposition during manufacture of luminescent screen
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Manufacturing & Machinery (AREA)
- ing And Chemical Polishing (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US05/772,996 US4061529A (en) | 1977-02-28 | 1977-02-28 | Method for making etch-resistant stencil with dichromate-sensitized casein coating |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| IT7820243A0 IT7820243A0 (it) | 1978-02-13 |
| IT1095410B true IT1095410B (it) | 1985-08-10 |
Family
ID=25096854
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| IT20243/78A IT1095410B (it) | 1977-02-28 | 1978-02-13 | Metodo di fabbricazione di una mascherina resistente all'attacco ghimico con un rivestimento di caseina sensibilizzata con bicromato |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US4061529A (it) |
| JP (1) | JPS6046420B2 (it) |
| CA (1) | CA1103974A (it) |
| DE (1) | DE2808300C2 (it) |
| FR (1) | FR2382025A1 (it) |
| IT (1) | IT1095410B (it) |
Families Citing this family (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4211563A (en) * | 1978-02-13 | 1980-07-08 | Rca Corporation | Aqueous photoresist of casein and N-methylol acrylamide |
| US4237210A (en) * | 1978-12-08 | 1980-12-02 | Rca Corporation | Aqueous photoresist method |
| US4230794A (en) * | 1979-03-16 | 1980-10-28 | Rca Corporation | Improving etch resistance of a casein-based photoresist |
| US4259421A (en) * | 1979-06-04 | 1981-03-31 | Rca Corporation | Improving etch-resistance of casein-based photoresist pattern |
| US4339528A (en) * | 1981-05-19 | 1982-07-13 | Rca Corporation | Etching method using a hardened PVA stencil |
| US4339529A (en) * | 1981-06-02 | 1982-07-13 | Rca Corporation | Etching method using a PVA stencil containing N-methylol acrylamide |
| JPS58214252A (ja) * | 1982-06-04 | 1983-12-13 | Toshiba Corp | シヤドウマスクの製造方法 |
| US4429028A (en) | 1982-06-22 | 1984-01-31 | Rca Corporation | Color picture tube having improved slit type shadow mask and method of making same |
| US4664996A (en) * | 1983-06-24 | 1987-05-12 | Rca Corporation | Method for etching a flat apertured mask for use in a cathode-ray tube |
| US4588676A (en) * | 1983-06-24 | 1986-05-13 | Rca Corporation | Photoexposing a photoresist-coated sheet in a vacuum printing frame |
| US4656107A (en) * | 1983-06-24 | 1987-04-07 | Rca Corporation | Photographic printing plate for use in a vacuum printing frame |
| JPS6079349A (ja) * | 1983-10-06 | 1985-05-07 | Mitsubishi Chem Ind Ltd | 水溶性感光性組成物及び有機カラ−フイルタ− |
| US4482426A (en) * | 1984-04-02 | 1984-11-13 | Rca Corporation | Method for etching apertures into a strip of nickel-iron alloy |
| JPS61180233A (ja) * | 1985-02-06 | 1986-08-12 | Dainippon Screen Mfg Co Ltd | 銅又は銅合金からなる基材表面への耐食性皮膜の形成方法 |
| US4669871A (en) * | 1986-08-01 | 1987-06-02 | Rca Corporation | Photographic printing plate and method of exposing a coated sheet using same |
| US4865953A (en) * | 1987-09-28 | 1989-09-12 | Rca Licensing Corp. | Method for making a stencil with a borax-free, low-dichromate, casein photoresist composition |
| US5006432A (en) * | 1987-10-28 | 1991-04-09 | Kabushiki Kaisha Toshiba | Method for manufacturing a shadow mask |
| US6508945B1 (en) | 2000-02-24 | 2003-01-21 | Sony Corporation | Aperture grill for use in cathode ray tube and method for producing same |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2387056A (en) * | 1943-04-12 | 1945-10-16 | Buck X Ograph Company | Surface plate coatings |
| US2750524A (en) * | 1951-11-15 | 1956-06-12 | Mergenthaler Linotype Gmbh | Perforate mask for multicolor television apparatus and method of producting same |
| US2921852A (en) * | 1954-11-19 | 1960-01-19 | Thomas R Caton | Light-sensitive coating and the method for its production |
| US3011890A (en) * | 1958-07-21 | 1961-12-05 | Eastman Kodak Co | Photographic emulsions |
| US3334584A (en) * | 1962-09-24 | 1967-08-08 | William C Toland | Production of lithographic printing plates |
| US3745011A (en) * | 1971-11-26 | 1973-07-10 | Narland Prod Inc | Novel photo resist composition containing cyclic polycarboxylic acids |
| US3751250A (en) * | 1972-05-08 | 1973-08-07 | Rca Corp | Method for photoexposing a coated sheet prior to etching |
| US3834905A (en) * | 1973-05-23 | 1974-09-10 | Rca Corp | Method of making elliptically or rectangularly graded photoprinting masters |
| FR2254805A1 (en) * | 1973-12-17 | 1975-07-11 | Lavogez Georges | Casein based photosensitive compsn. for offset plates - contg. dichromate or org. sensiters stabilised by borates or phosphates |
| US3929532A (en) * | 1974-07-17 | 1975-12-30 | Rca Corp | Method for etching apertured work piece |
| CA1061161A (en) * | 1974-09-12 | 1979-08-28 | Joseph J. Piascinski | Method for making an etch-resistant stencil |
-
1977
- 1977-02-28 US US05/772,996 patent/US4061529A/en not_active Expired - Lifetime
-
1978
- 1978-02-13 IT IT20243/78A patent/IT1095410B/it active
- 1978-02-22 CA CA297,536A patent/CA1103974A/en not_active Expired
- 1978-02-24 FR FR7805310A patent/FR2382025A1/fr active Granted
- 1978-02-27 DE DE2808300A patent/DE2808300C2/de not_active Expired
- 1978-02-27 JP JP53022721A patent/JPS6046420B2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| FR2382025B1 (it) | 1985-05-17 |
| US4061529A (en) | 1977-12-06 |
| JPS53108429A (en) | 1978-09-21 |
| FR2382025A1 (fr) | 1978-09-22 |
| JPS6046420B2 (ja) | 1985-10-16 |
| IT7820243A0 (it) | 1978-02-13 |
| CA1103974A (en) | 1981-06-30 |
| DE2808300C2 (de) | 1983-05-26 |
| DE2808300A1 (de) | 1978-08-31 |
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