IT1212404B - Metodo comportante un singolo attacco per la formazione di un mesa presentante una parete a piu'gradini. - Google Patents
Metodo comportante un singolo attacco per la formazione di un mesa presentante una parete a piu'gradini.Info
- Publication number
- IT1212404B IT1212404B IT8019547A IT1954780A IT1212404B IT 1212404 B IT1212404 B IT 1212404B IT 8019547 A IT8019547 A IT 8019547A IT 1954780 A IT1954780 A IT 1954780A IT 1212404 B IT1212404 B IT 1212404B
- Authority
- IT
- Italy
- Prior art keywords
- mesa
- presenting
- formation
- multiple wall
- single attack
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D88/00—Three-dimensional [3D] integrated devices
- H10D88/101—Three-dimensional [3D] integrated devices comprising components on opposite major surfaces of semiconductor substrates
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P50/00—Etching of wafers, substrates or parts of devices
- H10P50/60—Wet etching
- H10P50/64—Wet etching of semiconductor materials
- H10P50/642—Chemical etching
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P50/00—Etching of wafers, substrates or parts of devices
- H10P50/69—Etching of wafers, substrates or parts of devices using masks for semiconductor materials
- H10P50/691—Etching of wafers, substrates or parts of devices using masks for semiconductor materials for Group IV materials or Group III-V materials
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US1414479A | 1979-02-22 | 1979-02-22 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| IT8019547A0 IT8019547A0 (it) | 1980-01-29 |
| IT1212404B true IT1212404B (it) | 1989-11-22 |
Family
ID=21763796
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| IT8019547A IT1212404B (it) | 1979-02-22 | 1980-01-29 | Metodo comportante un singolo attacco per la formazione di un mesa presentante una parete a piu'gradini. |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JPS55115335A (it) |
| DE (1) | DE3005627A1 (it) |
| FR (1) | FR2449971A1 (it) |
| GB (1) | GB2042805A (it) |
| IT (1) | IT1212404B (it) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB8624637D0 (en) * | 1986-10-14 | 1986-11-19 | Emi Plc Thorn | Electrical device |
| US4996627A (en) * | 1989-01-30 | 1991-02-26 | Dresser Industries, Inc. | High sensitivity miniature pressure transducer |
| EP2717314A1 (en) * | 2012-10-03 | 2014-04-09 | ABB Technology AG | Method of producing a junction termination for a power semiconductor device and corresponding power semiconductor device |
| FR2998090A1 (fr) * | 2013-06-26 | 2014-05-16 | Commissariat Energie Atomique | Procede de structuration de surface par modification locale de selectivite a la gravure |
| FR3030876B1 (fr) * | 2014-12-22 | 2017-12-15 | Commissariat Energie Atomique | Procede de realisation de motifs |
| CN120711632A (zh) * | 2025-06-07 | 2025-09-26 | 东莞市楚钢精密蚀刻技术有限公司 | 一种多阶梯台阶成型工艺 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL153947B (nl) * | 1967-02-25 | 1977-07-15 | Philips Nv | Werkwijze voor het vervaardigen van halfgeleiderinrichtingen, waarbij een selectief elektrolytisch etsproces wordt toegepast en halfgeleiderinrichting verkregen met toepassing van de werkwijze. |
| NL162254B (nl) * | 1968-11-29 | 1979-11-15 | Philips Nv | Halfgeleiderinrichting voor het omzetten van mechanische spanningen in elektrische signalen en werkwijze voor het vervaardigen daarvan. |
| GB1211499A (en) * | 1969-03-07 | 1970-11-04 | Standard Telephones Cables Ltd | A method of manufacturing semiconductor devices |
| NL180265C (nl) * | 1976-06-21 | 1987-01-16 | Gen Electric | Halfgeleiderinrichting voor hoge spanning. |
| JPS5360580A (en) * | 1976-11-11 | 1978-05-31 | Nec Corp | Etching method of semiconductor material |
| JPS53120280A (en) * | 1977-03-30 | 1978-10-20 | Toshiba Corp | Manufacture of semiconductor device |
-
1980
- 1980-01-29 IT IT8019547A patent/IT1212404B/it active
- 1980-02-15 DE DE19803005627 patent/DE3005627A1/de not_active Withdrawn
- 1980-02-18 JP JP1966180A patent/JPS55115335A/ja active Pending
- 1980-02-19 GB GB8005581A patent/GB2042805A/en not_active Withdrawn
- 1980-02-21 FR FR8003835A patent/FR2449971A1/fr active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| GB2042805A (en) | 1980-09-24 |
| JPS55115335A (en) | 1980-09-05 |
| DE3005627A1 (de) | 1980-09-04 |
| IT8019547A0 (it) | 1980-01-29 |
| FR2449971A1 (fr) | 1980-09-19 |
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