IT1227877B - Procedimento per la deposizione via plasma di strati multipli dimate riale amorfo a composizione variabile - Google Patents

Procedimento per la deposizione via plasma di strati multipli dimate riale amorfo a composizione variabile

Info

Publication number
IT1227877B
IT1227877B IT8822731A IT2273188A IT1227877B IT 1227877 B IT1227877 B IT 1227877B IT 8822731 A IT8822731 A IT 8822731A IT 2273188 A IT2273188 A IT 2273188A IT 1227877 B IT1227877 B IT 1227877B
Authority
IT
Italy
Prior art keywords
procedure
multiple layers
plasma deposition
variable composition
sized amorphous
Prior art date
Application number
IT8822731A
Other languages
English (en)
Other versions
IT8822731A0 (it
Inventor
Dario Della Sala
Ciro Ostrifate
Original Assignee
Eniricerche S P A Agip S P A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eniricerche S P A Agip S P A filed Critical Eniricerche S P A Agip S P A
Publication of IT8822731A0 publication Critical patent/IT8822731A0/it
Priority to IT8822731A priority Critical patent/IT1227877B/it
Priority to GB8924713A priority patent/GB2225344B/en
Priority to NL8902779A priority patent/NL8902779A/nl
Priority to DK562789A priority patent/DK562789A/da
Priority to SE8903769A priority patent/SE8903769L/
Priority to CH4084/89A priority patent/CH677365A5/it
Priority to FR898915349A priority patent/FR2639653B1/fr
Priority to LU87626A priority patent/LU87626A1/fr
Priority to DE3938956A priority patent/DE3938956A1/de
Priority to JP1303427A priority patent/JPH02184023A/ja
Priority to BE8901259A priority patent/BE1003603A3/fr
Priority to ES8904405A priority patent/ES2019008A6/es
Application granted granted Critical
Publication of IT1227877B publication Critical patent/IT1227877B/it

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/515—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using pulsed discharges
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52—Controlling or regulating the coating process

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Vapour Deposition (AREA)
  • Photovoltaic Devices (AREA)
  • Silicon Compounds (AREA)
IT8822731A 1988-11-25 1988-11-25 Procedimento per la deposizione via plasma di strati multipli dimate riale amorfo a composizione variabile IT1227877B (it)

Priority Applications (12)

Application Number Priority Date Filing Date Title
IT8822731A IT1227877B (it) 1988-11-25 1988-11-25 Procedimento per la deposizione via plasma di strati multipli dimate riale amorfo a composizione variabile
GB8924713A GB2225344B (en) 1988-11-25 1989-11-02 Process for plasma-deposition of multiple layers of amorphous material
NL8902779A NL8902779A (nl) 1988-11-25 1989-11-09 Werkwijze voor de plasma-neerslag van meervoudige lagen van amorf materiaal met variabele samenstelling.
DK562789A DK562789A (da) 1988-11-25 1989-11-10 Fremgangsmaade til plasma-aflejring af multiple lag af amorft materiale og med variabel sammensaetning
SE8903769A SE8903769L (sv) 1988-11-25 1989-11-10 Saett foer plasma-avsaettning av multipla skikt av amorfa material med variabel komposition
CH4084/89A CH677365A5 (it) 1988-11-25 1989-11-13
FR898915349A FR2639653B1 (fr) 1988-11-25 1989-11-22 Procede pour deposer par decharge luminescente des couches multiples de matieres amorphes ayant une composition variable
LU87626A LU87626A1 (fr) 1988-11-25 1989-11-22 Procede pour deposer par decharge luminescente des couches multiples de matieres amorphes ayant une composition variable
DE3938956A DE3938956A1 (de) 1988-11-25 1989-11-24 Verfahren zur plasmaablagerung von mehreren schichten aus amorphem material mit variabler zusammensetzung
JP1303427A JPH02184023A (ja) 1988-11-25 1989-11-24 多層構造体のグロー放電析出法
BE8901259A BE1003603A3 (fr) 1988-11-25 1989-11-24 Procede pour deposer par decharge luminescente des couches multiples de matieres amorphes ayant une composition variable.
ES8904405A ES2019008A6 (es) 1988-11-25 1989-11-24 Procedimiento para la deposicion via plasma de estratos multiples de material amorfo de composicion variable.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IT8822731A IT1227877B (it) 1988-11-25 1988-11-25 Procedimento per la deposizione via plasma di strati multipli dimate riale amorfo a composizione variabile

Publications (2)

Publication Number Publication Date
IT8822731A0 IT8822731A0 (it) 1988-11-25
IT1227877B true IT1227877B (it) 1991-05-14

Family

ID=11199778

Family Applications (1)

Application Number Title Priority Date Filing Date
IT8822731A IT1227877B (it) 1988-11-25 1988-11-25 Procedimento per la deposizione via plasma di strati multipli dimate riale amorfo a composizione variabile

Country Status (12)

Country Link
JP (1) JPH02184023A (it)
BE (1) BE1003603A3 (it)
CH (1) CH677365A5 (it)
DE (1) DE3938956A1 (it)
DK (1) DK562789A (it)
ES (1) ES2019008A6 (it)
FR (1) FR2639653B1 (it)
GB (1) GB2225344B (it)
IT (1) IT1227877B (it)
LU (1) LU87626A1 (it)
NL (1) NL8902779A (it)
SE (1) SE8903769L (it)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2306510B (en) * 1995-11-02 1999-06-23 Univ Surrey Modification of metal surfaces
US6203898B1 (en) 1997-08-29 2001-03-20 3M Innovatave Properties Company Article comprising a substrate having a silicone coating

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4485125A (en) * 1982-03-19 1984-11-27 Energy Conversion Devices, Inc. Method for continuously producing tandem amorphous photovoltaic cells
DE3375700D1 (en) * 1982-10-12 1988-03-24 Nat Res Dev Infra red transparent optical components
JPS6066422A (ja) * 1983-09-21 1985-04-16 Kanegafuchi Chem Ind Co Ltd 半導体製造法
KR890004881B1 (ko) * 1983-10-19 1989-11-30 가부시기가이샤 히다찌세이사꾸쇼 플라즈마 처리 방법 및 그 장치
EP0154482B1 (en) * 1984-03-03 1990-05-16 Stc Plc Coating process
US4616597A (en) * 1984-10-31 1986-10-14 Rca Corporation Apparatus for making a plasma coating
US4637895A (en) * 1985-04-01 1987-01-20 Energy Conversion Devices, Inc. Gas mixtures for the vapor deposition of semiconductor material
GB2175016B (en) * 1985-05-11 1990-01-24 Barr & Stroud Ltd Optical coating
US4719123A (en) * 1985-08-05 1988-01-12 Sanyo Electric Co., Ltd. Method for fabricating periodically multilayered film
JP2686928B2 (ja) * 1985-08-26 1997-12-08 アンリツ株式会社 シリコン・ゲルマニウム混晶薄膜導電体
JPH0651909B2 (ja) * 1985-12-28 1994-07-06 キヤノン株式会社 薄膜多層構造の形成方法
GB8620346D0 (en) * 1986-08-21 1986-10-01 Special Research Systems Ltd Chemical vapour deposition of films
CH668145A5 (fr) * 1986-09-26 1988-11-30 Inst Microtechnique De L Unive Procede et installation de depot de silicium amorphe hydrogene sur un substrat dans une enceinte a plasma.
US4887134A (en) * 1986-09-26 1989-12-12 Canon Kabushiki Kaisha Semiconductor device having a semiconductor region in which either the conduction or valence band remains flat while bandgap is continuously graded
EP0334109B1 (de) * 1988-03-24 1993-06-02 Siemens Aktiengesellschaft Verfahren und Vorrichtung zum Herstellen von aus amorphen Silizium-Germanium-Legierungen bestehenden Halbleiterschichten nach der Glimmentladungstechnik, insbesondere für Solarzellen

Also Published As

Publication number Publication date
SE8903769D0 (sv) 1989-11-10
NL8902779A (nl) 1990-06-18
DK562789A (da) 1990-05-26
FR2639653A1 (fr) 1990-06-01
SE8903769L (sv) 1990-05-26
CH677365A5 (it) 1991-05-15
LU87626A1 (fr) 1990-06-12
DK562789D0 (da) 1989-11-10
IT8822731A0 (it) 1988-11-25
FR2639653B1 (fr) 1991-06-21
GB8924713D0 (en) 1989-12-20
DE3938956A1 (de) 1990-05-31
JPH02184023A (ja) 1990-07-18
GB2225344A (en) 1990-05-30
GB2225344B (en) 1993-01-27
BE1003603A3 (fr) 1992-05-05
ES2019008A6 (es) 1991-05-16

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Legal Events

Date Code Title Description
TA Fee payment date (situation as of event date), data collected since 19931001

Effective date: 19931115