IT1244329B - Transistor bipolare di alta velocita' e procedimento per la sua fabbricazione - Google Patents

Transistor bipolare di alta velocita' e procedimento per la sua fabbricazione

Info

Publication number
IT1244329B
IT1244329B IT02236890A IT2236890A IT1244329B IT 1244329 B IT1244329 B IT 1244329B IT 02236890 A IT02236890 A IT 02236890A IT 2236890 A IT2236890 A IT 2236890A IT 1244329 B IT1244329 B IT 1244329B
Authority
IT
Italy
Prior art keywords
procedure
manufacture
high speed
bipolar transistor
speed bipolar
Prior art date
Application number
IT02236890A
Other languages
English (en)
Other versions
IT9022368A0 (it
IT9022368A1 (it
Inventor
Myungsung Kim
Original Assignee
Samsung Electronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Samsung Electronics Co Ltd filed Critical Samsung Electronics Co Ltd
Publication of IT9022368A0 publication Critical patent/IT9022368A0/it
Publication of IT9022368A1 publication Critical patent/IT9022368A1/it
Application granted granted Critical
Publication of IT1244329B publication Critical patent/IT1244329B/it

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D10/00Bipolar junction transistors [BJT]
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00Interconnections in chips, wafers or substrates
    • H10W20/01Manufacture or treatment
    • H10W20/031Manufacture or treatment of conductive parts of the interconnections
    • H10W20/069Manufacture or treatment of conductive parts of the interconnections by forming self-aligned vias or self-aligned contact plugs
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D10/00Bipolar junction transistors [BJT]
    • H10D10/01Manufacture or treatment
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D10/00Bipolar junction transistors [BJT]
    • H10D10/01Manufacture or treatment
    • H10D10/051Manufacture or treatment of vertical BJTs
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D10/00Bipolar junction transistors [BJT]
    • H10D10/40Vertical BJTs
    • H10D10/441Vertical BJTs having an emitter-base junction ending at a main surface of the body and a base-collector junction ending at a lateral surface of the body
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/17Semiconductor regions connected to electrodes not carrying current to be rectified, amplified or switched, e.g. channel regions
    • H10D62/177Base regions of bipolar transistors, e.g. BJTs or IGBTs
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00Electrodes of devices having potential barriers
    • H10D64/01Manufacture or treatment
    • H10D64/011Manufacture or treatment of electrodes ohmically coupled to a semiconductor
    • H10D64/0111Manufacture or treatment of electrodes ohmically coupled to a semiconductor to Group IV semiconductors
    • H10D64/0113Manufacture or treatment of electrodes ohmically coupled to a semiconductor to Group IV semiconductors the conductive layers comprising highly doped semiconductor materials, e.g. polysilicon layers or amorphous silicon layers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00Electrodes of devices having potential barriers
    • H10D64/20Electrodes characterised by their shapes, relative sizes or dispositions 
    • H10D64/27Electrodes not carrying the current to be rectified, amplified, oscillated or switched, e.g. gates
    • H10D64/281Base electrodes for bipolar transistors
IT02236890A 1990-09-06 1990-12-13 Transistor bipolare di alta velocita' e procedimento per la sua fabbricazione IT1244329B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019900014093A KR920007211A (ko) 1990-09-06 1990-09-06 고속 바이폴라 트랜지스터 및 그의 제조방법

Publications (3)

Publication Number Publication Date
IT9022368A0 IT9022368A0 (it) 1990-12-13
IT9022368A1 IT9022368A1 (it) 1992-03-07
IT1244329B true IT1244329B (it) 1994-07-08

Family

ID=19303325

Family Applications (1)

Application Number Title Priority Date Filing Date
IT02236890A IT1244329B (it) 1990-09-06 1990-12-13 Transistor bipolare di alta velocita' e procedimento per la sua fabbricazione

Country Status (5)

Country Link
JP (1) JPH06342801A (it)
KR (1) KR920007211A (it)
FR (1) FR2666685A1 (it)
GB (1) GB2247778A (it)
IT (1) IT1244329B (it)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3366919B2 (ja) * 1997-06-27 2003-01-14 エヌイーシー化合物デバイス株式会社 半導体装置

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61166071A (ja) * 1985-01-17 1986-07-26 Toshiba Corp 半導体装置及びその製造方法
JPS61164262A (ja) * 1985-01-17 1986-07-24 Toshiba Corp 半導体装置
JPS62141768A (ja) * 1985-12-16 1987-06-25 Matsushita Electric Ind Co Ltd 半導体装置およびその製造方法
JPS62189753A (ja) * 1986-02-17 1987-08-19 Hitachi Ltd 半導体装置
US4829015A (en) * 1987-05-21 1989-05-09 Siemens Aktiengesellschaft Method for manufacturing a fully self-adjusted bipolar transistor
JP2623635B2 (ja) * 1988-02-16 1997-06-25 ソニー株式会社 バイポーラトランジスタ及びその製造方法

Also Published As

Publication number Publication date
IT9022368A0 (it) 1990-12-13
FR2666685A1 (fr) 1992-03-13
GB2247778A (en) 1992-03-11
KR920007211A (ko) 1992-04-28
JPH06342801A (ja) 1994-12-13
GB9027182D0 (en) 1991-02-06
IT9022368A1 (it) 1992-03-07

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0001 Granted