IT1245778B - Apparecchio di riscaldamento per vaschette chimiche - Google Patents

Apparecchio di riscaldamento per vaschette chimiche

Info

Publication number
IT1245778B
IT1245778B ITMI910947A ITMI910947A IT1245778B IT 1245778 B IT1245778 B IT 1245778B IT MI910947 A ITMI910947 A IT MI910947A IT MI910947 A ITMI910947 A IT MI910947A IT 1245778 B IT1245778 B IT 1245778B
Authority
IT
Italy
Prior art keywords
heating apparatus
chemical tanks
coil
chemical
immersed
Prior art date
Application number
ITMI910947A
Other languages
English (en)
Inventor
Cirino Scarpa
Giuseppe Musco
Alberto Falzone
Original Assignee
Sgs Thomson Microelectronics
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sgs Thomson Microelectronics filed Critical Sgs Thomson Microelectronics
Priority to ITMI910947A priority Critical patent/IT1245778B/it
Publication of ITMI910947A0 publication Critical patent/ITMI910947A0/it
Priority to JP4067022A priority patent/JPH0596153A/ja
Priority to EP92200864A priority patent/EP0507387B1/en
Priority to DE69207041T priority patent/DE69207041T2/de
Priority to US07/862,003 priority patent/US5353369A/en
Publication of ITMI910947A1 publication Critical patent/ITMI910947A1/it
Application granted granted Critical
Publication of IT1245778B publication Critical patent/IT1245778B/it

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0431—Apparatus for thermal treatment
    • H10P72/0434—Apparatus for thermal treatment mainly by convection
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0418—Apparatus for fluid treatment for etching
    • H10P72/0422—Apparatus for fluid treatment for etching for wet etching
    • H10P72/0426—Apparatus for fluid treatment for etching for wet etching with the semiconductor substrates being dipped in baths or vessels

Landscapes

  • Physical Or Chemical Processes And Apparatus (AREA)
  • Filling Or Discharging Of Gas Storage Vessels (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Weting (AREA)
  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
  • ing And Chemical Polishing (AREA)

Abstract

L'apparecchio comprende almeno una serpentina (1, 2) scambiatrice di calore posta in prossimità dette pareti e immersa all'interno di una vaschetta chimica (3) contenente una soluzione (4) da riscaldare. All'interno della serpentina è fatto circolare un flusso di gas inerte (23), per esempio azoto puro.
ITMI910947A 1991-04-05 1991-04-05 Apparecchio di riscaldamento per vaschette chimiche IT1245778B (it)

Priority Applications (5)

Application Number Priority Date Filing Date Title
ITMI910947A IT1245778B (it) 1991-04-05 1991-04-05 Apparecchio di riscaldamento per vaschette chimiche
JP4067022A JPH0596153A (ja) 1991-04-05 1992-03-25 化学製品タンクの加熱装置
EP92200864A EP0507387B1 (en) 1991-04-05 1992-03-26 Device for heating chemical tanks
DE69207041T DE69207041T2 (de) 1991-04-05 1992-03-26 Heizungsanlage für chemische Behälter
US07/862,003 US5353369A (en) 1991-04-05 1992-04-01 Device for heating a chemical tank with an inert heat exchange fluid using linear and impulsive control

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
ITMI910947A IT1245778B (it) 1991-04-05 1991-04-05 Apparecchio di riscaldamento per vaschette chimiche

Publications (3)

Publication Number Publication Date
ITMI910947A0 ITMI910947A0 (it) 1991-04-05
ITMI910947A1 ITMI910947A1 (it) 1992-10-05
IT1245778B true IT1245778B (it) 1994-10-18

Family

ID=11359464

Family Applications (1)

Application Number Title Priority Date Filing Date
ITMI910947A IT1245778B (it) 1991-04-05 1991-04-05 Apparecchio di riscaldamento per vaschette chimiche

Country Status (5)

Country Link
US (1) US5353369A (it)
EP (1) EP0507387B1 (it)
JP (1) JPH0596153A (it)
DE (1) DE69207041T2 (it)
IT (1) IT1245778B (it)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5550357A (en) * 1994-05-03 1996-08-27 Huang; James P. S. Apparatus for producing heat energy without combustion using non-fuel fluid matter
EP0703604B1 (en) * 1994-09-20 2001-12-05 Consorzio per la Ricerca sulla Microelettronica nel Mezzogiorno Apparatus for the controlled cooling of chemical tanks
US6503363B2 (en) * 2000-03-03 2003-01-07 Seh America, Inc. System for reducing wafer contamination using freshly, conditioned alkaline etching solution
US20040226506A1 (en) * 2003-05-14 2004-11-18 Lynn David Mark Coated wafer processing equipment
KR100752653B1 (ko) * 2006-02-01 2007-08-29 삼성전자주식회사 약액조 내에 가열부를 구비하는 기판 습식 처리 장치 및상기 장치를 사용한 기판 처리용 케미컬 가열 방법
DE102009022477A1 (de) * 2009-05-25 2010-12-16 Universität Konstanz Verfahren zum Texturieren einer Oberfläche eines Halbleitersubstrates sowie Vorrichtung zum Durchführen des Verfahrens
US8684198B2 (en) 2010-02-01 2014-04-01 Kobelco Construction Machinery Co., Ltd. Working machine
JP5496925B2 (ja) * 2011-01-25 2014-05-21 東京エレクトロン株式会社 めっき処理装置、めっき処理方法および記憶媒体
CN107275247A (zh) * 2016-04-07 2017-10-20 盟立自动化股份有限公司 具有气体循环装置的湿法工艺设备
CN107316825A (zh) * 2016-04-27 2017-11-03 盟立自动化股份有限公司 湿式蚀刻装置
US11410861B2 (en) * 2017-02-15 2022-08-09 Tokyo Electron Limited Substrate liquid processing apparatus
US11062922B2 (en) * 2017-02-28 2021-07-13 Tokyo Electron Limited Substrate liquid processing apparatus

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US729793A (en) * 1902-07-08 1903-06-02 Henry S Powell Water-heater.
US1053906A (en) * 1907-11-06 1913-02-18 Pittsburg Water Heater Company Instantaneous water-heater.
US1409019A (en) * 1920-10-11 1922-03-07 Frank Smith Electrical heating device
US1937226A (en) * 1930-02-20 1933-11-28 Horch Rudolf Apparatus for maintaining the temperature of a fermenting liquid
US2254387A (en) * 1939-03-11 1941-09-02 Charles A Olcott Means for conditioning sugar bearing materials
US2522373A (en) * 1944-10-26 1950-09-12 Electrolux Ab Storage type liquid-heating system
US3590909A (en) * 1969-10-29 1971-07-06 Trane Co Oxygen boiler
US3609296A (en) * 1970-03-27 1971-09-28 Fuel Engineering Electrically heated autoclave apparatus
US4362149A (en) * 1980-12-08 1982-12-07 Rockwell International Corporation Heat storage system and method
US4815526A (en) * 1982-01-18 1989-03-28 Leif Liljegren Central space heating apparatus
FR2562643B1 (fr) * 1984-04-09 1989-10-27 Equiptechnic Appareil pour produire de l'eau chaude au moyen de fluide a haute temperature et son application au chauffage de l'eau sanitaire, notamment au moyen de vapeur a haute pression
US4841645A (en) * 1987-12-08 1989-06-27 Micro Contamination Components Industries Vapor dryer
DE3906075A1 (de) * 1989-02-27 1990-08-30 Soehlbrand Heinrich Dr Dipl Ch Verfahren zur thermischen behandlung von halbleitermaterialien und vorrichtung zur durchfuehrung desselben

Also Published As

Publication number Publication date
DE69207041T2 (de) 1996-07-25
JPH0596153A (ja) 1993-04-20
EP0507387B1 (en) 1995-12-27
ITMI910947A0 (it) 1991-04-05
ITMI910947A1 (it) 1992-10-05
EP0507387A1 (en) 1992-10-07
DE69207041D1 (de) 1996-02-08
US5353369A (en) 1994-10-04

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Legal Events

Date Code Title Description
0001 Granted
TA Fee payment date (situation as of event date), data collected since 19931001

Effective date: 19970429