IT1252811B - Generatore di ioni con camera di ionizzazione costruita o rivestita con materiale ad alto coefficiente di emissione secondaria - Google Patents
Generatore di ioni con camera di ionizzazione costruita o rivestita con materiale ad alto coefficiente di emissione secondariaInfo
- Publication number
- IT1252811B IT1252811B ITFI910248A ITFI910248A IT1252811B IT 1252811 B IT1252811 B IT 1252811B IT FI910248 A ITFI910248 A IT FI910248A IT FI910248 A ITFI910248 A IT FI910248A IT 1252811 B IT1252811 B IT 1252811B
- Authority
- IT
- Italy
- Prior art keywords
- ionization chamber
- coated
- secondary emission
- emission coefficient
- high secondary
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F03—MACHINES OR ENGINES FOR LIQUIDS; WIND, SPRING, OR WEIGHT MOTORS; PRODUCING MECHANICAL POWER OR A REACTIVE PROPULSIVE THRUST, NOT OTHERWISE PROVIDED FOR
- F03H—PRODUCING A REACTIVE PROPULSIVE THRUST, NOT OTHERWISE PROVIDED FOR
- F03H1/00—Using plasma to produce a reactive propulsive thrust
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J43/00—Secondary-emission tubes; Electron-multiplier tubes
- H01J43/02—Tubes in which one or a few electrodes are secondary-electron emitting electrodes
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Combustion & Propulsion (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Electron Sources, Ion Sources (AREA)
- Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
- Particle Accelerators (AREA)
Abstract
In un dispositivo per la generazione di ioni, la camera di ionizzazione è caratterizzata da pareti rivestite da un materiale ad alto coefficiente di emissione secondaria, come ad esempio apposito vetro; ciò consente di migliorare, rispetto alle tecniche note, il rendimento energetico ed il rendimento di massa del dispositivo stesso.(Fig. 2)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| ITFI910248A IT1252811B (it) | 1991-10-11 | 1991-10-11 | Generatore di ioni con camera di ionizzazione costruita o rivestita con materiale ad alto coefficiente di emissione secondaria |
| JP4253034A JPH05242820A (ja) | 1991-10-11 | 1992-09-22 | 2次放出の高い係数の材料から構成され或いはその材料によって被覆された電離室付イオン発生器 |
| EP92830557A EP0537123A1 (en) | 1991-10-11 | 1992-10-05 | Ion generator with ionization chamber constructed from or coated with material with a high coefficient of secondary emission |
| US07/958,513 US5434469A (en) | 1991-10-11 | 1992-10-08 | Ion generator with ionization chamber constructed from or coated with material with a high coefficient of secondary emission |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| ITFI910248A IT1252811B (it) | 1991-10-11 | 1991-10-11 | Generatore di ioni con camera di ionizzazione costruita o rivestita con materiale ad alto coefficiente di emissione secondaria |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| ITFI910248A0 ITFI910248A0 (it) | 1991-10-11 |
| ITFI910248A1 ITFI910248A1 (it) | 1993-04-11 |
| IT1252811B true IT1252811B (it) | 1995-06-28 |
Family
ID=11349817
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| ITFI910248A IT1252811B (it) | 1991-10-11 | 1991-10-11 | Generatore di ioni con camera di ionizzazione costruita o rivestita con materiale ad alto coefficiente di emissione secondaria |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US5434469A (it) |
| EP (1) | EP0537123A1 (it) |
| JP (1) | JPH05242820A (it) |
| IT (1) | IT1252811B (it) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3268180B2 (ja) * | 1994-11-18 | 2002-03-25 | 株式会社東芝 | イオン発生装置、イオン照射装置、及び半導体装置の製造方法 |
| US5969470A (en) * | 1996-11-08 | 1999-10-19 | Veeco Instruments, Inc. | Charged particle source |
| DE19948229C1 (de) * | 1999-10-07 | 2001-05-03 | Daimler Chrysler Ag | Hochfrequenz-Ionenquelle |
| DE10058326C1 (de) * | 2000-11-24 | 2002-06-13 | Astrium Gmbh | Induktiv gekoppelte Hochfrequenz-Elektronenquelle mit reduziertem Leistungsbedarf durch elektrostatischen Einschluss von Elektronen |
| US7214949B2 (en) * | 2004-11-12 | 2007-05-08 | Thorrn Micro Technologies, Inc. | Ion generation by the temporal control of gaseous dielectric breakdown |
| US7661468B2 (en) * | 2005-01-24 | 2010-02-16 | Ventiva, Inc. | Electro-hydrodynamic gas flow cooling system |
| US20100177519A1 (en) * | 2006-01-23 | 2010-07-15 | Schlitz Daniel J | Electro-hydrodynamic gas flow led cooling system |
| CN101894725B (zh) * | 2010-07-09 | 2011-12-14 | 清华大学 | 离子源 |
| US9048190B2 (en) * | 2012-10-09 | 2015-06-02 | Applied Materials, Inc. | Methods and apparatus for processing substrates using an ion shield |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3634690A (en) * | 1970-03-23 | 1972-01-11 | Itt | Tubular photocell with secondary emission from internal surface |
| US4240007A (en) * | 1979-06-29 | 1980-12-16 | International Business Machines Corporation | Microchannel ion gun |
| US4298817A (en) * | 1979-08-13 | 1981-11-03 | Carette Jean Denis | Ion-electron source with channel multiplier having a feedback region |
| GB2120232A (en) * | 1982-05-17 | 1983-11-30 | Galileo Electro Optics Corp | Glass composition |
| JPS59151737A (ja) * | 1983-02-17 | 1984-08-30 | Semiconductor Res Found | イオン源 |
| JPS60262333A (ja) * | 1984-06-07 | 1985-12-25 | Toshiba Corp | マルチパクタ−荷電粒子源 |
| US4737688A (en) * | 1986-07-22 | 1988-04-12 | Applied Electron Corporation | Wide area source of multiply ionized atomic or molecular species |
| US4859908A (en) * | 1986-09-24 | 1989-08-22 | Matsushita Electric Industrial Co., Ltd. | Plasma processing apparatus for large area ion irradiation |
| IT1246682B (it) * | 1991-03-04 | 1994-11-24 | Proel Tecnologie Spa | Dispositivo a catodo cavo non riscaldato per la generazione dinamica di plasma |
-
1991
- 1991-10-11 IT ITFI910248A patent/IT1252811B/it active IP Right Grant
-
1992
- 1992-09-22 JP JP4253034A patent/JPH05242820A/ja active Pending
- 1992-10-05 EP EP92830557A patent/EP0537123A1/en not_active Withdrawn
- 1992-10-08 US US07/958,513 patent/US5434469A/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| EP0537123A1 (en) | 1993-04-14 |
| JPH05242820A (ja) | 1993-09-21 |
| US5434469A (en) | 1995-07-18 |
| ITFI910248A1 (it) | 1993-04-11 |
| ITFI910248A0 (it) | 1991-10-11 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 0001 | Granted | ||
| TA | Fee payment date (situation as of event date), data collected since 19931001 |
Effective date: 19951027 |