IT1261918B - Struttura per deposizione reattiva di metalli in impianti da vuoto continui e relativo processo. - Google Patents

Struttura per deposizione reattiva di metalli in impianti da vuoto continui e relativo processo.

Info

Publication number
IT1261918B
IT1261918B ITRM930385A ITRM930385A IT1261918B IT 1261918 B IT1261918 B IT 1261918B IT RM930385 A ITRM930385 A IT RM930385A IT RM930385 A ITRM930385 A IT RM930385A IT 1261918 B IT1261918 B IT 1261918B
Authority
IT
Italy
Prior art keywords
time
metal
continuous vacuum
roll
source
Prior art date
Application number
ITRM930385A
Other languages
English (en)
Inventor
Carlo Misiano
Enrico Simonetti
Original Assignee
Cetev Cent Tecnolog Vuoto
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cetev Cent Tecnolog Vuoto filed Critical Cetev Cent Tecnolog Vuoto
Priority to ITRM930385A priority Critical patent/IT1261918B/it
Publication of ITRM930385A0 publication Critical patent/ITRM930385A0/it
Publication of ITRM930385A1 publication Critical patent/ITRM930385A1/it
Priority to EP94830271A priority patent/EP0629715B1/en
Priority to US08/258,978 priority patent/US5462602A/en
Priority to US08/501,532 priority patent/US5571574A/en
Application granted granted Critical
Publication of IT1261918B publication Critical patent/IT1261918B/it

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

Miglioramento nella tecnica di deposizione di film dielettrici su substrati plastici generalmente destinati all'imballaggio di prodotti alimentari, a trattamenti ottici ecc. L'invenzione si colloca nel campo della fabbricazione di strutture per deposizioni reattive di metalli, da utilizzare in impianti da vuoto continui. Rispetto alla tecnica tradizionale, il substrato plastico (2) viene esposto alla sorgente (6) del metallo con un cammino a "molti passi", in da essere esposto più volte per una piccola frazione di tempo alla sorgente del metallo vaporizzato, avendo poi un tempo molto più lungo per reagire con l'ambiente gassoso reattivo, eventualmente attivato. L'impianto è essenzialmente costituito da un dispositivo "roll-to roll", avente una configurazione a molti rinvii (1) che si trova in una zona (Z1) di differente pressione rispetto alla zona (Z2) di deposizione, in modo tale da favorire la reazione con il gas di processo. Questa tecnica migliorata consente un notevole risparmio in termini di costo e di tempo nella produzione di film trattato.
ITRM930385A 1993-06-11 1993-06-11 Struttura per deposizione reattiva di metalli in impianti da vuoto continui e relativo processo. IT1261918B (it)

Priority Applications (4)

Application Number Priority Date Filing Date Title
ITRM930385A IT1261918B (it) 1993-06-11 1993-06-11 Struttura per deposizione reattiva di metalli in impianti da vuoto continui e relativo processo.
EP94830271A EP0629715B1 (en) 1993-06-11 1994-05-31 Apparatus for continuous reactive metal deposition in vacuum and its application
US08/258,978 US5462602A (en) 1993-06-11 1994-06-10 Apparatus for continuous reactive metal deposition in vacuum with web looping over upper and lower rollers
US08/501,532 US5571574A (en) 1993-06-11 1995-07-12 Process for continuous reactive metal oxide formation in vacuum

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
ITRM930385A IT1261918B (it) 1993-06-11 1993-06-11 Struttura per deposizione reattiva di metalli in impianti da vuoto continui e relativo processo.

Publications (3)

Publication Number Publication Date
ITRM930385A0 ITRM930385A0 (it) 1993-06-11
ITRM930385A1 ITRM930385A1 (it) 1993-09-11
IT1261918B true IT1261918B (it) 1996-06-04

Family

ID=11401803

Family Applications (1)

Application Number Title Priority Date Filing Date
ITRM930385A IT1261918B (it) 1993-06-11 1993-06-11 Struttura per deposizione reattiva di metalli in impianti da vuoto continui e relativo processo.

Country Status (3)

Country Link
US (2) US5462602A (it)
EP (1) EP0629715B1 (it)
IT (1) IT1261918B (it)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0722787B1 (en) 1993-10-04 2002-06-05 3M Innovative Properties Company Process for making an acrylate coating
DE29600991U1 (de) * 1996-01-20 1997-05-22 Strämke, Siegfried, Dr.-Ing., 52538 Selfkant Plasmareaktor
KR19980033213A (ko) * 1996-10-31 1998-07-25 조셉제이.스위니 스퍼터링 챔버내의 미립자 물질 발생 감소 방법
US6039834A (en) * 1997-03-05 2000-03-21 Applied Materials, Inc. Apparatus and methods for upgraded substrate processing system with microwave plasma source
US6026762A (en) * 1997-04-23 2000-02-22 Applied Materials, Inc. Apparatus for improved remote microwave plasma source for use with substrate processing systems
US6274058B1 (en) 1997-07-11 2001-08-14 Applied Materials, Inc. Remote plasma cleaning method for processing chambers
US6391400B1 (en) 1998-04-08 2002-05-21 Thomas A. Russell Thermal control films suitable for use in glazing
US6384736B1 (en) * 1998-04-30 2002-05-07 Dave Gothard Remote control electronic display system
DE19845268C1 (de) * 1998-10-01 2000-01-05 Fraunhofer Ges Forschung Verfahren zum Bedampfen bandförmiger Substrate mit einer transparenten Barriereschicht aus Aluminiumoxid
JP4841023B2 (ja) * 2000-02-10 2011-12-21 株式会社半導体エネルギー研究所 成膜装置及び太陽電池の作製方法
DE10255822B4 (de) * 2002-11-29 2004-10-28 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zum Bedampfen bandförmiger Substrate mit einer transparenten Barriereschicht aus Aluminiumoxid
KR101314708B1 (ko) 2006-03-26 2013-10-10 로터스 어플라이드 테크놀로지, 엘엘씨 원자층 증착 시스템 및 연성 기판을 코팅하기 위한 방법
US9017480B2 (en) 2006-04-06 2015-04-28 First Solar, Inc. System and method for transport
US8187679B2 (en) * 2006-07-29 2012-05-29 Lotus Applied Technology, Llc Radical-enhanced atomic layer deposition system and method
US9751254B2 (en) * 2008-10-09 2017-09-05 Bobst Manchester Ltd Apparatus for treating substrates
US8637117B2 (en) 2009-10-14 2014-01-28 Lotus Applied Technology, Llc Inhibiting excess precursor transport between separate precursor zones in an atomic layer deposition system
US8637123B2 (en) * 2009-12-29 2014-01-28 Lotus Applied Technology, Llc Oxygen radical generation for radical-enhanced thin film deposition
KR101114832B1 (ko) * 2011-05-31 2012-03-06 에스엔유 프리시젼 주식회사 진공증착장치
JP2015021172A (ja) * 2013-07-19 2015-02-02 日東電工株式会社 スパッタ装置
CN104404474A (zh) * 2014-12-26 2015-03-11 辽宁北宇真空科技有限公司 一种连续式真空离子镀膜机
CN108655115A (zh) * 2018-06-01 2018-10-16 江阴瑞兴科技有限公司 一种连续进出料式等离子清洗设备
DE102019007935B4 (de) * 2019-11-14 2023-06-29 Elfolion Gmbh Verfahren zum Bearbeiten flexibler Substrate und Vakuumbearbeitungsanlage zur Umsetzung des Verfahrens

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2665228A (en) * 1950-07-19 1954-01-05 Nat Res Corp Apparatus and process for vapor coating
GB1596385A (en) * 1976-12-29 1981-08-26 Matsushita Electric Industrial Co Ltd Methods and apparatus for manufacturing magnetic recording media
US4403002A (en) * 1979-12-10 1983-09-06 Fuji Photo Film Co., Ltd. Vacuum evaporating apparatus
DE3046564A1 (de) * 1979-12-10 1981-09-17 Fuji Photo Film Co., Ltd., Minami-Ashigara, Kanagawa "verfahren und vorrichtung zur vakuum-bedampfung"
JPS6053745B2 (ja) * 1981-07-31 1985-11-27 アルバツク成膜株式会社 二元蒸着によつて不均質光学的薄膜を形成する方法
EP0122092A3 (en) * 1983-04-06 1985-07-10 General Engineering Radcliffe Limited Vacuum coating apparatus
DE3738722C2 (de) * 1987-11-14 1995-12-14 Leybold Ag Vorrichtung zum beidseitigen Beschichten von Bändern
US4851095A (en) * 1988-02-08 1989-07-25 Optical Coating Laboratory, Inc. Magnetron sputtering apparatus and process
CA2044053C (en) * 1990-06-08 2001-11-27 Roger W. Phillips Barrier film having high colorless transparency and method

Also Published As

Publication number Publication date
US5462602A (en) 1995-10-31
EP0629715B1 (en) 1998-01-28
US5571574A (en) 1996-11-05
ITRM930385A0 (it) 1993-06-11
ITRM930385A1 (it) 1993-09-11
EP0629715A1 (en) 1994-12-21

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Legal Events

Date Code Title Description
0001 Granted
TA Fee payment date (situation as of event date), data collected since 19931001

Effective date: 19970404