IT1279080B1 - Processo di fabbricazione di circuiti in film sottile comprendenti condensatori integrati - Google Patents

Processo di fabbricazione di circuiti in film sottile comprendenti condensatori integrati

Info

Publication number
IT1279080B1
IT1279080B1 IT95MI002486A ITMI952486A IT1279080B1 IT 1279080 B1 IT1279080 B1 IT 1279080B1 IT 95MI002486 A IT95MI002486 A IT 95MI002486A IT MI952486 A ITMI952486 A IT MI952486A IT 1279080 B1 IT1279080 B1 IT 1279080B1
Authority
IT
Italy
Prior art keywords
thin film
manufacturing process
process including
including integrated
film circuits
Prior art date
Application number
IT95MI002486A
Other languages
English (en)
Inventor
Giorgio Carcano
Stefano Lazzari
Massimo Magliocco
Original Assignee
Sits Soc It Telecom Siemens
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sits Soc It Telecom Siemens filed Critical Sits Soc It Telecom Siemens
Priority to IT95MI002486A priority Critical patent/IT1279080B1/it
Publication of ITMI952486A0 publication Critical patent/ITMI952486A0/it
Priority to PCT/EP1996/004406 priority patent/WO1997020345A1/en
Priority to EP96934619A priority patent/EP0870326B1/en
Publication of ITMI952486A1 publication Critical patent/ITMI952486A1/it
Application granted granted Critical
Publication of IT1279080B1 publication Critical patent/IT1279080B1/it

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D1/00—Resistors, capacitors or inductors
    • H10D1/60—Capacitors
    • H10D1/68—Capacitors having no potential barriers
IT95MI002486A 1995-11-29 1995-11-29 Processo di fabbricazione di circuiti in film sottile comprendenti condensatori integrati IT1279080B1 (it)

Priority Applications (3)

Application Number Priority Date Filing Date Title
IT95MI002486A IT1279080B1 (it) 1995-11-29 1995-11-29 Processo di fabbricazione di circuiti in film sottile comprendenti condensatori integrati
PCT/EP1996/004406 WO1997020345A1 (en) 1995-11-29 1996-10-10 Manufacturing process for thin-film circuits comprising integrated capacitors
EP96934619A EP0870326B1 (en) 1995-11-29 1996-10-10 Manufacturing process for thin-film circuits comprising integrated capacitors

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IT95MI002486A IT1279080B1 (it) 1995-11-29 1995-11-29 Processo di fabbricazione di circuiti in film sottile comprendenti condensatori integrati

Publications (3)

Publication Number Publication Date
ITMI952486A0 ITMI952486A0 (it) 1995-11-29
ITMI952486A1 ITMI952486A1 (it) 1997-05-29
IT1279080B1 true IT1279080B1 (it) 1997-12-04

Family

ID=11372617

Family Applications (1)

Application Number Title Priority Date Filing Date
IT95MI002486A IT1279080B1 (it) 1995-11-29 1995-11-29 Processo di fabbricazione di circuiti in film sottile comprendenti condensatori integrati

Country Status (3)

Country Link
EP (1) EP0870326B1 (it)
IT (1) IT1279080B1 (it)
WO (1) WO1997020345A1 (it)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002025709A2 (en) * 2000-09-21 2002-03-28 Casper Michael D Integrated thin film capacitor/inductor/interconnect system and method
CN110491830B (zh) * 2019-07-18 2022-08-19 福建省福联集成电路有限公司 一种空气桥制作方法及具有该空气桥的器件
CN114121930B (zh) * 2021-11-12 2026-06-05 中国科学院半导体研究所 应用于mmic中的紧凑型电容、电阻并联结构
CN117524828B (zh) * 2024-01-05 2024-04-09 合肥晶合集成电路股份有限公司 溅射刻蚀方法及半导体结构
CN120971848A (zh) * 2025-08-08 2025-11-18 无锡宸瑞新能源科技有限公司 融合多维度数据的薄膜电容器寿命智能预测方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4436766A (en) * 1981-05-15 1984-03-13 The United States Of America As Represented By The Secretary Of The Navy Plated bridge step-over connection for monolithic devices and method for making thereof
ATE162924T1 (de) * 1993-12-22 1998-02-15 Italtel Spa Verfahren zur herstellung von metallisierten löchern in dielektrischen substraten mit untereinander verbundenen dünnschichtleiter- und/oder widerstandsbahnen

Also Published As

Publication number Publication date
EP0870326A1 (en) 1998-10-14
WO1997020345A1 (en) 1997-06-05
EP0870326B1 (en) 2000-05-31
ITMI952486A1 (it) 1997-05-29
ITMI952486A0 (it) 1995-11-29

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Legal Events

Date Code Title Description
0001 Granted