IT1290465B1 - Substrato con uno strato di diamante policristallino - Google Patents
Substrato con uno strato di diamante policristallinoInfo
- Publication number
- IT1290465B1 IT1290465B1 IT97MI000653A ITMI970653A IT1290465B1 IT 1290465 B1 IT1290465 B1 IT 1290465B1 IT 97MI000653 A IT97MI000653 A IT 97MI000653A IT MI970653 A ITMI970653 A IT MI970653A IT 1290465 B1 IT1290465 B1 IT 1290465B1
- Authority
- IT
- Italy
- Prior art keywords
- substrate
- layer
- polycrystalline diamond
- polycrystalline
- diamond
- Prior art date
Links
- 229910003460 diamond Inorganic materials 0.000 title 1
- 239000010432 diamond Substances 0.000 title 1
- 239000000758 substrate Substances 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
- C23C16/27—Diamond only
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0227—Pretreatment of the material to be coated by cleaning or etching
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Chemical Vapour Deposition (AREA)
- Laminated Bodies (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| AT0053996A AT411070B (de) | 1996-03-25 | 1996-03-25 | Verfahren zur herstellung eines substrates mit einer polykristallinen diamantschicht |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| ITMI970653A1 ITMI970653A1 (it) | 1998-09-21 |
| IT1290465B1 true IT1290465B1 (it) | 1998-12-04 |
Family
ID=3493299
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| IT97MI000653A IT1290465B1 (it) | 1996-03-25 | 1997-03-21 | Substrato con uno strato di diamante policristallino |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US5925413A (it) |
| AT (1) | AT411070B (it) |
| DE (1) | DE19710202A1 (it) |
| FR (1) | FR2746415B1 (it) |
| GB (1) | GB2311539B (it) |
| ID (1) | ID19642A (it) |
| IT (1) | IT1290465B1 (it) |
Families Citing this family (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| AT408153B (de) * | 1998-09-02 | 2001-09-25 | Electrovac | Metall-matrix-composite- (mmc-) bauteil |
| GB9910841D0 (en) * | 1999-05-10 | 1999-07-07 | Univ Nanyang | Heat transfer surface |
| WO2001066488A1 (en) * | 2000-03-07 | 2001-09-13 | Ibiden Co., Ltd. | Ceramic substrate for manufacture/inspection of semiconductor |
| AT6666U1 (de) | 2002-09-23 | 2004-01-26 | Plansee Ag | Wärmesenke aus diamant-haltigem verbundwerkstoff mit mehrlagigem überzug |
| US7866342B2 (en) | 2002-12-18 | 2011-01-11 | Vapor Technologies, Inc. | Valve component for faucet |
| US7866343B2 (en) | 2002-12-18 | 2011-01-11 | Masco Corporation Of Indiana | Faucet |
| US8220489B2 (en) | 2002-12-18 | 2012-07-17 | Vapor Technologies Inc. | Faucet with wear-resistant valve component |
| US8555921B2 (en) | 2002-12-18 | 2013-10-15 | Vapor Technologies Inc. | Faucet component with coating |
| TW200631144A (en) * | 2005-02-18 | 2006-09-01 | Mitac Technology Corp | Chip heat dissipation structure and manufacturing method thereof |
| TWI290012B (en) * | 2005-03-03 | 2007-11-11 | Mitac Technology Corp | Printed circuit board structure and manufacturing method thereof |
| US20070199682A1 (en) * | 2006-02-24 | 2007-08-30 | Ming-Hang Hwang | Dissipation Heat Pipe Structure and Manufacturing Method Thereof |
| US20070199679A1 (en) * | 2006-02-24 | 2007-08-30 | Ming-Hang Hwang | Chip Heat Dissipation System and Manufacturing Method and Structure of Heat Dissipation Device Thereof |
| US20070201207A1 (en) * | 2006-02-24 | 2007-08-30 | Ming-Hang Hwang | Chip Heat Dissipation System and Structure of Heat Exchange Device and Manufacturing Method Thereof |
| US20070201203A1 (en) * | 2006-02-24 | 2007-08-30 | Ming-Hang Hwang | Adhesion Material Structure and Process Method Thereof |
| US20070199677A1 (en) * | 2006-02-24 | 2007-08-30 | Ming-Hang Hwang | Heat Sink Fin Structure and Manufacturing Method Thereof |
| DE102007051800A1 (de) * | 2007-10-26 | 2009-05-07 | Jenoptik Laserdiode Gmbh | Trägerkörper für Halbleiterbauelemente |
| DE102008056368A1 (de) * | 2008-11-07 | 2010-05-12 | Esk Ceramics Gmbh & Co. Kg | Sicherungselement für Schraubverbindungen und dessen Verwendung |
| FR3057179B1 (fr) * | 2016-10-07 | 2021-05-21 | Commissariat Energie Atomique | Procede de fabrication d'elements spheriques submicrometriques ou micrometriques, a cœur en materiau inorganique et revetement en diamant |
| CN110428912B (zh) * | 2019-08-02 | 2020-11-03 | 太原理工大学 | 含有金刚石的第一壁材料及其制备方法 |
| US20250201582A1 (en) * | 2023-12-17 | 2025-06-19 | Taiwan Semiconductor Manufacturing Company, Ltd. | Manufacturing method of heat dissipation layer and manufacturing method of semiconductor device |
| DE102024130537A1 (de) * | 2024-10-21 | 2026-04-23 | Condias Gmbh | Mit Diamant beschichtetes AIN-Substrat und Verfahren zum Herstellen |
Family Cites Families (28)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5921032A (ja) * | 1982-07-26 | 1984-02-02 | Sumitomo Electric Ind Ltd | 半導体装置用基板 |
| JPS616199A (ja) * | 1984-06-21 | 1986-01-11 | Nec Corp | ダイヤモンドの気相合成方法とその装置 |
| EP0251767A3 (en) * | 1986-06-30 | 1988-09-07 | Canon Kabushiki Kaisha | Insulated gate type semiconductor device and method of producing the same |
| US5284709A (en) * | 1987-03-30 | 1994-02-08 | Crystallume | Diamond materials with enhanced heat conductivity |
| EP0374923B2 (en) * | 1988-12-21 | 1999-06-23 | Mitsubishi Materials Corporation | Diamond-coated tool member, substrate thereof and method for producing same |
| US4919974A (en) * | 1989-01-12 | 1990-04-24 | Ford Motor Company | Making diamond composite coated cutting tools |
| US4988421A (en) * | 1989-01-12 | 1991-01-29 | Ford Motor Company | Method of toughening diamond coated tools |
| US5100703A (en) * | 1989-02-23 | 1992-03-31 | Toshiba Tungaloy Co., Ltd. | Diamond-coated sintered body excellent in adhesion and process for preparing the same |
| WO1991004353A1 (fr) * | 1989-09-22 | 1991-04-04 | Showa Denko Kabushiki Kaisha | Procede de synthese de diamant depose en phase vapeur sur un substrat traite par voie electrochimique |
| JPH03141197A (ja) * | 1989-10-27 | 1991-06-17 | Natl Inst For Res In Inorg Mater | プラズマを用いるダイヤモンドの合成法 |
| US5082359A (en) * | 1989-11-28 | 1992-01-21 | Epion Corporation | Diamond films and method of growing diamond films on nondiamond substrates |
| CA2060823C (en) * | 1991-02-08 | 2002-09-10 | Naoya Omori | Diamond-or diamond-like carbon-coated hard materials |
| GB9103691D0 (en) * | 1991-02-21 | 1991-04-10 | De Beers Ind Diamond | Radiation absorbers |
| US5236740A (en) * | 1991-04-26 | 1993-08-17 | National Center For Manufacturing Sciences | Methods for coating adherent diamond films on cemented tungsten carbide substrates |
| WO1992022689A1 (en) * | 1991-06-18 | 1992-12-23 | The Board Of Governors Of Wayne State University | Process for making large-area single crystal diamond films |
| JP3121102B2 (ja) * | 1992-03-26 | 2000-12-25 | キヤノン株式会社 | 平板ダイヤモンド結晶、及びその形成方法 |
| WO1993022482A1 (en) * | 1992-05-04 | 1993-11-11 | Case Western Reserve University | Growth of diamond crystals |
| EP0628642B1 (en) * | 1992-12-08 | 2001-03-21 | Osaka Diamond Industrial Co. | Superhard film-coated material and method of producing the same |
| JPH06263595A (ja) * | 1993-03-10 | 1994-09-20 | Canon Inc | ダイヤモンド被覆部材及びその製造方法 |
| AT400041B (de) * | 1993-03-26 | 1995-09-25 | Plansee Tizit Gmbh | Hartmetall-substrat mit diamantschicht hoher haftfestigkeit |
| JP3549228B2 (ja) * | 1993-05-14 | 2004-08-04 | 株式会社神戸製鋼所 | 高配向性ダイヤモンド放熱基板 |
| SE503038C2 (sv) * | 1993-07-09 | 1996-03-11 | Sandvik Ab | Diamantbelagt skärande verktyg av hårdmetall eller keramik |
| FR2714254B1 (fr) * | 1993-12-20 | 1996-03-08 | Aerospatiale | Elément de transfert thermique, utilisable notamment en électronique comme support de circuit imprimé ou de composant et son procédé de fabrication. |
| EP0673055A1 (en) * | 1994-03-17 | 1995-09-20 | Shin-Etsu Chemical Co., Ltd. | Method for forming a superhard carbonaceous protective film on articles |
| AU2239995A (en) * | 1994-04-06 | 1995-10-30 | Regents Of The University Of California, The | Process to produce diamond films |
| JP3728465B2 (ja) * | 1994-11-25 | 2005-12-21 | 株式会社神戸製鋼所 | 単結晶ダイヤモンド膜の形成方法 |
| US5458927A (en) * | 1995-03-08 | 1995-10-17 | General Motors Corporation | Process for the formation of wear- and scuff-resistant carbon coatings |
| GB2304982B (en) * | 1995-09-08 | 1999-07-21 | Marconi Gec Ltd | Electron microscope specimen supports |
-
1996
- 1996-03-25 AT AT0053996A patent/AT411070B/de not_active IP Right Cessation
-
1997
- 1997-03-12 DE DE19710202A patent/DE19710202A1/de not_active Ceased
- 1997-03-17 GB GB9705491A patent/GB2311539B/en not_active Expired - Fee Related
- 1997-03-21 IT IT97MI000653A patent/IT1290465B1/it active IP Right Grant
- 1997-03-21 FR FR9703484A patent/FR2746415B1/fr not_active Expired - Fee Related
- 1997-03-25 ID IDP970985A patent/ID19642A/id unknown
- 1997-03-25 US US08/823,598 patent/US5925413A/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| ITMI970653A1 (it) | 1998-09-21 |
| ATA53996A (de) | 1997-09-15 |
| GB9705491D0 (en) | 1997-05-07 |
| US5925413A (en) | 1999-07-20 |
| FR2746415B1 (fr) | 2001-08-31 |
| DE19710202A1 (de) | 1997-10-30 |
| ID19642A (id) | 1998-07-23 |
| GB2311539B (en) | 2000-03-01 |
| AT411070B (de) | 2003-09-25 |
| FR2746415A1 (fr) | 1997-09-26 |
| GB2311539A (en) | 1997-10-01 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 0001 | Granted |