IT1299220B1 - Composizione sensibile sia a radiazioni ir che a radiazioni uv e lastra litografica - Google Patents

Composizione sensibile sia a radiazioni ir che a radiazioni uv e lastra litografica

Info

Publication number
IT1299220B1
IT1299220B1 IT98MI001023A ITMI981023A IT1299220B1 IT 1299220 B1 IT1299220 B1 IT 1299220B1 IT 98MI001023 A IT98MI001023 A IT 98MI001023A IT MI981023 A ITMI981023 A IT MI981023A IT 1299220 B1 IT1299220 B1 IT 1299220B1
Authority
IT
Italy
Prior art keywords
radiation
lithographic plate
composition sensitive
composition
sensitive
Prior art date
Application number
IT98MI001023A
Other languages
English (en)
Inventor
Angelo Bolli
Paolo Peveri
Andrea Tettamanti
Original Assignee
Lastra Spa
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lastra Spa filed Critical Lastra Spa
Priority to IT98MI001023A priority Critical patent/IT1299220B1/it
Priority to ES99201445T priority patent/ES2216435T3/es
Priority to AT99201445T priority patent/ATE263680T1/de
Priority to EP99201445A priority patent/EP0956948B1/en
Priority to DE69916162T priority patent/DE69916162T2/de
Priority to CA002271834A priority patent/CA2271834A1/en
Priority to US09/309,586 priority patent/US6376150B1/en
Priority to ZA9903248A priority patent/ZA993248B/xx
Priority to JP11131407A priority patent/JP2000029214A/ja
Priority to CNB991076931A priority patent/CN1185547C/zh
Priority to KR1019990016957A priority patent/KR19990088227A/ko
Publication of ITMI981023A1 publication Critical patent/ITMI981023A1/it
Application granted granted Critical
Publication of IT1299220B1 publication Critical patent/IT1299220B1/it
Priority to HK00102455.4A priority patent/HK1023310B/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00—Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
    • B41M5/36—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used using a polymeric layer, which may be particulate and which is deformed or structurally changed with modification of its' properties, e.g. of its' optical hydrophobic-hydrophilic, solubility or permeability properties
    • B41M5/368—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used using a polymeric layer, which may be particulate and which is deformed or structurally changed with modification of its' properties, e.g. of its' optical hydrophobic-hydrophilic, solubility or permeability properties involving the creation of a soluble/insoluble or hydrophilic/hydrophobic permeability pattern; Peel development
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/02—Positive working, i.e. the exposed (imaged) areas are removed
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/06—Developable by an alkaline solution
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/22—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by organic non-macromolecular additives, e.g. dyes, UV-absorbers, plasticisers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/26—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions not involving carbon-to-carbon unsaturated bonds
    • B41C2210/262—Phenolic condensation polymers, e.g. novolacs, resols

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Thermal Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
IT98MI001023A 1998-05-12 1998-05-12 Composizione sensibile sia a radiazioni ir che a radiazioni uv e lastra litografica IT1299220B1 (it)

Priority Applications (12)

Application Number Priority Date Filing Date Title
IT98MI001023A IT1299220B1 (it) 1998-05-12 1998-05-12 Composizione sensibile sia a radiazioni ir che a radiazioni uv e lastra litografica
AT99201445T ATE263680T1 (de) 1998-05-12 1999-05-10 Ir- und uv-strahlungsempfindliche zusammensetzung und offsetdruckplatte
EP99201445A EP0956948B1 (en) 1998-05-12 1999-05-10 IR and UV radiation -sensitive composition and lithographic plate
DE69916162T DE69916162T2 (de) 1998-05-12 1999-05-10 IR- und UV-Strahlungsempfindliche Zusammensetzung und Offsetdruckplatte
ES99201445T ES2216435T3 (es) 1998-05-12 1999-05-10 Composicion sensible a las radiaciones ir y uv.
US09/309,586 US6376150B1 (en) 1998-05-12 1999-05-11 IR- and UV-radiation-sensitive composition and lithographic plate
CA002271834A CA2271834A1 (en) 1998-05-12 1999-05-11 Ir- and uv-radiation-sensitive composition and lithographic plate
ZA9903248A ZA993248B (en) 1998-05-12 1999-05-11 IR- and UV-radiation-sensitive composition and lithographic plate.
JP11131407A JP2000029214A (ja) 1998-05-12 1999-05-12 赤外線及び紫外線感受性組成物及び平版印刷版
CNB991076931A CN1185547C (zh) 1998-05-12 1999-05-12 红外线和紫外线感光组合物及平印印版
KR1019990016957A KR19990088227A (ko) 1998-05-12 1999-05-12 Ｉｒ및ｕｖ조사광감광조성물및리토그라피판
HK00102455.4A HK1023310B (en) 1998-05-12 2000-04-26 Ir and uv radiation -sensitive composition and lithographic plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IT98MI001023A IT1299220B1 (it) 1998-05-12 1998-05-12 Composizione sensibile sia a radiazioni ir che a radiazioni uv e lastra litografica

Publications (2)

Publication Number Publication Date
ITMI981023A1 ITMI981023A1 (it) 1999-11-12
IT1299220B1 true IT1299220B1 (it) 2000-02-29

Family

ID=11379998

Family Applications (1)

Application Number Title Priority Date Filing Date
IT98MI001023A IT1299220B1 (it) 1998-05-12 1998-05-12 Composizione sensibile sia a radiazioni ir che a radiazioni uv e lastra litografica

Country Status (11)

Country Link
US (1) US6376150B1 (it)
EP (1) EP0956948B1 (it)
JP (1) JP2000029214A (it)
KR (1) KR19990088227A (it)
CN (1) CN1185547C (it)
AT (1) ATE263680T1 (it)
CA (1) CA2271834A1 (it)
DE (1) DE69916162T2 (it)
ES (1) ES2216435T3 (it)
IT (1) IT1299220B1 (it)
ZA (1) ZA993248B (it)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4132547B2 (ja) 2000-03-01 2008-08-13 富士フイルム株式会社 画像形成材料及びそれを用いた平版印刷版原版
US6458511B1 (en) * 2000-06-07 2002-10-01 Kodak Polychrome Graphics Llc Thermally imageable positive-working lithographic printing plate precursor and method for imaging
US6436601B1 (en) * 2001-06-25 2002-08-20 Citiplate, Inc. Thermally sensitive coating compositions containing mixed diazo novolaks useful for lithographic elements
US7097956B2 (en) * 2003-01-27 2006-08-29 Eastman Kodak Company Imageable element containing silicate-coated polymer particle
US6790582B1 (en) * 2003-04-01 2004-09-14 Clariant Finance Bvi Limited Photoresist compositions
US7205084B2 (en) * 2003-12-18 2007-04-17 Agfa-Gevaert Heat-sensitive lithographic printing plate precursor
US7338745B2 (en) * 2006-01-23 2008-03-04 Eastman Kodak Company Multilayer imageable element with improved chemical resistance
CN101611350B (zh) * 2007-02-13 2012-08-08 东丽株式会社 正型感光性树脂组合物
JP4790682B2 (ja) * 2007-09-28 2011-10-12 富士フイルム株式会社 平版印刷版原版
CN102207677B (zh) * 2010-03-29 2012-10-24 品青企业股份有限公司 辐射敏感组成物
WO2013119134A1 (en) 2012-10-16 2013-08-15 Eugen Pavel Photoresist with rare-earth sensitizers
CN107797384B (zh) * 2016-09-07 2020-10-09 上海飞凯电子材料有限公司 一种感光树脂、正性光刻胶及应用

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3100077A1 (de) * 1981-01-03 1982-08-05 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch, das einen naphthochinondiazidsulfonsaeureester enthaelt, und verfahren zur herstellung des naphthochinondiazidsulfonsaeureesters
US5753406A (en) * 1988-10-18 1998-05-19 Japan Synthetic Rubber Co., Ltd. Radiation-sensitive resin composition
DE4426820A1 (de) * 1993-07-29 1995-02-02 Fuji Photo Film Co Ltd Bilderzeugungsmaterial und Bilderzeugungsverfahren
EP0672954B1 (en) 1994-03-14 1999-09-15 Kodak Polychrome Graphics LLC Radiation-sensitive composition containing a resole resin, a novolac resin, an infrared absorber and a triazine and use thereof in lithographic printing plates
GB9426206D0 (en) * 1994-12-23 1995-02-22 Horsell Plc Lithographic plate
US5491046A (en) * 1995-02-10 1996-02-13 Eastman Kodak Company Method of imaging a lithographic printing plate
DE69604114T2 (de) * 1995-04-10 2000-03-02 Shipley Co., L.L.C. Gemische von photoaktiven Zusammensetzungen enthaltendes Fotoresist
US5641608A (en) * 1995-10-23 1997-06-24 Macdermid, Incorporated Direct imaging process for forming resist pattern on a surface and use thereof in fabricating printing plates
ES2114521T3 (es) 1996-04-23 2000-01-16 Kodak Polychrome Graphics Co Precursor de la forma para impresion litografica y su utilizacion en la formacion de imagenes por calor.
JP3814961B2 (ja) 1996-08-06 2006-08-30 三菱化学株式会社 ポジ型感光性印刷版
EP0833204A1 (en) 1996-09-30 1998-04-01 Eastman Kodak Company Infrared-sensitive diazonaphthoquinone imaging composition and element
US5705308A (en) * 1996-09-30 1998-01-06 Eastman Kodak Company Infrared-sensitive, negative-working diazonaphthoquinone imaging composition and element
US5705322A (en) * 1996-09-30 1998-01-06 Eastman Kodak Company Method of providing an image using a negative-working infrared photosensitive element
EP0996869A1 (en) 1997-07-05 2000-05-03 Kodak Polychrome Graphics LLC Pattern-forming methods and radiation sensitive materials
US6060217A (en) * 1997-09-02 2000-05-09 Kodak Polychrome Graphics Llc Thermal lithographic printing plates

Also Published As

Publication number Publication date
CN1241731A (zh) 2000-01-19
DE69916162D1 (de) 2004-05-13
EP0956948B1 (en) 2004-04-07
HK1023310A1 (en) 2000-09-08
CA2271834A1 (en) 1999-11-12
CN1185547C (zh) 2005-01-19
ZA993248B (en) 1999-11-11
DE69916162T2 (de) 2005-04-14
ES2216435T3 (es) 2004-10-16
KR19990088227A (ko) 1999-12-27
ATE263680T1 (de) 2004-04-15
ITMI981023A1 (it) 1999-11-12
JP2000029214A (ja) 2000-01-28
US6376150B1 (en) 2002-04-23
EP0956948A1 (en) 1999-11-17

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Legal Events

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