IT223201Z2 - Dispositivo di introduzione dei reagenti in un impianto di deposizionedi metallorganici allo stato vapore - Google Patents

Dispositivo di introduzione dei reagenti in un impianto di deposizionedi metallorganici allo stato vapore

Info

Publication number
IT223201Z2
IT223201Z2 ITTO910129U IT223201Z2 IT 223201 Z2 IT223201 Z2 IT 223201Z2 IT TO910129 U ITTO910129 U IT TO910129U IT 223201 Z2 IT223201 Z2 IT 223201Z2
Authority
IT
Italy
Prior art keywords
deposition system
vapor state
introduction device
state deposition
reagent introduction
Prior art date
Application number
Other languages
English (en)
Inventor
Daniele Bertone
Original Assignee
Cselt Centro Studi Lab Telecom
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cselt Centro Studi Lab Telecom filed Critical Cselt Centro Studi Lab Telecom
Priority to IT000129 priority Critical patent/IT223201Z2/it
Publication of ITTO910129V0 publication Critical patent/ITTO910129V0/it
Priority to US07/856,243 priority patent/US5224513A/en
Priority to CA 2069694 priority patent/CA2069694C/en
Priority to EP19920109299 priority patent/EP0535308B1/en
Priority to DE1992109299 priority patent/DE535308T1/de
Priority to DE1992601545 priority patent/DE69201545T2/de
Publication of ITTO910129U1 publication Critical patent/ITTO910129U1/it
Application granted granted Critical
Publication of IT223201Z2 publication Critical patent/IT223201Z2/it

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45561—Gas plumbing upstream of the reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02—Epitaxial-layer growth
    • C30B25/14—Feed and outlet means for the gases; Modifying the flow of the reactive gases

Landscapes

  • Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Investigating Or Analyzing Non-Biological Materials By The Use Of Chemical Means (AREA)
  • Chemical Vapour Deposition (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Sampling And Sample Adjustment (AREA)

Abstract

IL DISPOSITIVO D'INTRODUZIONE DEI REAGENTI IN UN IMPIANTO DI DEPOSIZIONE DI METALLORGANICI ALLO STATO VAPORE E' COSTITUITO DA UN CORPO VALVOLA COMPRENDENTE DUE CAMERE, CIASCUNA DELLE QUALI PUO' ESSERE POSTA IN COMUNICAZIONE CON UNA VIA PER L'INTRODUZIONE DEL REAGENTE ED E' PERMANENTEMENTE COLLEGATA A DUE VIE PER IL TRANSITO DI GAS VETTORI.
IT000129 1991-06-04 1991-06-04 Dispositivo di introduzione dei reagenti in un impianto di deposizionedi metallorganici allo stato vapore IT223201Z2 (it)

Priority Applications (6)

Application Number Priority Date Filing Date Title
IT000129 IT223201Z2 (it) 1991-06-04 1991-06-04 Dispositivo di introduzione dei reagenti in un impianto di deposizionedi metallorganici allo stato vapore
US07/856,243 US5224513A (en) 1991-06-04 1992-03-25 Device for introducing reagents into an organometallic vapor phase deposition apparatus
CA 2069694 CA2069694C (en) 1991-06-04 1992-05-27 Device for introducing reagents into an organometallic vapour phase deposition apparatus
EP19920109299 EP0535308B1 (en) 1991-06-04 1992-06-02 Device for introducing reagents into an organometallic vapour phase deposition apparatus
DE1992109299 DE535308T1 (de) 1991-06-04 1992-06-02 Vorrichtung zur Reagenzeinleitung in eine Vorrichtung für Metall-organische Abscheidung aus der Gasphase.
DE1992601545 DE69201545T2 (de) 1991-06-04 1992-06-02 Vorrichtung zur Reagenzeinleitung in eine Vorrichtung für Metall-organische Abscheidung aus der Gasphase.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IT000129 IT223201Z2 (it) 1991-06-04 1991-06-04 Dispositivo di introduzione dei reagenti in un impianto di deposizionedi metallorganici allo stato vapore

Publications (3)

Publication Number Publication Date
ITTO910129V0 ITTO910129V0 (it) 1991-06-04
ITTO910129U1 ITTO910129U1 (it) 1992-12-04
IT223201Z2 true IT223201Z2 (it) 1995-06-13

Family

ID=11408978

Family Applications (1)

Application Number Title Priority Date Filing Date
IT000129 IT223201Z2 (it) 1991-06-04 1991-06-04 Dispositivo di introduzione dei reagenti in un impianto di deposizionedi metallorganici allo stato vapore

Country Status (4)

Country Link
EP (1) EP0535308B1 (it)
CA (1) CA2069694C (it)
DE (2) DE535308T1 (it)
IT (1) IT223201Z2 (it)

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4747367A (en) * 1986-06-12 1988-05-31 Crystal Specialties, Inc. Method and apparatus for producing a constant flow, constant pressure chemical vapor deposition

Also Published As

Publication number Publication date
DE69201545T2 (de) 1995-08-03
DE535308T1 (de) 1994-02-24
ITTO910129V0 (it) 1991-06-04
DE69201545D1 (de) 1995-04-06
EP0535308B1 (en) 1995-03-01
CA2069694C (en) 1999-01-05
ITTO910129U1 (it) 1992-12-04
EP0535308A1 (en) 1993-04-07
CA2069694A1 (en) 1992-12-05

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Legal Events

Date Code Title Description
0001 Granted