IT959298B - Procedimento per la formazione di strati sepolti in dispositivi semi conduttori mediante iniezione di ioni - Google Patents

Procedimento per la formazione di strati sepolti in dispositivi semi conduttori mediante iniezione di ioni

Info

Publication number
IT959298B
IT959298B IT68603/72A IT6860372A IT959298B IT 959298 B IT959298 B IT 959298B IT 68603/72 A IT68603/72 A IT 68603/72A IT 6860372 A IT6860372 A IT 6860372A IT 959298 B IT959298 B IT 959298B
Authority
IT
Italy
Prior art keywords
ions
semi
injection
procedure
formation
Prior art date
Application number
IT68603/72A
Other languages
English (en)
Italian (it)
Original Assignee
Western Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co filed Critical Western Electric Co
Application granted granted Critical
Publication of IT959298B publication Critical patent/IT959298B/it

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W15/00Highly-doped buried regions of integrated devices
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/63Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the formation processes
    • H10P14/6302Non-deposition formation processes
    • H10P14/6304Formation by oxidation, e.g. oxidation of the substrate
    • H10P14/6306Formation by oxidation, e.g. oxidation of the substrate of the semiconductor materials
    • H10P14/6308Formation by oxidation, e.g. oxidation of the substrate of the semiconductor materials of Group IV semiconductors
    • H10P14/6309Formation by oxidation, e.g. oxidation of the substrate of the semiconductor materials of Group IV semiconductors of silicon in uncombined form, i.e. pure silicon
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/63Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the formation processes
    • H10P14/6302Non-deposition formation processes
    • H10P14/6322Formation by thermal treatments
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W15/00Highly-doped buried regions of integrated devices
    • H10W15/01Manufacture or treatment
IT68603/72A 1971-05-24 1972-05-19 Procedimento per la formazione di strati sepolti in dispositivi semi conduttori mediante iniezione di ioni IT959298B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US14625271A 1971-05-24 1971-05-24

Publications (1)

Publication Number Publication Date
IT959298B true IT959298B (it) 1973-11-10

Family

ID=22516512

Family Applications (1)

Application Number Title Priority Date Filing Date
IT68603/72A IT959298B (it) 1971-05-24 1972-05-19 Procedimento per la formazione di strati sepolti in dispositivi semi conduttori mediante iniezione di ioni

Country Status (11)

Country Link
JP (1) JPS5138582B1 (fr)
BE (1) BE783709A (fr)
CA (1) CA921620A (fr)
CH (1) CH535494A (fr)
DE (1) DE2224467B2 (fr)
FR (1) FR2138932B1 (fr)
GB (1) GB1397338A (fr)
HK (1) HK36076A (fr)
IT (1) IT959298B (fr)
NL (1) NL159531B (fr)
SE (1) SE372137B (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2206994A (en) * 1987-06-08 1989-01-18 Philips Electronic Associated Semiconductor device

Also Published As

Publication number Publication date
CA921620A (en) 1973-02-20
FR2138932B1 (fr) 1975-08-29
HK36076A (en) 1976-06-18
BE783709A (fr) 1972-09-18
FR2138932A1 (fr) 1973-01-05
CH535494A (de) 1973-03-31
DE2224467A1 (de) 1972-12-07
NL159531B (nl) 1979-02-15
NL7206913A (fr) 1972-11-28
JPS5138582B1 (fr) 1976-10-22
GB1397338A (en) 1975-06-11
SE372137B (fr) 1974-12-09
DE2224467B2 (de) 1974-03-07

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