ITMI20021961A1 - Procedimento per la fabbricazione ed il controllo mediante stampaggio su scale micro- e nanometriche di strutture e motivi di sostanze solubili e colloidali con riduzione delle dimensioni dei motivi dello stampo. - Google Patents

Procedimento per la fabbricazione ed il controllo mediante stampaggio su scale micro- e nanometriche di strutture e motivi di sostanze solubili e colloidali con riduzione delle dimensioni dei motivi dello stampo.

Info

Publication number
ITMI20021961A1
ITMI20021961A1 IT001961A ITMI20021961A ITMI20021961A1 IT MI20021961 A1 ITMI20021961 A1 IT MI20021961A1 IT 001961 A IT001961 A IT 001961A IT MI20021961 A ITMI20021961 A IT MI20021961A IT MI20021961 A1 ITMI20021961 A1 IT MI20021961A1
Authority
IT
Italy
Prior art keywords
reasons
nanometric
stairs
soluble
mold
Prior art date
Application number
IT001961A
Other languages
English (en)
Inventor
Fabio Biscarini
Francesco Cino Matacotta
Original Assignee
Consiglio Nazionale Ricerche
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Consiglio Nazionale Ricerche filed Critical Consiglio Nazionale Ricerche
Priority to IT001961A priority Critical patent/ITMI20021961A1/it
Priority to EP03769278A priority patent/EP1579275A2/en
Priority to PCT/EP2003/010242 priority patent/WO2004025367A2/en
Priority to US10/528,378 priority patent/US7320283B2/en
Priority to AU2003277859A priority patent/AU2003277859A1/en
Publication of ITMI20021961A1 publication Critical patent/ITMI20021961A1/it

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/84—Manufacture, treatment, or detection of nanostructure
    • Y10S977/887—Nanoimprint lithography, i.e. nanostamp
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/84—Manufacture, treatment, or detection of nanostructure
    • Y10S977/89—Deposition of materials, e.g. coating, cvd, or ald
    • Y10S977/892—Liquid phase deposition

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
IT001961A 2002-09-16 2002-09-16 Procedimento per la fabbricazione ed il controllo mediante stampaggio su scale micro- e nanometriche di strutture e motivi di sostanze solubili e colloidali con riduzione delle dimensioni dei motivi dello stampo. ITMI20021961A1 (it)

Priority Applications (5)

Application Number Priority Date Filing Date Title
IT001961A ITMI20021961A1 (it) 2002-09-16 2002-09-16 Procedimento per la fabbricazione ed il controllo mediante stampaggio su scale micro- e nanometriche di strutture e motivi di sostanze solubili e colloidali con riduzione delle dimensioni dei motivi dello stampo.
EP03769278A EP1579275A2 (en) 2002-09-16 2003-09-15 Method for manufacturing and controlling structures and patterns of soluble and colloidal substances by printing on the micrometer and nanometer scale and with reduction of the dimensions of the stamp's features
PCT/EP2003/010242 WO2004025367A2 (en) 2002-09-16 2003-09-15 Method for manufacturing and controlling structures and patterns of soluble and colloidal substances by printing on the micrometer and nanometer scale and with reduction of the dimensions of the stamp's features
US10/528,378 US7320283B2 (en) 2002-09-16 2003-09-15 Nanoprinting method
AU2003277859A AU2003277859A1 (en) 2002-09-16 2003-09-15 Method for manufacturing and controlling structures and patterns of soluble and colloidal substances by printing on the micrometer and nanometer scale and with reduction of the dimensions of the stamp's features

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IT001961A ITMI20021961A1 (it) 2002-09-16 2002-09-16 Procedimento per la fabbricazione ed il controllo mediante stampaggio su scale micro- e nanometriche di strutture e motivi di sostanze solubili e colloidali con riduzione delle dimensioni dei motivi dello stampo.

Publications (1)

Publication Number Publication Date
ITMI20021961A1 true ITMI20021961A1 (it) 2004-03-17

Family

ID=31986029

Family Applications (1)

Application Number Title Priority Date Filing Date
IT001961A ITMI20021961A1 (it) 2002-09-16 2002-09-16 Procedimento per la fabbricazione ed il controllo mediante stampaggio su scale micro- e nanometriche di strutture e motivi di sostanze solubili e colloidali con riduzione delle dimensioni dei motivi dello stampo.

Country Status (5)

Country Link
US (1) US7320283B2 (it)
EP (1) EP1579275A2 (it)
AU (1) AU2003277859A1 (it)
IT (1) ITMI20021961A1 (it)
WO (1) WO2004025367A2 (it)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10344777B4 (de) * 2003-09-26 2006-04-27 Infineon Technologies Ag Stempelvorrichtung für Softlithografie und Verfahren zu deren Herstellung
US7306970B2 (en) * 2004-08-30 2007-12-11 International Business Machines Corporation Method and apparatus for manufacturing an optoelectronic device
US9492272B2 (en) * 2009-08-13 2016-11-15 Acufocus, Inc. Masked intraocular implants and lenses
ITMI20102295A1 (it) 2010-12-15 2012-06-16 Consiglio Nazionale Ricerche Metodo per la realizzazione di strutture complesse su scala micrometrica o nanometrica, e struttura complessa cosi' ottenuta
KR102315257B1 (ko) 2014-03-31 2021-10-21 코닌클리케 필립스 엔.브이. 임프린팅 방법, 컴퓨터 프로그램 제품 및 임프린팅 장치
CN108682627B (zh) * 2018-05-18 2019-05-21 清华大学 图案化柔性有机薄膜及制备方法、层叠体及图案化方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5900160A (en) * 1993-10-04 1999-05-04 President And Fellows Of Harvard College Methods of etching articles via microcontact printing
WO1996029629A2 (en) * 1995-03-01 1996-09-26 President And Fellows Of Harvard College Microcontact printing on surfaces and derivative articles
US20030148024A1 (en) * 2001-10-05 2003-08-07 Kodas Toivo T. Low viscosity precursor compositons and methods for the depositon of conductive electronic features
US6713238B1 (en) * 1998-10-09 2004-03-30 Stephen Y. Chou Microscale patterning and articles formed thereby
EP1303792B1 (en) * 2000-07-16 2012-10-03 Board Of Regents, The University Of Texas System High-resolution overlay alignement methods and systems for imprint lithography
CN1696826A (zh) * 2000-08-01 2005-11-16 得克萨斯州大学系统董事会 用对激活光透明的模板在衬底上形成图案的方法及半导体器件
US6701843B2 (en) * 2000-09-18 2004-03-09 Agfa-Gevaert Method of lithographic printing with a reusable substrate
US6932934B2 (en) * 2002-07-11 2005-08-23 Molecular Imprints, Inc. Formation of discontinuous films during an imprint lithography process
US7077992B2 (en) * 2002-07-11 2006-07-18 Molecular Imprints, Inc. Step and repeat imprint lithography processes

Also Published As

Publication number Publication date
US7320283B2 (en) 2008-01-22
WO2004025367A3 (en) 2005-08-11
EP1579275A2 (en) 2005-09-28
US20060027117A1 (en) 2006-02-09
AU2003277859A1 (en) 2004-04-30
WO2004025367A2 (en) 2004-03-25

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