ITTO941014A0 - Dispositivo di irraggiamento per litografia rontgen di profondita' - Google Patents

Dispositivo di irraggiamento per litografia rontgen di profondita'

Info

Publication number
ITTO941014A0
ITTO941014A0 ITTO941014A ITTO941014A ITTO941014A0 IT TO941014 A0 ITTO941014 A0 IT TO941014A0 IT TO941014 A ITTO941014 A IT TO941014A IT TO941014 A ITTO941014 A IT TO941014A IT TO941014 A0 ITTO941014 A0 IT TO941014A0
Authority
IT
Italy
Prior art keywords
iradiation
rontgen
depth lithography
lithography
depth
Prior art date
Application number
ITTO941014A
Other languages
English (en)
Inventor
Bernd Seher
Rudi Neuland
Frank Reuther
Lutz Muller
Original Assignee
Jenoptik Technologie Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jenoptik Technologie Gmbh filed Critical Jenoptik Technologie Gmbh
Publication of ITTO941014A0 publication Critical patent/ITTO941014A0/it
Publication of ITTO941014A1 publication Critical patent/ITTO941014A1/it
Application granted granted Critical
Publication of IT1267202B1 publication Critical patent/IT1267202B1/it

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
IT94TO001014A 1994-05-28 1994-12-12 Dispositivo di irraggiamento per litografia rontgen di profondita' IT1267202B1 (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE4418779A DE4418779C1 (de) 1994-05-28 1994-05-28 Bestrahlungseinrichtung für die Röntgentiefenlithografie

Publications (3)

Publication Number Publication Date
ITTO941014A0 true ITTO941014A0 (it) 1994-12-12
ITTO941014A1 ITTO941014A1 (it) 1996-06-12
IT1267202B1 IT1267202B1 (it) 1997-01-28

Family

ID=6519288

Family Applications (1)

Application Number Title Priority Date Filing Date
IT94TO001014A IT1267202B1 (it) 1994-05-28 1994-12-12 Dispositivo di irraggiamento per litografia rontgen di profondita'

Country Status (8)

Country Link
US (1) US5515410A (it)
JP (1) JP2674960B2 (it)
DE (1) DE4418779C1 (it)
FR (1) FR2720526B1 (it)
GB (1) GB2289832B (it)
IT (1) IT1267202B1 (it)
SE (1) SE512180C2 (it)
TW (1) TW295779B (it)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19846958C2 (de) * 1998-08-19 2001-06-13 Fraunhofer Ges Forschung Verfahren zur Herstellung einer Einrichtung zum Transport von kleinsten Flüssigkeitsmengen
USD441866S1 (en) 1999-04-02 2001-05-08 Fabio Paolo Marchesi Light irradiation unit for the human body

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4993696A (en) * 1986-12-01 1991-02-19 Canon Kabushiki Kaisha Movable stage mechanism
JPH01139237U (it) * 1988-03-15 1989-09-22
DE4117639A1 (de) * 1990-05-31 1991-12-05 Toshiba Kawasaki Kk Synchrotronstrahlungsgeraet
DE4023403A1 (de) * 1990-07-23 1992-01-30 Seiko Seiki Kk Beruehrungsfrei gefuehrter positioniertisch

Also Published As

Publication number Publication date
JPH07326572A (ja) 1995-12-12
US5515410A (en) 1996-05-07
JP2674960B2 (ja) 1997-11-12
GB2289832A (en) 1995-11-29
SE9404015D0 (sv) 1994-11-25
GB9508025D0 (en) 1995-06-07
GB2289832B (en) 1998-07-22
ITTO941014A1 (it) 1996-06-12
SE9404015L (sv) 1995-11-29
TW295779B (it) 1997-01-11
IT1267202B1 (it) 1997-01-28
FR2720526B1 (fr) 1997-08-01
SE512180C2 (sv) 2000-02-07
DE4418779C1 (de) 1995-07-27
FR2720526A1 (fr) 1995-12-01

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Legal Events

Date Code Title Description
0001 Granted
TA Fee payment date (situation as of event date), data collected since 19931001

Effective date: 19981231