JP2000210875A - Rotary grinder - Google Patents

Rotary grinder

Info

Publication number
JP2000210875A
JP2000210875A JP11012116A JP1211699A JP2000210875A JP 2000210875 A JP2000210875 A JP 2000210875A JP 11012116 A JP11012116 A JP 11012116A JP 1211699 A JP1211699 A JP 1211699A JP 2000210875 A JP2000210875 A JP 2000210875A
Authority
JP
Japan
Prior art keywords
polishing
body layer
polishing plate
rotary
plate piece
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11012116A
Other languages
Japanese (ja)
Inventor
Seizo Tsuji
精三 辻
Atsushi Uemura
敦 植村
Shigeo Suzuki
成雄 鈴木
Fukuichi Kitani
福一 木谷
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NIYUUREJISUTON KK
Original Assignee
NIYUUREJISUTON KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NIYUUREJISUTON KK filed Critical NIYUUREJISUTON KK
Priority to JP11012116A priority Critical patent/JP2000210875A/en
Publication of JP2000210875A publication Critical patent/JP2000210875A/en
Pending legal-status Critical Current

Links

Landscapes

  • Polishing Bodies And Polishing Tools (AREA)

Abstract

PROBLEM TO BE SOLVED: To eliminate the unevenness of the height and the hardness of a grinding surface generated at the inner periphery and the outer periphery of an abrasive body layer, in a rotary grinder using a plate piece form of abrasive plate pieces as the composing elements on the abrasive body layer. SOLUTION: In a rotary grinder in which a rotary board 3, and abrasive body layers 2 formed along the peripheral part of on the board 3, are provided, and the abrasive body layers 2 are composed of numerous retangular abrasive plate pieces 1 which are laid to surround the peripheral part of the board 3, in an inclined laminating condition, the abrasive plate pieces 1 are made by a rectangle as the basic form, they are adhered and fixed to the rotary base board surface at the lower end side, and the upper end side is cut obliquely in order to make the cutting width the smaller gradually, from the inner peripheral side to the outer peripheral side.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は回転研磨具、詳しく
は研磨体層を多数枚の板片状研磨板片の傾斜積み重ねに
より構成する回転研磨具に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a rotary polishing tool, and more particularly to a rotary polishing tool in which a polishing body layer is formed by stacking a large number of plate-like polishing plate pieces in an inclined manner.

【0002】[0002]

【従来の技術】回転研磨具に於いて、研磨体層を多数枚
の研磨板片の傾斜積み重により構成することは、例えば
特開昭50−85985号公報から公知である。この公
知の回転研磨具に於いては、矩形状の研磨板片の多数枚
が、回転基板の周辺部を周回するように傾斜積み重ね状
態に敷き詰められ、研磨板片は下端側が回転基板面への
接着固定部を、また上端側が研磨体層の表面に於いて研
磨面を構成している。
2. Description of the Related Art It is known, for example, from Japanese Patent Application Laid-Open No. 50-85885, that in a rotary polishing tool, a polishing body layer is constituted by an inclined stack of a large number of polishing plate pieces. In this known rotary polishing tool, a large number of rectangular polishing plate pieces are laid in an obliquely stacked state so as to go around the peripheral portion of the rotating substrate, and the polishing plate piece has a lower end side to the rotating substrate surface. The adhesive fixing portion and the upper end side constitute the polishing surface in the surface of the polishing body layer.

【0003】[0003]

【発明が解決しようとする課題】上記構成の回転研磨具
によれば、研磨体層表面の研磨面側では、研磨板片の上
端側が磨滅して行くに従い、その下側の研磨板片部分が
次々と新しい研磨面として現れ出てくるので、長期間に
亘って継続使用できる。
According to the rotary polishing tool having the above-mentioned structure, on the polishing surface side of the surface of the polishing body layer, as the upper end side of the polishing plate piece wears down, the lower polishing plate piece portion becomes smaller. Since it appears as a new polishing surface one after another, it can be used continuously for a long time.

【0004】図5〜7は従来のこの種回転研磨具の一例
を示し、図5は矩形状の研磨板片aの傾斜積み重ね途中
の状況を、図6は上記研磨板片aの傾斜積み重ねにより
構成された研磨体層bの状況を、図7は回転基板cの半
径線l上に於ける研磨体層bの断面形状を示している。
図7から明らかなように、研磨体層bの研磨面b1は内
周側から外周側に向けて下がり勾配に傾斜している。図
8は研磨面b1の傾斜発生の原理説明図であり、図中、
Wは研磨体層bの円周上における一枚の研磨板片aの傾
斜設置に必要な設置幅Wを示し、例えば72枚の研磨板
片aから研磨体層bを構成する場合には、円周の長さL
(便宜的に直線で示してある)は設置幅Wの72倍に相
当し、傾斜設置された研磨板片aは内周端側では相互に
緊密に面接触する。ところが、円周の長さは、研磨体層
bの外周寄りほど漸進的に大きくなるので、研磨板片a
の傾斜設置角度θを内周端から外周端まで一定となるよ
うに傾斜設置した場合には、傾斜積み重ねされた研磨板
片a…の相互間に、外周端ほど大きい隙間が発生し、積
み重ね密度に大きなばらつきが発生し、これでは実用に
供し得ない。従来ではこのような問題を解決するため
に、研磨板片aに外周端側ほど傾斜設置角度θが漸進的
に小さくなるように捻れを強制的に与え、研磨板片a,
a間に生ずる隙間を消去している。このようにすれば、
研磨体層bの内外周間で生ずる重なり密度ひいては硬度
差をある程度なくすることができる。ところが、研磨板
片aの傾斜設置角度θが外周端側ほど小さくなると、研
磨体層bの厚みが外周端側ほど小さくなり、研磨面b1
の傾斜となって現れる。
FIGS. 5 to 7 show an example of a conventional rotary polishing tool of this kind. FIG. 5 shows a state in which rectangular polishing plate pieces a are being stacked in an inclined manner, and FIG. FIG. 7 shows the cross-sectional shape of the polishing body layer b on the radius line l of the rotating substrate c.
As apparent from FIG. 7, the polishing surface b 1 of the abrasive layer b is inclined from the inner circumference side gradient down toward the outer circumferential side. 8 is an explanatory view of the principle of the ramp generator of the polishing surface b 1, in the drawing,
W indicates an installation width W required for inclined installation of one polishing plate piece a on the circumference of the polishing body layer b. For example, when the polishing body layer b is formed from 72 polishing plate pieces a, Circumference length L
(Represented by a straight line for convenience) is equivalent to 72 times the installation width W, and the slopingly mounted polishing plate pieces a are in close surface contact with each other on the inner peripheral end side. However, since the circumference length gradually increases toward the outer periphery of the polishing body layer b, the polishing plate piece a
When the inclined installation angle θ is set to be constant from the inner peripheral end to the outer peripheral end, a larger gap is generated at the outer peripheral end between the inclined stacked polishing plate pieces a, and the stacking density is increased. Large variations occur, which cannot be put to practical use. Conventionally, in order to solve such a problem, a twist is forcibly given to the polishing plate piece a so that the inclination installation angle θ gradually decreases toward the outer peripheral end, and the polishing plate piece a,
The gap generated between a is eliminated. If you do this,
It is possible to eliminate the overlap density and the hardness difference between the inner and outer circumferences of the polishing body layer b to some extent. However, when the inclination setting angle θ of the polishing plate piece a becomes smaller toward the outer peripheral end, the thickness of the polishing body layer b becomes smaller toward the outer peripheral end, and the polishing surface b 1
Appears as a slope.

【0005】また、図9に概略的に示すように、捻りを
与えられた状態で傾斜設置された研磨板片aの傾斜設置
角度θは、内周端側で最大(実線参照)、外周端側で最
小(破線参照)となり、この最大角度θ1と最小角度θ2
との間では、研磨板片aはその保有弾性により最大角度
θ1に向けて復元しようとする傾向となる。この傾斜復
元傾向により、研磨板片aの重なり密度は内周端側では
略々設定通りに保持されるものの外周端側では研磨板片
a,aの相互間に隙間が発生する傾向となり、研磨体層
bの内,外周端間で重なり密度差ひいては硬度差となっ
て現れる。
[0005] As schematically shown in FIG. 9, the inclined installation angle θ of the polishing plate piece a which is inclined and installed in a twisted state is maximum on the inner peripheral end side (see the solid line), and is set on the outer peripheral end. Side (see the broken line), the maximum angle θ 1 and the minimum angle θ 2
The polishing plate piece a tends to recover toward the maximum angle θ 1 due to its elasticity. Due to this inclination restoring tendency, the overlapping density of the polishing plate pieces a is maintained substantially as set on the inner peripheral end side, but a gap tends to be generated between the polishing plate pieces a on the outer peripheral end side. It appears as an overlap density difference and thus a hardness difference between the inner and outer peripheral ends of the body layer b.

【0006】研磨体層bの内外周間で生ずる研磨面b1
の高さや硬度の不均一性は、平面研磨の障害になるばか
りでなく、グラインダーを反動で回転方向へ滑らせ人身
事故につながる危険性もあり、好ましくない。
The polishing surface b 1 generated between the inner and outer circumferences of the polishing body layer b.
The unevenness of the height and hardness is not only an obstacle to the surface polishing, but also has a risk of causing the grinder to slide in the rotating direction by the recoil and leading to personal injury, which is not preferable.

【0007】本発明は、研磨体層の構成要素として板片
状の研磨布紙を用いる回転研磨具に於いて、研磨体層の
内,外周部間で生ずる研磨面の高さ並びに硬度の不均一
性を解消することを目的としてなされたものである。
The present invention relates to a rotary polishing tool using plate-like polishing cloth as a component of a polishing body layer, and has a height and hardness of a polishing surface generated between the inner and outer peripheral portions of the polishing body layer. The purpose is to eliminate uniformity.

【0008】[0008]

【課題を解決するための手段】本発明は、回転基板と、
該基板上の周辺部沿いに形成された研磨体層とを備え、
該研磨体層が、上記基板上の周辺部を周回するように傾
斜積み重ね状態に敷き詰められた多数枚の矩形状研磨板
片から構成された回転研磨具に於いて、上記研磨板片は
矩形を基本形状とし、傾斜状態を基準に、下端側に於い
て回転基板面に接着固定され、上端側は内周端側から外
周側に向けて切り落とし幅が漸進的に小さくなるように
斜め裁断されていることを特徴とする回転研磨具に係
る。
SUMMARY OF THE INVENTION The present invention provides a rotating substrate,
A polishing body layer formed along a peripheral portion on the substrate,
The polishing body layer is a rotary polishing tool composed of a large number of rectangular polishing plate pieces spread in an inclined stack so as to go around a peripheral portion on the substrate, wherein the polishing plate pieces have a rectangular shape. With the basic shape, based on the inclined state, the lower end side is adhesively fixed to the rotating substrate surface, and the upper end side is cut obliquely so that the cut-off width gradually decreases from the inner peripheral end side to the outer peripheral side. The present invention relates to a rotary polishing tool characterized in that:

【0009】本発明に於いて、研磨体層を構成している
研磨板片の上端部の斜め裁断部は、回転基板の半径線上
に略々位置させておくことが好ましい。この場合、研磨
板片の上端部の外周端寄りの部分は斜めに切り取ってお
くことが好ましい。
In the present invention, it is preferable that the oblique cut portion at the upper end of the polishing plate piece constituting the polishing body layer is located substantially on the radius line of the rotating substrate. In this case, it is preferable that a portion of the upper end portion of the polishing plate piece near the outer peripheral end be cut off obliquely.

【0010】[0010]

【発明の実施の形態】以下に、本発明の一実施形態を添
付図面に基づき説明する。図1は本発明回転研磨具に於
ける、研磨板片1の傾斜積み重ね途中の状況を、図2は
研磨板片1の傾斜積み重ねにより構成された研磨体層2
の状況を、図3は研磨体層2の回転基板3の半径線上に
於ける概略断面形状を、それぞれ示している。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described below with reference to the accompanying drawings. FIG. 1 shows a state in which the polishing plate pieces 1 are being inclinedly stacked in the rotary polishing tool of the present invention, and FIG. 2 shows a polishing body layer 2 formed by the inclined stacking of the polishing plate pieces 1.
FIG. 3 shows a schematic cross-sectional shape of the polishing body layer 2 on the radius line of the rotating substrate 3.

【0011】本発明に於いて、研磨板片1は、従来品と
同様に、クロス等の基材に砥粒をフェノール樹脂等の合
成樹脂を結合材として付着させてなり、適度の硬度と弾
性を備えている。研磨板片1は、図1に破線で示すよう
に、矩形を基本形状とし、下端側1aに於いて回転基板
3面に傾斜設置状態に接着固定され、上端側に於いて研
磨面21を構成している。また研磨板片aには、内,外
周部間で生ずる重なり密度差ひいては硬度差を解消する
ために、従来品と同様に傾斜設置角度θ(図8参照)は
内周端側から外周端に向けて漸進的に小さくなってい
る。
In the present invention, the polishing plate piece 1 is made by attaching abrasive grains to a base material such as cloth as a binder with a synthetic resin such as phenol resin as in the case of the conventional product. It has. As shown by the broken line in FIG. 1, the polishing plate piece 1 has a rectangular shape as a basic shape, is adhered and fixed to the surface of the rotating substrate 3 at the lower end 1a in an inclined installation state, and forms a polishing surface 21 at the upper end. are doing. Also, in order to eliminate the difference in the overlapping density between the inner and outer peripheral portions and the difference in hardness, the inclined plate angle a (see FIG. 8) is set from the inner peripheral end side to the outer peripheral end in the same manner as the conventional product. It becomes progressively smaller.

【0012】本発明に於いて、研磨板片1は矩形を基本
形状とし、この基本形状から、図1に破線で示すよう
に、上端部1aが内周端側から外周側に向けて斜め裁断
線4により切り落とされている。
In the present invention, the polishing plate piece 1 has a rectangular basic shape, and from this basic shape, the upper end portion 1a is obliquely cut from the inner peripheral end side to the outer peripheral side as shown by a broken line in FIG. Line 4 has been cut off.

【0013】従来品と同様に、本発明於いても、研磨板
片1には重なり密度差を解消するために捻りが与えられ
ているので、研磨体層bの表面には傾斜が発生する傾向
となる。
As in the case of the conventional product, in the present invention, since the polishing plate piece 1 is twisted in order to eliminate the overlapping density difference, the surface of the polishing body layer b tends to be inclined. Becomes

【0014】本発明に於いては、研磨板片1の上端側に
は内周端側から外周端側に向けて斜め裁断が施されてい
るので、この斜め裁断により、研磨体層2の研磨面にみ
られる傾斜発生傾向を抑制乃至補正吸収でき、図3に概
略的に示すように、研磨面21の高さの不均一性を解消
できる。
In the present invention, since the upper end side of the polishing plate 1 is cut diagonally from the inner peripheral end to the outer peripheral end, the polishing body layer 2 is polished by the diagonal cutting. The inclination of the surface can be suppressed or corrected and absorbed, and the unevenness in the height of the polished surface 21 can be eliminated as schematically shown in FIG.

【0015】また、上記構成により重なり密度ひいては
硬さの不均一性も解消される傾向となることが確認され
ている。その理由は定かでないが、研磨板片1の上端部
1aを斜め裁断により切り落とすことによって、研磨板
片1の上下幅Hが内周端側ほど漸進的に小さくなり、こ
れにより、捻りによる復元傾向(図9の矢符d参照)が
抑制され、これが微妙に影響しているものと推定され
る。
Further, it has been confirmed that the above structure tends to eliminate the non-uniformity of the overlap density and the hardness. Although the reason is not clear, by cutting off the upper end portion 1a of the polishing plate piece 1 by diagonal cutting, the upper and lower width H of the polishing plate piece 1 gradually decreases toward the inner peripheral end side, whereby the tendency to recover due to twisting (See arrow d in FIG. 9) is suppressed, and this is presumed to be slightly affecting.

【0016】本発明に於いて、研磨板片1の上端部1a
の切り落し線上に位置する裁断線4の傾斜角度θ3(図
1参照)は広い範囲から選択できるが、90°に近づき
過ぎると高さ並びに硬度の不均一性の解消効果が充分に
得られなくなり、一方90°を基準にこれよりあまり小
さくなりすぎると逆方向の高さの不均一性を発生させる
恐れがあるので、通常は60〜80°、好ましくは72
〜75°程度の範囲内から研磨板片1の設置枚数、傾斜
設置角度、硬度、反発弾性、厚み等を考慮し、適宜選択
決定される。
In the present invention, the upper end portion 1a of the polishing plate 1
The inclination angle θ3 (see FIG. 1) of the cutting line 4 located on the cut-off line can be selected from a wide range. However, if it approaches 90 °, the effect of eliminating unevenness in height and hardness cannot be sufficiently obtained. On the other hand, if the angle is too small with respect to 90 °, unevenness in height in the opposite direction may occur, so that it is usually 60 to 80 °, preferably 72 °.
It is appropriately selected and determined from the range of about 75 ° in consideration of the number of the polishing plate pieces 1 installed, the inclined installation angle, the hardness, the resilience, the thickness, and the like.

【0017】本発明に於いて、研磨板片1は、図1,2
に示すように、上端の辺(裁断線4に相当する)が被研
磨面に直角に当たるように回転基板3の半径線5上に略
々位置するように、傾斜積み重ねされていることが好ま
しい。この場合、研磨板片1の上端の辺4の外周側寄り
の部分が被研削面に対し鋭角で当たると、被研削面に対
し深傷を与える恐れがあるので、図1,2に示すよう
に、斜めカット線6により外側の部分を切り落としてお
くことが好ましい。
In the present invention, the polishing plate piece 1 is shown in FIGS.
As shown in (1), it is preferable that the upper edge (corresponding to the cutting line 4) is obliquely stacked so as to be located substantially on the radius line 5 of the rotating substrate 3 so as to be perpendicular to the surface to be polished. In this case, if a portion near the outer peripheral side of the side 4 at the upper end of the polishing plate piece 1 hits the surface to be ground at an acute angle, there is a possibility that the surface to be ground is deeply damaged. In addition, it is preferable that the outer portion is cut off by the oblique cut line 6.

【0018】以下に本発明と従来品との比較試験結果を
示す。
The results of a comparison test between the present invention and a conventional product are shown below.

【0019】市販の研磨布を裁断し、研磨板片1を作製
した。研磨板片1の寸法形状は、図4に示す通りであ
る。 上記研磨板片1の72枚を回転基板3の面に常法
に従い傾斜積み重ねて研磨体層bを構成し、本発明品を
得た。一方本発明品とは、研磨板片が矩形状を有してい
るいる以外は同じ構成の図5,6に示すタイプの従来品
を得た。そして、本発明品及び比較品の回転基板の半径
線上に於ける点内周部p1、中間部p2及び外周部p3
の3点に於ける研磨体層の高さ及び硬度に付き測定し、
その結果を次表(n=10の平均値)に示す。尚、硬度
は加重5kgに於ける変形量(mm)で示した。
A commercially available polishing cloth was cut to produce a polishing plate piece 1. The dimensions and shape of the polishing plate 1 are as shown in FIG. Seventy-two polishing plates 1 were inclinedly stacked on the surface of the rotating substrate 3 according to a conventional method to form a polishing body layer b, thereby obtaining a product of the present invention. On the other hand, with the product of the present invention, a conventional product of the type shown in FIGS. 5 and 6 having the same configuration except that the polishing plate piece had a rectangular shape was obtained. Then, points on the radius line of the rotating substrate of the product of the present invention and the comparative product are the inner peripheral portion p1, the intermediate portion p2, and the outer peripheral portion p3.
Measure the height and hardness of the polishing body layer at three points,
The results are shown in the following table (average value of n = 10). The hardness is shown by the amount of deformation (mm) at a load of 5 kg.

【0020】 表 高さ(mm) 変形量(mm) 本発明品 p1 7.68 0.15 〃 p2 7.65 0.36 〃 p3 7.58 0.64 従来品 p1 8.63 0.15 〃 p2 8.09 0.67 〃 p3 7.43 1.63 上表の通り、本発明によれば、研磨体層の内,外周部間
の高さ並びに硬度のばらつきを殆どなくすることができ
る。
Table Height (mm) Deformation (mm) Product of the present invention p1 7.68 0.15 p p2 7.65 0.36 p p3 7.58 0.64 Conventional product p1 8.63 0.15 品p2 8.09 0.67 p p3 7.43 1.63 As shown in the above table, according to the present invention, it is possible to almost eliminate variations in the height and hardness between the inner and outer peripheral portions of the polishing body layer.

【0021】[0021]

【発明の効果】本発明によれば、回転研磨具の研磨体層
の内,外周部間に生ずる高さ並びに硬度の不均一性を解
消でき、品質性能を向上できる。
According to the present invention, the unevenness of the height and hardness between the inner and outer peripheral portions of the polishing body layer of the rotary polishing tool can be eliminated, and the quality performance can be improved.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の一実施形態を示す研磨板片の傾斜積み
重ね途中の状況を示す平面図である。
FIG. 1 is a plan view showing a state in which polishing plate pieces according to an embodiment of the present invention are being stacked in an inclined manner.

【図2】同、研磨板片の傾斜積み重ねにより構成された
研磨体層の平面図である。
FIG. 2 is a plan view of a polishing body layer formed by stacking polishing plate pieces in an inclined manner.

【図3】同、回転基板の半径線上に於ける研磨体層の断
面形状を概略的に示す説明図である。
FIG. 3 is an explanatory view schematically showing a cross-sectional shape of a polishing body layer on a radius line of a rotating substrate.

【図4】同、研磨板片の形状、寸法の一例を示す平面図
である。
FIG. 4 is a plan view showing an example of the shape and dimensions of a polishing plate piece.

【図5】従来品の研磨板片の傾斜積み重ね途中の状況を
示す平面図である。
FIG. 5 is a plan view showing a state in which a conventional polishing plate piece is being stacked while being inclined.

【図6】同、研磨板片の傾斜積み重ねにより構成された
研磨体層の平面図でる。
FIG. 6 is a plan view of a polishing body layer formed by stacking polishing plate pieces in an inclined manner.

【図7】同、回転基板の半径線上に於ける研磨体層の断
面形状を概略的示す説明図である。
FIG. 7 is an explanatory view schematically showing a cross-sectional shape of the polishing body layer on a radius line of the rotating substrate.

【図8】同、研磨板片の設置幅Wと設置傾斜角度θとの
関係を示す説明図でる。
FIG. 8 is an explanatory diagram showing a relationship between an installation width W of the polishing plate piece and an installation inclination angle θ.

【図9】研磨板片の捻り復元傾向を示す説明図である。FIG. 9 is an explanatory diagram showing a tendency of a polishing plate piece to recover from twisting.

【符号の説明】[Explanation of symbols]

1 研磨板片 2 研磨体層 3 回転基板 4 斜め裁断線 5 半径線 6 斜めカット線 Reference Signs List 1 polishing plate piece 2 polishing body layer 3 rotating substrate 4 diagonal cutting line 5 radius line 6 diagonal cutting line

───────────────────────────────────────────────────── フロントページの続き (72)発明者 鈴木 成雄 大阪府貝塚市木積2062番地 ニューレジス トン株式会社内 (72)発明者 木谷 福一 大阪府貝塚市木積2062番地 ニューレジス トン株式会社内 Fターム(参考) 3C063 AA06 AB05 BA14 BA25 BA31 BC03 BE04 BE16 BG07 BH17 BH20  ──────────────────────────────────────────────────続 き Continuing on the front page (72) Inventor Shigeo Suzuki 2062 Kizumi, Kaizuka, Osaka Pref. New Registon Co., Ltd. (72) Fukuichi Kitani 2062 Kizumi, Kizuka, Osaka Pref. (Reference) 3C063 AA06 AB05 BA14 BA25 BA31 BC03 BE04 BE16 BG07 BH17 BH20

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】回転基板と、該基板上の周辺部沿いに形成
された研磨体層とを備え、該研磨体層が、上記基板上の
周辺部を周回するように傾斜積み重ね状態に敷き詰めら
れた多数枚の矩形状研磨板片から構成された回転研磨具
に於いて、上記研磨板片は矩形を基本形状とし、傾斜状
態を基準に、下端側に於いて回転基板面に接着固定さ
れ、上端側は内周端側から外周側に向けて切り落とし幅
が漸進的に小さくなるように斜め裁断されていることを
特徴とする回転研磨具。
1. A rotating substrate, and a polishing body layer formed along a peripheral portion on the substrate, wherein the polishing body layer is spread in an inclined stack so as to go around the peripheral portion on the substrate. In the rotary polishing tool composed of a large number of rectangular polishing plate pieces, the polishing plate piece has a basic shape of a rectangle, based on an inclined state, and is adhered and fixed to the rotating substrate surface at the lower end side, A rotary polishing tool characterized in that the upper end side is obliquely cut such that the width of the cut-off portion gradually decreases from the inner peripheral end side to the outer peripheral side.
【請求項2】研磨体層を構成している研磨板片の上端部
の斜め裁断部が、回転基板の半径線上に略々位置してい
ることを特徴とする請求項1又は2記載の回転研磨具。
2. The rotating device according to claim 1, wherein the oblique cut portion at the upper end of the polishing plate piece constituting the polishing body layer is located substantially on the radius line of the rotating substrate. Polishing tool.
【請求項3】研磨板片の上端部の外周端寄りの部分が斜
めに切り取られていることを特徴とする請求項2記載の
回転研磨具。
3. The rotary polishing tool according to claim 2, wherein a portion of the upper end portion of the polishing plate piece near the outer peripheral end is cut off obliquely.
JP11012116A 1999-01-20 1999-01-20 Rotary grinder Pending JP2000210875A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11012116A JP2000210875A (en) 1999-01-20 1999-01-20 Rotary grinder

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11012116A JP2000210875A (en) 1999-01-20 1999-01-20 Rotary grinder

Publications (1)

Publication Number Publication Date
JP2000210875A true JP2000210875A (en) 2000-08-02

Family

ID=11796594

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11012116A Pending JP2000210875A (en) 1999-01-20 1999-01-20 Rotary grinder

Country Status (1)

Country Link
JP (1) JP2000210875A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6428406B1 (en) * 2000-08-04 2002-08-06 Kantoseito Co., Ltd. Soft polishing disc with holes and method of manufacturing the same
EP1249310A3 (en) * 2001-04-09 2003-06-11 Jobra Metall GmbH Holding disc for flap grinding wheel

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6428406B1 (en) * 2000-08-04 2002-08-06 Kantoseito Co., Ltd. Soft polishing disc with holes and method of manufacturing the same
EP1249310A3 (en) * 2001-04-09 2003-06-11 Jobra Metall GmbH Holding disc for flap grinding wheel
US6712683B2 (en) 2001-04-09 2004-03-30 Jobra Metall Gmbh Backing plate for abrasive flap wheels

Similar Documents

Publication Publication Date Title
JPS6322863U (en)
US6808446B1 (en) Abrasive flap disc
KR102052501B1 (en) Grinding stone having plurality of sandpaper layers
JP2000210875A (en) Rotary grinder
US11363934B2 (en) Rotary segmented floor stripping pad
EP0202241B1 (en) Coated abrasive back up pad
EP0826462B1 (en) Flap wheel
JP2740744B2 (en) Resinoid whetstone
JPS6254632B2 (en)
KR200444137Y1 (en) Polishing Wheel Using Diamond Sheet
JPS6246313B2 (en)
JPS649146B2 (en)
JP3209364U (en) Polishing brush
US1852885A (en) Buffing wheel
JP4932011B2 (en) Abrasive disc
JP2002178269A (en) Polishing wheel
EP1698434A1 (en) Geinder
KR200345071Y1 (en) A structure of sand grinding wheel
JPH0647654Y2 (en) Rotary whetstone
JP2842950B2 (en) Buff polishing tool
JPH0524455Y2 (en)
JPH0550380A (en) Wet type elastic grinding tool
JP3037414U (en) Polished flap wheel with shaft
JPS649147B2 (en)
JPH069869U (en) Polishing tool