JP2000314000A - Fluorine compound containing composite plating solution and formation of composite plated coating film - Google Patents
Fluorine compound containing composite plating solution and formation of composite plated coating filmInfo
- Publication number
- JP2000314000A JP2000314000A JP11118678A JP11867899A JP2000314000A JP 2000314000 A JP2000314000 A JP 2000314000A JP 11118678 A JP11118678 A JP 11118678A JP 11867899 A JP11867899 A JP 11867899A JP 2000314000 A JP2000314000 A JP 2000314000A
- Authority
- JP
- Japan
- Prior art keywords
- composite plating
- pitch
- plating film
- plating solution
- composite
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000007747 plating Methods 0.000 title claims abstract description 104
- 239000002131 composite material Substances 0.000 title claims abstract description 89
- 239000011248 coating agent Substances 0.000 title abstract description 5
- 238000000576 coating method Methods 0.000 title abstract description 5
- 230000015572 biosynthetic process Effects 0.000 title description 4
- 150000002222 fluorine compounds Chemical class 0.000 title 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 claims abstract description 42
- 229920001577 copolymer Polymers 0.000 claims abstract description 22
- 150000003839 salts Chemical class 0.000 claims abstract description 13
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 6
- 238000000034 method Methods 0.000 claims description 31
- -1 diamine compound Chemical class 0.000 claims description 29
- 229910052751 metal Inorganic materials 0.000 claims description 25
- 239000002184 metal Substances 0.000 claims description 25
- 229920001774 Perfluoroether Polymers 0.000 claims description 18
- 239000000758 substrate Substances 0.000 claims description 13
- 125000004432 carbon atom Chemical group C* 0.000 claims description 4
- XFNJVJPLKCPIBV-UHFFFAOYSA-N trimethylenediamine Chemical compound NCCCN XFNJVJPLKCPIBV-UHFFFAOYSA-N 0.000 claims description 4
- 229910052757 nitrogen Inorganic materials 0.000 claims description 3
- 229910001512 metal fluoride Inorganic materials 0.000 claims 1
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 abstract description 4
- 150000004985 diamines Chemical class 0.000 abstract 2
- 239000011295 pitch Substances 0.000 description 66
- 239000000243 solution Substances 0.000 description 35
- 239000000463 material Substances 0.000 description 27
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 22
- 239000007789 gas Substances 0.000 description 9
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 8
- 239000007864 aqueous solution Substances 0.000 description 8
- 239000010419 fine particle Substances 0.000 description 8
- 239000011737 fluorine Substances 0.000 description 8
- 229910052731 fluorine Inorganic materials 0.000 description 8
- 238000010438 heat treatment Methods 0.000 description 8
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 5
- 238000002845 discoloration Methods 0.000 description 5
- 239000011347 resin Substances 0.000 description 5
- 229920005989 resin Polymers 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- 229910052799 carbon Inorganic materials 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000011156 evaluation Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 239000000843 powder Substances 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- 229910000831 Steel Inorganic materials 0.000 description 3
- 238000009835 boiling Methods 0.000 description 3
- 239000003245 coal Substances 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- IUNMPGNGSSIWFP-UHFFFAOYSA-N dimethylaminopropylamine Chemical compound CN(C)CCCN IUNMPGNGSSIWFP-UHFFFAOYSA-N 0.000 description 3
- 238000009713 electroplating Methods 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- KERTUBUCQCSNJU-UHFFFAOYSA-L nickel(2+);disulfamate Chemical class [Ni+2].NS([O-])(=O)=O.NS([O-])(=O)=O KERTUBUCQCSNJU-UHFFFAOYSA-L 0.000 description 3
- 239000003921 oil Substances 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 239000010959 steel Substances 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 239000003575 carbonaceous material Substances 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- 230000001747 exhibiting effect Effects 0.000 description 2
- 239000000295 fuel oil Substances 0.000 description 2
- 230000001771 impaired effect Effects 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 239000011302 mesophase pitch Substances 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 2
- 229910000008 nickel(II) carbonate Inorganic materials 0.000 description 2
- ZULUUIKRFGGGTL-UHFFFAOYSA-L nickel(ii) carbonate Chemical compound [Ni+2].[O-]C([O-])=O ZULUUIKRFGGGTL-UHFFFAOYSA-L 0.000 description 2
- 239000003208 petroleum Substances 0.000 description 2
- 230000002265 prevention Effects 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- DDFHBQSCUXNBSA-UHFFFAOYSA-N 5-(5-carboxythiophen-2-yl)thiophene-2-carboxylic acid Chemical compound S1C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)S1 DDFHBQSCUXNBSA-UHFFFAOYSA-N 0.000 description 1
- 229920000049 Carbon (fiber) Polymers 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- 229910001111 Fine metal Inorganic materials 0.000 description 1
- 240000007594 Oryza sativa Species 0.000 description 1
- 235000007164 Oryza sativa Nutrition 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 230000003373 anti-fouling effect Effects 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 235000021168 barbecue Nutrition 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- 239000004566 building material Substances 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 239000004917 carbon fiber Substances 0.000 description 1
- 150000005323 carbonate salts Chemical class 0.000 description 1
- 150000003841 chloride salts Chemical class 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 239000011280 coal tar Substances 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 230000005674 electromagnetic induction Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 235000011389 fruit/vegetable juice Nutrition 0.000 description 1
- 150000002240 furans Chemical class 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 238000005984 hydrogenation reaction Methods 0.000 description 1
- CUPFNGOKRMWUOO-UHFFFAOYSA-N hydron;difluoride Chemical compound F.F CUPFNGOKRMWUOO-UHFFFAOYSA-N 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 239000011133 lead Substances 0.000 description 1
- 239000002931 mesocarbon microbead Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 125000000325 methylidene group Chemical group [H]C([H])=* 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 229910052754 neon Inorganic materials 0.000 description 1
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- 238000004525 petroleum distillation Methods 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 238000000634 powder X-ray diffraction Methods 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 238000000197 pyrolysis Methods 0.000 description 1
- 230000015227 regulation of liquid surface tension Effects 0.000 description 1
- 235000009566 rice Nutrition 0.000 description 1
- 238000007788 roughening Methods 0.000 description 1
- 238000005488 sandblasting Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 235000013555 soy sauce Nutrition 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 238000005292 vacuum distillation Methods 0.000 description 1
- 239000006200 vaporizer Substances 0.000 description 1
- 238000009423 ventilation Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 210000002268 wool Anatomy 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Landscapes
- Materials Applied To Surfaces To Minimize Adherence Of Mist Or Water (AREA)
Abstract
Description
【0001】[0001]
【発明が属する技術分野】本発明は、メッキ液およびメ
ッキ被膜の形成方法、特に、複合メッキ液および複合メ
ッキ被膜の形成方法に関する。The present invention relates to a plating solution and a method for forming a plating film, and more particularly to a composite plating solution and a method for forming a composite plating film.
【0002】[0002]
【従来の技術とその課題】金属製や樹脂製の基材に対し
て撥水性を付与するための被膜として、ポリテトラフル
オロエチレンなどのフッ素系樹脂からなるものが知られ
ている。ところが、フッ素系樹脂は、軟化流動しにくい
ため、細かな金属管の内面や複雑な凹凸形状を有する部
材の表面に対して均一な被膜を形成するのが困難であ
る。そこで、複雑な形状等を有する部材の表面等に対し
て均一な撥水性を付与することができる被膜として、撥
水性を有する複合メッキ被膜が提案されている。2. Description of the Related Art As a film for imparting water repellency to a metal or resin substrate, a film made of a fluorine-based resin such as polytetrafluoroethylene is known. However, since the fluororesin hardly softens and flows, it is difficult to form a uniform coating on the inner surface of a fine metal tube or the surface of a member having a complicated uneven shape. Therefore, a composite plating film having water repellency has been proposed as a film capable of imparting uniform water repellency to the surface of a member having a complicated shape or the like.
【0003】例えば、特開平7−26397号公報に
は、金属母材層中にフッ化ピッチ微粒子を分散共析させ
た複合メッキ被膜が示されている。この複合メッキ被膜
は、高い撥水性を示すフッ化ピッチ微粒子を金属母材層
中に含んでいるために撥水性が高く、しかも慣用的なメ
ッキ手法により形成することができることから、複雑な
形状等を有する部材の表面等に対しても均一に形成する
ことができる。For example, Japanese Patent Application Laid-Open No. Hei 7-26397 discloses a composite plating film in which fine pitch fluoride particles are dispersed and eutectoid in a metal base material layer. This composite plating film has high water repellency because it contains fine pitch fluoride particles exhibiting high water repellency in the metal base material layer, and can be formed by a conventional plating method, and thus has a complicated shape and the like. Can be formed even on the surface of a member having the same.
【0004】ところが、この複合メッキ被膜は、その表
面に摩擦力が加わった場合、金属母材層中に分散された
フッ化ピッチ微粒子が脱落しやすい。したがって、この
複合メッキ被膜は、それから脱落したフッ化ピッチ微粒
子により周辺環境を汚染するおそれがあり、また、形成
初期には高い撥水性を発揮し得るが、摩擦を受けると撥
水性が徐々に低下してしまうものと予想される。However, when a frictional force is applied to the surface of the composite plating film, pitch fluoride fine particles dispersed in the metal base material layer easily fall off. Therefore, the composite plating film may contaminate the surrounding environment due to fine pitch fluoride particles that have fallen from it, and may exhibit high water repellency in the initial stage of formation, but the water repellency gradually decreases when subjected to friction. It is expected to do.
【0005】本発明の目的は、フッ化ピッチを含む複合
メッキ被膜について、フッ化ピッチの脱落を抑制するこ
とにある。[0005] An object of the present invention is to suppress falling off of fluoride pitch in a composite plating film containing pitch fluoride.
【0006】[0006]
【課題を解決するための手段】本発明に係る複合メッキ
液は、金属塩、ジアミン化合物により処理されたフッ化
ピッチおよびヘキサフルオロエチレンパーフルオロアル
コキシビニルエーテル共重合体を含んでいる。ここで、
ジアミン化合物は、例えば下記の一般式(1)で示され
るものである。なお、式中、Rは炭素数が1〜3のアル
キル基を、nは2〜5の整数をそれぞれ示している。The composite plating solution according to the present invention contains a metal salt, pitch fluoride treated with a diamine compound and a hexafluoroethylene perfluoroalkoxy vinyl ether copolymer. here,
The diamine compound is, for example, one represented by the following general formula (1). In the formula, R represents an alkyl group having 1 to 3 carbon atoms, and n represents an integer of 2 to 5, respectively.
【0007】[0007]
【化2】 Embedded image
【0008】このような一般式(1)で示されるジアミ
ン化合物は、例えば、N,N−ジメチル−1,3−プロ
パンジアミンである。The diamine compound represented by the general formula (1) is, for example, N, N-dimethyl-1,3-propanediamine.
【0009】この複合メッキ液は、例えば、ジアミン化
合物により処理されたフッ化ピッチを10〜50g/
l、ヘキサフルオロエチレンパーフルオロアルコキシビ
ニルエーテル共重合体を10〜50g/lそれぞれ含ん
でいる。[0009] The composite plating solution is, for example, 10 to 50 g / fluoride pitch treated with a diamine compound.
1, 10 to 50 g / l of hexafluoroethylene perfluoroalkoxy vinyl ether copolymer.
【0010】本発明に係る複合メッキ被膜の形成方法
は、基材に対して複合メッキ被膜を形成するための方法
である。この形成方法は、金属塩、ジアミン化合物によ
り処理されたフッ化ピッチおよびヘキサフルオロエチレ
ンパーフルオロアルコキシビニルエーテル共重合体を含
む複合メッキ液を用意する工程と、複合メッキ液中に基
材を浸漬し、基材に対してメッキ法を適用する工程とを
含んでいる。このような複合メッキ被膜の形成方法は、
例えば、メッキ法により得られた複合メッキ被膜を熱処
理する工程をさらに含んでいる。The method for forming a composite plating film according to the present invention is a method for forming a composite plating film on a substrate. This forming method is a step of preparing a composite plating solution containing a metal salt, pitch fluoride and hexafluoroethylene perfluoroalkoxy vinyl ether copolymer treated with a diamine compound, and immersing the substrate in the composite plating solution, Applying a plating method to the base material. The method of forming such a composite plating film is as follows.
For example, the method further includes a step of heat-treating the composite plating film obtained by the plating method.
【0011】[0011]
【発明の実施の形態】本発明の複合メッキ液は、金属塩
が溶解され、かつフッ化ピッチおよびヘキサフルオロエ
チレンパーフルオロアルコキシビニルエーテル共重合体
が分散された水溶液からなる。DESCRIPTION OF THE PREFERRED EMBODIMENTS The composite plating solution of the present invention comprises an aqueous solution in which a metal salt is dissolved and pitch fluoride and a hexafluoroethylene perfluoroalkoxy vinyl ether copolymer are dispersed.
【0012】本発明で用いられる金属塩は、複合メッキ
被膜の金属母材層を形成するための材料であり、例え
ば、ニッケル、銅、亜鉛、スズ、鉄、鉛、カドミウム、
クロム、金や銀などの貴金属類、およびこれらの合金な
どの塩が用いられる。このような金属の塩としては、塩
化ニッケルなどの塩化物塩、炭酸ニッケルなどの炭酸
塩、スルファミン酸ニッケルなどのスルファミン酸塩な
どを例示することができる。The metal salt used in the present invention is a material for forming a metal base material layer of a composite plating film, for example, nickel, copper, zinc, tin, iron, lead, cadmium,
Noble metals such as chromium, gold and silver, and salts of alloys thereof are used. Examples of such metal salts include chloride salts such as nickel chloride, carbonate salts such as nickel carbonate, and sulfamate salts such as nickel sulfamate.
【0013】また、フッ化ピッチは、ピッチをフッ素ガ
スを用いてフッ素化することにより製造できる公知の物
質であり、例えば、特開昭62−275190号公報に
開示されている。Fluorinated pitch is a known substance which can be produced by fluorinating pitch using fluorine gas, and is disclosed in, for example, Japanese Patent Application Laid-Open No. 62-275190.
【0014】このようなフッ化ピッチを製造するために
用いられるピッチは、一般に芳香族縮合六員環平面がメ
チレンなどの脂肪族炭化水素基により架橋しながら積層
した層構造を有するものであり、通常、石油蒸留残渣、
ナフサ熱分解残渣、エチレンボトム油、石炭液化油およ
びコールタールなどの石油系または石炭系重質油を蒸留
して沸点が200℃未満の低沸点成分を除去したもの、
ナフタレン等の縮合によって合成されたもの、およびこ
れらをさらに熱処理や水添処理したものである。具体的
には、等方性ピッチ、メソフェースピッチ、水素化メソ
フェースピッチ、石油系または石炭系重質油を蒸留して
低沸点成分を除去した後に生成するメソフェース球体か
らなるメソカーボンマイクロビーズなどを挙げることが
できる。The pitch used for producing such a fluorinated pitch generally has a layer structure in which aromatic condensed six-membered ring planes are laminated while being cross-linked by an aliphatic hydrocarbon group such as methylene. Usually, petroleum distillation residue,
Naphtha pyrolysis residue, ethylene bottom oil, coal liquefied oil and petroleum or coal heavy oil such as coal tar are distilled to remove low boiling components having a boiling point of less than 200 ° C.,
These are those synthesized by condensation of naphthalene or the like, and those further subjected to heat treatment or hydrogenation treatment. Specifically, isotropic pitch, mesophase pitch, hydrogenated mesophase pitch, mesocarbon microbeads composed of mesophase spheres formed after distilling petroleum-based or coal-based heavy oil to remove low-boiling components, etc. Can be mentioned.
【0015】上述のピッチを用いて目的とするフッ化ピ
ッチを製造する際には、ピッチとフッ素ガスとを直接反
応させる。この反応時の温度は、0〜350℃程度に設
定するのが好ましく、ピッチの軟化点以下に設定するの
がより好ましい。また、反応時のフッ素ガス圧は、特に
限定されるものではないが、一般に0.07〜1.5気
圧に設定するのが好ましい。なお、フッ素ガスとして
は、窒素、ヘリウム、アルゴン、ネオンなどの不活性ガ
スを用いて希釈したものが用いられてもよい。When producing the desired fluorinated pitch using the above-mentioned pitch, the pitch is directly reacted with fluorine gas. The temperature at the time of this reaction is preferably set to about 0 to 350 ° C., and more preferably to the softening point of the pitch or lower. In addition, the fluorine gas pressure during the reaction is not particularly limited, but is generally preferably set to 0.07 to 1.5 atm. Note that, as the fluorine gas, a gas diluted with an inert gas such as nitrogen, helium, argon, or neon may be used.
【0016】本発明で利用可能なフッ化ピッチとして好
ましいものは、実質的に炭素原子とフッ素原子とからな
り、フッ素と炭素との原子比(フッ素/炭素)が、例え
ば0.5〜1.8程度の粉末状のものである。このよう
なフッ化ピッチは、次の(a)、(b)、(c)および
(d)の特性を示す。Preferred fluorinated pitches usable in the present invention substantially consist of carbon atoms and fluorine atoms, and have an atomic ratio of fluorine to carbon (fluorine / carbon) of, for example, 0.5 to 1. It is about 8 powders. Such a fluorinated pitch exhibits the following characteristics (a), (b), (c) and (d).
【0017】(a)粉末X線回折において、2θ=13
゜付近に最大強度のピークを示し、2θ=40゜付近に
最大強度ピークよりも強度の小さなピークを示す。 (b)X線光電子分光分析において、290.0±1.
0eVにCFに相当するピークおよび292.5±0.
9eV付近にCF2に相当するピークを示し、CFに相
当するピークに対するCF2に相当するピークの強さの
比が0.15〜1.5程度である。 (c)真空蒸留により膜を形成することができる。 (d)30℃における水に対する接触角が141°±8
°である。(A) In powder X-ray diffraction, 2θ = 13
A peak with the maximum intensity is shown near ゜, and a peak with a smaller intensity than the maximum intensity peak is shown near 2θ = 40 °. (B) 290.0 ± 1.
The peak corresponding to CF at 0 eV and 292.5 ± 0.
A peak corresponding to CF 2 is shown around 9 eV, and the ratio of the intensity of the peak corresponding to CF 2 to the peak corresponding to CF is about 0.15 to 1.5. (C) A film can be formed by vacuum distillation. (D) The contact angle with water at 30 ° C. is 141 ± 8.
°.
【0018】また、本発明では、透明樹脂状のフッ化ピ
ッチを使用することもできる。透明樹脂状のフッ化ピッ
チは、例えば、フッ化ピッチをフッ素ガス雰囲気下にお
いて0.1〜3℃/分程度、好ましくは0.5〜1.5
℃/分程度の昇温速度で250〜400℃程度まで昇温
し、所定時間、例えば1〜18時間程度、好ましくは6
〜12時間程度反応させることにより製造することがで
きる。この方法によれば、例えば次のような特性を示す
透明樹脂状のフッ化ピッチを得ることができる。In the present invention, a fluorinated pitch in the form of a transparent resin can also be used. The pitch of the fluorinated pitch in the form of a transparent resin is, for example, about 0.1 to 3 ° C./min, preferably 0.5 to 1.5 ° C. in a fluorine gas atmosphere.
The temperature is raised to about 250 to 400 ° C. at a rate of about 250 ° C./minute, and the temperature is raised for a predetermined time, for example, about 1 to 18 hours, preferably
It can be produced by reacting for about 12 hours. According to this method, for example, a fluorinated pitch in the form of a transparent resin having the following characteristics can be obtained.
【0019】 F/C原子比:1.5〜1.7 光透過率(250〜900nm):90% 分子量:1,500〜2,000 軟化点:150〜250℃F / C atomic ratio: 1.5 to 1.7 Light transmittance (250 to 900 nm): 90% Molecular weight: 1,500 to 2,000 Softening point: 150 to 250 ° C.
【0020】なお、フッ化ピッチは、上述の粉末状のも
のと透明樹脂状のものとが併用されてもよい。The pitch fluoride may be used in combination with the powdery powder and the transparent resinous pitch.
【0021】本発明で用いられるフッ化ピッチは、上述
のようなフッ化ピッチをジアミン化合物により処理した
もの、すなわち、上述のフッ化ピッチに対してジアミン
化合物を反応させたものであり、それ自体が界面活性能
を有するものである。ここで用いられるジアミン化合物
は、アミノ基を2つ有するものであれば特に限定される
ものではなく、公知の各種のものであるが、好ましくは
下記の一般式(1)で示されるものである。The pitch fluoride used in the present invention is obtained by treating the above-mentioned pitch fluoride with a diamine compound, that is, by reacting the above-mentioned pitch fluoride with a diamine compound. Has a surfactant activity. The diamine compound used here is not particularly limited as long as it has two amino groups, and is a variety of known compounds. Preferably, the diamine compound is represented by the following general formula (1). .
【0022】[0022]
【化3】 Embedded image
【0023】一般式(1)中、Rは炭素数が1〜3のア
ルキル基、具体的にはメチル基、エチル基、n−プロピ
ル基またはiso−プロピル基を示している。Rで示さ
れるアルキル基の炭素数が3を超える場合は、その立体
障害により、ジアミン化合物とフッ化ピッチとが反応し
にくくなる可能性がある。一方、nは2〜5の整数を示
している。nが1の場合は、ジアミン化合物が不安定に
なり、取扱いが困難になるおそれがある。逆に、5を超
えると、界面活性能の高いフッ化ピッチが得られ難くな
るおそれがある。In the general formula (1), R represents an alkyl group having 1 to 3 carbon atoms, specifically, a methyl group, an ethyl group, an n-propyl group or an iso-propyl group. When the carbon number of the alkyl group represented by R exceeds 3, the steric hindrance may make it difficult for the diamine compound to react with the fluorinated pitch. On the other hand, n has shown the integer of 2-5. When n is 1, the diamine compound becomes unstable and handling may be difficult. Conversely, if it exceeds 5, it may be difficult to obtain a fluorinated pitch having a high surface activity.
【0024】なお、一般式(1)で示されるジアミン化
合物のうち特に好ましいものは、Rで示されるアルキル
基がメチル基でありかつnが3の、N,N−ジメチル−
1,3−プロパンジアミンである。Particularly preferred among the diamine compounds represented by the general formula (1) are N, N-dimethyl-, wherein the alkyl group represented by R is a methyl group and n is 3.
1,3-propanediamine.
【0025】上述のフッ化ピッチとジアミン化合物とを
反応させる際には、通常、両者をそれぞれ適当な溶媒に
溶解した溶液を調製し、両溶液を混合してフッ化ピッチ
とジアミン化合物とを反応させる。フッ化ピッチおよび
ジアミン化合物を溶解させるための溶媒は、両者を溶解
することができるものであれば特に限定されるものでは
ないが、例えば、アルコール類、フラン類などを用いる
ことができる。When reacting the above-mentioned pitch fluoride and the diamine compound, usually, a solution is prepared by dissolving both in a suitable solvent, and both solutions are mixed to react the pitch fluoride with the diamine compound. Let it. The solvent for dissolving the pitch fluoride and the diamine compound is not particularly limited as long as both can be dissolved, and for example, alcohols, furans, and the like can be used.
【0026】フッ化ピッチとジアミン化合物とを反応さ
せる際の反応温度は、通常、常温〜100℃に設定する
のが好ましく、10〜40℃に設定するのがより好まし
く、10〜20℃に設定するのがさらに好ましい。反応
温度が100℃を超える場合は、生成物がタール化する
おそれがある。また、上述の反応の際には、フッ化ピッ
チに対するジアミン化合物の使用量が実質的に当量にな
るよう設定するのが好ましいが、通常はジアミン化合物
の使用量をフッ化ピッチに比べて多目に設定するのが好
ましい。The reaction temperature at the time of reacting the pitch fluoride and the diamine compound is usually preferably set at room temperature to 100 ° C., more preferably at 10 to 40 ° C., and more preferably at 10 to 20 ° C. More preferably, When the reaction temperature exceeds 100 ° C., the product may be tarred. In the above reaction, it is preferable to set the amount of the diamine compound to be substantially equivalent to the pitch fluoride. However, the amount of the diamine compound to be used is generally larger than that of the pitch fluoride. It is preferable to set
【0027】さらに、本発明で用いられるヘキサフルオ
ロエチレンパーフルオロアルコキシビニルエーテル共重
合体は、アルコキシ基としてメトキシ基やエトキシ基な
どを含む公知のフッ素樹脂であり、例えばダイキン工業
株式会社の商品名“AD−2CR”を挙げることができ
る。Further, the hexafluoroethylene perfluoroalkoxy vinyl ether copolymer used in the present invention is a known fluororesin containing a methoxy group, an ethoxy group or the like as an alkoxy group. -2CR ".
【0028】本発明の複合メッキ液は、水中に上述の金
属塩を溶解した水溶液を調製し、この水溶液中に上述の
ジアミン化合物により処理されたフッ化ピッチ(以下、
変性フッ化ピッチという場合がある)およびヘキサフル
オロエチレンパーフルオロアルコキシビニルエーテル共
重合体を均一にかつ微粒子状に分散させると製造するこ
とができる。ここで調製する水溶液中における金属塩の
濃度は、通常、30〜60重量%に設定するのが好まし
い。金属塩の濃度が30重量%未満の場合は、所要の厚
さの金属母材層が形成されにくい場合がある。逆に、6
0重量%を超える場合は、複合メッキ液の粘度が高くな
り、複合メッキ液の均一性を維持するのが困難になるお
それがある。The composite plating solution of the present invention is prepared by preparing an aqueous solution in which the above-mentioned metal salt is dissolved in water, and in this aqueous solution, pitch fluoride treated with the above-mentioned diamine compound (hereinafter, referred to as “pitch fluoride”).
It can be produced by uniformly and finely dispersing a modified fluorofluorinated pitch) and a hexafluoroethylene perfluoroalkoxy vinyl ether copolymer. The concentration of the metal salt in the aqueous solution prepared here is usually preferably set to 30 to 60% by weight. When the concentration of the metal salt is less than 30% by weight, it may be difficult to form a metal base material layer having a required thickness. Conversely, 6
If it exceeds 0% by weight, the viscosity of the composite plating solution will be high, and it may be difficult to maintain the uniformity of the composite plating solution.
【0029】また、本発明の複合メッキ液中における変
性フッ化ピッチの含有量は、通常、10〜50g/lに
設定するのが好ましく、12〜38g/lに設定するの
がより好ましい。変性フッ化ピッチの含有量が10g/
l未満の場合は、複合メッキ液の分散性が十分に高まら
ないおそれがある。逆に、50g/lを超える場合は、
複合メッキ被膜が変色し、複合メッキ被膜の外観が損な
われるおそれがある。The content of the modified fluorinated pitch in the composite plating solution of the present invention is usually preferably set to 10 to 50 g / l, more preferably 12 to 38 g / l. The content of the modified fluorinated pitch is 10 g /
If it is less than 1, the dispersibility of the composite plating solution may not be sufficiently increased. Conversely, if it exceeds 50 g / l,
The composite plating film may be discolored and the appearance of the composite plating film may be impaired.
【0030】さらに、本発明の複合メッキ中におけるヘ
キサフルオロエチレンパーフルオロアルコキシビニルエ
ーテル共重合体の含有量は、通常、10〜50g/lに
設定するのが好ましく、12〜38g/lに設定するの
がより好ましい。ヘキサフルオロエチレンパーフルオロ
アルコキシビニルエーテル共重合体の含有量が10g/
l未満の場合は、複合メッキ被膜からのフッ化ピッチの
脱落を効果的に抑制することができないおそれがある。
逆に、50g/lを超える場合は、複合メッキ液の分散
性が不十分になるおそれがある。Further, the content of the hexafluoroethylene perfluoroalkoxy vinyl ether copolymer in the composite plating of the present invention is usually preferably set to 10 to 50 g / l, and more preferably to 12 to 38 g / l. Is more preferred. The content of the hexafluoroethylene perfluoroalkoxy vinyl ether copolymer is 10 g /
If it is less than 1, there is a possibility that dropping of the fluoride pitch from the composite plating film cannot be effectively suppressed.
Conversely, if it exceeds 50 g / l, the dispersibility of the composite plating solution may be insufficient.
【0031】なお、本発明の複合メッキ液中に含まれる
変性フッ化ピッチとヘキサフルオロエチレンパーフルオ
ロアルコキシビニルエーテル共重合体との合計量は、通
常、40〜60g/lに設定するのが好ましく、45〜
55g/lに設定するのがより好ましく、50g/lに
設定するのが特に好ましい。The total amount of the modified fluorinated pitch and the hexafluoroethylene perfluoroalkoxy vinyl ether copolymer contained in the composite plating solution of the present invention is usually preferably set to 40 to 60 g / l, 45-
It is more preferably set to 55 g / l, and particularly preferably set to 50 g / l.
【0032】本発明の複合メッキ液は、上述の各種成分
の他に、一次光沢剤、二次光沢剤、複合メッキ被膜を着
色するための顔料などの、メッキ液に通常添加され得る
各種の添加剤を含んでいてもよい。The composite plating solution of the present invention may contain, in addition to the various components described above, various additives which can be usually added to the plating solution, such as a primary brightener, a secondary brightener, and a pigment for coloring the composite plating film. It may contain an agent.
【0033】本発明の複合メッキ液は、上述の通り、上
述の金属塩が溶解された水溶液中に変性フッ化ピッチ、
ヘキサフルオロエチレンパーフルオロアルコキシビニル
エーテル共重合体およびその他の添加剤などを添加して
混合・分散させると製造することができる。この際、変
性フッ化ピッチおよびヘキサフルオロエチレンパーフル
オロアルコキシビニルエーテル共重合体は、複合メッキ
被膜の撥水性の阻害原因となり得る界面活性剤を水溶液
中に添加しなくても、変性フッ化ピッチそのものが有す
る界面活性能により微粒子状で水溶液中に均一に分散し
得る。As described above, the composite plating solution of the present invention comprises a modified pitch fluoride in an aqueous solution in which the above-mentioned metal salt is dissolved.
It can be produced by adding and mixing and dispersing a hexafluoroethylene perfluoroalkoxy vinyl ether copolymer and other additives. At this time, the modified fluorinated pitch and the hexafluoroethylene perfluoroalkoxy vinyl ether copolymer can be used as a modified fluorinated pitch itself without adding a surfactant which may be a cause of inhibiting the water repellency of the composite plating film. It can be uniformly dispersed in an aqueous solution in the form of fine particles due to its surface activity.
【0034】上述の複合メッキ液を用いて複合メッキ被
膜を形成する場合は、上述のようにして調製された複合
メッキ液中に所定の基材を浸漬し、当該基材に対してメ
ッキ法を適用する。When a composite plating film is formed using the above-mentioned composite plating solution, a predetermined base material is immersed in the composite plating solution prepared as described above, and the plating method is applied to the base material. Apply.
【0035】この際、変性フッ化ピッチおよびヘキサフ
ルオロエチレンパーフルオロアルコキシビニルエーテル
共重合体による微粒子が複合メッキ被膜を構成する金属
母材層中でムラなく均一に分散するようにするため、複
合メッキ液は十分に撹拌するのが好ましい。撹拌方法
は、特に限定されるものではないが、例えば、スクリュ
ー撹拌、マグネチックスターラーによる撹拌など、公知
の種々の方法を採用することができる。また、メッキ法
としては、公知の無電解メッキ法や電解メッキ法を採用
することができる。この際のメッキ条件は、一般的な複
合メッキ法において採用されているものと同様に設定す
ることができる。具体的には、基材の性質や複合メッキ
液の種類などに応じて、液温、pH値および電流密度な
どを適宜設定することができる。At this time, in order to disperse the fine particles of the modified fluorinated pitch and the hexafluoroethylene perfluoroalkoxyvinyl ether copolymer evenly and uniformly in the metal base material layer constituting the composite plating film, a composite plating solution is used. Is preferably sufficiently stirred. The stirring method is not particularly limited, but various known methods such as screw stirring and stirring with a magnetic stirrer can be adopted. In addition, as the plating method, a known electroless plating method or electrolytic plating method can be adopted. The plating conditions at this time can be set in the same manner as those employed in a general composite plating method. Specifically, the solution temperature, pH value, current density, and the like can be appropriately set according to the properties of the base material, the type of the composite plating solution, and the like.
【0036】このような複合メッキ被膜の形成方法で
は、複合メッキ液中に含まれる金属塩が還元されて金属
になり、当該金属が基材上に電着する。これにより、基
材上に金属母材層が形成される。この際、複合メッキ液
中に含まれる変性フッ化ピッチおよびヘキサフルオロエ
チレンパーフルオロアルコキシビニルエーテル共重合体
が同時に共析し、金属母材層中に微粒子状で均一に分散
する。これにより、基材上には目的とする複合メッキ被
膜が形成される。In such a method of forming a composite plating film, the metal salt contained in the composite plating solution is reduced to a metal, and the metal is electrodeposited on the substrate. Thereby, a metal base material layer is formed on the base material. At this time, the modified pitch fluoride and the hexafluoroethylene perfluoroalkoxy vinyl ether copolymer contained in the composite plating solution are co-deposited at the same time, and are uniformly dispersed in the form of fine particles in the metal base material layer. Thereby, a target composite plating film is formed on the base material.
【0037】このようにして形成された複合メッキ被膜
は、さらに熱処理するのが好ましい。このような熱処理
を施すことにより、複合メッキ被膜の撥水性をより高め
ることができる。ここでの熱処理は、通常、処理温度を
150〜300℃に設定し、処理時間を30分〜2時間
に設定するのが好ましい。熱処理温度が150℃未満の
場合は、十分な熱処理効果を得るために熱処理時間を長
く設定する必要があり、効率的ではない。逆に、処理温
度が300℃を超える場合は、複合メッキ被膜が劣化す
るおそれがある。It is preferable that the composite plating film thus formed is further heat-treated. By performing such a heat treatment, the water repellency of the composite plating film can be further increased. In this heat treatment, it is usually preferable to set the processing temperature to 150 to 300 ° C. and the processing time to 30 minutes to 2 hours. When the heat treatment temperature is lower than 150 ° C., it is necessary to set a long heat treatment time in order to obtain a sufficient heat treatment effect, which is not efficient. Conversely, if the processing temperature exceeds 300 ° C., the composite plating film may be deteriorated.
【0038】このような複合メッキ被膜が適用される基
材は、通常、複合メッキ被膜により撥水性を付与する必
要があるものであり、例えば、下記の通りである。The substrate to which such a composite plating film is applied generally needs to be provided with water repellency by the composite plating film, and is, for example, as follows.
【0039】◎防錆性が要求される部材。例えば、各種
の建築用資材や船舶用資材など。 ◎着雪・着氷があると不都合が生じるおそれのある部
材。例えば、製氷板、送電線、パラボラアンテナなど。 ◎耐汚染性、撥油性、耐熱焦げ付き性などが要求される
部材。例えば、食器洗い機の内面、洗濯機水槽内面、レ
ンジフード、換気扇、テーブルコンロ天板、テーブルコ
ンロ汁受け皿、オーブン皿、焼き肉用鉄板、ロストル、
ジンギスカン鍋、フライパン、ごとく、焼き網、ガスコ
ンロ、オーブン、電子レンジ、炊飯器、バーベキューコ
ンロ、ホットプレート、鍋、オーブントースター、電気
ポット、電磁誘導ヒーター、システムキッチン天板、流
し台(シンク)、水栓、混合水栓、ガス管内外面コート
など。 ◎結露防止性が要求される部材。例えば、浴室の内装
材。 ◎撥水性および防汚性が要求される部材。例えば、浴
槽。 ◎熱伝導性が損なわれると不都合のある部材。例えば、
排気トップ、熱交換器のフィン部、炭素繊維表面コー
ト、炭素材コート、LNG気化器蒸発板、コピーローラ
ーなど。 ◎離型性が要求される部材。例えば、金型。 ◎撥水性および離氷性が要求される部材。例えば、航空
機およびヘリコプター用部品。 ◎摺動性が要求される部材。例えば、ガスバルブ内面コ
ートなど。 ◎良好な液切れ性が要求される部材。例えば、マイクロ
シリンジのニードル、ピペット、ディスペンサ、分液ロ
ートおよび一般のノズルなどの液体供給管。A member requiring rust prevention. For example, various building materials and ship materials. ◎ Materials that may cause inconvenience if snow or icing occurs. For example, ice plates, transmission lines, parabolic antennas, etc. ◎ Materials that are required to have stain resistance, oil repellency, heat scorch, etc. For example, the inner surface of a dishwasher, the inner surface of a washing machine tank, a range hood, a ventilation fan, a table stove top plate, a table stove juice saucer, an oven plate, a grilled iron plate, a roster,
Genghis Khan hot pot, frying pan, goku, grill, gas stove, oven, microwave oven, rice cooker, barbecue stove, hot plate, pot, oven toaster, electric pot, electromagnetic induction heater, system kitchen top plate, sink, faucet, Mixing faucet, gas pipe inner and outer coats, etc. ◎ Materials requiring dew condensation prevention. For example, bathroom interior materials. ◎ Materials requiring water repellency and antifouling properties. For example, a bathtub. ◎ A member that is inconvenient if thermal conductivity is impaired. For example,
Exhaust top, heat exchanger fins, carbon fiber surface coat, carbon material coat, LNG vaporizer evaporator plate, copy roller, etc. ◎ Materials requiring mold release properties. For example, a mold. ◎ A member that requires water repellency and ice repellency. For example, parts for aircraft and helicopters. ◎ Materials that require slidability. For example, gas valve inner surface coating. ◎ A member that requires good liquid drainage. For example, liquid supply tubes such as micro syringe needles, pipettes, dispensers, separating funnels and general nozzles.
【0040】このような基材を構成する具体的な材質
は、電気メッキ法を適用可能なものであれば特に限定さ
れるものではないが、例えば、銅、ステンレス鋼、一般
鋼、アルミニウムおよびアルミニウム合金などの各種金
属、炭素プレートや黒鉛プレートなどの炭素材などであ
る。The specific material constituting such a base material is not particularly limited as long as the electroplating method can be applied. Examples thereof include copper, stainless steel, general steel, aluminum and aluminum. Various metals such as alloys, and carbon materials such as carbon plates and graphite plates.
【0041】基材は、複合メッキ被膜との密着性を高め
るために、当該複合メッキ被膜が形成される部位が予め
微細な凹凸状に粗面化されていてもよい。このような粗
面化の方法としては、フッ化水素酸,フッ化アンモニウ
ムまたは塩酸などのエッチング剤水溶液を用いて基材を
化学的に処理する方法、或いはショットブラスト処理,
サンドブラスト処理,液体ホーニング処理およびスチー
ルワイヤやスチールウールを用いた研摩処理などの機械
的処理方法を採用することができる。In order to enhance the adhesion of the substrate to the composite plating film, the portion where the composite plating film is to be formed may be roughened in advance into fine irregularities. As such a method of surface roughening, a method of chemically treating a substrate using an aqueous solution of an etching agent such as hydrofluoric acid, ammonium fluoride, or hydrochloric acid, or a shot blast treatment,
Mechanical processing methods such as sandblasting, liquid honing, and polishing using steel wire or steel wool can be employed.
【0042】また、基材は、複合メッキ被膜が形成され
る面に、ニッケルメッキ層や銅メッキ層などの下地メッ
キ層を備えていてもよい。Further, the substrate may be provided with a base plating layer such as a nickel plating layer or a copper plating layer on the surface on which the composite plating film is formed.
【0043】上述のような複合メッキ被膜は、それに含
まれるフッ化ピッチおよびヘキサフルオロエチレンパー
フルオロアルコキシビニルエーテル共重合体の微粒子の
ために、良好な撥水性を発揮し得る。また、この複合メ
ッキ被膜は、その表面に摩擦力を加えたような場合であ
ってもフッ化ピッチの微粒子が脱落しにくい。この結
果、この複合メッキ被膜は、摩擦を受けた場合であって
も周辺の環境を汚染するおそれが少なく、また、撥水性
が長期間良好に維持され得る。この理由は詳らかではな
いが、フッ化ピッチと共に金属母材層中に分散している
ヘキサフルオロエチレンパーフルオロアルコキシビニル
エーテル共重合体の微粒子が、フッ化ピッチの微粒子を
金属母材層中に安定に保持する効果を発揮し得るためと
思われる。The composite plating film as described above can exhibit good water repellency because of fine particles of pitch fluoride and hexafluoroethylene perfluoroalkoxyvinyl ether copolymer contained therein. Further, in the composite plating film, even if frictional force is applied to the surface, fine particles of pitch fluoride are less likely to fall off. As a result, the composite plating film is less likely to contaminate the surrounding environment even when subjected to friction, and can maintain good water repellency for a long period of time. The reason for this is not clear, but the fine particles of the hexafluoroethylene perfluoroalkoxyvinyl ether copolymer dispersed in the metal base material layer together with the pitch fluoride are stably dispersing the fine pitch fluoride particles in the metal base material layer. It is thought that the effect of holding can be exhibited.
【0044】また、この複合メッキ被膜は、界面活性剤
を含まないため、ムラの発生や変色が少なく、仕上がり
具合、即ち外観が良好である。Further, since this composite plating film does not contain a surfactant, the occurrence of unevenness and discoloration are small, and the finished condition, that is, the appearance is good.
【0045】[0045]
【実施例】製造例(変性フッ化ピッチの製造) フッ化ピッチ(大阪瓦斯株式会社の試作品名“N−7−
25”)100gを200mlのエタノールに溶解し、
フッ化ピッチ溶液を得た。また、5gのN,N−ジメチ
ル−1,3−プロパンジアミンを200mlのエタノー
ルに溶解し、ジアミン化合物溶液を得た。EXAMPLES Production Example (Production of Modified Fluorinated Pitch) Pitch Fluoride (Prototype name "N-7-
25 ") Dissolve 100 g in 200 ml ethanol,
A pitch fluoride solution was obtained. Further, 5 g of N, N-dimethyl-1,3-propanediamine was dissolved in 200 ml of ethanol to obtain a diamine compound solution.
【0046】得られたフッ化ピッチ溶液とジアミン化合
物溶液とを常温下で混合したところ、フッ化ピッチと
N,N−ジメチル−1,3−プロパンジアミンとが発熱
しながら反応し、黒褐色の固形物(変性フッ化ピッチ)
が得られた。When the obtained pitch fluoride solution and the diamine compound solution were mixed at room temperature, the pitch fluoride and N, N-dimethyl-1,3-propanediamine reacted while generating heat, and a black-brown solid was formed. (Modified pitch fluoride)
was gotten.
【0047】実施例1〜3 スルファミン酸ニッケルを360g/l、塩化ニッケル
を45g/lおよびホウ酸を30g/l含むニッケルメ
ッキ水溶液を調製した。これに製造例で得られた変性フ
ッ化ピッチとヘキサフルオロエチレンパーフルオロアル
コキシビニルエーテル共重合体(ダイキン工業株式会社
の商品名“AD−2CR”:下記の表1において”PF
A”と表示する)とを合計量が50g/lになるよう表
1に示す割合で添加して微粒子状に均一に分散させ、さ
らに炭酸ニッケルを適宜添加してpHが4.2に調整さ
れた複合メッキ液を得た。 Examples 1 to 3 A nickel plating aqueous solution containing 360 g / l of nickel sulfamate, 45 g / l of nickel chloride and 30 g / l of boric acid was prepared. The modified fluorinated pitch and hexafluoroethylene perfluoroalkoxy vinyl ether copolymer obtained in Production Example (trade name "AD-2CR" of Daikin Industries, Ltd .: "PF-2" in Table 1 below)
A ") is added at a ratio shown in Table 1 so that the total amount becomes 50 g / l, uniformly dispersed in fine particles, and nickel carbonate is appropriately added to adjust the pH to 4.2. A composite plating solution was obtained.
【0048】得られた複合メッキ液に板状基材を浸漬し
て電解メッキ処理を施し、当該板状基材に複合メッキ被
膜を形成した。ここでは、板状基材として大きさが5.
0cm×5.0cmの鏡面を有するステンレス板(SU
S403)を用い、また、メッキ処理の条件を下記のよ
うに設定した。The plate-like substrate was immersed in the obtained composite plating solution and subjected to electrolytic plating to form a composite plating film on the plate-like substrate. Here, the size is 5.
A stainless steel plate (SU) having a mirror surface of 0 cm x 5.0 cm
S403), and plating conditions were set as follows.
【0049】 電流密度:3A/dm2 浴温度:50℃ 被膜の厚さ:10μmCurrent density: 3 A / dm 2 Bath temperature: 50 ° C. Coating thickness: 10 μm
【0050】実施例4〜6 実施例1〜3で得られた複合メッキ被膜を熱処理した。
ここでの熱処理条件は、300℃で30分に設定した。 Examples 4 to 6 The composite plating films obtained in Examples 1 to 3 were heat-treated.
The heat treatment conditions here were set at 300 ° C. for 30 minutes.
【0051】比較例1 ヘキサフルオロエチレンパーフルオロアルコキシビニル
エーテル共重合体を用いずに、製造例で得られた変性フ
ッ化ピッチのみを50g/lの割合で含む複合メッキ液
を調製し、実施例1〜3の場合と同様に複合メッキ被膜
を形成した。 Comparative Example 1 A composite plating solution containing only the modified fluorinated pitch obtained in the Production Example at a ratio of 50 g / l was prepared without using the hexafluoroethylene perfluoroalkoxy vinyl ether copolymer. In the same manner as in cases Nos. 1 to 3, a composite plating film was formed.
【0052】比較例2 比較例1で得られた複合メッキ被膜を熱処理した。ここ
での熱処理条件は、300℃で30分に設定した。 Comparative Example 2 The composite plating film obtained in Comparative Example 1 was heat-treated. The heat treatment conditions here were set at 300 ° C. for 30 minutes.
【0053】評価 各実施例および各比較例で得られた複合メッキ被膜につ
いて、蒸留水を滴下した場合の接触角および転落角を測
定し、また、フッ化ピッチ粉末の脱落試験および焦付き
試験を実施した。さらに、複合メッキ被膜の仕上がり具
合(外観)を評価した。なお、接触角および転落角は、
形成直後の複合メッキ被膜に対する場合(形成直後)お
よび十条キンバリー株式会社の商品名”キムワイプ”を
用いて表面を50回強く拭いた場合(摩擦処理後)のそ
れぞれについて測定した。また、焦付き試験は、摩擦処
理後の複合メッキ被膜について実施した。測定方法およ
び試験方法は下記の通りである。結果を表1に示す。 Evaluation With respect to the composite plating films obtained in the respective Examples and Comparative Examples, the contact angle and the falling angle when distilled water was dropped were measured, and the falling test and the burning test of the pitch fluoride powder were performed. Carried out. Further, the finished condition (appearance) of the composite plating film was evaluated. The contact angle and falling angle are
Measurements were made for the composite plating film immediately after formation (immediately after formation) and for the case where the surface was strongly wiped 50 times using “Kimwipe” (trade name of Jujo Kimberly Co., Ltd.) (after friction treatment). In addition, the burning test was performed on the composite plating film after the friction treatment. The measuring method and the test method are as follows. Table 1 shows the results.
【0054】(接触角)接触角計(協和界面科学株式会
社製の”CA−A型”)を用いて測定した。(Contact angle) The contact angle was measured using a contact angle meter ("CA-A type" manufactured by Kyowa Interface Science Co., Ltd.).
【0055】(転落角)接触角の測定で用いた接触角計
に直径が3mmの水滴を滴下して滴下面を水平面から徐
々に傾けて行き、水滴が流れるときの角度を転落角とし
た。(Falling Angle) A water drop having a diameter of 3 mm was dropped on the contact angle meter used in the measurement of the contact angle, and the dropping surface was gradually inclined from the horizontal plane.
【0056】(フッ化ピッチ粉末の脱落試験)上述のよ
うに複合メッキ被膜を摩擦処理した場合において、キム
ワイプに付着したフッ化ピッチ粉末の付着状況を目視で
判定した。評価の基準は次の通りである。 ○:付着なし。 △:僅かな付着がある。 ×:多量の付着がある。(Detachment Test of Fluoride Pitch Powder) When the composite plating film was subjected to the friction treatment as described above, the adhesion state of the fluorinated pitch powder adhered to the Kimwipe was visually determined. The evaluation criteria are as follows. :: No adhesion. Δ: There is slight adhesion. X: There is a large amount of adhesion.
【0057】(焦付き試験)タマゴ、醤油および砂糖の
混合液を調製し、これを複合メッキ被膜に滴下した。そ
して、複合メッキ被膜を250℃に加熱して混合液を焦
付かせ、その付着状態を目視で評価した。評価の基準は
下記の通りである。 ○:焦付きの付着なし。 △:焦付きの付着が僅かにある。 ×:著しい焦付きの付着がある。(Scorching Test) A mixed solution of egg, soy sauce and sugar was prepared and dropped onto the composite plating film. Then, the composite plating film was heated to 250 ° C. to cause the mixture to scorch, and the adhered state was visually evaluated. The evaluation criteria are as follows. :: no sticking adhesion. Δ: There is slight sticking adhesion. X: There is remarkable sticking.
【0058】(仕上がり具合)複合メッキ被膜を目視に
より観察し、ムラや変色の有無を判定した。評価の基準
は下記の通りである。 ○:ムラおよび変色がない。 △:僅かなムラおよび変色がある。 ×:明らかなムラおよび変色がある。(Finish Condition) The composite plating film was visually observed to determine the presence or absence of unevenness and discoloration. The evaluation criteria are as follows. :: No unevenness or discoloration. Δ: There is slight unevenness and discoloration. X: There is clear unevenness and discoloration.
【0059】[0059]
【表1】 [Table 1]
【0060】[0060]
【発明の効果】本発明の複合メッキ液は、ジアミン化合
物により処理されたフッ化ピッチと共にヘキサフルオロ
エチレンパーフルオロアルコキシビニルエーテル共重合
体を含んでいるため、高い撥水性を示し、しかもフッ化
ピッチの脱落が少ない複合メッキ被膜を実現することが
できる。Since the composite plating solution of the present invention contains hexafluoroethylene perfluoroalkoxy vinyl ether copolymer together with fluorinated pitch treated with a diamine compound, it exhibits high water repellency, A composite plating film with less falling off can be realized.
【0061】また、本発明に係る複合メッキ被膜の形成
方法は、本発明に係る上述の複合メッキ液を用いている
ので、高い撥水性を示し、しかもフッ化ピッチの脱落が
少ない複合メッキ被膜を形成することができる。In the method for forming a composite plating film according to the present invention, since the above-mentioned composite plating solution according to the present invention is used, a composite plating film exhibiting high water repellency and having a small amount of pitch fluoride fluoride falling off is obtained. Can be formed.
Claims (6)
フッ化ピッチおよびヘキサフルオロエチレンパーフルオ
ロアルコキシビニルエーテル共重合体を含む複合メッキ
液。1. A composite plating solution containing a metal salt, pitch fluoride treated with a diamine compound, and a hexafluoroethylene perfluoroalkoxy vinyl ether copolymer.
で示されるものである、請求項1に記載の複合メッキ
液。 【化1】 (式中、Rは炭素数が1〜3のアルキル基を、nは2〜
5の整数をそれぞれ示す。)2. The method according to claim 1, wherein the diamine compound is represented by the following general formula (1):
The composite plating solution according to claim 1, which is represented by: Embedded image (Wherein, R represents an alkyl group having 1 to 3 carbon atoms, and n represents 2 to
An integer of 5 is shown. )
1,3−プロパンジアミンである、請求項2に記載の複
合メッキ液。3. The method according to claim 1, wherein the diamine compound is N, N-dimethyl-
The composite plating solution according to claim 2, which is 1,3-propanediamine.
記ヘキサフルオロエチレンパーフルオロアルコキシビニ
ルエーテル共重合体を10〜50g/lそれぞれ含む請
求項1、2または3に記載の複合メッキ液。4. The composite plating solution according to claim 1, comprising 10 to 50 g / l of the pitch fluoride and 10 to 50 g / l of the hexafluoroethylene perfluoroalkoxy vinyl ether copolymer.
めの方法であって、 金属塩、ジアミン化合物により処理されたフッ化ピッチ
およびヘキサフルオロエチレンパーフルオロアルコキシ
ビニルエーテル共重合体を含む複合メッキ液を用意する
工程と、 前記複合メッキ液中に前記基材を浸漬し、前記基材に対
してメッキ法を適用する工程と、を含む複合メッキ被膜
の形成方法。5. A method for forming a composite plating film on a substrate, comprising a metal fluoride, pitch fluoride treated with a diamine compound and a hexafluoroethylene perfluoroalkoxy vinyl ether copolymer. A method for forming a composite plating film, comprising: preparing a solution; and immersing the substrate in the composite plating solution and applying a plating method to the substrate.
膜を熱処理する工程をさらに含む、請求項5に記載の複
合メッキ被膜の形成方法。6. The method for forming a composite plating film according to claim 5, further comprising a step of heat-treating the composite plating film obtained by said plating method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11118678A JP2000314000A (en) | 1999-04-26 | 1999-04-26 | Fluorine compound containing composite plating solution and formation of composite plated coating film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11118678A JP2000314000A (en) | 1999-04-26 | 1999-04-26 | Fluorine compound containing composite plating solution and formation of composite plated coating film |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2000314000A true JP2000314000A (en) | 2000-11-14 |
Family
ID=14742506
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11118678A Pending JP2000314000A (en) | 1999-04-26 | 1999-04-26 | Fluorine compound containing composite plating solution and formation of composite plated coating film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2000314000A (en) |
-
1999
- 1999-04-26 JP JP11118678A patent/JP2000314000A/en active Pending
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